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1. 发明授权

US5424552A Projection exposing apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5424552A
公开(公告)日：1995-06-13
申请号：US115517
申请日：1993-09-02
申请人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
发明人： Toshihiko Tsuji , Tetsuo Taniguchi , Yuji Imai , Mizutani Hideo
IPC分类号： G03F7/20 , G03F9/00 , G01N21/86
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70258 , G03F7/70883 , G03F7/70891 , G03F9/70 , G03F9/7034
摘要： A projection exposing apparatus for detecting a state of focus at two or more places in exposure region of a projection optical system by a focus state detection device. In accordance with the result of the detection of the focus state at the two or more places, the image forming characteristics of the projection optical system are measured by an image forming characteristics measuring device. A first pattern extending in the sagittal direction and a second pattern extending in the meridional direction are formed so that the focus state is measured by light beams transmitted these patterns and therefore the astigmatism, eccentricity or the spherical aberration is obtained so as to be corrected.
摘要翻译：一种投影曝光装置，用于通过聚焦状态检测装置检测在投影光学系统的曝光区域中的两个或更多处的焦点状态。根据两个以上的焦点状态的检测结果，通过图像形成特性测量装置测量投影光学系统的图像形成特性。形成沿矢状方向延伸的第一图案和沿子午方向延伸的第二图案，使得通过透射这些图案的光束测量聚焦状态，因此获得像散，偏心或球面像差以进行校正。

2. 发明授权

US06169602A Inspection method and apparatus for projection optical systems 失效
标题翻译：投影光学系统的检测方法和装置
公开(公告)号：US06169602A
公开(公告)日：2001-01-02
申请号：US09253711
申请日：1999-02-22
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G01B1100
CPC分类号： G03F7/70358 , G03F7/706 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
摘要翻译：本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像形成通过投影光学系统获得的参考标记的投影图像的位置。在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。

3. 发明授权

US5798838A Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same 失效
标题翻译：具有检测空间图像的强度分布功能的投影曝光装置及其检测方法
公开(公告)号：US5798838A
公开(公告)日：1998-08-25
申请号：US713719
申请日：1996-09-13
申请人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
发明人： Tetsuo Taniguchi , Toshihiko Tsuji , Tadashi Nagayama
IPC分类号： G03F7/20 , H01L21/30 , G01B11/00
CPC分类号： G03F7/70591 , G03F7/70133 , G03F7/70241 , G03F7/70258 , G03F7/70358
摘要： The invention relates to a projection exposure apparatus for detecting a light-intensity distribution of a spatial image of a mask pattern formed through a projection optical system. The projection exposure apparatus has a knife-edge member which is disposed on the main surface of a wafer stage such that a plane including an exposure surface of a photosensitive substrate is leveled with a light incidence surface of the knife-edge member. The knife-edge member has a transmission area for transmitting the exposure light passing through the projection optical system, a light shielding area for preventing transmission of the exposure light, and a knife-edge defined as a boundary line between the transmission area and the light shielding area. The projection exposure apparatus detects the light-intensity distribution of light from the spatial image while moving the spatial image of the mask pattern and the knife-edge of the knife-edge member relatively to each other. The information related to the light-intensity distribution is used in optically adjusting a projection optical system, or the like.
摘要翻译：本发明涉及一种用于检测通过投影光学系统形成的掩模图案的空间图像的光强度分布的投影曝光装置。投影曝光装置具有刀片部件，其设置在晶片台的主表面上，使得包括感光基板的曝光表面的平面与刀刃部件的光入射面平齐。刀刃部件具有用于透射通过投影光学系统的曝光光的透射区域，用于防止曝光光的透射的遮光区域和被定义为透射区域与光线之间的边界线的刀刃屏蔽区域。投影曝光装置在将掩模图案的空间图像和刀刃部件的刀刃相对于彼此移动的同时，检测来自空间图像的光的光强度分布。与光强分布有关的信息用于光学调整投影光学系统等。

4. 发明授权

US06850327B2 Inspection method and apparatus for projection optical systems 失效
标题翻译：投影光学系统的检测方法和装置
公开(公告)号：US06850327B2
公开(公告)日：2005-02-01
申请号：US10237130
申请日：2002-09-09
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G03F7/20 , G01B11/00
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： A reference mark is formed on an under-surface of a reference mark member that is disposed on a mask stage. The mask stage can be part of a projection exposure apparatus in which a substrate and a mask are moved in respective scanning directions during scanning exposure. The projection exposure apparatus also may include a projection system disposed under the mask stage, with the mask and substrate being provided on opposite sides of projection system. The mask stage may be moved into the image field of the projection system, and the reference mark is detected.
摘要翻译：参考标记形成在设置在掩模台上的参考标记部件的下表面上。掩模台可以是在扫描曝光期间基板和掩模在各个扫描方向上移动的投影曝光装置的一部分。投影曝光装置还可以包括设置在掩模台下方的投影系统，其中掩模和基板设置在投影系统的相对侧上。掩模台可以移动到投影系统的图像场中，并且检测到参考标记。

5. 发明授权

US06525817B1 Inspection method and apparatus for projection optical systems 失效
标题翻译：投影光学系统的检测方法和装置
公开(公告)号：US06525817B1
公开(公告)日：2003-02-25
申请号：US09667754
申请日：2000-09-21
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G01B1100
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
摘要翻译：本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像形成通过投影光学系统获得的参考标记的投影图像的位置。在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。

6. 发明授权

US5137349A Projection-type optical apparatus 失效
标题翻译：投影式光学装置
公开(公告)号：US5137349A
公开(公告)日：1992-08-11
申请号：US633314
申请日：1990-12-24
申请人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
发明人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70883 , G03F7/70241 , G03F9/7023
摘要： In a projection-type optical apparatus in which a projection optical system projects an image of an object upon a substrate, a position detecting sensor mechanically connected to the projection optical system detects the position of the projection optical system relative to the substrate along the optical axis of the projection optical system. A displacement measuring device measures relative displacement between the position detecting sensor and the projection optical system along the optical axis. The substrate is brought into coincidence with an optimum image forming plane of the projection optical system on the basis of the position detected by the position detecting sensor and the displacement measured by the displacement measuring device.
摘要翻译：在其中投影光学系统将物体的图像投射到基板的投影型光学装置中，机械地连接到投影光学系统的位置检测传感器沿着光轴检测投影光学系统相对于基板的位置的投影光学系统。位移测量装置测量沿着光轴的位置检测传感器和投影光学系统之间的相对位移。基于由位置检测传感器检测到的位置和由位移测量装置测量的位移，使基板与投影光学系统的最佳图像形成平面一致。

7. 发明授权

US6151122A Inspection method and apparatus for projection optical systems 有权
公开(公告)号：US6151122A
公开(公告)日：2000-11-21
申请号：US332027
申请日：1999-06-14
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G03F7/20 , G01B11/00
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

8. 发明授权

US07324187B2 Illumination system and exposure apparatus 有权
标题翻译：照明系统和曝光装置
公开(公告)号：US07324187B2
公开(公告)日：2008-01-29
申请号：US10956614
申请日：2004-10-01
申请人： Toshihiko Tsuji , Akira Yabuki
发明人： Toshihiko Tsuji , Akira Yabuki
IPC分类号： G03B27/74 , G03B27/42 , G03B27/54
CPC分类号： G03F7/7085 , G03B27/54 , G03F7/70066 , G03F7/70091
摘要： Disclosed is an illumination optical system and an exposure apparatus having the same, and specifically, as an aspect of the invention, an illumination optical system for illuminating a surface to be illuminated, that includes an aperture stop for defining an effective light source distribution upon a predetermined plane which is substantially in a Fourier transform relation with the surface to be illuminated, and a detector disposed adjacent an opening of the aperture stop.
摘要翻译：本发明公开了一种照明光学系统和曝光装置，具体而言，作为本发明的一个方面，照明光学系统用于照亮被照射的表面，该照明光学系统包括用于限定有效光源分布的孔径光阑与被照射的表面基本上是傅里叶变换关系的预定平面以及邻近孔径光阑的开口设置的检测器。

9. 发明授权

US06919951B2 Illumination system, projection exposure apparatus and device manufacturing method 失效
标题翻译：照明系统，投影曝光装置及装置的制造方法
公开(公告)号：US06919951B2
公开(公告)日：2005-07-19
申请号：US10205348
申请日：2002-07-25
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： H01L21/027 , G03F7/20 , G03B27/54 , G03B27/42
CPC分类号： G03F7/70075
摘要： Disclosed is an illumination system for illuminating an illumination region with uniform illuminance, wherein the light intensity gravity center of light impinging on the illumination region is registered with the center of light rays. The illumination system includes a first reflection type integrator, a first condensing mirror system for superposing light beams from the first reflection type integrator one upon another on the surface to be illuminated, a second reflection type integrator disposed between the light source and said first reflection type integrator, and a second condensing mirror system for superposing light beams from the second reflection type integrator one upon another on the first reflection type integrator. Also disclosed is an exposure apparatus having such illumination system, and a device manufacturing method using the same.
摘要翻译：公开了一种用于照明具有均匀照度的照明区域的照明系统，其中照射在照明区域上的光的重心重心与光线的中心对准。照明系统包括第一反射型积分器，第一聚光镜系统，用于将第一反射型积分器的光束在被照射的表面上叠加起来;第二反射型积分器，设置在光源和所述第一反射型之间积分器和第二聚光镜系统，用于在第一反射型积分器上叠加来自第二反射型积分器的光束。还公开了具有这种照明系统的曝光装置和使用该照明系统的装置制造方法。

10. 发明申请

US20050057738A1 Illumination optical system and exposure apparatus 失效
标题翻译：照明光学系统和曝光装置
公开(公告)号：US20050057738A1
公开(公告)日：2005-03-17
申请号：US10769373
申请日：2004-01-30
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/54 , G03F7/20 , G21K1/00 , H01L21/027
CPC分类号： G03F7/702 , G21K2201/06
摘要： Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.
摘要翻译：为了提供照明光学系统和使用该照明光学系统的曝光装置，其提供了比现有技术更光亮的用于照射掩模的光的角度分布，用于照射物体表面的照明光学系统包括：光学单元，其将来自光源部分成近似平行的光，并且包括第一和第二反射镜，其中第一反射镜具有开口，第二反射镜反射的光穿过该开口。

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