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    • 6. 发明授权
    • Semiconductor wafer treating apparatus utilizing a plasma
    • 利用等离子体的半导体晶片处理装置
    • US4877509A
    • 1989-10-31
    • US269688
    • 1988-11-10
    • Toshiaki OgawaNobuo FujiwaraKenji KawaiTeruo ShibanoHiroshi MoritaKyusaku Nishioka
    • Toshiaki OgawaNobuo FujiwaraKenji KawaiTeruo ShibanoHiroshi MoritaKyusaku Nishioka
    • H01L21/302C23C16/511H01J37/32H01L21/205H01L21/3065H01L21/31
    • H01J37/32293C23C16/511H01J37/32192H01J37/32678
    • An apparatus for treating semiconductor wafers utilizing a plasma generated by electron cyclotron resonance (ECR) is disclosed in which a microwave is supplied to a plasma generating chamber via a rectangular waveguide, a rectangular-to-circular microwave converter, and a circular polarization converter. The polarization converter may comprise a phase shift plate of a dielectric material or an electrically conductive material disposed in a circular waveguide in the form of a metallic cylinder. The polarization converter transforms a circular TE.sub.11 mode microwave supplied from the rectangular-to-circular microwave converter to a circularly polarized one by rotating the direction of the electric field of the microwave in the TE.sub.11 mode one complete turn in one period of the microwave. Thus, the electric field strength of the microwave supplied to the plasma generating chamber is averaged over the time along the circumferential direction in the plasma generating chamber to make the density of plasma generation therein spatially uniform. The spatially uniformly distributed plasma generated in the plasma generating chamber is conveyed to the wafer in the wafer treating chamber to effect a treatment of the wafer.
    • 公开了一种利用电子回旋共振(ECR)产生的等离子体处理半导体晶片的装置,其中通过矩形波导,矩形到圆形微波转换器和圆偏振转换器将微波提供给等离子体发生室。 偏振转换器可以包括介电材料的相移板或设置在金属圆筒形状的圆形波导中的导电材料。 在微波的一个周期内,通过在TE11模式一周内旋转微波的电场方向,将由矩形到圆形的微波转换器提供的循环TE11模式的微波变换成圆偏振的微波。 因此,供给到等离子体发生室的微波的电场强度在等离子体发生室中沿着圆周方向的时间平均化,使得其中等离子体产生的密度在空间上均匀。 在等离子体发生室中产生的空间均匀分布的等离子体被输送到晶片处理室中的晶片,以对晶片进行处理。