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    • 1. 发明授权
    • Positive photosensitive polyimide resin composition
    • 正光敏聚酰亚胺树脂组合物
    • US07026080B2
    • 2006-04-11
    • US10488093
    • 2002-09-18
    • Tomonari NakayamaMasakazu KatoTakayasu Nihira
    • Tomonari NakayamaMasakazu KatoTakayasu Nihira
    • G03F7/023
    • C08L79/08G03F7/0233
    • The invention provides a positive photosensitive resin composition which is free from film reduction, swelling or peeling at the time of development with an aqueous alkaline solution and which provides a dimensionally stable patterns after curing, and of which the final cured film has a low water absorption and excellent alkaline resistance. A positive photosensitive polyimide resin composition characterized by comprising an organic solvent-soluble polyimide having repeating units represented by the formula (1): (wherein m is an integer of from 3 to 10,000, R1 is a tetravalent organic group, R2 is a bivalent organic group, provided that from 5 to 100 mol % of R2 is a bivalent organic group having fluorine), a polyamic acid and a compound capable of generating an acid by irradiation with light.
    • 本发明提供一种正性感光性树脂组合物,其在用碱性水溶液显影时没有膜还原,溶胀或剥离,并且在固化后提供尺寸稳定的图案,并且其最终固化膜具有低吸水性 并具有优异的耐碱性。 一种正型感光性聚酰亚胺树脂组合物,其特征在于,含有具有式(1)表示的重复单元的有机溶剂可溶性聚酰亚胺:其中,m为3〜10000的整数,R 1为四价 有机基团R 2是二价有机基团,条件是5〜100摩尔%的R 2是具有氟的二价有机基团),聚酰胺酸和 能够通过光照射产生酸的化合物。
    • 2. 发明授权
    • Positive photosensitive polyimide resin composition
    • 正光敏聚酰亚胺树脂组合物
    • US06875554B2
    • 2005-04-05
    • US10381736
    • 2001-10-03
    • Tadashi HatanakaTomonari NakayamaTakayasu Nihira
    • Tadashi HatanakaTomonari NakayamaTakayasu Nihira
    • G03F7/037C08G73/10C08L79/08G03F7/022G03F7/023G03F7/004G03F7/038
    • G03F7/0233
    • A positive photosensitive polyimide resin composition comprising: (a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one solvent solubilizing functional group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, (b) a photosensitive orthoquinonediazide compound, and (c) from 0.1 to 50 wt %, based on the total weight of all polymers of the composition, of a component (c1) or (c2), wherein: component (c1) is a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, and component (c2) is a polyamic acid comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g.
    • 一种正型光敏聚酰亚胺树脂组合物,其包含:(a)由1至100摩尔%的衍生自二胺的二价有机基团的溶剂可溶性聚酰亚胺,其具有至少一种溶剂增溶官能团,所述聚酰亚胺具有比浓粘度 范围为0.05至5.0dl / g,(b)光敏正二叠氮化合物,和(c)基于组合物的所有聚合物的总重量,0.1至50重量%的组分(c1)或(c2) 其中:成分(c1)是由1〜100摩尔%的来自二胺的二价有机基团构成的溶剂可溶性聚酰亚胺,其具有至少1个选自由以下组成的组中的官能团:长链烷基, 至少6个碳原子和氟化烷基,所述聚酰亚胺的比浓粘度范围为0.05-5.0dl / g,组分(c2)是由1至100mol%的衍生自 二胺,至少有o 选自具有至少6个碳原子的长链烷基和氟化烷基的官能团,所述聚酰亚胺的比浓粘度为0.05-5.0dl / g。
    • 3. 发明授权
    • Positive type photosensitive polyimide resin composition
    • 正型光敏聚酰亚胺树脂组合物
    • US06677099B1
    • 2004-01-13
    • US10148396
    • 2002-05-30
    • Kazuhisa IshiiTomonari NakayamaTakayasu NihiraHiroyoshi Fukuro
    • Kazuhisa IshiiTomonari NakayamaTakayasu NihiraHiroyoshi Fukuro
    • G03F7023
    • H01L21/02118C08K5/20C08K5/28C08L79/08G03F7/0233H01L21/312
    • A positive type photosensitive resin composition which can be developed by an aqueous alkaline solution and which is excellent in the developability and the adhesion to a substrate, is presented. Namely, the present invention presents a positive type photosensitive polyimide resin composition characterized by comprising 100 parts by weight of a solvent-soluble polyimide having repeating units represented by the formula (1) and from 1 to 50 parts by weight of a polyimide precursor having repeating units represented by the formula (2), and by further containing an o-quinonediazide compound in an amount of from 1 to 100 parts by weight per 100 parts by weight of the total amount of the repeating units represented by the formula (1) and the repeating units represented by the formula (2): (wherein R1 and R3 are bivalent organic groups, from 1 to 90 mol % of R1 is a bivalent organic group having one or plural groups of at least one type selected from the group consisting of a phenolic hydroxyl group, a carboxyl group, a thiophenol group and a sulfonic group, and from 10 to 99 mol % is a bivalent organic group having no phenolic hydroxyl, carboxylic, thiophenol or sulfonic group, and R2 and R4 are tetravalent organic groups constituting a tetracarboxylic acid or its derivative).
    • 本发明提供一种正极型感光性树脂组合物,其可以通过碱性水溶液显影,并且显影性和对基材的粘附性优异。 即,本发明提供一种正型感光性聚酰亚胺树脂组合物,其特征在于,含有100重量份具有式(1)表示的重复单元的溶剂可溶性聚酰亚胺和1〜50重量份具有重复 由式(2)表示的单元,并且还包含相对于由式(1)表示的重复单元的总量和每100重量份的由式(1)表示的重复单元的总量为1至100重量份的邻醌二叠氮化合物和 由式(2)表示的重复单元:(其中R 1和R 3是二价有机基团,1至90摩尔%的R 1是具有一个或多个基团的二价有机基团 选自酚羟基,羧基,苯硫酚基和磺酸基的至少一种,10〜99摩尔%为无酚羟基,羧基,苯硫酚或磺酸基的二价有机基团, R 2和R 4是构成四羧酸或其衍生物的四价有机基团)。
    • 10. 发明授权
    • Field effect transistor and method of producing the same
    • 场效应晶体管及其制造方法
    • US07094625B2
    • 2006-08-22
    • US10535202
    • 2004-03-26
    • Daisuke MiuraTomonari Nakayama
    • Daisuke MiuraTomonari Nakayama
    • H01L51/40H01L21/00H01L51/00
    • H01L51/0077H01L51/0003H01L51/0545
    • A field effect transistor having a high field effect mobility is provided which can be obtained by a simple method. The field effect transistor includes an organic semiconductor layer composed of a crystallized film of a naphthoporphyrin compound represented by formula (2), which is obtained by the conversion by heating of the coating film of a porphyrin compound represented by formula (1), the organic semiconductor layer having crystal grains with a maximum diameter of 1 μm or more, wherein R1 and R2 each independently denote at least one selected from the group consisting of hydrogen, halogen, hydroxyl, and alkyl having 1 to 12 carbon atoms; R3 denotes at least one selected from the group consisting of a hydrogen atom and an aryl group; and M denotes two hydrogen atoms, a metal atom or a metal oxide.
    • 提供具有高场效应迁移率的场效应晶体管,其可以通过简单的方法获得。 场效应晶体管包括由式(2)表示的萘卟啉化合物的结晶膜构成的有机半导体层,其通过加热由式(1)表示的卟啉化合物的涂膜,有机物 具有最大直径为1μm以上的晶粒的半导体层,其中R 1和R 2各自独立地表示选自氢,卤素 ,羟基和具有1至12个碳原子的烷基; R 3表示选自氢原子和芳基中的至少一种; M表示2个氢原子,金属原子或金属氧化物。