专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120146554A1 A D.C. Charged Particle Accelerator, A Method of Accelerating Charged Particles Using D.C. Voltages and a High Voltage Power Supply Apparatus for use Therewith 有权
标题翻译：直流电荷粒子加速器，使用直流电压加速带电粒子的方法和用于其的高压电源装置
公开(公告)号：US20120146554A1
公开(公告)日：2012-06-14
申请号：US12962723
申请日：2010-12-08
申请人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
发明人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
IPC分类号： H05H7/22 , H02K16/00
CPC分类号： H05H5/04 , H02K11/0094 , H02K16/00 , H02K21/14 , H02M7/106
摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d. c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
摘要翻译：广告。 C。带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间单独调节的间隙电压施加在每个相邻的加速器电极对之间。在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。交流发电机的交流电源输出为单独调节的d提供输入。 C。电源产生间隙电压。电源是电隔离的，并且具有串联连接成对的加速器电极的输出。所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

2. 发明授权

US08558486B2 D. c. Charged particle accelerator, a method of accelerating charged particles using d. c. voltages and a high voltage power supply apparatus for use therewith 有权
标题翻译： D. c。带电粒子加速器，使用d加速带电粒子的方法。 C。电压和与其一起使用的高压电源装置
公开(公告)号：US08558486B2
公开(公告)日：2013-10-15
申请号：US12962723
申请日：2010-12-08
申请人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
发明人： Theodore H. Smick , Geoffrey Ryding , William H. Park , Ronald Horner
IPC分类号： H05H7/22 , H02K16/00
CPC分类号： H05H5/04 , H02K11/0094 , H02K16/00 , H02K21/14 , H02M7/106
摘要： A d.c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d.c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
摘要翻译：一个d.c. 带电粒子加速器包括通过绝缘垫片间隔开的加速器电极，其限定相邻电极对之间的加速间隙。单独调节的间隙电压施加在每个相邻的加速器电极对之间。在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。交流发电机的交流电源输出为各个调节直流电源提供输入。电源产生间隙电压。电源是电隔离的，并且具有串联连接成对的加速器电极的输出。所描述的实施例使得能够将离子束加速到高能量和高束流，具有良好的加速器稳定性。

3. 发明申请

US20110073781A1 ION IMPLANTATION APPARATUS 失效
标题翻译：离子植入装置
公开(公告)号：US20110073781A1
公开(公告)日：2011-03-31
申请号：US12894229
申请日：2010-09-30
申请人： William H. Leavitt , Theodore H. Smick , Joseph Daniel Gillespie , William H. Park , Paul Eide , Drew Arnold , Geoffrey Ryding
发明人： William H. Leavitt , Theodore H. Smick , Joseph Daniel Gillespie , William H. Park , Paul Eide , Drew Arnold , Geoffrey Ryding
IPC分类号： H01L21/265
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2007 , H01J2237/201
摘要： An ion implanter has an implant wheel with a plurality of wafer carriers distributed about a periphery of the wheel. Each wafer carrier has a heat sink for removing heat from a wafer on the carrier during the implant process by thermal contact between the wafer and the heat sink. The wafer carriers have wafer retaining fences formed as cylindrical rollers with axes in the respective wafer support planes of the wafer carriers. The cylindrical surfaces of the rollers provide wafer abutment surfaces which can move transversely to the wafer support surfaces so that no transverse loading is applied by the fences to wafer edges as the wafer is pushed against the heat sink by centrifugal force. The wafer support surfaces comprise layers of elastomeric material and the movable abutment surfaces of the fences allow even thermal coupling with the heat sink over the whole area of the wafer.
摘要翻译：离子注入机具有植入轮，其具有围绕轮的周边分布的多个晶片载体。每个晶片载体具有散热器，用于在植入过程期间通过晶片和散热器之间的热接触从载体上的晶片去除热量。晶片载体具有晶片保持栅栏，其形成为具有在晶片载体的相应晶片支撑平面中的轴线的圆柱形辊。辊的圆柱形表面提供可以横向移动到晶片支撑表面的晶片邻接表面，使得当晶片通过离心力推靠在散热片上时，栅栏不会向晶片边缘施加横向负载。晶片支撑表面包括弹性体材料层，并且栅栏的可移动邻接表面允许在晶片的整个区域上均匀地与散热器的热耦合。

4. 发明授权

US08324592B2 Ion source and a method of generating an ion beam using an ion source 有权
标题翻译：离子源和使用离子源产生离子束的方法
公开(公告)号：US08324592B2
公开(公告)日：2012-12-04
申请号：US12917510
申请日：2010-11-02
申请人： Geoffrey Ryding , Drew Arnold , William H. Park , Ronald Horner
发明人： Geoffrey Ryding , Drew Arnold , William H. Park , Ronald Horner
IPC分类号： H01J27/00 , H01J27/02 , H01J27/04
CPC分类号： H01J27/04 , H01J37/08 , H01J2237/082
摘要： Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.
摘要翻译：多个控制电极在离子源的等离子体室内沿着等离子体室的长度的各个位置处非对称地设置。选择性地偏压控制电极可以选择性地提高沿着提取狭缝的长度的相邻位置处的离子提取电流。公开了一种产生离子束的方法，其中控制沿着等离子体室的长度的不同位置处的横向电场的强度，以沿着狭缝的长度修改离子束线性电流密度分布。该方法用于控制带束束的均匀性。

5. 发明申请

US20120104273A1 Ion Source and a Method of Generating an Ion Beam Using an Ion Source 有权
标题翻译：离子源和使用离子源产生离子束的方法
公开(公告)号：US20120104273A1
公开(公告)日：2012-05-03
申请号：US12917510
申请日：2010-11-02
申请人： Geoffrey Ryding , Drew Arnold , William H. Park , Ronald Horner
发明人： Geoffrey Ryding , Drew Arnold , William H. Park , Ronald Horner
IPC分类号： H01J27/00
CPC分类号： H01J27/04 , H01J37/08 , H01J2237/082
摘要： Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.
摘要翻译：多个控制电极在离子源的等离子体室内沿着等离子体室的长度的各个位置处非对称地设置。选择性地偏压控制电极可以选择性地提高沿着提取狭缝的长度的相邻位置处的离子提取电流。公开了一种产生离子束的方法，其中控制沿着等离子体室的长度的不同位置处的横向电场的强度，以沿着狭缝的长度修改离子束线性电流密度分布。该方法用于控制带束束的均匀性。

6. 发明授权

US08058626B2 Method and apparatus for modifying a ribbon-shaped ion beam 有权
标题翻译：用于改变带状离子束的方法和装置
公开(公告)号：US08058626B2
公开(公告)日：2011-11-15
申请号：US12703194
申请日：2010-02-10
申请人： Kenneth Harry Purser , William H. Park
发明人： Kenneth Harry Purser , William H. Park
IPC分类号： H01J37/317 , H01J3/26 , H01L21/265
CPC分类号： G21K1/093 , H01J37/12 , H01J37/153 , H01J37/3171 , H01J2237/1405 , H01J2237/1534 , H01J2237/30477
摘要： A ribbon-shaped ion beam having an elongate cross-section normal to a beam direction is modified by generating, at a predetermined position along the ribbon-shaped beam, a magnetic field extending in an x-direction along an x-axis. The x-direction magnetic field has a non-uniform intensity which is a desired function of x.
摘要翻译：通过在沿着带状梁的预定位置处沿着x轴在x方向上延伸的磁场产生具有垂直于光束方向的细长横截面的带状离子束。 x方向磁场具有不均匀的强度，这是x的期望函数。

7. 发明授权

US5468217A Lower extremity phlebo pump 失效
标题翻译：下肢静脉泵
公开(公告)号：US5468217A
公开(公告)日：1995-11-21
申请号：US207301
申请日：1994-03-07
申请人： Mario C. Garcia , Kristofer T. Lund , William H. Park
发明人： Mario C. Garcia , Kristofer T. Lund , William H. Park
IPC分类号： A61H1/02 , A61H1/00
CPC分类号： A61H1/0266 , A61H2209/00
摘要： An ankle calf exerciser/phlebo pump adapted to reduce the development of deep vein thromboses (DVT), leg edema, muscular atrophy and ankle joint stiffness in postoperative orthopedic patients. An efficient and simple driving mechanism is provided from imparting an alternating and reciprocating movement of a pair of foot paddles. The foot paddles are coupled to the driving mechanism such that only the patient's ankles will be flexed while the knee and hip remains stationary. This device is ideally suited for patients with hip fractures, and hip replacement with prosthesis. The speed of paddle reciprocation can be selected, as can the arcuate path of travel of the foot paddles by adjusting the length of a driving rod.
摘要翻译：适用于减轻术后矫形患者深静脉血栓形成（DVT），腿部水肿，肌肉萎缩和踝关节僵硬发展的脚踝锻炼者/静脉泵。通过赋予一对脚踏板的交替和往复运动来提供有效和简单的驱动机构。脚踏板联接到驱动机构，使得仅膝盖和臀部保持静止时才能使患者的脚踝屈曲。该装置非常适用于髋部骨折患者和髋关节置换假体。可以选择桨叶往复运动的速度，通过调整驱动杆的长度，可以选择脚踏板的弓形运动路径。

8. 发明授权

US08089050B2 Method and apparatus for modifying a ribbon-shaped ion beam 有权
标题翻译：用于改变带状离子束的方法和装置
公开(公告)号：US08089050B2
公开(公告)日：2012-01-03
申请号：US12621689
申请日：2009-11-19
申请人： Kenneth Harry Purser , William H. Park
发明人： Kenneth Harry Purser , William H. Park
IPC分类号： H01J3/36
CPC分类号： G21K1/093 , H01J37/12 , H01J37/153 , H01J37/3171 , H01J2237/1405 , H01J2237/1534 , H01J2237/30477
摘要： A ribbon-shaped ion beam is modified using multiple coil structures on a pair of opposed ferromagnetic bars. The coil structures comprise continuous windings which have predetermined variations along the length of the bar of turns per unit length. In an example, one coil structure may have uniform turns per unit length along the bar, so that energizing the coil structures forms a magnetic field component extending across the gap between the bars with a quadrupole intensity distribution. A second coil structure may have turns per unit length varying to produce a hexapole magnetic field intensity distribution. Further coil structures may be provided to produce octopole and decapole magnetic field distributions. The coil structures may be energized to produce magnetic fields parallel to the bars which vary along the length of the bars, to twist or flatten the ribbon-shaped beam.
摘要翻译：在一对相对的铁磁条上使用多个线圈结构修改带状离子束。线圈结构包括沿着每单位长度的匝数的长度具有预定变化的连续绕组。在一个示例中，一个线圈结构可以具有沿着棒的每单位长度的均匀匝数，使得对线圈结构的通电形成一个以四极强度分布延伸穿过棒之间的间隙的磁场分量。第二线圈结构可以具有每单位长度的转弯以产生六极磁场强度分布。可以提供另外的线圈结构以产生八极和十极磁场分布。线圈结构可以被激励以产生平行于棒的磁场，其沿着杆的长度变化，以扭曲或平坦化带形梁。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式