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    • 4. 发明授权
    • Vertical Hall Effect sensor
    • 垂直霍尔效应传感器
    • US08093891B2
    • 2012-01-10
    • US12396204
    • 2009-03-02
    • Thomas RocznikChristoph LangSam Kavusi
    • Thomas RocznikChristoph LangSam Kavusi
    • G01R33/06
    • H01L43/065G01R33/07G01R33/077
    • A complimentary metal oxide semiconductor (CMOS) sensor system in one embodiment includes a doped well extending along a first axis of a doped substrate, a first electrical contact positioned within the doped well, a second electrical contact positioned within the doped well and spaced apart from the first electrical contact along the first axis, a third electrical contact positioned within the doped well and located between the first electrical contact and the second electrical contact along the first axis, and a fourth electrical contact electrically coupled to the doped well at a location of the doped well below the third electrical contact.
    • 在一个实施例中,互补的金属氧化物半导体(CMOS)传感器系统包括沿着掺杂衬底的第一轴延伸的掺杂阱,位于掺杂阱内的第一电触点,位于掺杂阱内并与之隔开的第二电触点 沿着第一轴线的第一电触头,位于掺杂阱内并位于第一电触点和第二电触点之间的第三电触头沿着第一轴线,以及第四电触点,其电耦合到位于 掺杂深度低于第三电接触。