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1. 发明申请

US20080151230A1 PATTERN INSPECTION METHOD 有权
标题翻译：模式检验方法
公开(公告)号：US20080151230A1
公开(公告)日：2008-06-26
申请号：US12033599
申请日：2008-02-19
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译：图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

2. 发明授权

US07372560B2 Pattern inspection apparatus 有权
标题翻译：图案检验仪
公开(公告)号：US07372560B2
公开(公告)日：2008-05-13
申请号：US10809409
申请日：2004-03-26
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译：图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

3. 发明授权

US07522276B2 Pattern inspection method 有权
标题翻译：图案检验方法
公开(公告)号：US07522276B2
公开(公告)日：2009-04-21
申请号：US12033599
申请日：2008-02-19
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译：图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

4. 发明授权

US07551767B2 Pattern inspection apparatus 有权
标题翻译：图案检验仪
公开(公告)号：US07551767B2
公开(公告)日：2009-06-23
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动地取出模具数据的检查区域，对比方法。

5. 发明授权

US07421109B2 Pattern inspection apparatus 失效
标题翻译：图案检验仪
公开(公告)号：US07421109B2
公开(公告)日：2008-09-02
申请号：US10642760
申请日：2003-08-19
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00 , G01B11/00 , G01J1/10
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.
摘要翻译：一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同成像装置。

6. 发明申请

US20080166054A1 PATTERN INSPECTION APPARATUS 有权
标题翻译：图案检查装置
公开(公告)号：US20080166054A1
公开(公告)日：2008-07-10
申请号：US12040541
申请日：2008-02-29
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/46
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域，对比方法。

7. 发明申请

US20050213084A1 Mask-defect inspecting apparatus 有权
标题翻译：掩模缺陷检查装置
公开(公告)号：US20050213084A1
公开(公告)日：2005-09-29
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射在其上形成有图案（6）的掩模（4）上的不同区域（14a，14b），物镜（OL）以及至少一对具有检测传感器（17,19）的检测光学系统（15,16），以形成图案的图像，并且用于通过该目标接收来自每个不同区域的照明光每个检测光学系统具有用于调整光圈角度的机构（13a，13b）。

8. 发明授权

US07760349B2 Mask-defect inspecting apparatus with movable focusing lens 有权
标题翻译：具有可移动聚焦透镜的掩模缺陷检测设备
公开(公告)号：US07760349B2
公开(公告)日：2010-07-20
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射形成有图案（6）的掩模（4）上的不同区域（14a，14b）;物镜（OL）所述掩模和至少一对检测光学系统（15,16），每个具有检测传感器（17,19）以形成所述图案的图像并且用于通过所述物镜接收来自每个所述不同区域的照明光，每个检测光学系统具有用于调整孔的角度的机构（18a，20a）。

9. 发明授权

US07415149B2 Pattern inspection apparatus 失效
标题翻译：图案检验仪
公开(公告)号：US07415149B2
公开(公告)日：2008-08-19
申请号：US11674025
申请日：2007-02-12
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.
摘要翻译：图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合，芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域，对比方法。

10. 发明申请

US20080204723A1 Mask defect inspection apparatus 有权
标题翻译：掩模缺陷检测仪器
公开(公告)号：US20080204723A1
公开(公告)日：2008-08-28
申请号：US12081852
申请日：2008-04-22
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译：掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化面膜方向。

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