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1. 发明授权

US06875554B2 Positive photosensitive polyimide resin composition 有权
标题翻译：正光敏聚酰亚胺树脂组合物
公开(公告)号：US06875554B2
公开(公告)日：2005-04-05
申请号：US10381736
申请日：2001-10-03
申请人： Tadashi Hatanaka , Tomonari Nakayama , Takayasu Nihira
发明人： Tadashi Hatanaka , Tomonari Nakayama , Takayasu Nihira
IPC分类号： G03F7/037 , C08G73/10 , C08L79/08 , G03F7/022 , G03F7/023 , G03F7/004 , G03F7/038
CPC分类号： G03F7/0233
摘要： A positive photosensitive polyimide resin composition comprising: (a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one solvent solubilizing functional group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, (b) a photosensitive orthoquinonediazide compound, and (c) from 0.1 to 50 wt %, based on the total weight of all polymers of the composition, of a component (c1) or (c2), wherein: component (c1) is a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, and component (c2) is a polyamic acid comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g.
摘要翻译：一种正型光敏聚酰亚胺树脂组合物，其包含：（a）由1至100摩尔％的衍生自二胺的二价有机基团的溶剂可溶性聚酰亚胺，其具有至少一种溶剂增溶官能团，所述聚酰亚胺具有比浓粘度范围为0.05至5.0dl / g，（b）光敏正二叠氮化合物，和（c）基于组合物的所有聚合物的总重量，0.1至50重量％的组分（c1）或（c2）其中：成分（c1）是由1〜100摩尔％的来自二胺的二价有机基团构成的溶剂可溶性聚酰亚胺，其具有至少1个选自由以下组成的组中的官能团：长链烷基，至少6个碳原子和氟化烷基，所述聚酰亚胺的比浓粘度范围为0.05-5.0dl / g，组分（c2）是由1至100mol％的衍生自二胺，至少有o 选自具有至少6个碳原子的长链烷基和氟化烷基的官能团，所述聚酰亚胺的比浓粘度为0.05-5.0dl / g。

2. 发明授权

US06677099B1 Positive type photosensitive polyimide resin composition 有权
标题翻译：正型光敏聚酰亚胺树脂组合物
公开(公告)号：US06677099B1
公开(公告)日：2004-01-13
申请号：US10148396
申请日：2002-05-30
申请人： Kazuhisa Ishii , Tomonari Nakayama , Takayasu Nihira , Hiroyoshi Fukuro
发明人： Kazuhisa Ishii , Tomonari Nakayama , Takayasu Nihira , Hiroyoshi Fukuro
IPC分类号： G03F7023
CPC分类号： H01L21/02118 , C08K5/20 , C08K5/28 , C08L79/08 , G03F7/0233 , H01L21/312
摘要： A positive type photosensitive resin composition which can be developed by an aqueous alkaline solution and which is excellent in the developability and the adhesion to a substrate, is presented. Namely, the present invention presents a positive type photosensitive polyimide resin composition characterized by comprising 100 parts by weight of a solvent-soluble polyimide having repeating units represented by the formula (1) and from 1 to 50 parts by weight of a polyimide precursor having repeating units represented by the formula (2), and by further containing an o-quinonediazide compound in an amount of from 1 to 100 parts by weight per 100 parts by weight of the total amount of the repeating units represented by the formula (1) and the repeating units represented by the formula (2): (wherein R1 and R3 are bivalent organic groups, from 1 to 90 mol % of R1 is a bivalent organic group having one or plural groups of at least one type selected from the group consisting of a phenolic hydroxyl group, a carboxyl group, a thiophenol group and a sulfonic group, and from 10 to 99 mol % is a bivalent organic group having no phenolic hydroxyl, carboxylic, thiophenol or sulfonic group, and R2 and R4 are tetravalent organic groups constituting a tetracarboxylic acid or its derivative).
摘要翻译：本发明提供一种正极型感光性树脂组合物，其可以通过碱性水溶液显影，并且显影性和对基材的粘附性优异。即，本发明提供一种正型感光性聚酰亚胺树脂组合物，其特征在于，含有100重量份具有式（1）表示的重复单元的溶剂可溶性聚酰亚胺和1〜50重量份具有重复由式（2）表示的单元，并且还包含相对于由式（1）表示的重复单元的总量和每100重量份的由式（1）表示的重复单元的总量为1至100重量份的邻醌二叠氮化合物和由式（2）表示的重复单元:(其中R 1和R 3是二价有机基团，1至90摩尔％的R 1是具有一个或多个基团的二价有机基团选自酚羟基，羧基，苯硫酚基和磺酸基的至少一种，10〜99摩尔％为无酚羟基，羧基，苯硫酚或磺酸基的二价有机基团， R 2和R 4是构成四羧酸或其衍生物的四价有机基团）。

3. 发明授权

US07026080B2 Positive photosensitive polyimide resin composition 有权
标题翻译：正光敏聚酰亚胺树脂组合物
公开(公告)号：US07026080B2
公开(公告)日：2006-04-11
申请号：US10488093
申请日：2002-09-18
申请人： Tomonari Nakayama , Masakazu Kato , Takayasu Nihira
发明人： Tomonari Nakayama , Masakazu Kato , Takayasu Nihira
IPC分类号： G03F7/023
CPC分类号： C08L79/08 , G03F7/0233
摘要： The invention provides a positive photosensitive resin composition which is free from film reduction, swelling or peeling at the time of development with an aqueous alkaline solution and which provides a dimensionally stable patterns after curing, and of which the final cured film has a low water absorption and excellent alkaline resistance. A positive photosensitive polyimide resin composition characterized by comprising an organic solvent-soluble polyimide having repeating units represented by the formula (1): (wherein m is an integer of from 3 to 10,000, R1 is a tetravalent organic group, R2 is a bivalent organic group, provided that from 5 to 100 mol % of R2 is a bivalent organic group having fluorine), a polyamic acid and a compound capable of generating an acid by irradiation with light.
摘要翻译：本发明提供一种正性感光性树脂组合物，其在用碱性水溶液显影时没有膜还原，溶胀或剥离，并且在固化后提供尺寸稳定的图案，并且其最终固化膜具有低吸水性并具有优异的耐碱性。一种正型感光性聚酰亚胺树脂组合物，其特征在于，含有具有式（1）表示的重复单元的有机溶剂可溶性聚酰亚胺：其中，m为3〜10000的整数，R 1为四价有机基团R 2是二价有机基团，条件是5〜100摩尔％的R 2是具有氟的二价有机基团），聚酰胺酸和能够通过光照射产生酸的化合物。

4. 发明授权

US06927012B2 Polyamic acid resin composition 有权
标题翻译：聚酰胺酸树脂组合物
公开(公告)号：US06927012B2
公开(公告)日：2005-08-09
申请号：US10484719
申请日：2002-07-15
申请人： Tadashi Hatanaka , Sahade Daniel Antonio , Takayasu Nihira
发明人： Tadashi Hatanaka , Sahade Daniel Antonio , Takayasu Nihira
IPC分类号： C08G73/10 , C08L79/08 , G03F7/004 , G03F7/023 , G03F7/037 , G03F7/038 , G03F7/075
CPC分类号： G03F7/0757 , C08G73/10 , C08G73/1039 , C08L79/08 , C08L2205/02 , G03F7/0046 , G03F7/0233 , G03F7/037 , G03F7/0387 , C08L2666/20
摘要： Provided is a polyamic acid resin composition for formation of a bank, which provides excellent film characteristics and adhesion to a substrate, which can undergo patterning with use of a positive type photoresist, and which can be transformed into a polyimide after the patterning to yield a polyimide resin with upper part of film having a low surface energy. It is achieved by a polyamic acid resin composition comprising a polyamic acid [a] as a base and a polyamic acid [b] having a fluorine-containing alkyl group with a carbon number of at least 2, and containing the polyamic acid [b] in an amount of from 0.1 to 30 wt % to the total amount of the polyamic acid [a] and the polyamic acid [b].
摘要翻译：提供一种用于形成堤的聚酰胺酸树脂组合物，其提供优异的膜特性和对基材的粘附性，其可以使用正型光致抗蚀剂进行图案化，并且可以在图案化之后转变成聚酰亚胺，得到具有低表面能的膜的上部的聚酰亚胺树脂。通过聚酰胺酸树脂组合物实现，所述聚酰胺酸树脂组合物包含聚酰胺酸[a]作为碱和具有碳原子数至少为2的含氟烷基的聚酰胺酸[b]，并含有聚酰胺酸[b] 相对于聚酰胺酸[a]和聚酰胺酸[b]的总量为0.1〜30重量％。

5. 发明申请

US20050147914A1 Positively photosensitive resin composition and method of pattern formation 有权
标题翻译：积极感光树脂组合物和图案形成方法
公开(公告)号：US20050147914A1
公开(公告)日：2005-07-07
申请号：US10510704
申请日：2003-04-18
申请人： Tadashi Hatanaka , Takayasu Nihira
发明人： Tadashi Hatanaka , Takayasu Nihira
IPC分类号： G03C1/76 , G03F7/00 , G03F7/022 , G03F7/023 , G03F7/039 , G03F7/40
CPC分类号： G03F7/0233 , G03F7/0007 , G03F7/0226
摘要： The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, planarization properties, transparency, low water absorption or the like. Further, the present invention provides a method for arbitrarily forming a pattern having a semicircular or trapezoidal section by using the composition. The positive photosensitive resin composition of the present invention comprises an alkali-soluble resin, a 1,2-quinone diazide compound, a crosslinking compound having at least two epoxy groups and a surfactant, and the alkali-soluble resin is a copolymer comprising a carboxylic group-containing acrylic monomer, a hydroxyl group-containing acrylic monomer and an N-substituted maleimide as essential components. By changing the postbake conditions, the composition can arbitrarily form a pattern having a semicircular or trapezoidal section.
摘要翻译：本发明提供一种能够以通常浓度的四甲基氢氧化铵水溶液显影，具有高灵敏度和优异分辨率的正型感光性树脂组合物，耐热性，平坦化性，透明性，低吸水性等优异。此外，本发明提供一种通过使用该组合物任意形成具有半圆形或梯形截面的图案的方法。本发明的正型感光性树脂组合物包含碱溶性树脂，1,2-醌二叠氮化合物，具有至少两个环氧基的交联化合物和表面活性剂，碱溶性树脂是包含羧酸的共聚物基团的丙烯酸类单体，含羟基的丙烯酸类单体和N-取代的马来酰亚胺作为必需成分。通过改变后烘烤条件，组合物可任意形成具有半圆形或梯形截面的图案。

6. 发明授权

US07001705B2 Positively photosensitive resin composition and method of pattern formation 有权
标题翻译：积极感光树脂组合物和图案形成方法
公开(公告)号：US07001705B2
公开(公告)日：2006-02-21
申请号：US10510704
申请日：2003-04-18
申请人： Tadashi Hatanaka , Takayasu Nihira
发明人： Tadashi Hatanaka , Takayasu Nihira
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/0233 , G03F7/0007 , G03F7/0226
摘要： The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, planarization properties, transparency, low water absorption or the like. Further, the present invention provides a method for arbitrarily forming a pattern having a semicircular or trapezoidal section by using the composition. The positive photosensitive resin composition of the present invention comprises an alkali-soluble resin, a 1,2-quinone diazide compound, a crosslinking compound having at least two epoxy groups and a surfactant, and the alkali-soluble resin is a copolymer comprising a carboxylic group-containing acrylic monomer, a hydroxyl group-containing acrylic monomer and an N-substituted maleimide as essential components. By changing the postbake conditions, the composition can arbitrarily form a pattern having a semicircular or trapezoidal section.
摘要翻译：本发明提供一种能够以通常浓度的四甲基氢氧化铵水溶液显影，具有高灵敏度和优异分辨率的正型感光性树脂组合物，耐热性，平坦化性，透明性，低吸水性等优异。此外，本发明提供一种通过使用该组合物任意形成具有半圆形或梯形截面的图案的方法。本发明的正型感光性树脂组合物包含碱溶性树脂，1,2-醌二叠氮化合物，具有至少两个环氧基的交联化合物和表面活性剂，碱溶性树脂是包含羧酸的共聚物基团的丙烯酸类单体，含羟基的丙烯酸类单体和N-取代的马来酰亚胺作为必需成分。通过改变后烘烤条件，组合物可任意形成具有半圆形或梯形截面的图案。

7. 发明授权

US06489431B1 Polyimide precursors and polyimides 有权
标题翻译：聚酰亚胺前体和聚酰亚胺
公开(公告)号：US06489431B1
公开(公告)日：2002-12-03
申请号：US09806487
申请日：2001-04-12
申请人： Kazuhisa Ishii , Takayasu Nihira , Hiroyoshi Fukuro
发明人： Kazuhisa Ishii , Takayasu Nihira , Hiroyoshi Fukuro
IPC分类号： C08G7310
CPC分类号： C08G73/1039 , C08G73/10
摘要： A polyimide precursor having a repeating unit represented by the following general formula (1), wherein R1 contains a bivalent organic group constituting a diamine having a hexafluoropropylidene group in its molecule represented by the following general formula (2), and the reduced viscosity is from 0.05 to 5.0 dl/g (in N-methylpyrrolidone at a temperature of 30° C., concentration: 0.5 g/dl), and a polyimide obtained by imidizing said precursor: (wherein R1 is a bivalent organic group constituting a diamine, A is a hydrogen atom, a linear alkyl group including a methyl group, or a trifluoromethyl group, and n is the number of a substituent on an aromatic ring and an integer of from 1 to 4).
摘要翻译：具有由以下通式（1）表示的重复单元的聚酰亚胺前体，其中R1分子由以下通式（2）表示的分子中包含构成具有六氟亚丙基的二胺的二价有机基团，并且比浓粘度来自 0.05〜5.0dl / g（在N-甲基吡咯烷酮中，温度30℃，浓度：0.5g / dl）和通过酰亚胺化所述前体获得的聚酰亚胺（其中R1是构成二胺的二价有机基团，A 是氢原子，包括甲基或三氟甲基的直链烷基，n是芳环上的取代基数和1至4的整数）。

8. 发明授权

US06808766B1 Liquid crystal alignment agent and liquid crystal device using the liquid crystal alignment and method for alignment of liquid crystal molecules 失效
标题翻译：液晶取向剂和使用液晶取向的液晶装置和液晶分子的取向方法
公开(公告)号：US06808766B1
公开(公告)日：2004-10-26
申请号：US09763294
申请日：2001-02-21
申请人： Yukihiro Miyama , Takayasu Nihira , Hideyuki Endo , Hiroyoshi Fukuro , Yu Nagase , Eiich Akiyama , Nobukatsu Nemoto
发明人： Yukihiro Miyama , Takayasu Nihira , Hideyuki Endo , Hiroyoshi Fukuro , Yu Nagase , Eiich Akiyama , Nobukatsu Nemoto
IPC分类号： C09K1900
CPC分类号： C08G69/32 , G02F1/133711 , G02F1/133723 , G02F1/133788 , G02F2001/133765 , Y10T428/1005 , Y10T428/1018 , Y10T428/1023
摘要： A liquid crystal alignment agent comprising a polymer having a specific unit structure, and a method for alignment of liquid crystal molecules by light irradiation without any rubbing treatment, provides liquid crystal alignment films with higher heat sensitivity, heat stability and light resistance.
摘要翻译：包含具有特定单元结构的聚合物的液晶取向剂以及通过光照射而不进行任何摩擦处理的液晶分子的取向方法提供了具有更高的热敏性，热稳定性和耐光性的液晶取向膜。

9. 发明授权

US06274695B1 Aligning agent for liquid crystal 有权
标题翻译：液晶对准剂
公开(公告)号：US06274695B1
公开(公告)日：2001-08-14
申请号：US09403766
申请日：1999-11-01
申请人： Hideyuki Endou , Takayasu Nihira , Hiroyoshi Fukuro
发明人： Hideyuki Endou , Takayasu Nihira , Hiroyoshi Fukuro
IPC分类号： C08G6926
CPC分类号： G02F1/133711 , G02F1/133723 , G02F1/133788 , G02F2001/133765 , G02F2001/133792 , Y10T428/1005 , Y10T428/1018 , Y10T428/1023 , Y10T428/31721 , Y10T428/31725
摘要： The present invention relates to a treating agent for liquid crystal alignment, which is an agent for liquid crystal alignment to be used for a method in which polarized ultraviolet rays or electron rays are irradiated on a polymer thin film formed on a substrate in a predetermined direction relative to the substrate plane, and said substrate is used for aligning liquid crystal without rubbing treatment, wherein said agent for liquid crystal alignment contains a polymer compound having photochemically reactive groups in the polymer main chain and a glass transition temperature of at least 200° C.
摘要翻译：液晶取向处理剂本发明涉及一种液晶取向剂，其用于将偏振紫外线或电子射线照射在形成于基板上的预定方向上的聚合物薄膜上的方法并且所述基板用于对准不经摩擦处理的液晶，其中所述液晶取向剂包含在聚合物主链中具有光化学反应性基团的聚合物化合物和至少200℃的玻璃化转变温度。

10. 发明授权

US06365771B1 Alicyclic compound and curable resin composition 失效
标题翻译：脂环族化合物和可固化树脂组合物
公开(公告)号：US06365771B1
公开(公告)日：2002-04-02
申请号：US09786443
申请日：2001-03-14
申请人： Hideo Suzuki , Takayasu Nihira , Shinichiro Takigawa
发明人： Hideo Suzuki , Takayasu Nihira , Shinichiro Takigawa
IPC分类号： C07C6952
CPC分类号： C07C43/1781 , C07C43/162 , C07C69/54 , C07C2603/68 , C08F220/30 , C08F222/1006 , G03F7/027
摘要： Decane compound or decene compound shown in the formula [1] below wherein A1 and A2 are independently hydrogen or (meth)acryloyl group or 2-vinyloxyethyl group; and the dotted line is single bond or double bond with the proviso that A1 and A2 are not hydrogen at the same time; and curable resin composition containing said compound therein. The compound are suitable as the photo-monomer for resist raw materials because of high clarity at short wavelength ultraviolet light, dry etching resistance, adhesive property for the substrate and high solubility in alkaline developing solution in addition to high sensitivity and greater resolution; as the monomer for optic raw materials and disk overcoat materials because of high clarity, low birefringence and low water absorption rate; and as the monomer for the coating raw materials such as EB curable coating raw materials because of high reactivity, high wear characteristics and water resistance.
摘要翻译：式（1）所示的癸烷化合物或癸烯化合物，其中A1和A2独立地为氢或（甲基）丙烯酰基或2-乙烯氧基乙基; 并且虚线是单键或双键，条件是A1和A2不同时为氢; 和含有该化合物的可固化树脂组合物。由于在短波长紫外光下的高透明度，耐干蚀刻性，基板粘合性和在碱性显影液中的高溶解度，因此该化合物适合作为抗蚀剂原料的光单体灵敏度高，分辨率更高; 作为光学原料和圆盘外套材料的单体，因为透明度高，双折射低，吸水率低; 并且作为涂料原料如EB固化涂料原料的单体，因为反应性高，耐磨性和耐水性高。

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