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    • 1. 发明申请
    • METHOD FOR FORMING ORGANIC THIN FILM
    • 形成有机薄膜的方法
    • US20090281238A1
    • 2009-11-12
    • US12312096
    • 2007-11-13
    • Tomoya HidakaYoshitaka FujitaNorifumi NakamotoKazuhisa KumazawaEiji Hoshi
    • Tomoya HidakaYoshitaka FujitaNorifumi NakamotoKazuhisa KumazawaEiji Hoshi
    • C09D5/00
    • C09D7/1233B05D1/185B05D7/24B05D2202/00B05D2203/35C03C17/30C03C2217/76C03C2218/113C08K5/01C08K5/04C08K5/05C08K5/5419C09D7/63C09K3/18
    • The object is to provide a method for forming an organic thin film which enables to form quickly a dense monomolecular film with less impurity. It is a method for forming an organic thin film which comprises:1) a step of preparing a hydroxyl group-containing solution by mixing the following (a), (b) and (c) so that the total amount of (A) and (B) in the hydroxyl group-containing solution becomes 0.1 wt % to 80 wt %, and conducting hydrolysis to generate a hydroxyl group-containing compound; a) an adjuvant for forming an organic thin film comprising a metal surfactant (A) having at least one or more hydrolysable group, and a compound (C) that can interact with the metal surfactant in an organic solvent b) a metal surfactant having at least one or more hydrolysable group (B), and c) water 2) a step of preparing a solution for forming an organic thin film by mixing an organic solvent and the hydroxyl group-containing solution obtained in the above step 1); and 3) a step of allowing the substrate to contact with the solution for forming an organic thin film obtained in the above step 2).
    • 本发明的目的是提供一种形成有机薄膜的方法,其能够快速形成具有较少杂质的致密单分子膜。 形成有机薄膜的方法包括:1)通过混合以下(a),(b)和(c)制备含羟基溶液的步骤,使得(A)和 含羟基溶液中的(B)成为0.1重量%〜80重量%,进行水解生成含羟基化合物; a)用于形成包含具有至少一个或多个可水解基团的金属表面活性剂(A)的有机薄膜的助剂和可在有机溶剂中与金​​属表面活性剂相互作用的化合物(C)b)具有 至少一个或多个可水解基团(B)和c)水2)通过混合有机溶剂和在上述步骤1)中获得的含羟基溶液来制备用于形成有机薄膜的溶液的步骤; 和3)允许基板与用于形成上述步骤2)中获得的有机薄膜的溶液接触的步骤。
    • 10. 发明申请
    • Forming Mold Or Electroforming Mother Die Having Release Layer And Method For Manufacturing The Same
    • 具有脱模层的成型模具或电铸母模及其制造方法
    • US20080290249A1
    • 2008-11-27
    • US11722847
    • 2005-12-28
    • Tomoya HidakaNorifumi NakamotoYoshitaka Fujita
    • Tomoya HidakaNorifumi NakamotoYoshitaka Fujita
    • B28B7/34B28B7/00
    • B29C33/64B29C33/56C25D1/22
    • The present invention provides a forming mold or electroforming mother die comprising a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution comprising a silane surfactant represented by the formula [1] Rn—Si—X4-n  [1] (wherein, R represents an optionally substituted hydrocarbon group having 1 to 20 carbon atoms, an optionally substituted halogenated hydrocarbon group having 1 to 20 carbon atom, a hydrocarbon group having a linking group which has 1 to 20 carbon atoms, or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, and X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3), and a catalyst capable of interacting with the silane surfactant, the release layer having excellent releasing properties and abrasion resistance, and a production method thereof.
    • 本发明提供了一种成型模具或电铸母模,其包括模具或母模,以及由模具表面或母模表面上的有机薄膜组成的剥离层,其通过使模具或母模与有机溶剂接触而形成 包含由式[1]表示的硅烷表面活性剂的溶液<?in-line-formula description =“In-line Formulas”end =“lead”?> Rn-Si-X4-n [1] 式(式中,R表示可以具有取代基的碳原子数1〜20的烃基,可以具有取代基的碳原子数1〜20的卤代烃基,具有碳原子数1〜20的烃基) 或具有1〜20个碳原子的连接基的卤代烃基,X表示羟基,卤素原子,碳原子数为1〜6的烷氧基,或者 酰氧基,n表示1〜3的整数)和催化剂 其能够与硅烷表面活性剂相互作用,脱模层具有优异的脱模性和耐磨性,及其制备方法。