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1. 发明授权

US07844359B2 Coating and developing apparatus, operating method for same, and storage medium for the method 有权
标题翻译：涂料和显影装置，其操作方法和方法的存储介质
公开(公告)号：US07844359B2
公开(公告)日：2010-11-30
申请号：US12128437
申请日：2008-05-28
申请人： Tomonori Shin , Kouji Okamura , Tomohiro Kaneko , Akira Miyata , Syuzo Fujimaru
发明人： Tomonori Shin , Kouji Okamura , Tomohiro Kaneko , Akira Miyata , Syuzo Fujimaru
IPC分类号： G06F19/00 , H01L21/00
CPC分类号： H01L21/67225 , H01L21/67276
摘要： In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not appropriately surface-coated with a protective film during liquid-immersion light exposure are queued in a queuing module, instead of being loaded into an exposure unit, and after the immediately preceding substrate has been unloaded from the exposure unit and loaded into a designated module, for example, a pre-developing second heating module, each abnormal substrate is loaded into the designated module in order to prevent so-called “scheduled transfer” from being affected, and a protective-film removing unit is also controlled to process the abnormal substrate.
摘要翻译：在适用于液浸式曝光的涂布显影装置中，可以回收没有适当形成的保护膜的基板，而不会不利地影响正常的基板处理效率，另外可以简化保护膜的去除。在本发明的涂布和显影装置中，在液浸式曝光期间不被适当表面涂覆有保护膜的异常基板排队在排队模块中，而不是装载到曝光单元中，并且在紧接在前面的基板已经从曝光单元卸载并加载到指定的模块中，例如预先显影的第二加热模块中，每个异常基板被装载到指定模块中，以防止所谓的“计划传送”受到影响，并且还控制保护膜去除单元以处理异常衬底。

2. 发明申请

US20080299502A1 COATING AND DEVELOPING APPARATUS, OPERATING METHOD FOR SAME, AND STORAGE MEDIUM FOR THE METHOD 有权
标题翻译：涂料和开发设备，其操作方法和存储介质的方法
公开(公告)号：US20080299502A1
公开(公告)日：2008-12-04
申请号：US12128437
申请日：2008-05-28
申请人： Tomonori SHIN , Kouji OKAMURA , Tomohiro KANEKO , Akira MIYATA , Syuzo FUJIMARU
发明人： Tomonori SHIN , Kouji OKAMURA , Tomohiro KANEKO , Akira MIYATA , Syuzo FUJIMARU
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： H01L21/67225 , H01L21/67276
摘要： In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not appropriately surface-coated with a protective film during liquid-immersion light exposure are queued in a queuing module, instead of being loaded into an exposure unit, and after the immediately preceding substrate has been unloaded from the exposure unit and loaded into a designated module, for example, a pre-developing second heating module, each abnormal substrate is loaded into the designated module in order to prevent so-called “scheduled transfer” from being affected, and a protective-film removing unit is also controlled to process the abnormal substrate.
摘要翻译：在适用于液浸式曝光的涂布显影装置中，可以回收没有适当形成的保护膜的基板，而不会不利地影响正常的基板处理效率，另外可以简化保护膜的去除。在本发明的涂布和显影装置中，在液浸式曝光期间不被适当表面涂覆有保护膜的异常基板排队在排队模块中，而不是装载到曝光单元中，并且在紧接在前面的基板已经从曝光单元卸载并加载到指定的模块中，例如预先显影的第二加热模块中，每个异常基板被装载到指定模块中，以防止所谓的“计划传送”受到影响，并且还控制保护膜去除单元以处理异常衬底。

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