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    • 1. 发明授权
    • Processes for the preparation of diphenylsulfone compounds
    • 二苯砜化合物的制备方法
    • US07619120B2
    • 2009-11-17
    • US10950889
    • 2004-09-27
    • Kiyoshi KatsuuraTomoya HidakaYutaka TakashinaYasuo Ohnuki
    • Kiyoshi KatsuuraTomoya HidakaYutaka TakashinaYasuo Ohnuki
    • C07C315/06
    • C07C315/04C07C315/06C07C317/22
    • The present invention is to provide methods for producing highly pure 4,4′-dihydroxydiphenyl sulfone monoethers advantageously in industrial production.In a process for producing a compound represented by Formula (I) (wherein, R1 and R2 are each independently halogen, alkyl having 1 to 8 carbons or alkenyl having 2 to 8 carbons; m and n are each independently 0 or an integer of 1 to 4; and R3 is alkyl having 1 to 8 carbons, alkenyl having 2 to 8 carbons, cycloalkyl having 3 to 8 carbons or optionally substituted aralkyl), (1) a pH adjustment is carried out twice or more in the purification process, (2) an excessive amount of alkyl halide used is removed, (3) a solvent, such as water, containing 0.05 ppm or less of iron components is used, (4) tanks with corrosion-resistant layers over the inner walls are used, (6) a chelating agent is added, and (7) a means of drying with mechanical stir is applied.
    • 本发明提供在工业生产中有利地生产高纯度4,4'-二羟基二苯砜单醚的方法。 在制备由式(I)表示的化合物的方法中(其中,R 1和R 2各自独立地为卤素,具有1至8个碳的烷基或具有2至8个碳的烯基; m和n各自独立地为0或整数1 至4; R3为具有1至8个碳的烷基,具有2至8个碳的烯基,3至8个碳原子的环烷基或任选取代的芳烷基),(1)在纯化过程中进行两次或更多次的pH调节( 2)除去过量的烷基卤,(3)使用含有0.05ppm以下铁组分的溶剂如水,(4)使用内壁上具有耐腐蚀层的罐( 6)加入螯合剂,(7)用机械搅拌干燥的方法。
    • 6. 发明申请
    • SOLUTION FOR FORMATION OF ORGANIC THIN FILM, AND METHOD FOR PRODUCTION THEREOF
    • 用于形成有机薄膜的方法及其生产方法
    • US20100324210A1
    • 2010-12-23
    • US12866899
    • 2009-02-23
    • Tomoya HidakaToshiaki TakahashiKazuhisa Kumazawa
    • Tomoya HidakaToshiaki TakahashiKazuhisa Kumazawa
    • C08K5/1535C08L83/06C08K5/1545
    • C09D183/04C08G77/045C08G77/06C08G77/16C08G77/18C08G79/00C08G79/12C09D185/00C23C2222/20
    • It is to provide a solution for forming an organic metal thin film that can form rapidly a dense monomolecular film with less impurity. A solution for forming an organic thin film comprising(A) at least one organic metal compound shown by the following formula (I) (provided that at least one organic metal compound contains a hydroxyl group); and (B) at least one organic metal compound shown by the following formula (II), R3mM2X54-m  (II) wherein the solution is 40≦[(A)/{(A)+(B)}]×100≦100 (mass %), and 0≦[(B)/{(A)+(B)}]×100≦60 (mass %); or a solution for forming an organic thin film comprising an organic metal compound having at least one hydroxyl group and at least one hydrolysable group among the organic metal compounds shown by the following formula (I); or a solution for forming an organic thin film wherein the mass ratio of trimer with respect to dimer is greater than 0.5 among the metal organic compound shown by formula (I).
    • 提供形成有机金属薄膜的解决方案,其可以形成快速形成较少杂质的致密单分子膜。 一种形成有机薄膜的溶液,其包含(A)至少一种由下式(I)表示的有机金属化合物(条件是至少一种有机金属化合物含有羟基); (B)至少一种下式(II)所示的有机金属化合物,其中溶液为40<(A)/ {(A)+(B)}]×100& (质量%),0≦̸ [(B)/ {(A)+(B)}]×100≦̸ 60(质量%) 或用于形成有机薄膜的溶液,所述有机薄膜包含由下式(I)表示的有机金属化合物中具有至少一个羟基和至少一个可水解基团的有机金属化合物; 或形成有机薄膜的溶液,其中三聚物相对于二聚体的质量比在式(I)所示的金属有机化合物中大于0.5。
    • 7. 发明申请
    • METHOD FOR FORMING ORGANIC THIN FILM
    • 形成有机薄膜的方法
    • US20090281238A1
    • 2009-11-12
    • US12312096
    • 2007-11-13
    • Tomoya HidakaYoshitaka FujitaNorifumi NakamotoKazuhisa KumazawaEiji Hoshi
    • Tomoya HidakaYoshitaka FujitaNorifumi NakamotoKazuhisa KumazawaEiji Hoshi
    • C09D5/00
    • C09D7/1233B05D1/185B05D7/24B05D2202/00B05D2203/35C03C17/30C03C2217/76C03C2218/113C08K5/01C08K5/04C08K5/05C08K5/5419C09D7/63C09K3/18
    • The object is to provide a method for forming an organic thin film which enables to form quickly a dense monomolecular film with less impurity. It is a method for forming an organic thin film which comprises:1) a step of preparing a hydroxyl group-containing solution by mixing the following (a), (b) and (c) so that the total amount of (A) and (B) in the hydroxyl group-containing solution becomes 0.1 wt % to 80 wt %, and conducting hydrolysis to generate a hydroxyl group-containing compound; a) an adjuvant for forming an organic thin film comprising a metal surfactant (A) having at least one or more hydrolysable group, and a compound (C) that can interact with the metal surfactant in an organic solvent b) a metal surfactant having at least one or more hydrolysable group (B), and c) water 2) a step of preparing a solution for forming an organic thin film by mixing an organic solvent and the hydroxyl group-containing solution obtained in the above step 1); and 3) a step of allowing the substrate to contact with the solution for forming an organic thin film obtained in the above step 2).
    • 本发明的目的是提供一种形成有机薄膜的方法,其能够快速形成具有较少杂质的致密单分子膜。 形成有机薄膜的方法包括:1)通过混合以下(a),(b)和(c)制备含羟基溶液的步骤,使得(A)和 含羟基溶液中的(B)成为0.1重量%〜80重量%,进行水解生成含羟基化合物; a)用于形成包含具有至少一个或多个可水解基团的金属表面活性剂(A)的有机薄膜的助剂和可在有机溶剂中与金​​属表面活性剂相互作用的化合物(C)b)具有 至少一个或多个可水解基团(B)和c)水2)通过混合有机溶剂和在上述步骤1)中获得的含羟基溶液来制备用于形成有机薄膜的溶液的步骤; 和3)允许基板与用于形成上述步骤2)中获得的有机薄膜的溶液接触的步骤。
    • 8. 发明授权
    • Process for producing diphenyl sulfone compound
    • 二苯砜化合物的制备方法
    • US06831201B2
    • 2004-12-14
    • US10239483
    • 2002-09-20
    • Kiyoshi KatsuuraTomoya HidakaYutaka TakashinaYasuo Ohnuki
    • Kiyoshi KatsuuraTomoya HidakaYutaka TakashinaYasuo Ohnuki
    • C07C31506
    • C07C315/04C07C315/06C07C317/22
    • The present invention is to provide methods for producing highly pure 4,4′-dihydroxydiphenyl sulfone monoethers advantageously in industrial production. In a process for producing a compound represented by Formula (1) (wherein, R1 and R2 are each independently halogen, alkyl having 1 to 8 carbons or alkenyl having 2 to 8 carbons; m and n are each independently 0 or an integer of 1 to 4; and R3 is alkyl having 1 to 8 carbons, alkenyl having 2 to 8 carbons, cycloalkyl having 3 to 8 carbons or optionally substituted aralkyl), (1) a pH adjustment is carried out twice or more in the purification process, (2) an excessive amount of alkyl halide used is removed, (3) a solvent, such as water, containing 0.05 ppm or less of iron components is used, (4) tanks with corrosion-resistant layers over the inner walls are used, (6) a chelating agent is added, and (7) a means of drying with mechanical stir is applied.
    • 本发明提供了在工业生产中有利地生产高纯度4,4'-二羟基二苯基砜单醚的方法。在制备由式(1)表示的化合物(其中R 1和R 2为 各自独立地为卤素,具有1至8个碳的烷基或具有2至8个碳的烯基; m和n各自独立地为0或1至4的整数;并且R 3为具有1至8个碳的烷基,具有2至 8个碳原子数为3〜8的环烷基或任意取代的芳烷基),(1)在纯化工序中进行两次以上的pH调节,(2)除去过量的烷基卤,(3)溶剂 使用含有0.05ppm以下的铁成分的水,(4)使用内壁具有耐腐蚀层的罐,(6)添加螯合剂,(7)使用 应用机械搅拌。