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1. 发明授权

US06888094B2 Plasma processing method and plasma processing apparatus 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US06888094B2
公开(公告)日：2005-05-03
申请号：US10781717
申请日：2004-02-20
申请人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
发明人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
IPC分类号： H01J37/32 , B23K9/00 , B23K10/00
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01J37/3299 , H01L21/32137 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A plasma processing method of processing a substrate by controlling the application of a bias to the substrate independently of generation of plasma. The method includes modulating periodically an output value of a high-frequency voltage applied to a substrate base and changing a duty ratio of the periodic modulation for one of each processed substrate and for each of a plurality of processed substrates. The duty ratio is defined as a ratio of a sub-period of a period of the period modulation, during which a large voltage of the output value of the high-frequency voltage is applied, to the period of the periodic modulation.
摘要翻译：一种等离子体处理方法，其通过不依赖于等离子体的产生来控制向衬底施加偏压来处理衬底。该方法包括周期性地调制施加到衬底基底的高频电压的输出值，并改变每个处理衬底之一和多个处理衬底中的每一个的周期性调制的占空比。占空比被定义为周期调制的周期的周期的周期的周期之间的比率，其中施加了高频电压的输出值的大电压。

2. 发明授权

US06700090B2 Plasma processing method and plasma processing apparatus 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US06700090B2
公开(公告)日：2004-03-02
申请号：US10229034
申请日：2002-08-28
申请人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
发明人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
IPC分类号： B23K900
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01J37/3299 , H01L21/32137 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： Plasma is generated in a vacuum processing apparatus and a high-frequency voltage is applied to a lower electrode on which a wafer is placed. The high-frequency voltage applied to the lower electrode is subjected to periodical on-off modulation, the on-off duty ratio of which is determined for each wafer or each plurality of wafers, to carry out plasma processing on the wafer. As a result, in the plasma processing carried out on the wafer, the wafer is fabricated with a high degree of reproducibility by suppressing variations in fabricated-line dimension from wafer to wafer without decreasing the throughput.
摘要翻译：在真空处理装置中产生等离子体，并且将高频电压施加到其上放置晶片的下电极。施加到下电极的高频电压进行周期性的开 - 关调制，其对每个晶片或每个晶片确定其开关占空比，以在晶片上进行等离子体处理。结果，在晶片上进行的等离子体处理中，通过抑制制造线尺寸从晶片到晶片的变化而不降低生产量，从而以高再现性制造晶片。

3. 发明申请

US20070184562A1 Plasma Processing Method And Plasma Processing Apparatus 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US20070184562A1
公开(公告)日：2007-08-09
申请号：US11696827
申请日：2007-04-05
申请人： Tetsuo ONO , Katsumi Setoguchi , Hideyuki Yamamoto
发明人： Tetsuo ONO , Katsumi Setoguchi , Hideyuki Yamamoto
IPC分类号： H01L21/00 , H01L21/302
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01J37/3299 , H01L21/32137 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A plasma processing method for processing a sample by applying a high-frequency bias power periodically for each one period (T) which is divided along a time axis into a first sub-period (T1) for which feedback control of a CD gain is executed, a second sub-period (T2) for which feedback control of a select ratio is executed, and a third sub-period (T3) for which feedback control of both the CD gain and the select ratio are executed. The applied power is set at a large value in the first sub-period, and a duty ratio T1/T is controlled in accordance with the CD gain. A plurality of samples are processed with preset process conditions, and feedback control for each processing unit of the samples is executed in accordance with a processing state of each of the samples so that an average applied power over the one period (T) is constant.
摘要翻译：一种等离子体处理方法，用于通过对沿着时间轴分割的每个周期（T）周期性地施加高频偏置功率来对CD增益的反馈控制的第一子周期（T 1）为执行选择比率的反馈控制的第二子时段（T 2）和执行CD增益和选择比率的反馈控制的第三子时段（T 3）。所施加的功率在第一子周期中被设置为大的值，并且根据CD增益来控制占空比T 1 / T。以预设的处理条件处理多个样本，并且根据每个样本的处理状态执行样本的每个处理单元的反馈控制，使得在一个周期（T）的平均施加功率是恒定的。

4. 发明授权

US07611993B2 Plasma processing method and plasma processing apparatus 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US07611993B2
公开(公告)日：2009-11-03
申请号：US11696827
申请日：2007-04-05
申请人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
发明人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
IPC分类号： H01L21/302
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01J37/3299 , H01L21/32137 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A plasma processing method for processing a sample by applying a high-frequency bias power periodically for each one period (T) which is divided along a time axis into a first sub-period (T1) for which feedback control of a CD gain is executed, a second sub-period (T2) for which feedback control of a select ratio is executed, and a third sub-period (T3) for which feedback control of both the CD gain and the select ratio are executed. The applied power is set at a large value in the first sub-period, and a duty ratio T1/T is controlled in accordance with the CD gain. A plurality of samples are processed with preset process conditions, and feedback control for each processing unit of the samples is executed in accordance with a processing state of each of the samples so that an average applied power over the one period (T) is constant.
摘要翻译：一种等离子体处理方法，用于通过对沿着时间轴分割的每个周期（T）周期性地施加高频偏置功率来对执行CD增益的反馈控制的第一子周期（T1）进行处理，，执行选择比率的反馈控制的第二子时段（T2）以及执行CD增益和选择比率的反馈控制的第三子时段（T3）。所施加的功率在第一子周期中被设置为大的值，并且根据CD增益来控制占空比T1 / T。以预设的处理条件处理多个样本，并且根据每个样本的处理状态执行样本的每个处理单元的反馈控制，使得在一个周期（T）的平均施加功率是恒定的。

5. 发明申请

US20050183822A1 Plasma processing method and plasma processing apparatus 审中-公开
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US20050183822A1
公开(公告)日：2005-08-25
申请号：US11111873
申请日：2005-04-22
申请人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
发明人： Tetsuo Ono , Katsumi Setoguchi , Hideyuki Yamamoto
IPC分类号： H01J37/32 , C23F1/00
CPC分类号： H01J37/32146 , H01J37/32082 , H01J37/32623 , H01J37/32706 , H01J37/3299 , H01L21/32137 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： A plasma processing apparatus for processing a substrate placed on a sample base installed in a vacuum processing chamber, in which plasma is generated and a high-frequency voltage is applied to the sample base. The apparatus includes a high-frequency power supply connected to the sample base, a modulation unit for periodically carrying out on-off modulation on the high-frequency voltage generated by the high-frequency power supply, and a control unit for changing a duty ratio of the on-off modulation for each processed substrate or each plurality of processed substrates.
摘要翻译：一种等离子体处理装置，用于处理放置在安装在真空处理室中的样品基底上的基板，其中产生等离子体并向样品基底施加高频电压。该装置包括连接到采样基座的高频电源，用于周期性地对由高频电源产生的高频电压进行开 - 关调制的调制单元和用于改变占空比的控制单元对于每个经处理的基板或每个经处理的基板的开 - 关调制。

6. 发明申请

US20060043293A1 Charged particle beam adjustment method and apparatus 有权
标题翻译：带电粒子束调节方法和装置
公开(公告)号：US20060043293A1
公开(公告)日：2006-03-02
申请号：US11209759
申请日：2005-08-24
申请人： Takashi Doi , Noriaki Arai , Hidetoshi Morokuma , Katsumi Setoguchi , Fumihiro Sasajima , Maki Tanaka , Atsushi Miyamoto
发明人： Takashi Doi , Noriaki Arai , Hidetoshi Morokuma , Katsumi Setoguchi , Fumihiro Sasajima , Maki Tanaka , Atsushi Miyamoto
IPC分类号： G21K7/00 , G21K5/10
CPC分类号： G21K1/08 , G01N2223/07 , G01N2223/32 , H01J37/1478 , H01J37/153 , H01J37/21 , H01J37/28 , H01J2237/1536 , H01J2237/216
摘要： A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.
摘要翻译：公开了一种用于使倾斜偏转器倾斜电子束的带电粒子束调节装置。在电子束倾斜时产生的图像失真的电子束的倾斜角度调整和畸变调整是在金字塔形样品等特定的样品上进行的。获取并处理倾斜之前和之后的图像以确定倾斜角度值和失真量。根据预定的处理流程，自动地进行倾斜角调整和矫正矫正。

7. 发明授权

US09702695B2 Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof 有权
公开(公告)号：US09702695B2
公开(公告)日：2017-07-11
申请号：US13700096
申请日：2011-05-25
申请人： Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
发明人： Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
IPC分类号： G01N23/00 , G01B15/00 , H01J37/22 , H01J37/28 , G06K9/62
CPC分类号： G01B15/00 , G06K9/6201 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/2817 , H01J2237/2826 , Y10T428/24355
摘要： An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.

8. 发明授权

US09275829B2 Image forming device and computer program 有权
标题翻译：图像形成装置和计算机程序
公开(公告)号：US09275829B2
公开(公告)日：2016-03-01
申请号：US13818094
申请日：2011-08-31
申请人： Katsumi Setoguchi , Osamu Komuro
发明人： Katsumi Setoguchi , Osamu Komuro
IPC分类号： H01J3/14 , G06K9/36 , H01J37/28 , H01J37/26
CPC分类号： H04N7/18 , H01J37/263 , H01J37/28 , H01J2237/221 , H01J2237/24578 , H01J2237/2826
摘要： In an image forming apparatus and a computer program, extraction of information about distortion in a charged particle beam scan area can be implemented. An image forming apparatus integrates image data obtained by a charged particle beam apparatus and calculates, from a plurality of images with different scan directions of the charged particle beam apparatus, first information about the amount of change in a feature quantity in accordance with the time of irradiation of the charged particle beam, second information about the amount of change in the feature quantity before and after a change in beam scan direction, and/or third information about a position error of a pattern on the image before and after the change in beam scan direction.
摘要翻译：在图像形成装置和计算机程序中，可以实现关于带电粒子束扫描区域中的失真的信息的提取。图像形成装置对由带电粒子束装置得到的图像数据进行了积分，并根据带电粒子束装置的不同扫描方向的多个图像，根据时间带电粒子束的照射，关于光束扫描方向改变前后的特征量的变化量的第二信息，和/或关于光束变化前后的图像上的图案的位置误差的第三信息扫描方向。

9. 发明申请

US20130141563A1 IMAGE FORMING DEVICE AND COMPUTER PROGRAM 有权
标题翻译：图像形成设备和计算机程序
公开(公告)号：US20130141563A1
公开(公告)日：2013-06-06
申请号：US13818094
申请日：2011-08-31
申请人： Katsumi Setoguchi , Osamu Komuro
发明人： Katsumi Setoguchi , Osamu Komuro
IPC分类号： H04N7/18
CPC分类号： H04N7/18 , H01J37/263 , H01J37/28 , H01J2237/221 , H01J2237/24578 , H01J2237/2826
摘要： The purpose of the present invention is to provide an image forming apparatus and a computer program such that extraction of information about distortion in a charged particle beam scan area can be implemented. An embodiment for achieving the purpose proposes: an image forming apparatus that integrates image data obtained by a charged particle beam apparatus and that calculates, from a plurality of images with different scan directions of the charged particle beam apparatus, first information about the amount of change in a feature quantity in accordance with the time of irradiation of the charged particle beam, second information about the amount of change in the feature quantity before and after a change in beam scan direction, and/or third information about a position error of a pattern on the image before and after the change in beam scan direction; and a computer program for causing a computing apparatus to perform the above process.
摘要翻译：本发明的目的是提供一种图像形成装置和计算机程序，从而可以实现关于带电粒子束扫描区域中的失真的信息的提取。实现该目的的实施例提出：一种图像形成装置，其对由带电粒子束装置获得的图像数据进行积分，并且从具有带电粒子束装置的不同扫描方向的多个图像计算关于变化量的第一信息在根据照射带电粒子束的时间的特征量中，关于波束扫描方向的变化前后的特征量的变化量的第二信息和/或关于图案的位置误差的第三信息在光束扫描方向变化前后的图像上; 以及用于使计算装置执行上述处理的计算机程序。

10. 发明申请

US20130146763A1 Image Processing Device, Charged Particle Beam Device, Charged Particle Beam Device Adjustment Sample, and Manufacturing Method Thereof 有权
标题翻译：图像处理装置，带电粒子束装置，带电粒子束装置调整样品及其制造方法
公开(公告)号：US20130146763A1
公开(公告)日：2013-06-13
申请号：US13700096
申请日：2011-05-25
申请人： Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
发明人： Hiroki Kawada , Osamu Inoue , Miyako Matsui , Takahiro Kawasaki , Naoshi Itabashi , Takashi Takahama , Katsumi Setoguchi , Osamu Komuro
IPC分类号： G01B15/00 , G06K9/62
CPC分类号： G01B15/00 , G06K9/6201 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/2817 , H01J2237/2826 , Y10T428/24355
摘要： An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.
摘要翻译：本发明的目的是提供一种快速且精确地测量或评估视野中的失真和带电粒子束装置的图像处理装置。为了实现该目的，提出了一种图像处理装置等，其获取成像目标的第一区域的第一图像和位于与第一区域不同的位置的第二区域的第二图像，并且部分地与所述第一区域确定所述第二图像中的测量点和所述第二图像的与所述第一图像和所述第二图像的重叠区域中的多个位置的特定区域相对应的第二部分之间的距离。

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