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1. 发明申请

US20090280727A1 POLISHING SYSTEM WITH THREE HEADED CAROUSEL 审中-公开
标题翻译：具有三头卡车的抛光系统
公开(公告)号：US20090280727A1
公开(公告)日：2009-11-12
申请号：US12118438
申请日：2008-05-09
申请人： LAKSHMANAN KARUPPIAH , Tetsuya Ishikawa , Donald J.K. Olgado , Allen L. D'Ambra , Hung Chih Chen
发明人： LAKSHMANAN KARUPPIAH , Tetsuya Ishikawa , Donald J.K. Olgado , Allen L. D'Ambra , Hung Chih Chen
IPC分类号： B24B29/02 , B24B1/00
CPC分类号： B24B41/005 , B24B27/0076 , B24B37/345
摘要： Embodiments of the present invention provide a polishing module configured to use in a polishing system. The polishing module comprises a base member, two polishing stations disposed on the base member, one load cup, and a carousel having three polishing heads.
摘要翻译：本发明的实施例提供了一种配置成在抛光系统中使用的抛光模块。抛光模块包括基座构件，设置在基座构件上的两个抛光台，一个负载杯和具有三个抛光头的圆盘传送带。

2. 发明申请

US20080268753A1 NON-CONTACT WET WAFER HOLDER 审中-公开
标题翻译：非接触式湿纸架
公开(公告)号：US20080268753A1
公开(公告)日：2008-10-30
申请号：US11739450
申请日：2007-04-24
申请人： Tetsuya Ishikawa , Donald J.K. Olgado , Hung Chih Chen
发明人： Tetsuya Ishikawa , Donald J.K. Olgado , Hung Chih Chen
IPC分类号： B24B1/00
CPC分类号： B24B37/30 , H01L21/6838
摘要： The present invention relates to a load cup configured to speed up substrate transferring to and from a carrier head and to reduce corrosion during the transferring. One embodiment of the present invention provides a non-contact substrate holder comprising a pedestal having a top surface configured to support a substrate, and at least one injection port configured to eject a high velocity liquid stream on the top surface of the pedestal, wherein the liquid stream in configured to secure the substrate on the pedestal without the substrate contacting the top surface of the pedestal.
摘要翻译：本发明涉及一种负载杯，其被配置为加速基板向载体头转移和从载体头转移并减少转印期间的腐蚀。本发明的一个实施例提供了一种非接触衬底保持器，其包括具有构造成支撑衬底的顶表面的基座和被配置为在基座的顶表面上喷射高速液体流的至少一个注入端口，其中，液体流被配置成将基板固定在基座上，而基板不接触基座的顶面。

3. 发明申请

US20100099342A1 PAD CONDITIONER AUTO DISK CHANGE 审中-公开
标题翻译： PAD控制器自动盘更改
公开(公告)号：US20100099342A1
公开(公告)日：2010-04-22
申请号：US12255442
申请日：2008-10-21
申请人： Hung Chih Chen , Steven M. Zuniga , Donald J.K. Olgado
发明人： Hung Chih Chen , Steven M. Zuniga , Donald J.K. Olgado
IPC分类号： B24D9/08
CPC分类号： B24B53/017
摘要： A method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is provided. The apparatus comprises a disk load/unload station for unloading used conditioning disks from a pad conditioning assembly and loading unused conditioning disks onto the pad conditioning assembly, on or more disk storage stations for storing both used and unused conditioning disks, and a central robot having a range of motion sufficient for transferring both used an unused conditioning disks between the disk load/unload station and the one or more disk storage stations. Embodiments described herein reduce the length of system interruption by eliminating the need to safety lock out the system for the replacement of polishing pad conditioning disks.
摘要翻译：一种用于更换抛光垫调节盘的方法和装置是提供化学机械抛光系统。该装置包括用于从衬垫调节组件卸载使用的调节盘并将未使用的调节盘装载到衬垫调节组件上的多个盘装载/卸载站，用于存储使用和未使用的调节盘的两个或多个盘存储站，以及一个中央机器人，足够的运动范围，用于在盘装载/卸载站和一个或多个盘存储站之间使用未使用的调节盘。本文所描述的实施例通过消除安全锁定系统来更换抛光垫调节盘来减少系统中断的长度。

4. 发明申请

US20090036036A1 APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD 审中-公开
标题翻译：用于调节抛光垫的装置和方法
公开(公告)号：US20090036036A1
公开(公告)日：2009-02-05
申请号：US12245759
申请日：2008-10-05
申请人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
发明人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
IPC分类号： B24B53/02
CPC分类号： B24B53/017 , B24B53/005 , B24B53/12
摘要： Apparatus and methods for conditioning a polishing pad are provided. An apparatus includes a base, an arm adapted to support a conditioning disk; and a drive mechanism coupled between the arm and the conditioning disk, wherein the drive mechanism is adapted to directly rotate the conditioning disk relative to the arm. Numerous other aspects are disclosed.
摘要翻译：提供了用于调节抛光垫的装置和方法。一种装置包括底座，适于支撑调节盘的臂; 以及联接在所述臂和所述调节盘之间的驱动机构，其中所述驱动机构适于相对于所述臂直接旋转所述调节盘。公开了许多其他方面。

5. 发明申请

US20090264049A1 PLATEN EXHAUST FOR CHEMICAL MECHANICAL POLISHING SYSTEM 有权
标题翻译：化学机械抛光系统的排气
公开(公告)号：US20090264049A1
公开(公告)日：2009-10-22
申请号：US12105924
申请日：2008-04-18
申请人： Hung Chih Chen , Allen L. D'Ambra , Donald J.K. Olgado
发明人： Hung Chih Chen , Allen L. D'Ambra , Donald J.K. Olgado
IPC分类号： B24B1/00 , B24B55/12 , B08B5/04 , B08B15/02
CPC分类号： B24B37/04 , B08B15/04 , B24B55/12
摘要： The present invention generally relates to a substrate transferring system. Particularly, the present invention relates to apparatus and method to effectively remove the chemical fume, vapor and other byproducts generated during a polishing process. One embodiment of the present invention provides an apparatus for polishing a substrate comprising a platen having a polishing surface configured to polish the substrate by contacting the substrate while moving relatively to the substrate, a polishing head configured to support the substrate and position the substrate to be in contact with the polishing surface during polishing, a solution nozzle configured to dispense a polishing solution on the polishing surface, and an exhaust assembly configured to remove fume, vapor and other byproducts generated during polishing.
摘要翻译：本发明一般涉及基片转印系统。特别地，本发明涉及有效地除去在抛光过程中产生的化学烟雾，蒸气和其它副产物的装置和方法。本发明的一个实施例提供了一种用于抛光衬底的装置，包括具有抛光表面的压板，所述抛光表面被配置为通过在相对于衬底移动的同时使衬底接触而抛光衬底;抛光头，其被配置为支撑衬底并将衬底定位为在抛光期间与抛光表面接触，配置成在研磨表面上分配抛光溶液的溶液喷嘴以及被配置为去除在抛光期间产生的烟雾，蒸气和其它副产物的排气组件。

6. 发明申请

US20090036035A1 APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD 审中-公开
标题翻译：用于调节抛光垫的装置和方法
公开(公告)号：US20090036035A1
公开(公告)日：2009-02-05
申请号：US12245758
申请日：2008-10-05
申请人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
发明人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
IPC分类号： B24B1/00 , B24B7/00
CPC分类号： B24B53/017 , B24B53/005 , B24B53/12
摘要： Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
摘要翻译：用于调理抛光垫的装置和方法包括基座，枢转地联接到基座并适于支撑调节盘的臂以及联接到基座和臂的致动器。致动器适于使臂以线性可变量的力将调节盘压靠抛光垫。用致动器产生第一力。第一力通过线性可变量被缩放到通过调节盘施加到抛光垫的第二力。公开了许多其他方面。

7. 发明申请

US20070212983A1 APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD 审中-公开
标题翻译：用于调节抛光垫的装置和方法
公开(公告)号：US20070212983A1
公开(公告)日：2007-09-13
申请号：US11684969
申请日：2007-03-12
申请人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
发明人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
IPC分类号： B24B51/00 , B24B1/00 , B24B21/18
CPC分类号： B24B53/017 , B24B53/005 , B24B53/12
摘要： Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
摘要翻译：用于调理抛光垫的装置和方法包括基座，枢转地联接到基座并适于支撑调节盘的臂以及联接到基座和臂的致动器。致动器适于使臂以线性可变量的力将调节盘压靠抛光垫。用致动器产生第一力。第一力通过线性可变量被缩放到通过调节盘施加到抛光垫的第二力。公开了许多其他方面。

8. 发明申请

US20130203321A1 RETAINING RING MONITORING AND CONTROL OF PRESSURE 有权
标题翻译：保持环的监测和压力控制
公开(公告)号：US20130203321A1
公开(公告)日：2013-08-08
申请号：US13749554
申请日：2013-01-24
申请人： Hung Chih Chen , Thomas H. Osterheld , Charles C. Garretson , Jason Garcheung Fung
发明人： Hung Chih Chen , Thomas H. Osterheld , Charles C. Garretson , Jason Garcheung Fung
IPC分类号： B24B37/005 , B24B37/32 , B24B37/34
CPC分类号： B24B37/005 , B24B37/32 , B24B37/345
摘要： A load cup apparatus for transferring a substrate in a processing system includes a pedestal assembly having a substrate support, an actuator, and a controller. The actuator is configured to move the pedestal assembly into a loading position in contact with a retaining ring of a carrier head and to generate a retaining ring thickness signal based on a distance travelled by the pedestal assembly. The controller is configured to receive the retaining ring thickness signal from the actuator.
摘要翻译：用于在处理系统中传送衬底的装载杯装置包括具有衬底支撑件，致动器和控制器的基座组件。致动器构造成将基座组件移动到与承载头的保持环接触的装载位置，并且基于由基座组件行进的距离产生保持环厚度信号。控制器被配置为从致动器接收保持环厚度信号。

9. 发明授权

US08460067B2 Polishing head zone boundary smoothing 有权
公开(公告)号：US08460067B2
公开(公告)日：2013-06-11
申请号：US12720893
申请日：2010-03-10
申请人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Gautam Shashank Dandavate , Denis M. Koosau
发明人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Gautam Shashank Dandavate , Denis M. Koosau
IPC分类号： B24B5/00
CPC分类号： B24B37/30 , B24B41/06
摘要： A method and apparatus for chemical mechanical polishing of substrates, and more particularly a method and apparatus related to a carrier had for use in chemical mechanical polishing is provided. In one embodiment the carrier head assembly comprises a base assembly for providing support to the substrate, a flexible membrane mounted on the base assembly having a generally circular central portion with a lower surface that provides a substrate mounting surface, and a plurality of independently pressurizable chambers formed between the base assembly and the flexible membrane, comprising an annular outer chamber and a non-circular inner chamber, is provided.

10. 发明授权

US08376813B2 Retaining ring and articles for carrier head 失效
标题翻译：用于承载头的保持环和物品
公开(公告)号：US08376813B2
公开(公告)日：2013-02-19
申请号：US12703591
申请日：2010-02-10
申请人： Doyle E. Bennett , Andrew J. Nagengast , Hung Chih Chen
发明人： Doyle E. Bennett , Andrew J. Nagengast , Hung Chih Chen
IPC分类号： B24B47/26
CPC分类号： B24B37/32 , B24B37/30
摘要： A carrier head for chemical mechanical polishing that has a base, a mounting assembly connected to the base having a surface for contacting a substrate, and a retaining ring secured to the base. The retaining ring can include perfluoroalkoxy, polyetherketoneketone, polybenzimidazole, a semi-crystalline thermoplastic polyester, or a long molecular chain molecule produced from poly-paraphenylene terephthalamide.
摘要翻译：一种用于化学机械抛光的载体头，其具有基部，连接到基部的安装组件具有用于接触基底的表面和固定到基部的保持环。保持环可以包括全氟烷氧基，聚醚酮酮，聚苯并咪唑，半结晶热塑性聚酯或由聚对苯二甲酰对苯二胺生产的长分子链分子。

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