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1. 发明授权

US06903489B2 Piezoelectric resonator, piezoelectric resonator component and method of making the same 失效
标题翻译：压电谐振器，压电谐振器元件及其制造方法
公开(公告)号：US06903489B2
公开(公告)日：2005-06-07
申请号：US09911392
申请日：2001-07-25
申请人： Toshiyuki Suzuki , Nobuyuki Miki
发明人： Toshiyuki Suzuki , Nobuyuki Miki
IPC分类号： H03H9/02 , H03H9/10 , H03H9/17 , H01L41/08
CPC分类号： H03H9/1014 , H03H9/02094 , H03H9/02133 , H03H9/0504 , H03H9/0514 , H03H9/177
摘要： A first vibrating electrode is provided on a first side of a piezoelectric substrate perpendicular to the thickness direction. A second vibrating electrode is provided on a second side opposite to the first side to face the first vibrating electrode. A first pad and a second pad are respectively formed on a side of the piezoelectric substrate perpendicular to the thickness direction in area having a small vibration displacement. The first pad and the second pad are electrically connected to the first vibrating electrode and the second vibrating electrode.
摘要翻译：第一振动电极设置在垂直于厚度方向的压电基板的第一侧上。第二振动电极设置在与第一侧相对的第二侧上以面对第一振动电极。第一焊盘和第二焊盘分别形成在垂直于厚度方向的压电基板的一侧，具有小振动位移的区域。第一焊盘和第二焊盘电连接到第一振动电极和第二振动电极。

2. 发明授权

US06404102B1 Piezoelectric resonator and piezoelectric resonator part 失效
标题翻译：压电谐振器和压电谐振器部分
公开(公告)号：US06404102B1
公开(公告)日：2002-06-11
申请号：US09631699
申请日：2000-08-03
申请人： Toshiyuki Suzuki , Nobuyuki Miki , Masakazu Hirose , Masayoshi Inoue
发明人： Toshiyuki Suzuki , Nobuyuki Miki , Masakazu Hirose , Masayoshi Inoue
IPC分类号： H01L4108
CPC分类号： H03H9/177 , H03H9/0207 , H03H9/02157 , H03H9/0504 , H03H9/1014
摘要： A piezoelectric substrate is constituted by a piezoelectric material of an effective Poisson's ratio being less than 1/3. The substrate has a pair of opposite faces and the opposite faces are provide with a pair of vibrating electrodes in correspondence. The opposite faces of the piezoelectric substrate are rectangular respectively. The sum of the lengths Lc of the one faces in the opposite faces 1a, 1b and the length Wc of the other side of the same is limited within range 2.22 mm≦≦2.24 mm or 2.34 mm≦≦2.48 mm, said one faces being vertical each other. The areas Sc of the opposite faces are 1.22 mm2≦Sc≦1.26 mm2 or 1.35 mm2≦Sc≦1.538 mm2. Accordingly, though using the piezoelectric material of the effective Poisson's ratio being less than 1/3, vibration in the thickness extensional fundamental waves can be steadily utilized.
摘要翻译：压电基板由有效泊松比的压电材料构成，小于1/3。基板具有一对相对的面，相对的面相应地设有一对振动电极。压电基板的相对面分别为矩形。相对面1a，1b中的一个面的长度Lc和其另一面的长度Wc的总和被限制在2.22mm <= 2.24mm或2.34mm <= <= 2.48mm的范围内，说一个人面对垂直。相对面的面积Sc为1.22 mm2 <= Sc <= 1.26 mm2或1.35 mm2 <= Sc <= 1.538 mm2。因此，尽管使用有效泊松比的压电材料小于1/3，但可以稳定地利用厚度延伸基波的振动。

3. 发明授权

US08802334B2 Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask 有权
标题翻译：面罩坯料的表面处理方法，掩模坯料的制造方法以及掩模的制造方法
公开(公告)号：US08802334B2
公开(公告)日：2014-08-12
申请号：US13440539
申请日：2012-04-05
申请人： Takeyuki Yamada , Toshiyuki Suzuki , Masahiro Hashimoto , Yasunori Yokoya
发明人： Takeyuki Yamada , Toshiyuki Suzuki , Masahiro Hashimoto , Yasunori Yokoya
IPC分类号： G03F1/00
CPC分类号： G03F1/68 , G03F1/80
摘要： Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.
摘要翻译：提供了一种掩模坯料表面处理方法，用于将具有薄膜的掩模坯料在基板上进行表面处理，使用处理液，形成转印图案的薄膜表面。该薄膜由可以通过基于离子的干蚀刻蚀刻的材料制成。包含在处理液中的蚀刻抑制剂的浓度为0.3ppb以下。

4. 发明授权

US08777347B2 Liquid discharging apparatus, inspection method, and medium having recorded program 有权
标题翻译：液体排放装置，检查方法和记录程序的介质
公开(公告)号：US08777347B2
公开(公告)日：2014-07-15
申请号：US13445992
申请日：2012-04-13
申请人： Osamu Shinkawa , Toshiyuki Suzuki
发明人： Osamu Shinkawa , Toshiyuki Suzuki
IPC分类号： B41J29/38
CPC分类号： B41J2/0451 , B41J2/04581
摘要： A printer has a plurality of dischargers for discharging ink, a detector for detecting an electric signal SW, and an inspector unit for inspecting the dischargers on the basis of the electric signal SW; and a grounding terminal connecting a drive element of a discharger being inspected is electrically disconnected from another grounding terminal and a grounding line GL when the electric signal SW is detected by the detector.
摘要翻译：打印机具有用于排出墨的多个放电器，用于检测电信号SW的检测器和用于基于电信号SW检查放电器的检查单元; 并且当检测器检测到电信号SW时，连接被检查的放电器的驱动元件的接地端子与另一接地端子和接地线GL电连接。

5. 发明授权

US08663876B2 Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same 有权
标题翻译：光掩模坯料，其制造方法，光掩模及其制造方法
公开(公告)号：US08663876B2
公开(公告)日：2014-03-04
申请号：US13201368
申请日：2010-02-04
申请人： Masahiro Hashimoto , Toshiyuki Suzuki , Hiroyuki Iwashita
发明人： Masahiro Hashimoto , Toshiyuki Suzuki , Hiroyuki Iwashita
IPC分类号： C23C16/34 , G03F1/22
CPC分类号： G03F1/50 , G03F1/32 , G03F1/54
摘要： A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide.
摘要翻译：用于制造适用于具有200nm以下的波长的曝光光的光掩模的光掩模坯料在透明基板上具有薄膜。薄膜由含有过渡金属，硅和碳的材料制成，并且包含碳化硅和/或过渡金属碳化物。

6. 发明授权

US08663875B2 Method of manufacturing a photomask 有权
标题翻译：制造光掩模的方法
公开(公告)号：US08663875B2
公开(公告)日：2014-03-04
申请号：US13201148
申请日：2010-01-29
申请人： Yasushi Okubo , Toshiyuki Suzuki , Masahiro Hashimoto
发明人： Yasushi Okubo , Toshiyuki Suzuki , Masahiro Hashimoto
IPC分类号： G03F1/48
CPC分类号： G03F1/48 , G03F1/32 , G03F1/54
摘要： A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to prevent the transfer characteristics of the thin film pattern from changing more than predetermined even in the case where exposure light with a wavelength of 200 nm or less is cumulatively applied onto the thin film pattern which has been formed. The main surface and the side walls are modified by, for instance, performing heat treatment to the main surface and the side walls at 450-900° C. in the atmosphere containing oxygen.
摘要翻译：在透明基板上形成由含有金属和硅的材料构成的薄膜，通过图案化薄膜形成薄膜图案。然后，预先修改薄膜图案的主表面和侧壁，以便即使在波长为200nm以下的曝光光为200nm以下的情况下，也能够防止薄膜图案的转印特性变化超过规定累积地施加到已经形成的薄膜图案上。主表面和侧壁通过例如在含有氧的气氛中在450-900℃下对主表面和侧壁进行热处理而进行改性。

7. 发明授权

US08659305B2 Detection device for detecting impedance of sensor element in gas sensor and sensor unit equipped with detection device 有权
标题翻译：用于检测气体传感器中传感器元件阻抗的检测装置和配备检测装置的传感器单元
公开(公告)号：US08659305B2
公开(公告)日：2014-02-25
申请号：US13108091
申请日：2011-05-16
申请人： Toshiyuki Suzuki
发明人： Toshiyuki Suzuki
IPC分类号： G01R27/04 , G01R27/00 , G01R27/08
CPC分类号： G01N27/4065
摘要： In a sensor control circuit, an impedance signal output unit has a HPF, a P/H circuit, a LPF, etc., and detects an element impedance of a sensor element on the basis of an impedance response signal which is alternately changed in response to an alternating current signal supplied to the sensor element. The P/H circuit has an input comparator which inputs an impedance detection voltage Vz after the HPF, a rectifying element connected to the P/H circuit, and a hold capacitor which is charged by the output of the input comparator. The input comparator has a constant current circuit and a transistor. The constant current circuit limits an updating value of a hold voltage value Vph of the hold capacitor every alternating current period. The sensor control device detects the element impedance of the sensor element with high accuracy while preventing influence of noise.
摘要翻译：在传感器控制电路中，阻抗信号输出单元具有HPF，P / H电路，LPF等，并且基于响应中交替改变的阻抗响应信号来检测传感器元件的元件阻抗提供给传感器元件的交流信号。 P / H电路具有输入比较器，其在HPF之后输入阻抗检测电压Vz，连接到P / H电路的整流元件和由输入比较器的输出充电的保持电容器。输入比较器具有恒流电路和晶体管。恒流电路每交流电流限制保持电容器的保持电压值Vph的更新值。传感器控制装置以高精度检测传感器元件的元件阻抗，同时防止噪声的影响。

8. 发明授权

US08216742B2 Fuel cell and gas separator for fuel cell 有权
公开(公告)号：US08216742B2
公开(公告)日：2012-07-10
申请号：US12531366
申请日：2008-11-17
申请人： Yoshinori Yamamoto , Toshiyuki Suzuki , Haruyuki Aono , Junichi Shirahama
发明人： Yoshinori Yamamoto , Toshiyuki Suzuki , Haruyuki Aono , Junichi Shirahama
IPC分类号： H01M8/04 , H01M2/38
CPC分类号： H01M8/0254 , H01M8/0258 , H01M8/0265
摘要： In at least one of flow distribution areas 35 provided on a separator 15, plurality of first projections 46 formed in a region corresponding to a first section (parted regions 32a and 32c) of a center area (including parted regions 32a through 32c) having a relatively high flow rate of a first fluid (refrigerant) are designed to have a larger diameter of a cross section than plurality of first projections 46 formed in a region corresponding to a second section (parted region 32b) of the center area having a relatively low flow rate of the first fluid. This arrangement effectively attains a substantially uniform flow rate distribution of a fluid in a fluid flow path formed on a separator, which is configured to have concavo-convex structures formed in a mutually reversed relation on two opposed sides thereof.

9. 发明授权

US08100491B2 Liquid jet apparatus and printing apparatus 有权
公开(公告)号：US08100491B2
公开(公告)日：2012-01-24
申请号：US11780357
申请日：2007-07-19
申请人： Atsushi Oshima , Kunio Tabata , Toshiyuki Suzuki , Osamu Shinkawa , Tomoki Hatano
发明人： Atsushi Oshima , Kunio Tabata , Toshiyuki Suzuki , Osamu Shinkawa , Tomoki Hatano
IPC分类号： B41J29/38
摘要： A liquid jet apparatus includes a plurality of nozzles provided to the liquid jet head, an actuator provided corresponding to each of the nozzles, drive unit that applies a drive signal to the actuator, drive waveform signal generation unit that generates a drive waveform signal providing a reference of a signal for controlling the actuator, modulator unit that pulse-modulates the drive waveform signal generated by the drive waveform signal generation unit, a digital power amplifier for power-amplifying the modulated signal, which is pulse-modulated by the modulator unit, and a low-pass filter provided individually corresponding to the actuator and for supplying the actuator with the power amplified modulated signal power-amplified by the digital power amplifier as a drive signal after smoothing.

10. 发明申请

US20110217635A1 METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：制造转移掩模的方法和制造半导体器件的方法
公开(公告)号：US20110217635A1
公开(公告)日：2011-09-08
申请号：US13122680
申请日：2010-10-08
申请人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
发明人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
IPC分类号： G03F1/00
CPC分类号： G03F1/46 , G03F1/54 , G03F1/80 , G03F1/82
摘要： The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask. In the manufacturing method, the transfer mask is produced by performing, in the following order, a process of forming a resist film having a transfer pattern on the chromium-based thin film, a process of forming a transfer pattern in the chromium-based thin film with use of a mask of the resist film having the transfer pattern, a process of forming a transfer pattern in the thin film for pattern formation with use of a mask of the chromium-based thin film having the transfer pattern, and a process of removing the chromium-based thin film by etching. The manufacturing method further includes a cleaning process of at least one of alkali solution cleaning, hot water cleaning, and ozone-containing water cleaning on the produced transfer mask until a width of the transfer pattern of the thin film for pattern formation is reduced by 4 nm or a space width of the thin film for pattern formation is increased by 4 nm.
摘要翻译：本发明是一种使用掩模坯料制造转印掩模的方法，其中用于图案形成的薄膜和由含铬材料制成的铬基薄膜依次层叠在透明基板上。用于图案形成的薄膜由含有硅和除铬以外的过渡金属的材料制成。铬基薄膜由含铬的材料制成。将具有200nm以下波长的曝光光施加到转印掩模。在制造方法中，通过以下顺序，通过在铬系薄膜上形成具有转印图案的抗蚀剂膜的工序来制造转印掩模，在铬系薄膜中形成转印图案的工序使用具有转印图案的抗蚀剂膜的掩模的膜，使用具有转印图案的铬基薄膜的掩模在图案形成用薄膜中形成转印图案的工序，以及通过蚀刻去除铬基薄膜。该制造方法还包括在制造的转印掩模上进行碱溶液清洗，热水清洗和含臭氧水清洗中的至少一种的清洗处理，直到图案形成用薄膜的转印图案的宽度减少4 nm或用于图案形成的薄膜的空间宽度增加4nm。

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