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    • 1. 发明授权
    • Magnetic resistance device
    • 磁阻器件
    • US06992869B2
    • 2006-01-31
    • US09777325
    • 2001-02-06
    • Toshihisa SuzukiNaoshi Horiai
    • Toshihisa SuzukiNaoshi Horiai
    • G11B5/127
    • B82Y25/00B82Y10/00G01R33/093G11B5/3903G11B5/3909
    • In order to realize a magnetic resistance device having a high magnetic resistance change rate, satisfactory production yield and a low level of variation in production, a pair of magnetic tunnel resistance devices 2 employing a laminated structure comprised of antiferromagnetic film 8, lower magnetic layer 9, barrier film 10 and upper magnetic layer 11 are independently and separately formed by ion beam etching on a lower electrode 3 and in common with said lower electrode 3 provided on a substrate 5. A pair of independent upper electrodes 4 are formed on upper magnetic layer 11. As a result, a pair of magnetic tunnel resistance devices 2 are formed connected in series on substrate 5.
    • 为了实现具有高磁阻变化率,令人满意的生产率和低生产变化水平的磁阻装置,采用由反铁磁膜8,下磁层9 ,阻挡膜10和上磁性层11通过在下电极3上的离子束蚀刻和与设置在基板5上的所述下电极3共同地分别形成。 一对独立的上电极4形成在上磁性层11上。 结果,形成了一对串联连接在基板5上的磁通电阻装置2。