会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • Silicon-based thin-film photoeclectric converter and method of manufacturing the same
    • 硅基薄膜光电转换器及其制造方法
    • US20090133753A1
    • 2009-05-28
    • US11991141
    • 2006-07-25
    • Toshiaki SasakiKenji Yamamoto
    • Toshiaki SasakiKenji Yamamoto
    • H01L31/00B05D5/12
    • H01L31/075H01L31/076H01L31/202Y02E10/548Y02P70/521
    • In order to improve photoelectric conversion properties of a silicon-based thin-film photoelectric converter to which a conductive SiOx layer is inserted to obtain an optical confinement effect, the silicon-based thin-film photoelectric converter according to the present invention includes an i-type photoelectric conversion layer of hydrogenated amorphous silicon or an alloy thereof, an i-type buffer layer made of hydrogenated amorphous silicon, and an n-type Si1-xOx layer (x is 0.25-0.6) stacked successively, wherein the buffer layer has a higher hydrogen concentration at its interface with and as compared with the photoelectric conversion layer and has a thickness of at least 5 nm and at most 50 nm. Accordingly, generation of silicon crystal phase parts and reduction of resistivity are promoted in the n-type Si1-xOx layer, contact resistance at the interface is reduced, and FF of the photoelectric converter is improved, so that the photoelectric converter achieves improved properties.
    • 为了提高插入导电性SiO x层的硅系薄膜光电转换器的光电转换性能,得到光限制效果,本发明的硅系薄膜光电转换元件包括:i- 氢化非晶硅或其合金的类型光电转换层,由氢化非晶硅制成的i型缓冲层和n型Si1-xOx层(x为0.25-0.6),其中缓冲层具有 在与光电转换层相比的界面处的氢浓度较高,并且具有至少5nm至最多50nm的厚度。 因此,在n型Si1-xOx层中促进硅晶相的产生和电阻率的降低,界面处的接触电阻降低,光电转换器的FF提高,光电转换器实现了改善的性能。
    • 4. 发明授权
    • Stacked photoelectric converter
    • 堆叠光电转换器
    • US07550665B2
    • 2009-06-23
    • US10530283
    • 2004-07-15
    • Toshiaki SasakiYohei KoiKenji YamamotoMasashi YoshimiMitsuru Ichikawa
    • Toshiaki SasakiYohei KoiKenji YamamotoMasashi YoshimiMitsuru Ichikawa
    • H01L31/00H02N6/00
    • H01L31/077H01L31/056H01L31/076Y02E10/52Y02E10/548
    • In a stacked-layer type photoelectric conversion device, a plurality of photoelectric conversion units are stacked on a substrate, each of which includes a one conductivity-type layer, a photoelectric conversion layer of substantially intrinsic semiconductor and an opposite conductivity-type layer in this order from a light-incident side. At least one of the opposite conductivity-type layer in a front photoelectric conversion unit arranged relatively closer to the light-incident side and the one conductivity-type layer in a back photoelectric conversion unit arranged adjacent to the front photoelectric conversion unit includes a silicon composite layer at least in a part thereof. The silicon composite layer has a thickness of more than 20 nm and less than 130 nm and an oxygen concentration of more than 25 atomic % and less than 60 atomic %, and includes silicon-rich phase parts in an amorphous alloy phase of silicon and oxygen.
    • 在堆叠层型光电转换装置中,在基板上层叠多个光电转换单元,每个基板包括一个导电型层,本质上为半导体的光电转换层和相反的导电型层 从光线一方的命令。 在与前光电转换单元相邻布置的背光电转换单元中相对靠近光入射侧的前光电转换单元中的至少一个导电类型层和一个导电型层中的至少一个包括硅复合物 至少在其一部分。 硅复合层的厚度大于20nm且小于130nm,氧浓度大于25原子%且小于60原子%,并且包括在硅和氧的非晶合金相中的富硅相部分 。
    • 5. 发明申请
    • Substrate for thin-film solar cell, method for producing the same, and thin-film solar cell employing it
    • 薄膜太阳能电池用基板,其制造方法以及使用该薄膜太阳能电池的薄膜太阳能电池
    • US20070169805A1
    • 2007-07-26
    • US10588708
    • 2005-03-15
    • Toshiaki SasakiYohei KoiYuko TawadaKenji Yamamoto
    • Toshiaki SasakiYohei KoiYuko TawadaKenji Yamamoto
    • H01L31/00
    • H01L31/03921H01L31/022466H01L31/022483H01L31/02363H01L31/02366H01L31/1884Y02E10/50
    • An inexpensive substrate for thin film solar cells having improved performance of a thin film solar cell, and a manufacturing method thereof are provided by increasing light trapping effect due to effective increase in unevenness of a substrate for thin film solar cells. Furthermore, a thin film solar cell having improved performance using the substrate is provided. A substrate for thin film solar cells of the present invention has a transparent insulating substrate and a transparent electrode layer deposited thereon including at least zinc oxide (ZnO), the transparent insulating substrate has a fine surface unevenness having a root-mean-square deviation of the surface (RMS) 5 to 50 nm in an interface by a side of the transparent electrode layer, a projected area thereof consists of a curved surface, and furthermore a haze ratio or a ratio of a diffuse transmittance to a total transmittance as an index of unevenness of a substrate may be set at not less than 20% measured using a C light source. And thereby light trapping effect may effectively occur to improve performance of the thin film solar cell.
    • 通过提高薄膜太阳能电池基板的不均匀性的增加的光捕获效果,提供薄膜太阳能电池的性能提高的薄膜太阳能电池的便宜的基板,及其制造方法。 此外,提供了使用该基板具有改进的性能的薄膜太阳能电池。 本发明的薄膜太阳能电池用基板具有透明绝缘性基板和至少含有氧化锌(ZnO)的淀积的透明电极层,透明绝缘性基板具有平均值偏差为 通过透明电极层的一侧的界面中的5〜50nm的面(RMS),其投影面积由曲面构成,此外,雾度比或漫透射率与总透射率的比率为指标 可以将基板的不平坦度设定为使用C光源测量的不小于20%。 从而可以有效地发生光捕获效应,以改善薄膜太阳能电池的性能。
    • 6. 发明授权
    • Thin-film photoelectric converter
    • 薄膜光电转换器
    • US07678992B2
    • 2010-03-16
    • US10543516
    • 2004-05-28
    • Takashi SuezakiMasashi YoshimiToshiaki SasakiYuko TawadaKenji Yamamoto
    • Takashi SuezakiMasashi YoshimiToshiaki SasakiYuko TawadaKenji Yamamoto
    • H01L31/00
    • H01L31/076H01L31/046Y02E10/548
    • A thin film photoelectric converter, especially an integrated thin film photoelectric converter having improved photoelectric conversion efficiency is provided by controlling an open-circuit voltage and a fill factor so as not be small in a thin film photoelectric converter including a crystalline silicon photoelectric conversion unit. The thin film photoelectric converter by the present invention has at least a transparent electrode film, a crystalline silicon photoelectric conversion unit, and a back electrode film formed sequentially on one principal surface of a transparent substrate, and the converter has a whitish discoloring area on a part of a surface of the converter after formation of the crystalline silicon photoelectric conversion unit. A percentage of dimensions of the whitish discoloring area preferably is not more than 5% of a dimension of the photoelectric conversion area. A thin film photoelectric converter of the present invention is preferably an integrated thin film photoelectric converter.
    • 通过在包括晶体硅光电转换单元的薄膜光电转换器中控制开路电压和填充因子以不小而提供薄膜光电转换器,特别是具有改进的光电转换效率的集成薄膜光电转换器。 本发明的薄膜光电转换器至少在透明基板的一个主表面上依次形成透明电极膜,晶体硅光电转换单元和背面电极膜,并且转换器具有白色变色区域 形成晶体硅光电转换单元后的转换器表面的一部分。 白色变色区域的尺寸的百分比优选不大于光电转换区域的尺寸的5%。 本发明的薄膜光电转换器优选为集成薄膜光电转换器。
    • 7. 发明授权
    • Silicon-based thin-film photoelectric converter and method of manufacturing the same
    • 硅基薄膜光电转换器及其制造方法
    • US07960646B2
    • 2011-06-14
    • US11991141
    • 2006-07-25
    • Toshiaki SasakiKenji Yamamoto
    • Toshiaki SasakiKenji Yamamoto
    • H01L31/00B05D5/12
    • H01L31/075H01L31/076H01L31/202Y02E10/548Y02P70/521
    • In order to improve photoelectric conversion properties of a silicon-based thin-film photoelectric converter to which a conductive SiOx layer is inserted to obtain an optical confinement effect, the silicon-based thin-film photoelectric converter according to the present invention includes an i-type photoelectric conversion layer of hydrogenated amorphous silicon or an alloy thereof, an i-type buffer layer made of hydrogenated amorphous silicon, and an n-type Si1-xOx layer (x is 0.25-0.6) stacked successively, wherein the buffer layer has a higher hydrogen concentration at its interface with and as compared with the photoelectric conversion layer and has a thickness of at least 5 nm and at most 50 nm. Accordingly, generation of silicon crystal phase parts and reduction of resistivity are promoted in the n-type Si1-xOx layer, contact resistance at the interface is reduced, and FF of the photoelectric converter is improved, so that the photoelectric converter achieves improved properties.
    • 为了提高插入导电性SiO x层的硅系薄膜光电转换器的光电转换性能,得到光限制效果,本发明的硅系薄膜光电转换元件包括:i- 氢化非晶硅或其合金的类型光电转换层,由氢化非晶硅制成的i型缓冲层和n型Si1-xOx层(x为0.25-0.6),其中缓冲层具有 在与光电转换层相比的界面处的氢浓度较高,并且具有至少5nm至最多50nm的厚度。 因此,在n型Si1-xOx层中促进硅晶相的产生和电阻率的降低,界面处的接触电阻降低,光电转换器的FF提高,光电转换器实现了改善的性能。
    • 8. 发明授权
    • Substrate for thin-film solar cell, method for producing the same, and thin-film solar cell employing it
    • 薄膜太阳能电池用基板,其制造方法以及使用该薄膜太阳能电池的薄膜太阳能电池
    • US07781668B2
    • 2010-08-24
    • US10588708
    • 2005-03-15
    • Toshiaki SasakiYohei KoiYuko TawadaKenji Yamamoto
    • Toshiaki SasakiYohei KoiYuko TawadaKenji Yamamoto
    • H01L25/00
    • H01L31/03921H01L31/022466H01L31/022483H01L31/02363H01L31/02366H01L31/1884Y02E10/50
    • An inexpensive substrate for thin film solar cells having improved performance of a thin film solar cell, and a manufacturing method thereof are provided by increasing light trapping effect due to effective increase in unevenness of a substrate for thin film solar cells. Furthermore, a thin film solar cell having improved performance using the substrate is provided. A substrate for thin film solar cells of the present invention has a transparent insulating substrate and a transparent electrode layer deposited thereon including at least zinc oxide (ZnO), the transparent insulating substrate has a fine surface unevenness having a root-mean-square deviation of the surface (RMS) 5 to 50 nm in an interface by a side of the transparent electrode layer, a projected area thereof consists of a curved surface, and furthermore a haze ratio or a ratio of a diffuse transmittance to a total transmittance as an index of unevenness of a substrate may be set at not less than 20% measured using a C light source. And thereby light trapping effect may effectively occur to improve performance of the thin film solar cell.
    • 通过提高薄膜太阳能电池基板的不均匀性的增加的光捕获效果,提供薄膜太阳能电池的性能提高的薄膜太阳能电池的便宜的基板,及其制造方法。 此外,提供了使用该基板具有改进的性能的薄膜太阳能电池。 本发明的薄膜太阳能电池用基板具有透明绝缘性基板和至少含有氧化锌(ZnO)的淀积的透明电极层,透明绝缘性基板具有平均值偏差为 通过透明电极层的一侧的界面中的5〜50nm的面(RMS),其投影面积由曲面构成,此外,雾度比或漫透射率与总透射率的比率为指标 可以将基板的不平坦度设定为使用C光源测量的不小于20%。 从而可以有效地发生光捕获效应,以改善薄膜太阳能电池的性能。
    • 10. 发明申请
    • Thin-film photoelectric converter
    • 薄膜光电转换器
    • US20060097259A1
    • 2006-05-11
    • US10543516
    • 2004-05-28
    • Takashi SuezakiMasashi YoshimiToshiaki SasakiYuko TawadaKenji Yamamoto
    • Takashi SuezakiMasashi YoshimiToshiaki SasakiYuko TawadaKenji Yamamoto
    • H01L29/76H01L29/10
    • H01L31/076H01L31/046Y02E10/548
    • A thin film photoelectric converter, especially an integrated thin film photoelectric converter having improved photoelectric conversion efficiency is provided by controlling an open-circuit voltage and a fill factor so as not be small in a thin film photoelectric converter including a crystalline silicon photoelectric conversion unit. The thin film photoelectric converter by the present invention has at least a transparent electrode film, a crystalline silicon photoelectric conversion unit, and a back electrode film formed sequentially on one principal surface of a transparent substrate, and the converter has a whitish discoloring area on a part of a surface of the converter after formation of the crystalline silicon photoelectric conversion unit. A percentage of dimensions of the whitish discoloring area preferably is not more than 5% of a dimension of the photoelectric conversion area. A thin film photoelectric converter of the present invention is preferably an integrated thin film photoelectric converter.
    • 通过在包括晶体硅光电转换单元的薄膜光电转换器中控制开路电压和填充因子以不小而提供薄膜光电转换器,特别是具有改进的光电转换效率的集成薄膜光电转换器。 本发明的薄膜光电转换器至少在透明基板的一个主表面上依次形成透明电极膜,晶体硅光电转换单元和背面电极膜,并且转换器具有白色变色区域 形成晶体硅光电转换单元后的转换器表面的一部分。 白色变色区域的尺寸的百分比优选不大于光电转换区域的尺寸的5%。 本发明的薄膜光电转换器优选为集成薄膜光电转换器。