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1. 发明申请

US20050213084A1 Mask-defect inspecting apparatus 有权
标题翻译：掩模缺陷检查装置
公开(公告)号：US20050213084A1
公开(公告)日：2005-09-29
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射在其上形成有图案（6）的掩模（4）上的不同区域（14a，14b），物镜（OL）以及至少一对具有检测传感器（17,19）的检测光学系统（15,16），以形成图案的图像，并且用于通过该目标接收来自每个不同区域的照明光每个检测光学系统具有用于调整光圈角度的机构（13a，13b）。

2. 发明授权

US07551273B2 Mask defect inspection apparatus 有权
标题翻译：掩模缺陷检测仪器
公开(公告)号：US07551273B2
公开(公告)日：2009-06-23
申请号：US12081852
申请日：2008-04-22
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译：掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化面膜方向。

3. 发明申请

US20080204723A1 Mask defect inspection apparatus 有权
标题翻译：掩模缺陷检测仪器
公开(公告)号：US20080204723A1
公开(公告)日：2008-08-28
申请号：US12081852
申请日：2008-04-22
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译：掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化面膜方向。

4. 发明授权

US07379176B2 Mask defect inspection apparatus 有权
公开(公告)号：US07379176B2
公开(公告)日：2008-05-27
申请号：US11083202
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

5. 发明申请

US20050213083A1 Mask defect inspection apparatus 有权
标题翻译：掩模缺陷检测仪器
公开(公告)号：US20050213083A1
公开(公告)日：2005-09-29
申请号：US11083202
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/88 , G01N21/95 , G01N21/956 , G03F1/68 , G03F1/84
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译：掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化，掩模的厚度方向。

6. 发明授权

US07760349B2 Mask-defect inspecting apparatus with movable focusing lens 有权
标题翻译：具有可移动聚焦透镜的掩模缺陷检测设备
公开(公告)号：US07760349B2
公开(公告)日：2010-07-20
申请号：US11083323
申请日：2005-03-18
申请人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
发明人： Akihiko Sekine , Ikunao Isomura , Toshiyuki Watanabe , Shinji Sugihara , Riki Ogawa
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.
摘要翻译：一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射形成有图案（6）的掩模（4）上的不同区域（14a，14b）;物镜（OL）所述掩模和至少一对检测光学系统（15,16），每个具有检测传感器（17,19）以形成所述图案的图像并且用于通过所述物镜接收来自每个所述不同区域的照明光，每个检测光学系统具有用于调整孔的角度的机构（18a，20a）。

7. 发明授权

US07522276B2 Pattern inspection method 有权
标题翻译：图案检验方法
公开(公告)号：US07522276B2
公开(公告)日：2009-04-21
申请号：US12033599
申请日：2008-02-19
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译：图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

8. 发明授权

US07372560B2 Pattern inspection apparatus 有权
标题翻译：图案检验仪
公开(公告)号：US07372560B2
公开(公告)日：2008-05-13
申请号：US10809409
申请日：2004-03-26
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译：图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

9. 发明申请

US20080151230A1 PATTERN INSPECTION METHOD 有权
标题翻译：模式检验方法
公开(公告)号：US20080151230A1
公开(公告)日：2008-06-26
申请号：US12033599
申请日：2008-02-19
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译：图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

10. 发明授权

US5347328A Apparatus for measuring an intraocular length between anterior and posterior portions of an eye 失效
标题翻译：用于测量眼睛的前部和后部之间的眼内长度的装置
公开(公告)号：US5347328A
公开(公告)日：1994-09-13
申请号：US872266
申请日：1992-04-21
申请人： Akihiko Sekine , Funio Ohtomo
发明人： Akihiko Sekine , Funio Ohtomo
IPC分类号： A61B3/10 , G01B9/02
CPC分类号： A61B3/1005 , G01B9/02004 , G01B9/0207 , G01B2290/60
摘要： An apparatus for measuring an eye axial length includes a measuring optical system for projecting laser beam onto an eye and making interference between light reflected by the cornea of the eye and light reflected by the retina of the eye. The measuring optical system includes beam splitting means for splitting the beams of light reflected by the cornea and the retina each into two each for different optical systems, a cornea reflected light receiving optical system for receiving the light reflected by the cornea, a retina reflected light receiving optical system for receiving the light reflected by the retina, and an interference light receiving optical system for reuniting each reflected light at the substantially identical wave front and receiving interference light.
摘要翻译：用于测量眼睛轴向长度的装置包括用于将激光束投射到眼睛上并在由眼睛的角膜反射的光与由眼睛的视网膜反射的光之间的干涉的测量光学系统。测量光学系统包括用于将由角膜和视网膜反射的光束分别分成用于不同光学系统的光束的光束分离装置，用于接收由角膜反射的光的角膜反射光接收光学系统，视网膜反射光用于接收由视网膜反射的光的接收光学系统和用于使基本相同的波前的每个反射光重新接收并接收干涉光的干涉光接收光学系统。

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