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1. 发明授权

US06465137B2 Resist composition and pattern forming process 有权
标题翻译：抗蚀组成和图案形成过程
公开(公告)号：US06465137B2
公开(公告)日：2002-10-15
申请号：US09288781
申请日：1999-04-09
申请人： Keiji Watanabe , Miwa Kozawa , Ei Yano , Takahisa Namiki , Koji Nozaki , Junichi Kon , Eiichi Hoshino , Masahiro Uraguchi , Toshikatsu Minagawa , Yuichi Yamamoto
发明人： Keiji Watanabe , Miwa Kozawa , Ei Yano , Takahisa Namiki , Koji Nozaki , Junichi Kon , Eiichi Hoshino , Masahiro Uraguchi , Toshikatsu Minagawa , Yuichi Yamamoto
IPC分类号： G03F900
CPC分类号： G03F7/004 , G03F7/0045
摘要： A resist composition comprising, in a resist, an additive which has a melting point-of 160° C. or above, contains no aromatic ring, has a molecular size of no greater than 50 Å and is soluble in the developing solution for the resist, at 1-50 parts by weight with respect to 100 parts by solid weight of the resist, as well as a pattern forming process employing it. It thereby becomes possible to obtain high-resolution resist patterns.
摘要翻译：抗蚀剂组合物，在抗蚀剂中含有熔点为160℃以上的添加剂，不含芳香环，分子大小不大于且可溶于抗蚀剂的显影液中相对于100重量份的抗蚀剂的固体重量为1-50重量份，以及使用它的图案形成方法。从而可以获得高分辨率抗蚀剂图案。

2. 发明授权

US06551749B1 Developer and method for forming resist pattern and photomask produced by use thereof 失效
标题翻译：用于形成抗蚀剂图案和使用其制造的光掩模的显影剂和方法
公开(公告)号：US06551749B1
公开(公告)日：2003-04-22
申请号：US09526295
申请日：2000-03-15
申请人： Toshikatsu Minagawa , Eiichi Hoshino , Keiji Watanabe
发明人： Toshikatsu Minagawa , Eiichi Hoshino , Keiji Watanabe
IPC分类号： G03F900
CPC分类号： G03F7/32 , Y10S430/108
摘要： A developer used for the formation of a resist pattern from a resist resin based on a halogenated alkylstyrene, wherein the developer is a mixture of a solvent regarded as a good solvent and a solvent regarded as a poor solvent for the resist resin based on a halogenated alkylstyrene. The developer is useful for the formation of photomasks, including various masks and reticles used to form various device patterns in a semiconductor product, a plasma display panel (PDP), a liquid crystal display (LCD) or the like. A method of forming a resist pattern using the developer is also disclosed. In addition, a photomask produced using the developer and the method is disclosed.
摘要翻译：用于从基于卤代烷基苯乙烯的抗蚀剂树脂形成抗蚀剂图案的显影剂，其中显影剂是被认为是良溶剂的溶剂和作为抗蚀剂树脂的不良溶剂的溶剂的混合物，其基于卤代烷基苯乙烯。显影剂可用于形成光掩模，包括用于在半导体产品中形成各种器件图案的各种掩模和掩模版，等离子体显示面板（PDP），液晶显示器（LCD）等。还公开了使用显影剂形成抗蚀剂图案的方法。此外，公开了使用显影剂和该方法制造的光掩模。

3. 发明授权

US5906912A Processes for forming resist pattern and for producing semiconductor device 失效
标题翻译：用于形成抗蚀剂图案和用于制造半导体器件的工艺
公开(公告)号：US5906912A
公开(公告)日：1999-05-25
申请号：US834044
申请日：1997-04-11
申请人： Keiji Watanabe , Miwa Igarashi , Ei Yano , Keiko Yano , Takashi Maruyama , Eiichi Hoshino , Kotaro Shirabe , Masafumi Nakaishi
发明人： Keiji Watanabe , Miwa Igarashi , Ei Yano , Keiko Yano , Takashi Maruyama , Eiichi Hoshino , Kotaro Shirabe , Masafumi Nakaishi
IPC分类号： G03F7/038 , C23F1/00 , G03F7/075 , G03F7/09 , G03F7/11 , G03F7/26 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/311 , H01L21/768 , G03C5/00
CPC分类号： G03F7/093 , G03F1/40 , H01L21/31138 , H01L21/76838
摘要： An electroconductive pattern is formed by coating a substrate with a solution comprising 100 parts by weight of a soluble electroconductive polymer containing an organic radical capable of cross-linking with a cross-linking agent, 5 to 1,000 parts by weight of a cross-linking agent, and 100 to 100,000 parts by weight of a solvent; effecting cross-linking of the resultant coated film to obtain a cured electroconductive film having a sheet resistance of 10.sup.10 .OMEGA./.quadrature. or less; forming a pattern as an upper layer on the cured electroconductive layer; and transferring the pattern of the upper layer to the cured electroconductive layer.
摘要翻译：通过用包含100重量份的含有能够与交联剂交联的有机基团的可溶性导电聚合物的溶液涂布基材来形成导电图案，5至1,000重量份的交联剂和100〜100,000重量份的溶剂; 实现所得涂膜的交联，得到薄膜电阻为1010Ω/□以下的固化导电膜; 在固化的导电层上形成上层的图案; 并将上层的图案转印到固化的导电层上。

4. 发明授权

US09257583B2 Solar cell 有权
标题翻译：太阳能电池
公开(公告)号：US09257583B2
公开(公告)日：2016-02-09
申请号：US14119195
申请日：2011-05-25
申请人： Keiji Watanabe , Ryuta Tsuchiya , Takashi Hattori , Mieko Matsumura
发明人： Keiji Watanabe , Ryuta Tsuchiya , Takashi Hattori , Mieko Matsumura
IPC分类号： H01L31/00 , H01L31/0352 , H01L31/0236
CPC分类号： H01L31/035281 , H01L31/02366 , H01L31/03529 , Y02E10/50
摘要： A solar cell including a substrate 1, a nanopillar 11 having diameter D1 connected to the substrate 1, and a nanopillar 12 having diameter D2 connected to the substrate 1 is characterized in that D2 is greater than D1 in order to realize a solar cell having, as the surface structure, a nanopillar array structure with which it is possible to prevent reflection within the broad wavelength region of solar light. A nanopillar array structure 21 formed from two types of nanopillars having different diameters has a point of minimum reflectivity of a nanopillar array structure formed from the nanopillar 11 having diameter D1 and a point of minimum reflectivity of a nanopillar array structure formed from the nanopillar 12 having diameter D2 and therefore, is capable of preventing reflection within the broad wavelength region of solar light.
摘要翻译：包括基板1，具有与基板1连接的直径D1的纳米柱11和具有连接到基板1的直径D2的纳米柱12的太阳能电池的特征在于，D2大于D1，以实现太阳能电池，作为表面结构，可以防止在太阳光的宽波长范围内的反射的纳米柱阵列结构。由具有不同直径的两种类型的纳米柱形成的纳米柱阵列结构21具有由具有直径D1的纳米柱11形成的纳米柱阵列结构的最小反射率点和由纳米柱12形成的纳米柱阵列结构的最小反射率点，因此，能够防止太阳光的宽波长范围内的反射。

5. 发明授权

US08674520B2 Semiconductor device, method for manufacturing the same, and power supply unit 有权
标题翻译：半导体装置及其制造方法以及电源装置
公开(公告)号：US08674520B2
公开(公告)日：2014-03-18
申请号：US13355805
申请日：2012-01-23
申请人： Nobuhiro Imaizumi , Keishiro Okamoto , Keiji Watanabe
发明人： Nobuhiro Imaizumi , Keishiro Okamoto , Keiji Watanabe
IPC分类号： H01L29/40
CPC分类号： H01L23/49513 , H01L23/3107 , H01L23/49562 , H01L24/29 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/49 , H01L24/73 , H01L2224/05553 , H01L2224/05554 , H01L2224/0603 , H01L2224/29 , H01L2224/29076 , H01L2224/29101 , H01L2224/29111 , H01L2224/29147 , H01L2224/2919 , H01L2224/32245 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48247 , H01L2224/48257 , H01L2224/48472 , H01L2224/4903 , H01L2224/49171 , H01L2224/49175 , H01L2224/73265 , H01L2224/83101 , H01L2224/92247 , H01L2924/01006 , H01L2924/01013 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01049 , H01L2924/0105 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/0133 , H01L2924/0134 , H01L2924/014 , H01L2924/0665 , H01L2924/10329 , H01L2924/13064 , H01L2924/15738 , H01L2924/15747 , H01L2924/15763 , H01L2924/181 , H01L2924/00 , H01L2924/01022 , H01L2924/01028 , H01L2924/01046 , H01L2924/00012 , H01L2924/00014 , H01L2924/3512
摘要： A method for manufacturing a semiconductor device includes placing a sheet containing a fibrous material having at least one outer surface having a metal on a semiconductor chip-mounting region of a substrate; forming a bonding layer containing a fusible metal on the semiconductor chip-mounting region; placing a semiconductor chip on the semiconductor chip-mounting region; and bonding the semiconductor chip to the semiconductor chip-mounting region with the fusible metal-containing bonding layer by heating.
摘要翻译：一种半导体器件的制造方法，其特征在于，在衬底的半导体芯片安装区域上放置含有具有至少一个具有金属的外表面的纤维材料的片材; 在半导体芯片安装区域上形成含有可熔金属的接合层; 将半导体芯片放置在半导体芯片安装区域上; 并且通过加热将半导体芯片与可熔融金属键合层接合到半导体芯片安装区域。

6. 发明授权

US08449783B2 Method of manufacturing liquid ejection head substrate 有权
标题翻译：液体喷射头基板的制造方法
公开(公告)号：US08449783B2
公开(公告)日：2013-05-28
申请号：US13545370
申请日：2012-07-10
申请人： Keiji Watanabe
发明人： Keiji Watanabe
IPC分类号： H01B13/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645
摘要： A liquid ejection head substrate is manufactured by forming a wiring pattern on one surface of a substrate, forming an etching mask layer on the other surface of the substrate, forming a positioning reference mark on the etching mask layer by means of a laser, forming an opening pattern groove running through the etching mask layer and having a bottom in the inside of the silicon substrate, using the positioning reference mark, and forming a liquid supply port running through the silicon substrate by etching the silicon substrate from the opening pattern groove to the one surface by means of crystal anisotropic etching.
摘要翻译：通过在基板的一个表面上形成布线图案，在基板的另一个表面上形成蚀刻掩模层，通过激光在蚀刻掩模层上形成定位参考标记来制造液体喷射头基板，形成通过蚀刻掩模层延伸的开口图案凹槽，并且使用定位参考标记在硅衬底的内部具有底部，并且通过从开口图案凹槽蚀刻硅衬底而形成穿过硅衬底的液体供给口，一个表面借助于晶体各向异性蚀刻。

7. 发明申请

US20110151598A1 METHOD FOR MANUFACTURING A SUBSTRATE FOR LIQUID-EJECTING HEADS AND A LIQUID-EJECTING HEAD 失效
标题翻译：用于液体喷射头和液体喷射头的制造基板的方法
公开(公告)号：US20110151598A1
公开(公告)日：2011-06-23
申请号：US12973708
申请日：2010-12-20
申请人： Hiroyuki Abo , Keiji Watanabe , Keiji Matsumoto
发明人： Hiroyuki Abo , Keiji Watanabe , Keiji Matsumoto
IPC分类号： H01L21/302
CPC分类号： B41J2/1603 , B41J2/1629
摘要： A method for manufacturing a substrate for liquid-ejecting heads includes etching a surface of a silicon substrate using a first etchant, with a silicon oxide layer as a mask, to form a depression as a part of a liquid supply port, and subsequently etching at least the silicon oxide layer and the thickness sandwiched between the depression and the etched surface of the silicon substrate with a second etchant to form the liquid supply port.
摘要翻译：一种液体喷射头用基板的制造方法，其特征在于，使用第一蚀刻剂，以氧化硅层作为掩模蚀刻硅基板的表面，形成作为液体供给口的一部分的凹部，用第二蚀刻剂将硅氧化物层和夹在硅衬底的蚀刻表面之间的厚度最小化，以形成液体供应端口。

8. 发明授权

US07575135B2 Immersion nozzle for continuous casting of steel and method of continuous casting method of steel 有权
标题翻译：用于连续铸钢的浸渍喷嘴和钢的连铸方法
公开(公告)号：US07575135B2
公开(公告)日：2009-08-18
申请号：US10500789
申请日：2003-01-27
申请人： Yutaka Awajiya , Mikio Suzuki , Keiji Watanabe , Makoto Iiyama
发明人： Yutaka Awajiya , Mikio Suzuki , Keiji Watanabe , Makoto Iiyama
IPC分类号： B22D41/00
CPC分类号： B22D41/54
摘要： An immersion nozzle for continuous casting of steel supplies molten steel into a mold. At least a part of the immersion nozzle is formed of a refractory having a desulfurizing ability. A method for continuous casting of steel employs the immersion nozzle to supply molten steel into a mold using the immersion nozzle for continuous casting.
摘要翻译：用于连续铸钢的浸入式喷嘴将钢水供应到模具中。浸渍喷嘴的至少一部分由具有脱硫能力的耐火材料形成。钢的连续铸造方法采用浸渍喷嘴，使用浸入式喷嘴连续铸造，将钢水供给到模具中。

9. 发明授权

US07534750B2 Composition, magnetic recording medium, head slider, and magnetic recording device 有权
标题翻译：组合物，磁记录介质，磁头滑块和磁记录装置
公开(公告)号：US07534750B2
公开(公告)日：2009-05-19
申请号：US11063737
申请日：2005-02-24
申请人： Hiroshi Chiba , Yukiko Oshikubo , Keiji Watanabe , Eishin Yamakawa , Takeshi Toukairin
发明人： Hiroshi Chiba , Yukiko Oshikubo , Keiji Watanabe , Eishin Yamakawa , Takeshi Toukairin
IPC分类号： C10M169/04
CPC分类号： C08G65/007 , C08G65/2639 , C08G65/3318 , C09J171/02 , G11B5/725
摘要： There are provided a composition that exhibits sufficient flowability and also displays high substrate adhesion, and a magnetic recording medium, a head slider and a magnetic recording device that use this composition as a lubricant and are thus not prone to faults. The composition comprises a fluorine-containing polyether represented by formula (1), (in formula (1), p and q represent, independently of the symbols in other formulae, any chosen integers). The composition can be produced by reacting a polymer represented by formula (2) with glycidol, HOCH2CF2O(CF2CF2O)p(CF2O)qCF2CH2OH (2) (in formula (2), p and q represent, independently of the symbols in other formulae, any chosen integers).
摘要翻译：提供了表现出足够的流动性并且还显示出高的基材粘附性的组合物，以及使用该组合物作为润滑剂并因此不易发生故障的磁记录介质，磁头滑块和磁记录装置。该组合物包含由式（1）表示的含氟聚醚，（式（1）中，p和q独立于其它式中的符号表示任意选定的整数）。该组合物可以通过使由式（2）表示的聚合物与缩水甘油反应来制备，<？in-line-formula description =“In-line Formulas”end =“lead”？> HOCH2CF2O（CF2CF2O）p（CF2O）qCF2CH2OH （在公式（2）中，p和q独立于其他公式中的符号，表示任何所选择的整数）。

10. 发明申请

US20070023690A1 Method of producing heat-resistant electrically charged fluororesin material and method of producing electret condenser microphone using heat-resistant electrically charged fluororesin material 审中-公开
标题翻译：耐热性带电氟树脂材料的制造方法及使用耐热性带电氟树脂材料制造驻极体电容麦克风的方法
公开(公告)号：US20070023690A1
公开(公告)日：2007-02-01
申请号：US11479804
申请日：2006-06-30
申请人： Yuki Tsuchiya , Keiji Watanabe , Yorinobu Yamada
发明人： Yuki Tsuchiya , Keiji Watanabe , Yorinobu Yamada
IPC分类号： B05D3/00 , B29C71/02 , B05D3/02
CPC分类号： H04R19/016 , C08J7/123 , C08J2327/12 , H04R31/00
摘要： A method of producing a heat-resistant electrically charged fluororesin material is provided. The method comprises the steps of providing a fluorine-containing resin material; irradiating the fluorine-containing resin material with ionizing radiation at a temperature not lower than a crystalline melting point of the fluorine-containing resin material in absence of oxygen, thereby causing crosslinking in the fluorine-containing resin material to change the fluorine-containing resin material into a heat-resistant fluororesin material; and, electrifying the heat-resistant fluororesin material to form a heat-resistant electrically charged fluororesin material. The method may further comprises the step of heating the material following the step of electrifying. The successive steps of electrifying and heating are repeatedly conducted more than one time.
摘要翻译：提供一种生产耐热带电氟树脂材料的方法。该方法包括提供含氟树脂材料的步骤; 在不含氧的情况下，在不低于含氟树脂材料的结晶熔点的温度下，用电离辐射照射含氟树脂材料，从而使含氟树脂材料发生交联以改变含氟树脂材料成为耐热氟树脂材料; 并对耐热氟树脂材料充电以形成耐热带电氟树脂材料。该方法还可以包括在通电步骤之后加热材料的步骤。电气和加热的连续步骤反复进行一次以上。

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