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    • 2. 发明授权
    • Aircraft reaction link
    • 飞机反应链接
    • US08678694B2
    • 2014-03-25
    • US12954140
    • 2010-11-24
    • Koji ItohToshiaki OgawaMakoto Nagashima
    • Koji ItohToshiaki OgawaMakoto Nagashima
    • F16C11/06F16J1/16
    • B64C13/24Y02T50/44
    • An aircraft reaction link includes a pair of linear portions, a coupling portion that couples ends of the pair of linear portions on the same side to each other, a fulcrum shaft attachment portion, and a cylinder attachment portion. A metal frame that is made of a metallic material and that is provided so as to extend across the coupling portion and the pair of linear portions and a composite frame that is made of fiber-reinforced plastic and that is provided so as to extend at least in the pair of linear portions are bonded together, and thereby, the pair of linear portions and the coupling portion are formed. The metal frame is provided so as to extend from the fulcrum shaft attachment portion to the cylinder attachment portion.
    • 飞机反应连杆包括一对直线部分,将一对直线部分的端部彼此相对联接的联接部分,支点轴附接部分和气缸附接部分。 金属框架,其由金属材料制成,并且设置成跨越所述联接部分和所述一对直线部分,以及复合框架,所述复合框架由纤维增强塑料制成,并且被设置成至少延伸 在一对直线部分接合在一起,从而形成一对直线部分和联接部分。 金属框架设置成从支点轴附接部分延伸到气缸附接部分。
    • 7. 发明申请
    • Systems and methods for back-biased face target sputtering
    • 反向偏置面靶溅射的系统和方法
    • US20070131538A1
    • 2007-06-14
    • US11301488
    • 2005-12-13
    • Makoto Nagashima
    • Makoto Nagashima
    • C23C14/00
    • C23C14/352C23C14/568H01J37/3405H01J37/3452
    • Systems and methods are disclosed for forming stacked substrates with data storage arrays formed on each substrate in an air-tight chamber in which an inert gas is admittable and exhaustible; a pair of target plates placed at opposite ends of said air-tight chamber respectively so as to face each other and form a plasma region therebetween; a pair of magnets respectively disposed adjacent to said target plates such that magnet poles of different polarities face each other across said plasma region thereby to establish a magnetic field of said plasma region between said target plates; a substrate holder disposed adjacent to said plasma region, said substrate holder adapted to hold a substrate on which an alloyed thin film is to be deposited; and a back-bias power supply coupled to the substrate holder, wherein the chamber temperature is maintained at 380 degrees Celsius or less, a back-bias voltage greater than 80 volts, and an oxygen flow of at least 17%.
    • 公开了用于形成堆叠衬底的系统和方法,其中数据存储阵列形成在气密室中的每个衬底上,其中惰性气体是可渗透和可消耗的; 一对靶板分别放置在所述气密室的相对端,以便彼此面对并在它们之间形成等离子体区域; 分别设置在所述目标板附近的一对磁体,使得具有不同极性的磁极在所述等离子体区域之间彼此面对,从而在所述靶板之间建立所述等离子体区域的磁场; 与所述等离子体区域相邻设置的衬底保持器,所述衬底保持器适于保持要沉积合金化薄膜的衬底; 以及耦合到所述衬底保持器的背偏置电源,其中所述腔室温度保持在380摄氏度或更低,大于80伏的背偏压,以及至少17%的氧气流。