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1. 发明申请

US20120181239A1 CHEMICAL LIQUID SUPPLY METHOD AND CHEMICAL LIQUID SUPPLY SYSTEM 有权
标题翻译：化学液体供应方法和化学液体供应系统
公开(公告)号：US20120181239A1
公开(公告)日：2012-07-19
申请号：US13351284
申请日：2012-01-17
申请人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
发明人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
IPC分类号： B01D57/00
CPC分类号： G03F7/162 , H01L21/67017 , H01L21/6715
摘要： There is provided a chemical liquid supply system configured to filter a chemical liquid by opening/closing operations of first and second opening/closing valves and a supply/exhaust operation. The chemical liquid supply system includes a pressure sensor, a flow meter, an electro-pneumatic regulator and a controller. The pressure sensor detects a pressure in the operation room when the first opening/closing valve is opened at a time of starting a replenishment of the chemical liquid into the chemical liquid pump. The flow rate sensor detects an exhaust flow rate exhausted from the operation room. The controller adjusts an exhaust pressure by controlling the electro-pneumatic regulator based on the detected pressure and the detected exhaust flow rate so as not to cause an excessive pressure change when the replenishment of the chemical liquid is started.
摘要翻译：提供了一种配置成通过第一和第二开/关阀的打开/关闭操作和供给/排出操作来过滤化学液体的化学液体供应系统。化学液体供应系统包括压力传感器，流量计，电动气动调节器和控制器。压力传感器在开始补充化学液体进入化学液体泵时开启第一开闭阀时检测手术室内的压力。流量传感器检测从手术室排出的排气流量。控制器通过基于检测到的压力和检测到的废气流量控制电动气动调节器来调节排气压力，以便在开始补充化学液体时不会引起过大的压力变化。

2. 发明授权

US09372405B2 Chemical liquid supply method and chemical liquid supply system 有权
标题翻译：化学液体供应方式和化学液体供应系统
公开(公告)号：US09372405B2
公开(公告)日：2016-06-21
申请号：US13351284
申请日：2012-01-17
申请人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
发明人： Toshinobu Furusho , Takahiro Ookubo , Takashi Sasa , Tsuyoshi Nogami
IPC分类号： B01D57/00 , G03F7/16 , H01L21/67
CPC分类号： G03F7/162 , H01L21/67017 , H01L21/6715
摘要： The pressure sensor detects a pressure in the operation chamber when the first opening/closing valve is opened at a time of starting a replenishment of the chemical liquid into the chemical liquid pump. The flow rate sensor detects an exhaust flow rate exhausted from the operation chamber.
摘要翻译：压力传感器在开始补充化学液体进入药液泵时开启第一打开/关闭阀时检测操作室中的压力。流量传感器检测从操作室排出的排气流量。

3. 发明授权

US09086190B2 Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus 有权
标题翻译：化学供应系统，包括其的基底处理装置以及包含相同装置的涂层和显影系统
公开(公告)号：US09086190B2
公开(公告)日：2015-07-21
申请号：US13695844
申请日：2011-03-16
申请人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
发明人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
IPC分类号： B05C5/00 , F17D1/00 , H01L21/67 , B05C9/06
CPC分类号： B05D1/02 , B01D29/56 , B01D35/02 , B05C9/06 , B05C11/10 , F17D1/00 , H01L21/67017 , H01L21/6715 , H01L21/67173 , H01L21/67178 , Y10T137/794
摘要： A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.
摘要翻译：化学品供应系统包括：第一容器和用于储存化学溶液的第二容器; 第一泵，位于连接第一和第二容器的第一管上，用于将存储在第一容器中的溶液引导到第二容器; 以及位于第一管道中的第一过滤器，用于将从第一容器流过第一管道的溶液过滤到第二容器。该系统还包括：用于连接第一容器和第二容器的第二管; 以及位于第二管上的用于将存储在第二容器中的溶液引导到第一容器的第二泵。

4. 发明申请

US20130068324A1 CHEMICAL SUPPLY SYSTEM, SUBSTRATE TREATMENT APPARATUS INCORPORATING THE SAME, AND COATING AND DEVELOPING SYSTEM INCORPORATING THE SAME APPARATUS 有权
公开(公告)号：US20130068324A1
公开(公告)日：2013-03-21
申请号：US13695844
申请日：2011-03-16
申请人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
发明人： Toshinobu Furusho , Takahiro Ookubo , Kousuke Yoshihara , Yusuke Yamamoto , Steffen Hornig
IPC分类号： F17D1/00
CPC分类号： B05D1/02 , B01D29/56 , B01D35/02 , B05C9/06 , B05C11/10 , F17D1/00 , H01L21/67017 , H01L21/6715 , H01L21/67173 , H01L21/67178 , Y10T137/794
摘要： A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.

5. 发明授权

US06848625B2 Process liquid supply mechanism and process liquid supply method 有权
标题翻译：工艺液体供给机构和工艺液体供应方式
公开(公告)号：US06848625B2
公开(公告)日：2005-02-01
申请号：US10388357
申请日：2003-03-14
申请人： Takashi Takekuma , Toshinobu Furusho , Takeshi Ohto , Hiroyuki Miyamoto , Kousuke Yoshihara , Shinya Hori , Hiroyuki Hara
发明人： Takashi Takekuma , Toshinobu Furusho , Takeshi Ohto , Hiroyuki Miyamoto , Kousuke Yoshihara , Shinya Hori , Hiroyuki Hara
IPC分类号： H01L21/00 , B05B17/00
CPC分类号： H01L21/67253 , H01L21/6715
摘要： A process liquid supply mechanism for supplying a process liquid comprises a process liquid supply source for supplying a process liquid, a process liquid discharging nozzle for discharging the process liquid, a pipe connecting the process liquid supply source to the process liquid discharging nozzle, a pump mounted to the pipe for allowing the process liquid to be discharged from the process liquid discharging nozzle, a pressure sensor for detecting the pressure of the process liquid at a prescribed position intermediate between the pump and the process liquid discharging nozzle, and a controller for controlling the inner pressure of the pump based on the pressure value detected by the pressure sensor and the relationship obtained in advance between the pressure and the discharging rate of the process liquid such that the process liquid is discharged at a prescribed discharging rate.
摘要翻译：一种用于提供处理液的处理液供给机构包括：用于供给处理液的处理液供给源，用于排出处理液的处理液排出喷嘴，将处理液供给源与处理液排出喷嘴连接的管，泵安装到管道上以允许处理液体从处理液体排放喷嘴排出;压力传感器，用于检测在泵和处理液体排放喷嘴之间的预定位置处的处理液体的压力;以及控制器，用于控制基于由压力传感器检测到的压力值的泵的内部压力以及预处理液体的压力和排出速率之间获得的关系，使得处理液体以规定的排出速率排出。

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