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1. 发明授权

US07691562B2 Method for forming film pattern, and method for manufacturing device, electro-optical device, electronic apparatus and active matrix substrate 失效
标题翻译：用于形成膜图案的方法以及制造装置，电光装置，电子装置和有源矩阵基板的方法
公开(公告)号：US07691562B2
公开(公告)日：2010-04-06
申请号：US11458531
申请日：2006-07-19
申请人： Toshimitsu Hirai , Katsuyuki Moriya
发明人： Toshimitsu Hirai , Katsuyuki Moriya
IPC分类号： H01L21/00
CPC分类号： H01L51/0005 , H01L27/1292 , H01L27/3295 , H01L29/66765 , H05K3/125 , H05K3/1258 , H05K2201/09727 , H05K2203/013 , H05K2203/0568 , H05K2203/0577
摘要： A method for forming a film pattern, comprises: disposing a first bank forming material to a substrate so as to form a first bank layer; disposing a second bank forming material on the first bank layer so as to form a second bank layer; and pattering the first bank layer and the second bank layer so as to form a bank including a pattern forming region having a first pattern forming region and a second pattern forming region, the second pattern forming region having a width larger than a width of the first pattern forming region, and being continuously formed from the first pattern forming region, wherein the first bank layer has a sidewall facing the pattern forming region and a first contact angle of less than 50 degrees with respect to a functional liquid containing H2O on the sidewall, and the second bank layer has a second contact angle larger than the first contact angle with respect to the functional liquid.
摘要翻译：一种形成膜图案的方法，包括：将第一堤形成材料设置在基板上以形成第一堤层; 在第一堤层上设置第二堤形成材料，以形成第二堤层; 以及形成第一堤层和第二堤层以形成包括具有第一图案形成区域和第二图案形成区域的图案形成区域的堤岸，第二图案形成区域的宽度大于第一图案形成区域的宽度，图案形成区域，并且从第一图案形成区域连续形成，其中第一堤层具有面向图案形成区域的侧壁和相对于在侧壁上含有H 2 O的功能液体的第一接触角小于50度，并且所述第二堤层相对于所述功能液体具有大于所述第一接触角的第二接触角。

2. 发明申请

US20070264814A1 METHOD FOR FORMING METAL WIRING LINE, METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS 审中-公开
标题翻译：形成金属布线的方法，制造活性基质基板的方法，器件，电光器件和电子设备
公开(公告)号：US20070264814A1
公开(公告)日：2007-11-15
申请号：US11737165
申请日：2007-04-19
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA
IPC分类号： H01L21/44
CPC分类号： H01L21/288 , H01L21/4867 , H01L21/76838 , H01L27/12 , H01L27/124 , H01L27/1292 , H01L27/3246 , H01L29/41733 , H01L51/0022 , H05K3/125 , H05K3/1258 , H05K2201/09254 , H05K2201/09727 , H05K2201/09909 , H05K2203/013 , H05K2203/1173 , H05K2203/1476
摘要： A method for forming a metal wiring line, comprises: (a) forming a bank including a first opening corresponding to a first film pattern and a second opening corresponding to a second film pattern that is coupled to the first film pattern and has a width narrower than a width of the first film pattern; (b) disposing a droplet of a functional liquid in the first opening so as to dispose the functional liquid in the second opening by an autonomous flow of the functional liquid; (c) hardening the functional liquid disposed in the first opening and the second opening; and (d) forming the first film pattern and the second film pattern by alternately repeating step (b) and step (c) at least one time.
摘要翻译：一种用于形成金属布线的方法，包括：（a）形成包括对应于第一膜图案的第一开口和对应于第二膜图案的第二开口的堤，该第二膜图案耦合到第一膜图案并且具有宽度较窄比第一膜图案的宽度大; （b）在所述第一开口中设置功能液滴，以通过所述功能液体的自主流动将所述功能液体配置在所述第二开口中; （c）硬化设置在第一开口和第二开口中的功能液体; 和（d）至少一次交替地重复步骤（b）和步骤（c）来形成第一膜图案和第二膜图案。

3. 发明授权

US07294566B2 Method for forming wiring pattern, method for manufacturing device, device, electro-optic apparatus, and electronic equipment 失效
标题翻译：形成布线图案的方法，装置制造方法，装置，电光设备和电子设备
公开(公告)号：US07294566B2
公开(公告)日：2007-11-13
申请号：US11250370
申请日：2005-10-17
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： H01L21/44
CPC分类号： H05K3/125 , G02F2001/136295 , H01L21/288 , H01L21/76838 , H01L21/7685 , H01L27/3295 , H01L51/0022 , H05K3/1258 , H05K3/245 , H05K2201/09909 , H05K2203/013 , H05K2203/1476
摘要： A method for forming a wiring pattern according to an aspect of the invention forms a wiring pattern in a certain area on a substrate by using a droplet discharge technique, and includes forming a bank surrounding the certain area on the substrate; discharging a first functional liquid containing a material of the wiring pattern to an area surrounded by the bank to form a first wiring pattern; discharging a second functional liquid onto the first wiring pattern to form a second wiring pattern; and collectively baking the wiring pattern of a plurality of layers including the first wiring pattern and the second wiring pattern.
摘要翻译：根据本发明的一个方面的用于形成布线图案的方法通过使用液滴喷射技术在基板的某一区域中形成布线图案，并且包括在基板上形成围绕该特定区域的堤岸; 将包含所述布线图案的材料的第一功能性液体排出到由所述堤包围的区域，以形成第一布线图案; 将第二功能液体排出到第一布线图案上以形成第二布线图案; 并且共同地烘烤包括第一布线图案和第二布线图案的多个层的布线图案。

4. 发明申请

US20070099396A1 METHOD OF FORMING PATTERN, FILM STRUCTURE, ELECTROOPTICAL DEVICE AND ELECTRONIC EQUIPMENT 审中-公开
标题翻译：形成图案，电影结构，电子设备和电子设备的方法
公开(公告)号：US20070099396A1
公开(公告)日：2007-05-03
申请号：US11552719
申请日：2006-10-25
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA , Akira INAGAKI
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA , Akira INAGAKI
IPC分类号： H01L21/00
CPC分类号： H05K1/0269 , H01L27/1292 , H01L51/56 , H05K3/0008 , H05K3/125 , H05K2201/09918 , H05K2203/013 , H05K2203/0568
摘要： A method of forming a pattern includes forming mark partition walls that correspond to an alignment mark on a substrate before forming the pattern by providing a pattern forming material between partition walls, and providing a liquid material containing an alignment mark forming material between the mark partition walls.
摘要翻译：形成图案的方法包括在形成图案之前，通过在分隔壁之间设置图案形成材料形成与基板上的对准标记相对应的标记分隔壁，并且在标记分隔壁之间提供含有对准标记形成材料的液体材料。

5. 发明申请

US20060257797A1 BANK STRUCTURE, WIRING PATTERN FORMING METHOD, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS 审中-公开
标题翻译：银行结构，布线图案形成方法，装置，电光装置和电子装置
公开(公告)号：US20060257797A1
公开(公告)日：2006-11-16
申请号：US11383034
申请日：2006-05-12
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： G03F7/26
CPC分类号： H01L27/1288 , G02F2001/136295 , H01L27/1292
摘要： There is provided a bank structure which partitions off a pattern formation region in which a functional liquid is to be disposed. The pattern formation region includes a first pattern formation region, and a second pattern formation region which is connected to the first pattern formation region and which has a smaller width than the first pattern formation region. The height of an internal surface part of a bank which partitions off the second pattern formation region is smaller than the height of an internal surface part of a bank which partitions off the first pattern formation region.
摘要翻译：设置有隔离其中要设置功能液体的图案形成区域的堤结构。图案形成区域包括第一图案形成区域和连接到第一图案形成区域并且具有比第一图案形成区域更小的宽度的第二图案形成区域。隔离第二图案形成区域的堤的内表面部分的高度小于从第一图案形成区域分隔开的堤的内表面部分的高度。

6. 发明申请

US20060257796A1 BANK STRUCTURE, WIRING PATTERN FORMING METHOD, DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS 有权
标题翻译：银行结构，布线图案形成方法，装置，电光装置和电子装置
公开(公告)号：US20060257796A1
公开(公告)日：2006-11-16
申请号：US11382950
申请日：2006-05-12
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： G03F7/26
CPC分类号： H01L51/0005 , G02F2001/136295 , H01L27/1292 , H01L27/3246 , Y10T29/49117 , Y10T29/49126 , Y10T29/49128 , Y10T29/49155 , Y10T29/49158 , Y10T29/49162 , Y10T428/23943 , Y10T428/24802
摘要： There is provided a bank structure which partitions off a pattern formation region in which a functional liquid is to be disposed and flow. The pattern formation region includes a first pattern formation region, and a second pattern formation region which is continuously connected to the first pattern formation region and which has a larger width than the first pattern formation region. The second pattern formation region is provided with at least one partition bank which partitions off the second pattern formation region to regulate the flow direction of the functional liquid. A partition width substantially orthogonal to the flow direction of the functional liquid which is regulated by the partition bank is less than ±20% of the width of the first pattern formation region.
摘要翻译：提供了一种隔离其中要布置和流动功能液体的图案形成区域的堤结构。图案形成区域包括第一图案形成区域和连续地连接到第一图案形成区域并且具有比第一图案形成区域宽的宽度的第二图案形成区域。第二图案形成区域设置有至少一个分隔开的第二图案形成区域以限制功能液体的流动方向的分隔堤。基本上与由分隔块调节的功能液体的流动方向正交的分隔宽度小于第一图案形成区域的宽度的±20％。

7. 发明申请

US20060255720A1 METHOD OF FORMING FILM PATTERN, FILM PATTERN, DEVICE, ELECTRO OPTIC DEVICE, AND ELECTRONIC APPARATUS 有权
标题翻译：形成薄膜图案，薄膜图案，器件，电光器件和电子设备的方法
公开(公告)号：US20060255720A1
公开(公告)日：2006-11-16
申请号：US11382555
申请日：2006-05-10
申请人： Toshimitsu HIRAI , Katsuyuki MORIYA , Shinri SAKAI
发明人： Toshimitsu HIRAI , Katsuyuki MORIYA , Shinri SAKAI
IPC分类号： H05B33/00 , H01L51/50
CPC分类号： H01L51/0005 , H01L27/3295
摘要： A method of forming a film pattern by placing a functional liquid on a substrate, comprises: forming a bank on the substrate, wherein the bank corresponds to a region for forming the film pattern; placing the functional liquid in the region for forming the film pattern partitioned by the bank; and curing the functional liquid to form the film pattern; wherein the functional liquid is placed under conditions that a difference between an advancing contact angle and a receding contact angle of the functional liquid with a top surface of the bank is 10 degrees or more and that the receding contact angle is 13 degrees or more.
摘要翻译：通过将功能性液体放置在基板上来形成膜图案的方法包括：在所述基板上形成堤，其中所述堤对应于用于形成所述膜图案的区域; 将功能液体放置在用于形成由堤岸分隔的膜图案的区域中; 并固化功能液体以形成膜图案; 其特征在于，所述功能液在所述功能液与所述堤的顶面之间的前进接触角与后退接触角之间的差为10度以上且所述后退接触角为13度以上的条件下配置。

8. 发明申请

US20060088998A1 Wiring pattern forming method, film pattern forming method, semiconductor device, electro-optical device, and electronic equipment 有权
公开(公告)号：US20060088998A1
公开(公告)日：2006-04-27
申请号：US11242009
申请日：2005-10-04
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： H01L21/44
CPC分类号： H01L21/288 , H01L21/76838 , H01L21/76877 , H01L27/1292 , H01L29/4908 , H05K3/045 , H05K3/125 , H05K3/1258 , H05K2203/013 , H05K2203/0568
摘要： A wiring pattern forming method which is a method of forming a wiring pattern by using a liquid droplet ejection method on a preset area on a substrate, includes: forming a bank on the preset area on the substrate; ejecting a functional liquid including a wiring pattern material on an area surrounded by the bank and drying the functional liquid to form the wiring pattern; and removing part of the bank so as to make a height of the bank and a thickness of the wiring pattern approximately the same.

9. 发明授权

US07556991B2 Method for manufacturing thin film transistor, electro-optical device, and electronic apparatus 失效
标题翻译：薄膜晶体管，电光器件和电子设备的制造方法
公开(公告)号：US07556991B2
公开(公告)日：2009-07-07
申请号：US11381852
申请日：2006-05-05
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： H01L21/00
CPC分类号： H01L29/4908 , H01L27/1292 , H01L29/458
摘要： A method for manufacturing a thin film transistor which includes forming precursors of a first and second bank corresponding to a region to form gate, source, and drain electrodes on the substrate with one of a polysilazane liquid, a polysilane liquid, and a polysiloxane liquid by using a droplet discharge method; firing the precursor of the first and second banks to form the first and banks an inorganic layer having polysiloxane as a skeleton; providing a functional liquid to a region partitioned by the first bank to form the gate electrode; forming a semiconductor layer immediately above the gate electrode in a region partitioned by the second bank with an insulation film between; and providing a functional liquid to a region partitioned by the second bank to form the source electrode and the drain electrode, which are coupled to the semiconductor layer.
摘要翻译：一种制造薄膜晶体管的方法，其包括形成对应于区域的第一和第二组的前体，以通过聚硅氮烷液体，聚硅烷液体和聚硅氧烷液体中的一种在基板上形成栅极，源极和漏极，由使用液滴喷射法; 烧制第一和第二组的前体以形成第一和第二组，并形成具有聚硅氧烷作为骨架的无机层; 向由所述第一组隔开的区域提供功能液体以形成所述栅电极; 在由所述第二堤隔开的区域中，在所述栅电极的正上方形成半导体层，所述半导体层之间具有绝缘膜; 以及将功能液体提供给由第二组隔开的区域，以形成耦合到半导体层的源电极和漏电极。

10. 发明申请

US20060255735A1 METHOD OF FORMING BANK, METHOD OF FORMING FILM PATTERN, SEMICONDUCTOR DEVICE, ELECTRO OPTIC DEVICE, AND ELECTRONIC APPARATUS 审中-公开
标题翻译：形成银行的方法，形成薄膜图案的方法，半导体器件，电光器件和电子设备
公开(公告)号：US20060255735A1
公开(公告)日：2006-11-16
申请号：US11381834
申请日：2006-05-05
申请人： Katsuyuki MORIYA , Toshimitsu HIRAI
发明人： Katsuyuki MORIYA , Toshimitsu HIRAI
IPC分类号： H01J17/02
CPC分类号： G03F7/168 , G02F2001/136295 , G03F7/0045 , G03F7/0757 , G03F7/40 , H01L27/3244 , H01L27/3295 , H01L51/0005
摘要： A method of forming a bank that partitions a region for forming a film pattern made of a functional liquid, includes: forming a bank film made of a photo resist by applying a photo resist liquid onto a substrate and drying the photo resist liquid; performing a lyophobic treatment for the bank film by using a lyophobic treatment gas and plasma; reducing a lyophobic property by selectively applying ultraviolet rays to the bank film after the lyophobic treatment with a mask; selectively exposing the bank film after the lyophobic treatment to light with the mask; developing and patterning the bank film after reducing the lyophobic property and exposing the bank film to light so as to form the bank; wherein the lyophobic property is reduced and the bank film is exposed to light continuously or at the same time with the same mask.
摘要翻译：一种形成分隔用于形成由功能液体形成的薄膜图案的区域的堤的方法，包括：通过将光致抗蚀剂液体涂覆在基板上并干燥光致抗蚀剂液体，形成由光致抗蚀剂制成的堤膜; 通过使用疏液处理气体和等离子体对银膜进行疏液处理; 通过用掩模进行疏液处理后选择性地将紫外线施加到堤膜上来降低疏液性; 在疏液处理后将堤膜选择性地暴露于面罩上; 在降低泄露性能后，开发银行电影图案，并将银行薄膜曝光以形成银行; 其中疏液性降低，并且银膜被连续地或同时用相同的掩模曝光。

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