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1. 发明授权

US06280897B1 Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts 失效
标题翻译：光敏组合物，使用其形成图案的方法，以及电子部件的制造方法
公开(公告)号：US06280897B1
公开(公告)日：2001-08-28
申请号：US08997623
申请日：1997-12-23
申请人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
发明人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
IPC分类号： G03F7004
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.
摘要翻译：一种感光性组合物，其含有具有下述通式（1A）表示的重复链段的聚合物和能够通过照射光化辐射而产生酸的化合物。其中，R 11为氢原子，脂肪族烃基，烷氧基基团，卤素原子或氰基，R 12是脂族烃基或环状烯烃，R 13是（a）具有2〜12个碳原子的直链烯烃，环状烯烃或杂环基中的任一种和（ b）由 - （CH 2）m - （m为3〜9的整数）表示的烃基，R 14为亲水性基团。

2. 发明授权

US5853952A Color developing organic material, color developing resin composition and colored thin film pattern 失效
标题翻译：显色有机材料，彩色显影树脂组合物和着色薄膜图案
公开(公告)号：US5853952A
公开(公告)日：1998-12-29
申请号：US705265
申请日：1996-08-29
申请人： Toru Ushirogouchi , Makoto Nakase , Akira Yoshizumi , Naoko Kihara , Takuya Naito , Naomi Shida , Koji Asakawa
发明人： Toru Ushirogouchi , Makoto Nakase , Akira Yoshizumi , Naoko Kihara , Takuya Naito , Naomi Shida , Koji Asakawa
IPC分类号： C08G12/06 , C08G73/00 , G02B5/22 , G03F7/00 , G03F7/004 , G03F7/105 , G03C1/73
CPC分类号： C08G12/06 , G03F7/0007 , G03F7/0045 , G03F7/105 , G02B5/22 , Y10S430/163
摘要： There is disclosed a color developing resin composition comprising a base polymer, a dialdehyde represented by the general formula OHC--R.sup.1' --CHO, a diamine represented by the general formula H.sub.2 N--R.sup.2' --NH.sub.2 (at least one of R.sup.1' and R.sup.2' is an aromatic group), a compound which produces an acid by light irradiating and a resin which is crosslinked with the acid.
摘要翻译：公开了一种显色树脂组合物，其包含基础聚合物，由通式OHC-R1'-CHO表示的二醛，由通式H2N-R2'-NH2表示的二胺（R1'和R2'中的至少一个）是芳族基团），通过光照射产生酸的化合物和与酸交联的树脂。

3. 发明授权

US06168897A Method of forming patterns 失效
标题翻译：形成图案的方法
公开(公告)号：US06168897A
公开(公告)日：2001-01-02
申请号：US09277744
申请日：1999-03-29
申请人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
发明人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
IPC分类号： G03F700
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/09 , G03F7/091 , G03F7/2004 , G03F7/2006
摘要： Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range shorter than the maximum wavelength in the third absorption band from the long-wave side in the absorption spectrum of the aromatic compound and longer than the maximum wavelength in the fourth absorption band from the same, thereby to cause a photochemical reaction in the light-sensitive layer, and a step of developing the exposed light-sensitive layer, optionally after heat-treating the layer, so as to selectively remove the exposed area of the layer or leave the area as it is. The method gives a pattern having a high resolving power and an excellent dry-etching resistance.
摘要翻译：公开了一种在基板上形成图案的方法，包括在基板上形成含有芳族化合物的感光层的步骤，使用波长范围短于在芳族化合物的吸收光谱中的长波侧的第三吸收带中的最大波长比第四吸收带中的最大波长长，从而在感光层中引起光化学反应，任选地在热处理该层之后，显影出曝光的感光层的步骤，以选择性地去除该层的曝光区域，或者直接离开该区域。该方法给出了具有高分辨能力和优异的耐干蚀刻性的图案。

4. 发明授权

US5928841A Method of photoetching at 180 to 220 失效
标题翻译：在180至220NM下光刻的方法
公开(公告)号：US5928841A
公开(公告)日：1999-07-27
申请号：US462546
申请日：1995-06-05
申请人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
发明人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/09 , G03F7/20 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/09 , G03F7/091 , G03F7/2006 , G03F7/2004
摘要： Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range shorter than the maximum wavelength; in the third absorption band from the long-wave side in the absorption spectrum of the aromatic compound and longer than the maximum wavelength in the fourth absorption band from the same, thereby to cause a photochemical reaction in the light-sensitive layer, and a step of developing the exposed light-sensitive layer, optionally after heat-treating the layer, so as to selectively remove the exposed area of the layer or leave the area as it is. The method gives a pattern having a high resolving power and an excellent dry-etching resistance.
摘要翻译：公开了一种在基板上形成图案的方法，包括在基板上形成含有芳族化合物的感光层的步骤，使用波长范围短于最大波长; 在芳香族化合物的吸收光谱中的长波侧的第三吸收带中，比来自该芳香族化合物的第四吸收带的最大波长长，从而在感光层中产生光化学反应，显影曝光的感光层，任选地在热处理该层之后，以选择性地去除该层的暴露区域，或者直接离开该区域。该方法给出了具有高分辨能力和优异的耐干蚀刻性的图案。

5. 再颁专利

USRE38256E1 Photosensitive composition 有权
标题翻译：感光组合物
公开(公告)号：USRE38256E1
公开(公告)日：2003-09-23
申请号：US09448977
申请日：1999-11-24
申请人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
发明人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
IPC分类号： G03F7021
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0215 , G03F7/038 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

6. 发明授权

US5691101A Photosensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5691101A
公开(公告)日：1997-11-25
申请号：US644395
申请日：1996-05-09
申请人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
发明人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
IPC分类号： G03F7/004 , G03F7/021 , G03F7/038 , G03F7/039 , G03F7/023
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0215 , G03F7/038 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.
摘要翻译：公开了一种安全的浆料感光性组合物，其成像能力如分辨率和灵敏度优异且不含有害化合物，以及能够在不使用任何有机溶剂的情况下溶解在水中的安全的水溶性光敏组合物，同时保持足够的灵敏度作为抗蚀剂不含有害物质。浆料光敏组合物含有当用光或电离辐射照射时产生酸的化合物，至少一种具有酸交联性或酸分解性的树脂和粉末。可以通过在基板上形成这种感光性组合物的层来制造各种装置，根据期望的图案将该层曝光，并加热该层。水溶性光敏组合物含有当用光或电离辐射照射时产生酸的化合物和缩醛树脂。将该水溶性感光性组合物涂布在基材上，并根据期望的图案用光或电离辐射照射。所得到的底物通过加热化学放大并用水显影。这使得可以安全地形成图案而不使用任何呼吸机。

7. 发明授权

US6060207A Photosensitive material 失效
标题翻译：感光材料
公开(公告)号：US6060207A
公开(公告)日：2000-05-09
申请号：US499974
申请日：1995-07-10
申请人： Naomi Shida , Toru Ushirogouchi , Takuya Naito , Makoto Nakase
发明人： Naomi Shida , Toru Ushirogouchi , Takuya Naito , Makoto Nakase
IPC分类号： G03F7/004 , G03F7/039 , G03F7/008
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111 , Y10S430/115 , Y10S430/122
摘要： A photosensitive material which is very low in absorption of a light source of short wavelength and excellent in dry etch resistance. This photosensitive material comprises a compound having a terpenoid skeleton. Preferably, the compound having a terpenoid skeleton is a compound having a monovalent menthyl group or menthyl derivative group which can be represented by the general formula (1). ##STR1## wherein R is a hydrogen atom or a monovalent hydrocarbon group, R.sup.1 may be the same with or different from each other and individually represents a hydrogen atom, a halogen atom, a hydrocarbon group, a hydroxyl group, an alkoxyl group, an amino group, an alkoxy group, an amino group, an imide group, an amide group, or a sulfonyl group, a carboxyl group, a carbonyl group, or a sulfonamide group, and a pair of neighboring R.sup.1 may be connected together to form a closed ring.
摘要翻译：一种感光材料，其对短波长的光源的吸收非常低，并且具有优异的耐干蚀刻性。该感光材料包含具有萜类骨架的化合物。优选具有萜类骨架的化合物是具有可以由通式（1）表示的一价薄荷基或薄荷基衍生物基团的化合物。其中R为氢原子或一价烃基，R 1可以相同或不同，分别表示氢原子，卤素原子，烃基，羟基，烷氧基，氨基，烷氧基，氨基，酰亚胺基，酰胺基或磺酰基，羧基，羰基或磺酰胺基，并且一对相邻的R 1可以连接在一起形成封闭环。

8. 发明授权

US5348838A Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group 失效
标题翻译：包含碱溶性粘合剂和具有磺酰基的光致酸发生剂的光敏组合物
公开(公告)号：US5348838A
公开(公告)日：1994-09-20
申请号：US921692
申请日：1992-07-30
申请人： Toru Ushirogouchi , Naoko Kihara , Osamu Sasaki , Tsukasa Tada , Takuya Naito , Satoshi Saito
发明人： Toru Ushirogouchi , Naoko Kihara , Osamu Sasaki , Tsukasa Tada , Takuya Naito , Satoshi Saito
IPC分类号： C08G8/28 , C08K5/41 , G03F7/004 , G03C1/492
CPC分类号： C08G8/28 , C08K5/41 , G03F7/0045 , Y10S430/11
摘要： A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.
摘要翻译：感光性组合物包含碱溶性树脂，具有可被酸分解的取代基的化合物，在分解取代基时产生碱溶性基团，或具有能够使碱溶性交联的取代基的化合物（1）表示的曝光时产生酸的化合物：其中R11表示一价有机基团或一价有机基团，其中在引入选自卤素原子，硝基和氰基中的至少一个，R 12，R 13和R 14各自独立地表示氢，卤素原子，硝基，氰基，一价有机基基团或其中引入选自卤素原子，硝基和氰基中的至少一种的一价有机基团。

9. 发明授权

US06974658B2 HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS 失效
标题翻译：高分子化合物，单体化合物和光敏组合物，使用光敏组合物的图案形成方法，以及制造电子元件的方法
公开(公告)号：US06974658B2
公开(公告)日：2005-12-13
申请号：US10425848
申请日：2003-04-30
申请人： Naomi Shida , Toru Ushirogouchi , Takuya Naito
发明人： Naomi Shida , Toru Ushirogouchi , Takuya Naito
IPC分类号： C08F16/00 , C08F24/00 , C08F28/00 , C08F32/00 , C08F32/08 , C08F34/02 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/38
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C):
摘要翻译：公开了一种光致抗蚀剂用高分子化合物，其特征在于，高分子化合物由具有以下通式（1），通式（2A），通式（2B）或通式（2C）所示的至少一个骨架的高分子化合物形成）：

10. 发明授权

US5372914A Pattern forming method 失效
标题翻译：图案形成方法
公开(公告)号：US5372914A
公开(公告)日：1994-12-13
申请号：US36254
申请日：1993-03-24
申请人： Takuya Naito , Osamu Sasaki , Tsukasa Tada , Naoko Kihara , Toru Ushirogouchi , Satoshi Saito , Takashi Jonai , Hirokazu Niki
发明人： Takuya Naito , Osamu Sasaki , Tsukasa Tada , Naoko Kihara , Toru Ushirogouchi , Satoshi Saito , Takashi Jonai , Hirokazu Niki
IPC分类号： G03F7/004 , G03F7/09 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/094 , Y10S430/122
摘要： On a substrate a protective layer is formed which can suppress the diffusion of a contaminant from the substrate. On the protective layer, thus formed, a resin layer is formed. The resin layer comprises a photosensitive composition containing a compound which has a substituent group capable of being decomposed or cross-linked in the presence of an acid, and a compound which can generate an acid when exposed to light. The resin layer is pattern-exposed to light and then baked at a predetermined temperature. The resin layer is developed, whereby the exposed portions of the resin layer are removed or left, thus forming a pattern comprising lines and spaces each having a predetermined width. Each of the lines of the pattern has a cross-section having neither sloped profile nor undercut profile, and the pattern therefore has an improved resolution.
摘要翻译：在基板上形成保护层，其可以抑制污染物从基板的扩散。在形成的保护层上形成树脂层。树脂层包含含有在酸存在下具有能够分解或交联的取代基的化合物的光敏组合物和在暴露于光时可产生酸的化合物。将树脂层图案曝光，然后在预定温度下烘烤。树脂层被显影，由此树脂层的暴露部分被去除或留下，从而形成包括具有预定宽度的线和间隔的图案。图案的每条线具有既不具有倾斜轮廓也不具有底切轮廓的横截面，因此，该花纹具有改进的分辨率。

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