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    • 3. 发明授权
    • Silicon-containing alicyclic polyimide resin, polyamic acid resin, and manufacturing method for same
    • 含硅脂环族聚酰亚胺树脂,聚酰胺酸树脂及其制造方法
    • US08592546B2
    • 2013-11-26
    • US13583727
    • 2011-04-13
    • Tooru KikuchiToshihiko TakasakiKatsuyuki Masuda
    • Tooru KikuchiToshihiko TakasakiKatsuyuki Masuda
    • C08G77/452
    • C08G73/106C08G69/42C08G73/105C08G73/1075C08G73/1078C08G77/455
    • A polyimide resin including repeating units represented by formula (1): wherein R is a diamine residue or a diisocyanate residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of imide rings bonded to the norbornane rings is in exo configuration with respect to the norbornane rings, and a polyamic acid resin including repeating units represented by formula (2): wherein R is a diamine residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of amide groups and carboxyl groups bonded to the norbornane rings is in exo configuration with respect to the norbornane rings. The polyimide resin is soluble in general-purpose solvents, has a good transparency and a high molecular weight, and is excellent in mechanical properties, such as tensile strength and elongation.
    • 包含由式(1)表示的重复单元的聚酰亚胺树脂:其中R是二胺残基或二异氰酸酯残基; m为2〜30的整数, 与降冰片烷环结合的任何硅原子相对于降冰片烷环都处于外部构型; 并且与降冰片烷环结合的任何酰亚胺环相对于降冰片烷环为外部构型,和包含由式(2)表示的重复单元的聚酰胺酸树脂:其中R是二胺残基; m为2〜30的整数, 与降冰片烷环结合的任何硅原子相对于降冰片烷环都处于外部构型; 与降冰片烷环结合的酰胺基和羧基中的任何一个相对于降冰片烷环都处于外部构型。 聚酰亚胺树脂可溶于通用溶剂,透明度高,分子量高,机械性能优异,拉伸强度和伸长率优异。
    • 4. 发明申请
    • NOVEL SILICON-CONTAINING ALICYCLIC POLYIMIDE RESIN, POLYAMIC ACID RESIN, AND MANUFACTURING METHOD FOR SAME
    • 新型含硅聚合物聚酰胺树脂,聚酰胺树脂及其制造方法
    • US20130158225A1
    • 2013-06-20
    • US13583727
    • 2011-04-13
    • Tooru KikuchiToshihiko TakasakiKatsuyuki Masuda
    • Tooru KikuchiToshihiko TakasakiKatsuyuki Masuda
    • C08G73/10C08G69/42
    • C08G73/106C08G69/42C08G73/105C08G73/1075C08G73/1078C08G77/455
    • A polyimide resin including repeating units represented by formula (1): wherein R is a diamine residue or a diisocyanate residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of imide rings bonded to the norbornane rings is in exo configuration with respect to the norbornane rings, and a polyamic acid resin including repeating units represented by formula (2): wherein R is a diamine residue; m is an integer of 2 to 30; any of silicon atoms bonded to norbornane rings is in exo configuration with respect to the norbornane rings; and any of amide groups and carboxyl groups bonded to the norbornane rings is in exo configuration with respect to the norbornane rings. The polyimide resin is soluble in general-purpose solvents, has a good transparency and a high molecular weight, and is excellent in mechanical properties, such as tensile strength and elongation.
    • 包含由式(1)表示的重复单元的聚酰亚胺树脂:其中R是二胺残基或二异氰酸酯残基; m为2〜30的整数, 与降冰片烷环结合的任何硅原子相对于降冰片烷环都处于外部构型; 并且与降冰片烷环结合的任何酰亚胺环相对于降冰片烷环为外部构型,和包含由式(2)表示的重复单元的聚酰胺酸树脂:其中R是二胺残基; m为2〜30的整数, 与降冰片烷环结合的任何硅原子相对于降冰片烷环都处于外部构型; 并且与降冰片烷环结合的酰胺基和羧基中的任一个相对于降冰片烷环具有外部构型。 聚酰亚胺树脂可溶于通用溶剂,透明度高,分子量高,机械性能优异,拉伸强度和伸长率优异。