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1. 发明申请

US20070265378A1 Polyvinyl Chloride Fiber Reduced in Initial Coloration 审中-公开
标题翻译：初始着色中聚氯乙烯纤维减少
公开(公告)号：US20070265378A1
公开(公告)日：2007-11-15
申请号：US11663467
申请日：2005-09-29
申请人： Toshiyuki Kawaguchi , Yuichi Ohyama , Toshihiko Hirose
发明人： Toshiyuki Kawaguchi , Yuichi Ohyama , Toshihiko Hirose
IPC分类号： C08K5/07 , A41G3/00 , D01F6/48
CPC分类号： C08K5/07 , A41G3/0083 , C08K5/098 , D01F1/10 , D01F6/48 , C08L27/06
摘要： The polyvinyl chloride-based fiber of the present invention is a polyvinyl chloride-based fiber formed of a vinyl chloride-based resin composition that is obtained by blending, with respect to 100 parts by weight of a mixture (a) containing 95 wt % to 50 wt % of a vinyl chloride-based resin and 5 wt % to 50 wt % of a chlorinated vinyl chloride resin, 0.5 parts by weight to 3 parts by weight of a hydrotalcite-based thermostabilizer (b), 0.5 parts by weight to 2 parts by weight of a metallic soap-based thermostabilizer (c), and 0.5 parts by weight to 1.2 parts by weight of β-diketone as a stabilizing aid (d). This polyvinyl chloride-based fiber has excellent spinnability, excellent transparency, small initial coloration and excellent colorability, and thus has a high commercial value as artificial hair for hair adornment, and can be used widely for practical goods and fashion purposes. Moreover, due to this property, the polyvinyl chloride-based fiber also can be applied to a field of industrial materials and the like besides artificial hair.
摘要翻译：本发明的聚氯乙烯系纤维是由氯乙烯系树脂组合物形成的聚氯乙烯系纤维，其相对于100重量份的含有95重量％以上的混合物（a）〜 50重量％的氯乙烯类树脂和5重量％〜50重量％的氯化氯乙烯树脂，0.5重量份〜3重量份的水滑石类热稳定剂（b），0.5重量份〜2重量％重量份的金属皂基热稳定剂（c）和0.5重量份至1.2重量份的作为稳定助剂的β-二酮（d）。该聚氯乙烯类纤维具有优异的可纺性，优异的透明性，初期着色性和着色性优异，作为头发装饰用的人造毛发具有高的商业价值，可广泛用于实用的商品和时尚用途。此外，由于该性能，聚氯乙烯系纤维也可以应用于除人造毛发以外的工业材料等领域。

2. 发明申请

US20070120765A1 Backlight, display apparatus and light source controlling method 失效
标题翻译：背光源，显示装置和光源控制方法
公开(公告)号：US20070120765A1
公开(公告)日：2007-05-31
申请号：US11581667
申请日：2006-10-16
申请人： Takehiro Misonou , Yuichi Ohyama
发明人： Takehiro Misonou , Yuichi Ohyama
IPC分类号： G09G3/18
CPC分类号： G09G3/342 , G09G2310/024 , G09G2320/0233 , G09G2320/0242 , G09G2360/145 , G09G2360/16
摘要： A backlight for illuminating the back of a display section includes a plurality of light sources disposed in positions corresponding to a display area of the display section; a diffusion member configured to transmit light from the light sources to the display section; a photo-sensor; a light guiding member configured to introduce the light from the light sources to the photo-sensor for detection; and an arithmetic operation processing section configured to calculate the luminance or chromaticity of each of the light sources from the luminance or chromaticity detected by the photo-sensor.
摘要翻译：用于照亮显示部分的背面的背光源包括设置在与显示部分的显示区域对应的位置的多个光源; 扩散构件，被配置为将来自所述光源的光透射到所述显示部; 光电传感器; 导光构件，被配置为将来自所述光源的光引入所述光传感器以进行检测; 以及算术运算处理部，被配置为根据由所述光传感器检测的亮度或色度来计算每个所述光源的亮度或色度。

3. 发明授权

US06339653B1 Inspection data analyzing system 失效
标题翻译：检验数据分析系统
公开(公告)号：US06339653B1
公开(公告)日：2002-01-15
申请号：US09523380
申请日：2000-03-10
申请人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
发明人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
IPC分类号： G06K900
CPC分类号： G01N21/88 , G01N21/956 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides data analysis stations respectively for a probing tester and an automatic particle inspection machine. And, in the data analysis station, the coordinates on which the disposition of the chips are described on a product basis are equal to those on which the locations of the defects are described. Further, the station provides a function of determining which of the chips each defect belongs to. These data analysis stations are connected through a communication line. The present invention is capable of analyzing the data on a chip basis, resulting in being able to grasp the relation between how the defects are caused on each chip and the product character of the chip.
摘要翻译：本发明分别提供用于探测器和自动粒子检测机的数据分析台。并且，在数据分析站中，以产品为基础描述芯片的配置的坐标与描述缺陷的位置的坐标相同。此外，该站提供确定每个缺陷属于哪个芯片的功能。这些数据分析站通过通信线连接。本发明能够基于芯片分析数据，从而能够掌握每个芯片上的缺陷引起的芯片与芯片的产品特性之间的关系。

4. 发明授权

US5841893A Inspection data analyzing system 失效
公开(公告)号：US5841893A
公开(公告)日：1998-11-24
申请号：US908550
申请日：1992-06-30
申请人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
发明人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
IPC分类号： H01L21/66 , G01N21/88 , G01N21/956 , G06K9/00
CPC分类号： G01N21/88 , G01N21/956 , H01L22/20 , H01L2924/0002
摘要： The present invention provides data analysis stations respectively for a probing tester and an automatic particle inspection machine. And, in the data analysis station, the coordinates on which the disposition of the chips are described on a product basis are equal to those on which the locations of the defects are described. Further, the station provides a function of determining which of the chips each defect belongs to. These data analysis stations are connected through a communication line. The present invention is capable of analyzing the data on a chip basis, resulting in being able to grasp the relation between how the defects are caused on each chip and the product character of the chip.

5. 发明授权

US06542830B1 Process control system 有权
标题翻译：过程控制系统
公开(公告)号：US06542830B1
公开(公告)日：2003-04-01
申请号：US09142546
申请日：1998-09-10
申请人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
发明人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
IPC分类号： H01L2166
CPC分类号： H01L22/20 , G01N21/9501 , G01R31/2894 , G01R33/06 , H01L2223/54466 , H01L2924/0002 , H01L2924/00
摘要： A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
摘要翻译：根据本发明的处理管理系统包括用于检查晶片上的缺陷的检查装置，通过通信网络连接的检查装置，从这些检查装置获得的检查信息和图像信息被收集以构建数据库和图像文件，其中缺陷的定义通过基于检查信息和从检查装置获得的图像信息来表征缺陷的元件的组合来给出。通过给出缺陷的定义，可以细分和知道缺陷的特征。因此，可以研究缺陷的原因。

6. 发明授权

US06529619B2 Inspection data analyzing system 失效
标题翻译：检验数据分析系统
公开(公告)号：US06529619B2
公开(公告)日：2003-03-04
申请号：US09893889
申请日：2001-06-29
申请人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
发明人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
IPC分类号： G06K900
CPC分类号： G01N21/88 , G01N21/956 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides data analysis stations respectively for a probing tester and an automatic particle inspection machine. And in the data analysis station, the coordinates on which the disposition of the chips are described on a product basis are equal to those on which the locations of the defects are described. Further, the station provides a function of determining which of the chips each defect belongs to. These data analysis stations are connected through a communication line. The present invention is capable of analyzing the data on a chip basis, resulting in being able to grasp the relation between how the defects are caused on each chip and the product character of the chip.
摘要翻译：本发明分别提供用于探测器和自动粒子检测机的数据分析台。并且在数据分析站中，以产品为基础描述芯片的配置的坐标与描述缺陷的位置的坐标相同。此外，该站提供确定每个缺陷属于哪个芯片的功能。这些数据分析站通过通信线连接。本发明能够基于芯片分析数据，从而能够掌握每个芯片上的缺陷引起的芯片与芯片的产品特性之间的关系。

7. 发明授权

US4583223A Testing system 失效
标题翻译：测试系统
公开(公告)号：US4583223A
公开(公告)日：1986-04-15
申请号：US475158
申请日：1983-03-14
申请人： Fumihito Inoue , Yuichi Ohyama , Kinichi Nakahara , Kazuhiko Kimura
发明人： Fumihito Inoue , Yuichi Ohyama , Kinichi Nakahara , Kazuhiko Kimura
IPC分类号： G01R31/28 , G01R31/316 , G01R31/319
CPC分类号： G01R31/31917
摘要： A first signal generator and a second signal generator for setting measuring conditions of a connection pin of a device under test are disposed in each of a number of signal transmission circuits. Each of the signal generators stores therein information for setting a measuring condition in the form of a digital data, which is D-A converted, and this D-A converted output determines the measuring condition. Analog switches are disposed for selecting as a measuring condition of the connection pin either the D-A converted output of the first signal generator or that of the second signal generator. A first discriminator and a second discriminator for discriminating the quality of measured results of the connection pin of the device under test are disposed in each of the signal transmission circuits. In each of the discriminators, reference value information for discriminating the quality is stored in the form of digital data, which is D-A converted, and this D-A converted output and a measured result of the connection pin are compared with each other. A controller controls the operation of each of the signal transmission circuits.
摘要翻译：设置在多个信号传输电路的每一个中的第一信号发生器和用于设置被测器件的连接引脚的测量条件的第二信号发生器。每个信号发生器存储用于设置D-A转换的数字数据形式的测量条件的信息，并且该D-A转换的输出确定测量条件。配置模拟开关用于选择连接引脚的测量条件，即第一信号发生器的D-A转换输出或第二信号发生器的输出。在每个信号传输电路中设置用于区分被测器件的连接引脚的测量结果的质量的第一鉴别器和第二鉴别器。在每个鉴别器中，用于识别质量的参考值信息以D-A转换的数字数据的形式存储，并且将该D-A转换输出和连接引脚的测量结果相互比较。控制器控制每个信号传输电路的操作。

8. 发明授权

US08085238B2 Backlight, display apparatus and light source controlling method 失效
标题翻译：背光源，显示装置和光源控制方法
公开(公告)号：US08085238B2
公开(公告)日：2011-12-27
申请号：US11581667
申请日：2006-10-16
申请人： Takehiro Misonou , Yuichi Ohyama
发明人： Takehiro Misonou , Yuichi Ohyama
IPC分类号： G09G3/36
CPC分类号： G09G3/342 , G09G2310/024 , G09G2320/0233 , G09G2320/0242 , G09G2360/145 , G09G2360/16
摘要： A backlight for illuminating the back of a display section includes a plurality of light sources disposed in positions corresponding to a display area of the display section; a diffusion member configured to transmit light from the light sources to the display section; a photo-sensor; a light guiding member configured to introduce the light from the light sources to the photo-sensor for detection; and an arithmetic operation processing section configured to calculate the luminance or chromaticity of each of the light sources from the luminance or chromaticity detected by the photo-sensor.
摘要翻译：用于照亮显示部分的背面的背光源包括设置在与显示部分的显示区域对应的位置的多个光源; 扩散构件，被配置为将来自所述光源的光透射到所述显示部; 光电传感器; 导光构件，被配置为将来自所述光源的光引入所述光传感器以进行检测; 以及算术运算处理部，被配置为根据由所述光传感器检测的亮度或色度来计算每个所述光源的亮度或色度。

9. 发明授权

US06757621B2 Process management system 失效
标题翻译：流程管理系统
公开(公告)号：US06757621B2
公开(公告)日：2004-06-29
申请号：US10342871
申请日：2003-01-16
申请人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
发明人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
IPC分类号： H01L2166
CPC分类号： H01L22/20 , G01N21/9501 , G01R31/2894 , G01R33/06 , H01L2223/54466 , H01L2924/0002 , H01L2924/00
摘要： A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
摘要翻译：根据本发明的处理管理系统包括用于检查晶片上的缺陷的检查装置，通过通信网络连接的检查装置，从这些检查装置获得的检查信息和图像信息被收集以构建数据库和图像文件，其中缺陷的定义通过基于检查信息和从检查装置获得的图像信息来表征缺陷的元件的组合来给出。通过给出缺陷的定义，可以细分和知道缺陷的特征。因此，可以研究缺陷的原因。

10. 发明授权

US06628817B2 Inspection data analyzing system 失效
公开(公告)号：US06628817B2
公开(公告)日：2003-09-30
申请号：US09752674
申请日：2001-01-03
申请人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
发明人： Seiji Ishikawa , Masao Sakata , Jun Nakazato , Sadao Shimoyashiro , Hiroto Nagatomo , Yuzo Taniguchi , Osamu Satou , Tsutomu Okabe , Yuzaburo Sakamoto , Kimio Muramatsu , Kazuhiko Matsuoka , Taizo Hashimoto , Yuichi Ohyama , Yutaka Ebara , Isao Miyazaki , Shuichi Hanashima
IPC分类号： G06K900
CPC分类号： G01N21/88 , G01N21/956 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention provides data analysis stations respectively for a probing tester and an automatic particle inspection machine. And, in the data analysis station, the coordinates on which the disposition of the chips are described on a product basis are equal to those on which the locations of the defects are described. Further, the station provides a function of determining which of the chips each defect belongs to. These data analysis stations are connected through a communication line. The present invention is capable of analyzing the data on a chip basis, resulting in being able to grasp the relation between how the defects are caused on each chip and the product character of the chip.

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