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    • 7. 发明授权
    • Electron device
    • 电子器件
    • US4089022A
    • 1978-05-09
    • US744864
    • 1976-11-24
    • Shojiro AsaiToshiaki MasuharaKenji Kaneko
    • Shojiro AsaiToshiaki MasuharaKenji Kaneko
    • H01L21/822H01L21/331H01L21/8222H01L27/04H01L27/06H01L27/082H01L27/088H01L29/73H01L29/78H03K19/082
    • H01L27/088H01L27/082H01L29/7304
    • An electron device comprising (i) a semiconductor element which includes a semiconductor region A of a first conductivity type, a semiconductor region B of a second conductivity type adjoining the region A, and a semiconductor region C of the second conductivity type adjoining the region A and isolated from the region B by the region A, and in which on a surface extending from the region B via the region A to the region C, a gate electrode is provided through an insulating film, (ii) means for holding a potential of the gate electrode so that a potential of minority carriers in a surface portion of the region A underneath the gate electrode may become lower than a potential in an inner portion of the region A, (iii) means for applying a forward bias voltage between the region A and the region B, and (iv) means for applying to the region C a potential by which a potential for the minority carriers becomes lower in the region C than in the region B. The electron device is capable of such operations as amplification, oscillation and memory under an extraordinarily low supply voltage, and is extraordinarily low in the power consumption.
    • 一种电子器件,包括(i)半导体元件,其包括第一导电类型的半导体区域A,与区域A相邻的第二导电类型的半导体区域B和与区域A相邻的第二导电类型的半导体区域C 并且通过区域A从区域B隔离,并且其中在从区域B经由区域A延伸到区域C的表面上,通过绝缘膜提供栅电极,(ii)保持电位的装置 使得栅极电极下面的区域A的表面部分中的少数载流子的电位可能变得低于区域A的内部部分中的电位,(iii)在区域A之间施加正向偏置电压的装置 A和区域B,以及(iv)用于向区域C施加在区域C中少于少数载流子的电位低于区域B的电位的装置。电子装置能够 作为在非常低的电源电压下的放大,振荡和存储的操作,并且功耗非常低。
    • 8. 发明授权
    • Semiconductor device and a method for fabricating the same
    • 半导体装置及其制造方法
    • US4021835A
    • 1977-05-03
    • US544265
    • 1975-01-27
    • Jun EtohToshiaki Masuhara
    • Jun EtohToshiaki Masuhara
    • H01L21/265H01L29/78
    • H01L29/7838H01L21/2652H01L29/78
    • A MOS-FET (Metal-Oxide-Semiconductor Field Effect Transistor) comprises a semiconductor body, source and drain regions disposed in the body at portions separated from each other, a second semiconductor region having a higher impurity concentration than that of the body, formed by ion implantation in the body between the source and drain regions, a first semiconductor region having a lower impurity concentration than that of the second semiconductor region but a higher impurity concentration than that of the body, and having an opposite conductivity type to that of the second semiconductor region, formed by ion implantation, so that the second semiconductor region is very thin, and which has a very small amount of a minute current, that is a tailing current.
    • MOS-FET(金属氧化物半导体场效应晶体管)包括半导体本体,源极和漏极区域,其设置在彼此分离的部分的主体中,形成具有比主体杂质浓度更高的第二半导体区域 通过在源极和漏极区域之间的体内离子注入,具有比第二半导体区域低的杂质浓度的杂质浓度较低的杂质浓度比第二半导体区域低的杂质浓度的第一半导体区域,并且具有与 第二半导体区域,通过离子注入形成,使得第二半导体区域非常薄,并且具有非常少量的微小电流,即尾部电流。