专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2007048742A Inductively coupled plasma alignment apparatus and method 有权
标题翻译：电感耦合等离子体对准装置及方法
公开(公告)号：JP2007048742A
公开(公告)日：2007-02-22
申请号：JP2006172345
申请日：2006-06-22
申请人： Thermo Fisher Scientific Inc , サーモフィッシャーサイエンティフィックインク
发明人： MARRIOTT PHILIP , WHITECHURCH TIMOTHY A , BRADFORD JONATHAN H , STRINGER JIM
IPC分类号： H05H1/30 , G01N27/68
CPC分类号： H05H1/30
摘要： PROBLEM TO BE SOLVED: To obtain an inductively coupled plasma (ICP) alignment apparatus that dispenses with the movement of a bulky and heavy RF electronic circuit, can suppress RF radiation, and has small adjustment width for impedance matching. SOLUTION: The ICP alignment apparatus comprises: a coil 10 for generating an ICP in a gas; a torch 20 passing at least partially through the coil 10; and an adjustment mechanism 80 for adjusting the position of the torch 20 to the coil 10 so that the arrangement of a torch axis 200 to a coil axis 100 changes. The adjustment mechanism 80 may adjust an angle and/or a distance between the axis of the coil 10 and the torch axis 200. The torch axis 200 may be held substantially parallel to the coil axis 100, while the adjustment mechanism adjusts a distance between the torch axis 200 and the coil axis 100. The coil 10 is preferably maintained substantially fixed in position with respect to a sampling aperture for sampling photons or ions originating from the inductively coupled plasma. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题为了获得省去笨重和重的RF电子电路的移动的电感耦合等离子体（ICP）对准装置，可以抑制RF辐射，并且具有小的调整宽度用于阻抗匹配。解决方案：ICP对准装置包括：用于在气体中产生ICP的线圈10; 通过至少部分地通过线圈10的手电筒20; 以及调节机构80，用于将焊炬20的位置调整到线圈10，使得焊炬轴线200到线圈轴线100的配置发生变化。调节机构80可以调节线圈10的轴线和割炬轴线200之间的角度和/或距离。焊枪轴线200可以被保持为基本上平行于线圈轴线100，而调节机构调节焊枪轴线200和线圈轴线100.线圈10优选地相对于采样孔基本固定在适当位置，用于采样源自感应耦合等离子体的光子或离子。版权所有（C）2007，JPO＆INPIT

2. 发明专利

AU2006201971B2 Inductively Coupled Plasma Alignment Apparatus and Method 未知
公开(公告)号：AU2006201971B2
公开(公告)日：2011-03-17
申请号：AU2006201971
申请日：2006-05-11
申请人： THERMO FISHER SCIENTIFIC INC
发明人： STRINGER JIM , WHITECHURCH TIMOTHY A , BRADFORD JONATHAN H , MARRIOTT PHILIP
IPC分类号： G01N21/73 , H01J49/10 , H05H1/30
摘要： An inductively coupled plasma alignment apparatus having a coil 10 for generating an inductively coupled plasma in a gas, the coil having a first axis 100 ; a torch 20 passing at least partially through the coil, the torch having a second axis 200 ; and an adjustment mechanism 80, 110 for adjusting the position of the torch with respect to the coil so as to alter the relative configuration of the first and second axes. The adjustment mechanism may adjust an angle and/or a distance between the second axis and the first axis. The second axis may be held substantially parallel to the first axis, while the adjustment mechanism adjusts a distance between the second axis and the first axis. The coil is preferably maintained substantially fixed in position with respect to a sampling aperture for sampling photons or ions from the plasma.

3. 发明专利

DE102006036674B4 Vorrichtung und Verfahren zum Ausrichten von induktiv gekoppeltem Plasma 未知
公开(公告)号：DE102006036674B4
公开(公告)日：2014-12-24
申请号：DE102006036674
申请日：2006-07-18
申请人： THERMO FISHER SCIENTIFIC INC
发明人： MARRIOTT PHILIP , WHITECHURCH TIMOTHY A , BRADFORD JONATHAN H , STRINGER JIM
IPC分类号： H05H1/30 , G01N21/68 , G01N21/73 , H01J49/26
摘要： Ausrichtungsvorrichtung für induktiv gekoppeltes Plasma, umfassend: eine Spule (10) zum Erzeugen eines induktiv gekoppelten Plasmas in einem Gas, wobei die Spule (10) eine erste Achse (100) aufweist; einen Brenner (20), der zumindest teilweise durch die Spule (10) hindurchgeht, wobei der Brenner (20) eine zweite Achse (200) aufweist; und einen Einstellmechanismus (80, 110) zum Einstellen der Position des Brenners (20) in Bezug auf die Spule (10), um die relative Konfiguration der ersten Achse (100) und der zweiten Achse (200) durch Einstellen eines Winkels zwischen der zweiten Achse (200) und der ersten Achse (100) und/oder durch Einstellen eines Abstands zwischen der zweiten Achse (200) und der ersten Achse (100) zu verändern.

4. 发明专利

GB2418293B Inductively coupled plasma alignment apparatus and method 未知
公开(公告)号：GB2418293B
公开(公告)日：2007-01-31
申请号：GB0516451
申请日：2005-08-10
申请人： THERMO ELECTRON CORP , THERMO FISHER SCIENTIFIC INC
发明人： MARROITT PHILIP , WHITECHURCH TIMOTHY A , BRADFORD JONATHAN HERBERT , STRINGER JIM
IPC分类号： H01J49/12 , H05H1/26 , H05H1/30
摘要： An inductively coupled plasma alignment apparatus having a coil 10 for generating an inductively coupled plasma in a gas, the coil having a first axis 100 ; a torch 20 passing at least partially through the coil, the torch having a second axis 200 ; and an adjustment mechanism 80, 110 for adjusting the position of the torch with respect to the coil so as to alter the relative configuration of the first and second axes. The adjustment mechanism may adjust an angle and/or a distance between the second axis and the first axis. The second axis may be held substantially parallel to the first axis, while the adjustment mechanism adjusts a distance between the second axis and the first axis. The coil is preferably maintained substantially fixed in position with respect to a sampling aperture for sampling photons or ions from the plasma.

5. 发明专利

AU2006201971A1 Inductively Coupled Plasma Alignment Apparatus and Method 未知
公开(公告)号：AU2006201971A1
公开(公告)日：2007-03-01
申请号：AU2006201971
申请日：2006-05-11
申请人： THERMO FISHER SCIENTIFIC INC
发明人： STRINGER JIM , WHITECHURCH TIMOTHY A , BRADFORD JONATHAN H , MARRIOTT PHILIP
IPC分类号： G01N21/73 , H01J49/10 , H05H1/30
摘要： An inductively coupled plasma alignment apparatus having a coil 10 for generating an inductively coupled plasma in a gas, the coil having a first axis 100 ; a torch 20 passing at least partially through the coil, the torch having a second axis 200 ; and an adjustment mechanism 80, 110 for adjusting the position of the torch with respect to the coil so as to alter the relative configuration of the first and second axes. The adjustment mechanism may adjust an angle and/or a distance between the second axis and the first axis. The second axis may be held substantially parallel to the first axis, while the adjustment mechanism adjusts a distance between the second axis and the first axis. The coil is preferably maintained substantially fixed in position with respect to a sampling aperture for sampling photons or ions from the plasma.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式