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1. 发明申请

US20060255720A1 METHOD OF FORMING FILM PATTERN, FILM PATTERN, DEVICE, ELECTRO OPTIC DEVICE, AND ELECTRONIC APPARATUS 有权
标题翻译：形成薄膜图案，薄膜图案，器件，电光器件和电子设备的方法
公开(公告)号：US20060255720A1
公开(公告)日：2006-11-16
申请号：US11382555
申请日：2006-05-10
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA , Shinri SAKAI
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA , Shinri SAKAI
IPC分类号： H05B33/00 , H01L51/50
CPC分类号： H01L51/0005 , H01L27/3295
摘要： A method of forming a film pattern by placing a functional liquid on a substrate, comprises: forming a bank on the substrate, wherein the bank corresponds to a region for forming the film pattern; placing the functional liquid in the region for forming the film pattern partitioned by the bank; and curing the functional liquid to form the film pattern; wherein the functional liquid is placed under conditions that a difference between an advancing contact angle and a receding contact angle of the functional liquid with a top surface of the bank is 10 degrees or more and that the receding contact angle is 13 degrees or more.
摘要翻译：通过将功能性液体放置在基板上来形成膜图案的方法包括：在所述基板上形成堤，其中所述堤对应于用于形成所述膜图案的区域; 将功能液体放置在用于形成由堤岸分隔的膜图案的区域中; 并固化功能液体以形成膜图案; 其特征在于，所述功能液在所述功能液与所述堤的顶面之间的前进接触角与后退接触角之间的差为10度以上且所述后退接触角为13度以上的条件下配置。

2. 发明申请

US20060255735A1 METHOD OF FORMING BANK, METHOD OF FORMING FILM PATTERN, SEMICONDUCTOR DEVICE, ELECTRO OPTIC DEVICE, AND ELECTRONIC APPARATUS 审中-公开
标题翻译：形成银行的方法，形成薄膜图案的方法，半导体器件，电光器件和电子设备
公开(公告)号：US20060255735A1
公开(公告)日：2006-11-16
申请号：US11381834
申请日：2006-05-05
申请人： Katsuyuki MORIYA , Toshimitsu HIRAI
发明人： Katsuyuki MORIYA , Toshimitsu HIRAI
IPC分类号： H01J17/02
CPC分类号： G03F7/168 , G02F2001/136295 , G03F7/0045 , G03F7/0757 , G03F7/40 , H01L27/3244 , H01L27/3295 , H01L51/0005
摘要： A method of forming a bank that partitions a region for forming a film pattern made of a functional liquid, includes: forming a bank film made of a photo resist by applying a photo resist liquid onto a substrate and drying the photo resist liquid; performing a lyophobic treatment for the bank film by using a lyophobic treatment gas and plasma; reducing a lyophobic property by selectively applying ultraviolet rays to the bank film after the lyophobic treatment with a mask; selectively exposing the bank film after the lyophobic treatment to light with the mask; developing and patterning the bank film after reducing the lyophobic property and exposing the bank film to light so as to form the bank; wherein the lyophobic property is reduced and the bank film is exposed to light continuously or at the same time with the same mask.
摘要翻译：一种形成分隔用于形成由功能液体形成的薄膜图案的区域的堤的方法，包括：通过将光致抗蚀剂液体涂覆在基板上并干燥光致抗蚀剂液体，形成由光致抗蚀剂制成的堤膜; 通过使用疏液处理气体和等离子体对银膜进行疏液处理; 通过用掩模进行疏液处理后选择性地将紫外线施加到堤膜上来降低疏液性; 在疏液处理后将堤膜选择性地暴露于面罩上; 在降低泄露性能后，开发银行电影图案，并将银行薄膜曝光以形成银行; 其中疏液性降低，并且银膜被连续地或同时用相同的掩模曝光。

3. 发明申请

US20070020834A1 METHOD FOR FORMING FILM PATTERN, AND METHOD FOR MANUFACTURING DEVICE, ELECTRO-OPTICAL DEVICE, ELECTRONIC APPARATUS AND ACTIVE MATRIX SUBSTRATE 失效
标题翻译：用于形成薄膜图案的方法和制造装置的方法，电光装置，电子装置和主动矩阵基板
公开(公告)号：US20070020834A1
公开(公告)日：2007-01-25
申请号：US11458531
申请日：2006-07-19
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA
IPC分类号： H01L21/8234
CPC分类号： H01L51/0005 , H01L27/1292 , H01L27/3295 , H01L29/66765 , H05K3/125 , H05K3/1258 , H05K2201/09727 , H05K2203/013 , H05K2203/0568 , H05K2203/0577
摘要： A method for forming a film pattern, comprises: disposing a first bank forming material to a substrate so as to form a first bank layer; disposing a second bank forming material on the first bank layer so as to form a second bank layer; and pattering the first bank layer and the second bank layer so as to form a bank including a pattern forming region having a first pattern forming region and a second pattern forming region, the second pattern forming region having a width larger than a width of the first pattern forming region, and being continuously formed from the first pattern forming region, wherein the first bank layer has a sidewall facing the pattern forming region and a first contact angle of less than 50 degrees with respect to a functional liquid containing H2O on the sidewall, and the second bank layer has a second contact angle larger than the first contact angle with respect to the functional liquid.
摘要翻译：一种形成膜图案的方法，包括：将第一堤形成材料设置在基板上以形成第一堤层; 在第一堤层上设置第二堤形成材料，以形成第二堤层; 以及形成第一堤层和第二堤层以形成包括具有第一图案形成区域和第二图案形成区域的图案形成区域的堤岸，第二图案形成区域的宽度大于第一图案形成区域的宽度，图案形成区域，并且从第一图案形成区域连续地形成，其中第一堤层具有面向图案形成区域的侧壁和相对于包含H 2的功能液体的小于50度的第一接触角并且第二堤层相对于功能液体具有大于第一接触角的第二接触角。

4. 发明申请

US20060275539A1 TRANSPARENT CONDUCTIVE FILM AND METHOD FORMING THEREOF, ELECTROOPTIC DEVICE AND ELECTRONIC APPARATUS 审中-公开
标题翻译：透明导电膜及其形成方法，电子设备和电子设备
公开(公告)号：US20060275539A1
公开(公告)日：2006-12-07
申请号：US11382094
申请日：2006-05-08
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA
IPC分类号： B05D5/12 , B05D3/02 , B05D5/00
CPC分类号： C23C18/06 , C23C18/04 , C23C18/1216 , C23C18/1225 , G02F1/13439 , H01L27/1292 , H01L2924/0002 , H01L2924/00
摘要： A method of forming a transparent conductive film on a substrate, comprises: forming a bank with a material including polysiloxane as a main component, wherein the bank corresponds to a region for forming the transparent conductive film; placing a first functional liquid including transparent conductive micro particles in a region partitioned by the bank by a liquid droplet discharging method; forming a first layered film by drying the first functional liquid; placing a second functional liquid including a metal compound on the first layered film by a liquid droplet discharging method; forming a transparent conductive layer composed of the first layered film and a metal oxide material, which is filled in holes formed in the first layered film, by burning the first layered film and the second functional liquid in a lump.
摘要翻译：一种在基板上形成透明导电膜的方法，包括：用包含聚硅氧烷作为主要成分的材料形成堤，其中堤对应于用于形成透明导电膜的区域; 通过液滴喷射方法将由透明导电微粒子构成的第一功能液体放置在由堤分隔开的区域中; 通过干燥第一功能性液体形成第一层状膜; 通过液滴喷射法将包含金属化合物的第二功能液体放置在第一层状膜上; 通过将第一层状膜和第二功能液烧成一体，形成由第一层状膜和金属氧化物构成的透明导电层，填充在形成于第一层状膜中的孔内。

5. 发明申请

US20060258068A1 METHOD FOR MANUFACTURING THIN FILM TRANSISTOR, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS 失效
标题翻译：制造薄膜晶体管，电光器件和电子设备的方法
公开(公告)号：US20060258068A1
公开(公告)日：2006-11-16
申请号：US11381852
申请日：2006-05-05
申请人： Katsuyuki MORIYA , Toshimitsu HIRAI
发明人： Katsuyuki MORIYA , Toshimitsu HIRAI
IPC分类号： H01L21/84 , H01L21/00
CPC分类号： H01L29/4908 , H01L27/1292 , H01L29/458
摘要： A method for manufacturing a thin film transistor in which a gate electrode, a semiconductor layer, and a source electrode and a drain electrode both of which are coupled to the semiconductor layer, are fabricated on a substrate, the method includes: forming a precursor of a first bank corresponding to a region to form the gate electrode on the substrate with one of a polysilazane liquid, a polysilane liquid, and a polysiloxane liquid; forming a precursor of a second bank corresponding to a region to form the source electrode and the drain electrode on a predetermined position of the precursor of the first bank with one of a polysilazane liquid, a polysilane liquid, and a polysiloxane liquid by using a droplet discharge method; firing the precursor of the first bank and the precursor of the second bank together so as to together form the first bank and the second bank both of which are made of an inorganic layer having polysiloxane as a skeleton; providing a functional liquid containing a conductive material to a region partitioned by one of the precursor of the first bank and the first bank formed from the precursor by using a droplet discharge method so as to form the gate electrode; forming a semiconductor layer on a part located immediately above the gate electrode in a region partitioned by the second bank with an insulation film between the semiconductor layer and the part; and providing a functional liquid containing a conductive material to a region partitioned by the second bank by using a droplet discharge method so as to form the source electrode and the drain electrode both of which are coupled to the semiconductor layer.
摘要翻译：一种薄膜晶体管的制造方法，其中在基板上制造栅电极，半导体层以及与半导体层耦合的源电极和漏电极的薄膜晶体管，该方法包括：对应于在聚硅氮烷液体，聚硅烷液体和聚硅氧烷液体之一上形成基板上的栅电极的区域的第一堤岸; 形成对应于区域的第二组的前体，以通过使用液滴形成源极电极和漏极，在第一组的前体的预定位置上具有聚硅氮烷液体，聚硅烷液体和聚硅氧烷液体之一放电方式将第一组的前体和第二组的前体一起烧制，以一起形成第一组和第二组，它们都由具有聚硅氧烷作为骨架的无机层制成; 通过使用液滴喷射方法将由导电材料制成的功能性液体提供到由第一组的前体之一和由前体形成的第一组分隔开的区域中以形成栅电极; 在位于所述半导体层与所述半导体层之间的绝缘膜的所述第二堤岸分隔的区域中的位于所述栅电极正上方的部分上形成半导体层; 以及通过使用液滴喷射法将包含导电材料的功能性液体提供给由第二组划分的区域，以便形成源电极和漏电极，二者都与半导体层耦合。

6. 发明申请

US20070264814A1 METHOD FOR FORMING METAL WIRING LINE, METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS 审中-公开
标题翻译：形成金属布线的方法，制造活性基质基板的方法，器件，电光器件和电子设备
公开(公告)号：US20070264814A1
公开(公告)日：2007-11-15
申请号：US11737165
申请日：2007-04-19
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA
IPC分类号： H01L21/44
CPC分类号： H01L21/288 , H01L21/4867 , H01L21/76838 , H01L27/12 , H01L27/124 , H01L27/1292 , H01L27/3246 , H01L29/41733 , H01L51/0022 , H05K3/125 , H05K3/1258 , H05K2201/09254 , H05K2201/09727 , H05K2201/09909 , H05K2203/013 , H05K2203/1173 , H05K2203/1476
摘要： A method for forming a metal wiring line, comprises: (a) forming a bank including a first opening corresponding to a first film pattern and a second opening corresponding to a second film pattern that is coupled to the first film pattern and has a width narrower than a width of the first film pattern; (b) disposing a droplet of a functional liquid in the first opening so as to dispose the functional liquid in the second opening by an autonomous flow of the functional liquid; (c) hardening the functional liquid disposed in the first opening and the second opening; and (d) forming the first film pattern and the second film pattern by alternately repeating step (b) and step (c) at least one time.
摘要翻译：一种用于形成金属布线的方法，包括：（a）形成包括对应于第一膜图案的第一开口和对应于第二膜图案的第二开口的堤，该第二膜图案耦合到第一膜图案并且具有宽度较窄比第一膜图案的宽度大; （b）在所述第一开口中设置功能液滴，以通过所述功能液体的自主流动将所述功能液体配置在所述第二开口中; （c）硬化设置在第一开口和第二开口中的功能液体; 和（d）至少一次交替地重复步骤（b）和步骤（c）来形成第一膜图案和第二膜图案。

7. 发明申请

US20070099396A1 METHOD OF FORMING PATTERN, FILM STRUCTURE, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT 审中-公开
标题翻译：形成图案，电影结构，电子设备和电子设备的方法
公开(公告)号：US20070099396A1
公开(公告)日：2007-05-03
申请号：US11552719
申请日：2006-10-25
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA , Akira INAGAKI
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA , Akira INAGAKI
IPC分类号： H01L21/00
CPC分类号： H05K1/0269 , H01L27/1292 , H01L51/56 , H05K3/0008 , H05K3/125 , H05K2201/09918 , H05K2203/013 , H05K2203/0568
摘要： A method of forming a pattern includes forming mark partition walls that correspond to an alignment mark on a substrate before forming the pattern by providing a pattern forming material between partition walls, and providing a liquid material containing an alignment mark forming material between the mark partition walls.
摘要翻译：形成图案的方法包括在形成图案之前，通过在分隔壁之间设置图案形成材料形成与基板上的对准标记相对应的标记分隔壁，并且在标记分隔壁之间提供含有对准标记形成材料的液体材料。

8. 发明申请

US20080026499A1 METHOD FOR FORMING PATTERN, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY 有权
标题翻译：形成图案的方法，以及制造液晶显示的方法
公开(公告)号：US20080026499A1
公开(公告)日：2008-01-31
申请号：US11769301
申请日：2007-06-27
申请人： Katsuyuki MORIYA , Toshimitsu HIRAI
发明人： Katsuyuki MORIYA , Toshimitsu HIRAI
IPC分类号： H01L21/00 , G03F7/00
CPC分类号： G03F7/0007 , G02F2001/136295 , H05K3/0023 , H05K3/1241 , H05K3/1258 , H05K2201/09727 , H05K2201/09909 , H05K2203/1173
摘要： A method for forming a pattern, comprises: forming a bank film on a substrate; performing a lyophobic treatment on a surface of the bank film; patterning the bank film on which the lyophobic treatment has been performed to form a bank; performing a surface modification treatment in which a hydroxyl group on a surface of a pattern forming region partitioned by the bank is alkylated; disposing a functional liquid in the pattern forming region; and firing the functional liquid to form a pattern.
摘要翻译：一种形成图案的方法，包括：在基板上形成堤膜; 对银膜的表面进行疏油处理; 图案化已经进行疏油处理的银行薄膜以形成银行; 进行表面改性处理，其中由所述堤分隔的图案形成区域的表面上的羟基被烷基化; 在图案形成区域中设置功能性液体; 并烧制功能液体以形成图案。

9. 发明申请

US20070257261A1 METHOD FOR FORMING METAL WIRING, METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPRATUS 审中-公开
标题翻译：形成金属接线的方法，制造有源矩阵衬底的方法，器件，电光器件和电子设备
公开(公告)号：US20070257261A1
公开(公告)日：2007-11-08
申请号：US11741925
申请日：2007-04-30
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA
IPC分类号： H01L29/04 , H01L29/10 , H01L21/82 , H01L31/00
CPC分类号： G02F1/1303 , H01L21/28 , H01L27/1292 , H01L29/458 , H01L29/4908 , H01L29/66757 , H01L29/66765 , H01L29/78603 , H01L2924/0002 , H01L2924/00
摘要： A device includes a substrate; a bank provided on the substrate; and a metal wiring in a wiring forming region of the substrate that is sectioned by the bank with a liquid phase method. The metal wiring includes a first film formed along a bottom of the wiring forming region and a side face of the bank facing the wiring forming region. The metal wiring also includes a second film disposed on the first film.
摘要翻译：一种器件包括：衬底; 设在基板上的银行; 以及通过液相法由堤形成的基板的布线形成区域中的金属布线。金属布线包括沿着布线形成区域的底部形成的第一膜和面向布线形成区域的堤岸的侧面。金属布线还包括设置在第一膜上的第二膜。

10. 发明申请

US20070246723A1 METHOD FOR FORMING FILM PATTERN, METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, DEVICE, ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS 有权
标题翻译：形成薄膜图案的方法，制造活性基质基板的方法，器件，电光器件和电子设备
公开(公告)号：US20070246723A1
公开(公告)日：2007-10-25
申请号：US11689533
申请日：2007-03-22
申请人： Katsuyuki MORIYA , Toshimitsu HIRAI
发明人： Katsuyuki MORIYA , Toshimitsu HIRAI
IPC分类号： H01L33/00 , B05D1/32 , B32B9/04 , H01L21/3205 , H01L31/111
CPC分类号： H01L27/1292 , G02F2001/136295 , H01L21/76879 , Y10T428/31504
摘要： A method for forming a film pattern by disposing a functional liquid in a pattern forming region partitioned by a bank includes: disposing a first bank forming material to a substrate so as to form a first bank layer; and forming a second bank layer on the first bank layer, wherein the first bank forming material is an organic material while the second bank layer is made of a fluorine resin material covering the first bank layer.
摘要翻译：通过将功能性液体设置在由堤分隔开的图案形成区域中来形成膜图案的方法包括：将第一堤形成材料设置在基板上以形成第一堤层; 以及在所述第一堤层上形成第二堤层，其中所述第一堤岸形成材料是有机材料，而所述第二堤层由覆盖所述第一堤层的氟树脂材料制成。

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