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1. 发明申请

US20080299502A1 COATING AND DEVELOPING APPARATUS, OPERATING METHOD FOR SAME, AND STORAGE MEDIUM FOR THE METHOD 有权
标题翻译：涂料和开发设备，其操作方法和存储介质的方法
公开(公告)号：US20080299502A1
公开(公告)日：2008-12-04
申请号：US12128437
申请日：2008-05-28
申请人： Tomonori SHIN , Kouji OKAMURA , Tomohiro KANEKO , Akira MIYATA , Syuzo FUJIMARU
发明人： Tomonori SHIN , Kouji OKAMURA , Tomohiro KANEKO , Akira MIYATA , Syuzo FUJIMARU
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： H01L21/67225 , H01L21/67276
摘要： In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not appropriately surface-coated with a protective film during liquid-immersion light exposure are queued in a queuing module, instead of being loaded into an exposure unit, and after the immediately preceding substrate has been unloaded from the exposure unit and loaded into a designated module, for example, a pre-developing second heating module, each abnormal substrate is loaded into the designated module in order to prevent so-called “scheduled transfer” from being affected, and a protective-film removing unit is also controlled to process the abnormal substrate.
摘要翻译：在适用于液浸式曝光的涂布显影装置中，可以回收没有适当形成的保护膜的基板，而不会不利地影响正常的基板处理效率，另外可以简化保护膜的去除。在本发明的涂布和显影装置中，在液浸式曝光期间不被适当表面涂覆有保护膜的异常基板排队在排队模块中，而不是装载到曝光单元中，并且在紧接在前面的基板已经从曝光单元卸载并加载到指定的模块中，例如预先显影的第二加热模块中，每个异常基板被装载到指定模块中，以防止所谓的“计划传送”受到影响，并且还控制保护膜去除单元以处理异常衬底。

2. 发明申请

US20090021704A1 COATING/DEVELOPING APPARATUS AND OPERATION METHOD THEREOF 失效
标题翻译：涂装/开发设备及其操作方法
公开(公告)号：US20090021704A1
公开(公告)日：2009-01-22
申请号：US12166470
申请日：2008-07-02
申请人： Tomohiro KANEKO , Akira Miyata
发明人： Tomohiro KANEKO , Akira Miyata
IPC分类号： G03B27/32
CPC分类号： G03B27/32
摘要： A coating/developing apparatus has a carrier block including a first transfer device, a process block including processing modules, an examination block including examination modules and a second transfer device, and first to forth stages. A controller executes a first operation mode preset to transfer substrates from the process block and carrier block into the examination block in parallel. The first operation mode includes transferring substrates processed by the process block to the third or fourth stage through or not through an examination module by the second transfer device, transferring substrates to be only examined from a carrier in the carrier block to the second stage by the first transfer device, and transferring these substrates from the second stage to an examination modules by the second transfer device, and transferring substrates thus examined from the examination block to the third or fourth stage by the second transfer device.
摘要翻译：涂覆/显影装置具有载体块，其包括第一转印装置，包括处理模块的处理块，包括检查模块和第二转印装置的检查块以及第一至第四级。控制器执行预设的第一操作模式以将基板从处理块和载体块并行地传送到检查块中。第一操作模式包括通过第二传送装置将通过或不通过检查模块将由处理块处理的衬底转移到第三或第四阶段，将仅被检查的衬底从载体块中的载体传送到第二级，由第一转印装置，并且通过第二转印装置将这些基板从第二阶段转印到检查模块，以及通过第二转印装置将从检查块转移到第三或第四阶段的基板。

3. 发明申请

US20080117390A1 COATING/DEVELOPING APPARATUS AND SUBSTRATE TRANSFER METHOD 有权
标题翻译：涂层/开发设备和基板传输方法
公开(公告)号：US20080117390A1
公开(公告)日：2008-05-22
申请号：US11877324
申请日：2007-10-23
申请人： Tomohiro KANEKO , Akira MIYATA
发明人： Tomohiro KANEKO , Akira MIYATA
IPC分类号： G03B27/52
CPC分类号： G03F7/7075 , H01L21/67225 , H01L21/67276 , Y10S414/135
摘要： In a coating/developing apparatus, a process section includes post-exposure baking units each having a waiting position and configured to perform a baking process on a substrate. An interface section transfer mechanism includes a first transfer mechanism configured to transfer the substrate to and from the process section and to load the substrate into the post-exposure baking units, and a second transfer mechanism configured to transfer the substrate to and from the light exposure apparatus. An interface section includes a relay position configured to place thereon the substrate transferred by the second transfer mechanism, and to allow the first transfer mechanism to receive the substrate therefrom. A control section is arranged to set the substrate on standby at the relay position and the waiting position, to make a time period constant among substrates from an end of the light exposure process to a start of a post-exposure baking process.
摘要翻译：在涂布/显影装置中，处理部分包括具有等待位置并被配置为在基板上进行烘烤处理的后曝光烘焙单元。接口部分传送机构包括第一传送机构，其被配置为将基板传送到处理部分并从处理部分传送基板并将基板装载到后曝光烘烤单元中;以及第二传送机构，其被配置为将基板传送到曝光和从曝光仪器。接口部分包括被配置为放置在其上由第二传送机构传送的基板并且允许第一传送机构从其接收基板的中继位置。控制部被配置为将基板设置在继电器位置和待机位置的待机状态，使得从曝光过程结束到曝光后烘烤处理开始之间的基板之间的时间段恒定。

4. 发明申请

US20110029122A1 COATING AND DEVELOPING SYSTEM, METHOD OF CONTROLLING COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM 有权
标题翻译：涂料与开发系统，涂料和发展体系与储存介质的控制方法
公开(公告)号：US20110029122A1
公开(公告)日：2011-02-03
申请号：US12902529
申请日：2010-10-12
申请人： Tomohiro KANEKO , Akira Miyata
发明人： Tomohiro KANEKO , Akira Miyata
IPC分类号： G06F19/00 , H01L21/677
CPC分类号： H01L21/67745 , H01L21/67276
摘要： A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode.
摘要翻译：涂装和显影系统包括一个盒式磁带站，一个处理站和一个插入在磁带站和处理站之间的检查站。基板在检查模块中无用的时间减少了。设置在检查模块中的基板承载装置优先地将基板传送到盒站和处理站之间，并且在循环时间的一部分中将基板传送到检查模块，其中布置在处理站中的基板承载装置执行一个携带循环。允许以跳过方式从检查模块执行基板，其中由较小的数字指定的基板在由较小的数字指定的基板的前面进行。在跳过运行模式下，禁止将基板运送到检查模块。

5. 发明申请

US20130032179A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM 有权
标题翻译：基板加工设备，基板加工方法和储存介质
公开(公告)号：US20130032179A1
公开(公告)日：2013-02-07
申请号：US13564217
申请日：2012-08-01
申请人： Tomohiro KANEKO
发明人： Tomohiro KANEKO
IPC分类号： H01L21/677 , B08B3/04
CPC分类号： H01L21/67745 , H01L21/6715 , H01L21/67276 , H01L21/67766
摘要： Provided is a substrate processing apparatus which can efficiently transfer substrates using a conveying mechanism including a plurality of substrate holding members. The substrate processing apparatus transfers a processed substrate to an intermediate conveying unit using a transport mechanism when the processed substrate returns to a substrate receiving unit. When a conveying mechanism withdraws the processed substrate from the intermediate conveying unit and transfers the processed substrate to the substrate receiving unit, a control unit determines whether both of a first substrate processed first among a plurality of substrates withdrawn from the substrate receiving unit as a set and a succeeding substrate processed later than the first substrate should be transferred together after waiting until the succeeding substrate is transferred to the intermediate conveying unit or to transfer the first substrate without waiting for the succeeding substrate, when the first substrate is transferred to the intermediate conveying unit.
摘要翻译：提供一种基板处理装置，其能够使用包括多个基板保持部件的输送机构有效地转印基板。当处理后的基板返回到基板接收单元时，基板处理设备使用输送机构将处理后的基板传送到中间输送单元。当输送机构从中间输送单元取出经处理的基板并将处理过的基板转移到基板接收单元时，控制单元确定在从基板接收单元退出的多个基板之间首先处理的第一基板是否为一组并且在等待直到下一个衬底被转移到中间传送单元或转移第一衬底而不等待后续衬底之后，在第一衬底被转移到中间传送单元。

6. 发明申请

US20110297085A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM 有权
标题翻译：基板处理装置，基板处理方法和存储介质
公开(公告)号：US20110297085A1
公开(公告)日：2011-12-08
申请号：US12796160
申请日：2010-06-08
申请人： Kenichirou MATSUYAMA , Tomohiro KANEKO
发明人： Kenichirou MATSUYAMA , Tomohiro KANEKO
IPC分类号： B05C13/00
CPC分类号： G03F7/20 , H01L21/6715 , H01L21/67178 , H01L21/67276 , H01L21/67745 , H01L21/67769
摘要： A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier.
摘要翻译：公开了一种基板处理装置，其具有将在处理块处理的基板传送到载体的转印机构，从而抑制转印处理次数的增加，提高处理效率。衬底处理装置被配置成使得当第二转移模块容纳至少一个衬底时，可以容纳至少一个衬底的载体不被放置在载体放置单元中时，所述至少一个衬底是转移到缓冲模块。当第二转移模块容纳至少一个基底并且能够容纳至少一个基底的载体被放置在载体放置单元中时，至少一个基底被转移到载体，而不管基底是否是从缓冲模块传输到载体。

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