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1. 发明授权

US5137349A Projection-type optical apparatus 失效
标题翻译：投影式光学装置
公开(公告)号：US5137349A
公开(公告)日：1992-08-11
申请号：US633314
申请日：1990-12-24
申请人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
发明人： Tetsuo Taniguchi , Kazuaki Suzuki , Toshihiko Tsuji , Masato Hatasawa
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70883 , G03F7/70241 , G03F9/7023
摘要： In a projection-type optical apparatus in which a projection optical system projects an image of an object upon a substrate, a position detecting sensor mechanically connected to the projection optical system detects the position of the projection optical system relative to the substrate along the optical axis of the projection optical system. A displacement measuring device measures relative displacement between the position detecting sensor and the projection optical system along the optical axis. The substrate is brought into coincidence with an optimum image forming plane of the projection optical system on the basis of the position detected by the position detecting sensor and the displacement measured by the displacement measuring device.
摘要翻译：在其中投影光学系统将物体的图像投射到基板的投影型光学装置中，机械地连接到投影光学系统的位置检测传感器沿着光轴检测投影光学系统相对于基板的位置的投影光学系统。位移测量装置测量沿着光轴的位置检测传感器和投影光学系统之间的相对位移。基于由位置检测传感器检测到的位置和由位移测量装置测量的位移，使基板与投影光学系统的最佳图像形成平面一致。

2. 发明授权

US06922293B2 Kinematic optical mounting assembly with flexures 有权
标题翻译：运动光学安装组件带弯曲
公开(公告)号：US06922293B2
公开(公告)日：2005-07-26
申请号：US10229051
申请日：2002-08-28
申请人： Douglas C. Watson , Alton H. Phillips , Masato Hatasawa
发明人： Douglas C. Watson , Alton H. Phillips , Masato Hatasawa
IPC分类号： G02B7/02
CPC分类号： G02B7/023
摘要： A kinematic optical mounting assembly secures an optical element to a base. A plurality of first bracket assemblies and second bracket assemblies are secured to the base and engage the optical element. Each first bracket assembly constrains the optical element from movement relative to the base in a direction substantially parallel to an axis of the base. Each second bracket assembly constrains the optical element from movement relative to the base in a direction substantially perpendicular to the axis of the base and substantially tangential to a periphery of the base. Six independent bracket assemblies constrain the optical element in six degrees of freedom to provide kinematic constraint without bending moments.
摘要翻译：运动学光学安装组件将光学元件固定到基座。多个第一支架组件和第二支架组件固定到基座并接合光学元件。每个第一支架组件限制光学元件在基本上平行于基座的轴线的方向上相对于基座移动。每个第二支架组件约束光学元件在基本上垂直于基座的轴线的方向上相对于基座移动，并且基本上与基座的周边相切。六个独立的支架组件以六个自由度约束光学元件以提供运动约束而没有弯矩。

3. 发明授权

US5852518A Projection optical unit and projection exposure apparatus comprising the same 失效
标题翻译：投影光学单元和包括该投影光学单元的投影曝光设备
公开(公告)号：US5852518A
公开(公告)日：1998-12-22
申请号：US865933
申请日：1997-05-30
申请人： Masato Hatasawa , Masatoshi Ikeda
发明人： Masato Hatasawa , Masatoshi Ikeda
IPC分类号： G02B13/00 , G02B7/02 , G02B13/14 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70825 , G02B13/143 , G02B7/021 , G03F7/70258 , G03F7/70883
摘要： Four specified lenses 22.sub.1 to 22.sub.4 of a plurality of lenses in a projection optical unit are subjected to special processing (astigmatic surface processing) so that asymmetric component aberration relative to an optical axis is generated. Each of the lenses 22.sub.1 to 22.sub.4 is held by each of secondary lens frames 20 set in each of primary lens frames 14. Each of the secondary lens frames 20 is constructed so that it can be rotated from the outside of a lens barrel 12. The asymmetric component aberration relative to the optical axis of an optical system comprising all lenses for constituting the projection optical unit 10 can be easily corrected by rotating a pair of two of the lenses 22 subjected to the astigmatic surface processing. The projection optical unit is used for a projection exposure apparatus.
摘要翻译：对投影光学单元中的多个透镜的四个特定透镜221至224进行特殊处理（散光表面处理），从而产生相对于光轴的非对称分量像差。每个透镜221至224由设置在每个主透镜框14中的每个次透镜框20保持。每个次透镜框20被构造成使其能够从透镜镜筒12的外部旋转。通过旋转经受散像表面处理的一对透镜22，可以容易地校正包括用于构成投影光学单元10的所有透镜的光学系统的相对于光轴的光学非对称分量像差。投影光学单元用于投影曝光装置。

4. 发明授权

US5973863A Exposure projection apparatus 失效
标题翻译：曝光投影装置
公开(公告)号：US5973863A
公开(公告)日：1999-10-26
申请号：US908949
申请日：1997-08-08
申请人： Masato Hatasawa , Masatoshi Ikeda
发明人： Masato Hatasawa , Masatoshi Ikeda
IPC分类号： G02B7/02 , G02B13/14 , G02B27/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70258 , G02B13/143 , G02B27/0068 , G03F7/70825 , G03F7/70883
摘要： The exposure projection apparatus includes an illumination system which illuminates a mask with a light beam, and a optical projection system which projects the image of a pattern formed on the mask onto a substrate. The optical projection system includes a first barrel which holds a plurality of optical elements, at least three second barrels, each holding at least one optical element disposed between the mask and the first barrel, so that the coma, astigmatism, and distortion of the optical projection system can be adjusted, and a first optical element which is disposed between the substrate and the first barrel so that either the spherical aberration or curvature of field of the optical projection system, or both, can be adjusted.
摘要翻译：曝光投影装置包括用光束照射掩模的照明系统和将形成在掩模上的图案的图像投影到基板上的光学投影系统。光学投影系统包括：第一筒，其保持多个光学元件;至少三个第二个筒，每个保持至少一个光学元件，设置在掩模和第一个镜筒之间，使得光学器件的彗差，散光和畸变可以调节投影系统，以及设置在基板和第一镜筒之间的第一光学元件，以便可以调整光学投影系统的球面像差或者是曲率，或两者。

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