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    • 1. 发明授权
    • Liquid application mechanism and inkjet recording apparatus
    • 液体施加机构和喷墨记录装置
    • US08210667B2
    • 2012-07-03
    • US12636065
    • 2009-12-11
    • Tsuyoshi SaekiTetsu HamanoJunichi Yoshikawa
    • Tsuyoshi SaekiTetsu HamanoJunichi Yoshikawa
    • B41J2/175B41J2/18
    • B41J2/18B41J2/175B41J29/38
    • A liquid application mechanism includes a liquid application unit that applies liquid to an application medium, and a liquid supply unit that supplies the liquid to the liquid application unit from a storage unit. The liquid supply unit recovers a portion of the liquid to the storage unit, the portion of the liquid being a portion that has been supplied to the liquid application unit and has not been applied to the application medium. At a bottom portion of the storage unit, a plurality of trap space sections separated from each other by ribs are formed. The trap space sections have continuous rectangular shapes, and are open upward in the direction opposite to gravity. The rib height of the trap space sections is equal to or greater than 3 mm, and the rib interval of the trap space sections is in the range from 2 mm to 10 mm.
    • 液体施加机构包括向施加介质施加液体的液体施加单元和从存储单元向液体施加单元供给液体的液体供应单元。 液体供应单元将一部分液体回收到存储单元,液体的一部分是已被供应到液体施加单元并且未被施加到施加介质的部分。 在存储单元的底部形成有通过肋彼此分离的多个陷阱空间部分。 陷阱空间部分具有连续的矩形形状,并且在与重力相反的方向上向上敞开。 陷阱空间部分的肋高度等于或大于3mm,陷阱空间部分的肋间距在2mm至10mm的范围内。
    • 2. 发明申请
    • LIQUID APPLICATION MECHANISM AND INKJET RECORDING APPARATUS
    • 液体应用机构和喷墨记录装置
    • US20100149289A1
    • 2010-06-17
    • US12636065
    • 2009-12-11
    • Tsuyoshi SaekiTetsu HamanoJunichi Yoshikawa
    • Tsuyoshi SaekiTetsu HamanoJunichi Yoshikawa
    • B41J2/175
    • B41J2/18B41J2/175B41J29/38
    • A liquid application mechanism includes a liquid application unit that applies liquid to an application medium, and a liquid supply unit that supplies the liquid to the liquid application unit from a storage unit. The liquid supply unit recovers a portion of the liquid to the storage unit, the portion of the liquid being a portion that has been supplied to the liquid application unit and has not been applied to the application medium. At a bottom portion of the storage unit, a plurality of trap space sections separated from each other by ribs are formed. The trap space sections have continuous rectangular shapes, and are open upward in the direction opposite to gravity. The rib height of the trap space sections is equal to or greater than 3 mm, and the rib interval of the trap space sections is in the range from 2 mm to 10 mm.
    • 液体施加机构包括向施加介质施加液体的液体施加单元和从存储单元向液体施加单元供给液体的液体供应单元。 液体供应单元将一部分液体回收到存储单元,液体的一部分是已被供应到液体施加单元并且未被施加到施加介质的部分。 在存储单元的底部形成有通过肋彼此分离的多个陷阱空间部分。 陷阱空间部分具有连续的矩形形状,并且在与重力相反的方向上向上敞开。 陷阱空间部分的肋高度等于或大于3mm,陷阱空间部分的肋间距在2mm至10mm的范围内。