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1. 发明授权

US06327506B1 Far infrared heating apparatus 失效
标题翻译：远红外加热装置
公开(公告)号：US06327506B1
公开(公告)日：2001-12-04
申请号：US09368235
申请日：1999-08-04
申请人： Teruaki Yogo , Akira Nakashima
发明人： Teruaki Yogo , Akira Nakashima
IPC分类号： A61F200
CPC分类号： A61N5/06 , A61N2005/0642
摘要： A far infrared heating methods to facilitate a user receiving continued comfortable thermal stimulation. The far infrared heating method, are provided with a temperature sensor for attachment to the object to be heated, and when the temperature detected by the temperature sensor has reached a predetermined maximum temperature, the radiation from the far infrared radiator is stopped. Furthermore, the user can switch to a timer control mechanism which causes the far infrared radiator to radiate intermittently during a predetermined time cycles.
摘要翻译：一种远红外加热方法，方便用户接受持续舒适的热刺激。远红外线加热方法设置有用于附着到待加热物体的温度传感器，当由温度传感器检测到的温度达到规定的最高温度时，来自远红外线辐射体的辐射停止。此外，用户可以切换到定时器控制机构，其使远红外辐射器在预定时间周期内间歇地辐射。

2. 发明授权

US08227028B2 Method for forming amorphous silica-based coating film with low dielectric constant and thus obtained amorphous silica-based coating film 有权
标题翻译：用于形成具有低介电常数的无定形二氧化硅基涂膜的方法，由此获得无定形二氧化硅基涂膜
公开(公告)号：US08227028B2
公开(公告)日：2012-07-24
申请号：US12310486
申请日：2007-07-11
申请人： Miki Egami , Akira Nakashima , Michio Komatsu
发明人： Miki Egami , Akira Nakashima , Michio Komatsu
IPC分类号： B05D3/02 , B05D3/04 , H01L29/00
CPC分类号： C09D1/00 , C09D4/00 , H01L21/316 , C08G77/04
摘要： A method of forming on a substrate an amorphous silica-based coating film having a low dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, which comprises, as a typical one, the steps of; (a) coating on the substrate a liquid composition containing hydrolysate of an organic silicon compound or compounds hydrolyzed in the presence of tetraalkylammonium hydroxide (TAAOH); (b) setting the substrate in a chamber and then drying a coating film formed on the substrate at a temperature in the range from 25 to 340° C.; (c) heating the coating film at a temperature in the range from 105 to 450° C. with introduction of a superheated steam having such a temperature into the chamber, and (d) curing the coating film at a temperature in the range from 350 to 450° C. with introduction of a nitrogen gas into the chamber.
摘要翻译：一种在基板上形成介电常数低于3.0或更低的无定形二氧化硅基涂层以及3.0GPa或更高的膜强度（杨氏模量）的方法，其中典型的步骤包括：（a）在基材上涂覆含有有机硅化合物的水解产物或在四烷基氢氧化铵（TAAOH））存在下水解的化合物的液体组合物; （b）将基板设置在室中，然后在25至340℃的温度范围内干燥形成在基板上的涂膜。（c）在105至450℃的温度范围内加热涂膜，并将具有这种温度的过热蒸汽引入室中，和（d）在350℃的温度下固化涂膜至450℃，同时将氮气引入室中。

3. 发明授权

US07600752B2 Sheet feeding device 有权
标题翻译：送纸装置
公开(公告)号：US07600752B2
公开(公告)日：2009-10-13
申请号：US11700878
申请日：2007-02-01
申请人： Akira Nakashima , Toyoaki Nanba
发明人： Akira Nakashima , Toyoaki Nanba
IPC分类号： B65H7/12
CPC分类号： B65H1/14 , B65H1/18 , B65H2301/42252 , B65H2801/06 , B65H2801/21
摘要： A sheet feeding device includes a stacking plate, a moving mechanism, a pick-up device, a detection plate, a detecting device, and a control section. The stacking plate is movably supported inside the sheet feeding device. The mechanism moves the stacking plate up and down. The pick-up device sends a top one of sheets stacked on the stacking plate, out in a direction from a sheet feeding position within a predetermined level range. The detection plate is mounted above the position and below a top inner surface of the sheet feeding device, with a lower surface thereof facing an object to be placed on the stacking plate. The detection plate is movably supported at a support portion provided at a predetermined location in an upper surface thereof. The detecting device detects upward and downward displacement of the detection plate. According to the detection result, the section controls operation of the mechanism.
摘要翻译：片材进给装置包括堆叠板，移动机构，拾取装置，检测板，检测装置和控制部。堆叠板可移动地支撑在片材进给装置的内部。该机构上下移动堆放板。拾取装置沿着从预定水平范围内的送纸位置的方向向上发送堆叠在堆叠板上的顶片。检测板安装在片材进给装置的顶部内表面上方的位置的下方，其下表面面向要放置在堆叠板上的物体。检测板可移动地支撑在设置在其上表面中的预定位置处的支撑部分处。检测装置检测检测板的向上和向下位移。根据检测结果，该部分控制机构的操作。

4. 发明授权

US07152857B2 Paper feed and output assembly, and image forming apparatus 有权
标题翻译：供纸和输出组件和成像设备
公开(公告)号：US07152857B2
公开(公告)日：2006-12-26
申请号：US10458639
申请日：2003-06-11
申请人： Yoshiaki Hiramoto , Akira Nakashima
发明人： Yoshiaki Hiramoto , Akira Nakashima
IPC分类号： B65H83/00 , B65H3/44 , B65H39/11
CPC分类号： B65H3/44 , B65H31/24 , B65H2405/3322 , B65H2408/113 , B65H2801/06
摘要： An image forming apparatus, which has sophisticated functions of feeding recording paper of various sizes selectively and of sorting printed paper, is reduced in size. The feed bin sorters, the output bin sorters, and the output tray are arranged in tiers. Pre-printed paper is supplied from any of the feed bin sorters, and printed paper is delivered to any of the output bin sorters or the output tray.
摘要翻译：具有选择性地进给各种尺寸的记录纸和分类打印纸的复杂功能的图像形成装置的尺寸减小。进料仓分拣机，出纸槽分拣机和出纸盘排列。任何进纸仓分拣机都提供预打印纸，并将打印纸送到任何出纸槽分拣机或出纸盘。

5. 发明申请

US20060084277A1 Method of forming amorphous silica-based coating film with low dielectric constant and thus obtained silica-based coating film 有权
标题翻译：形成具有低介电常数的无定形二氧化硅基涂膜的方法，由此得到二氧化硅基涂膜
公开(公告)号：US20060084277A1
公开(公告)日：2006-04-20
申请号：US10533238
申请日：2003-10-27
申请人： Akira Nakashima , Miki Egami , Michio Komatsu , Yoshihiro Nakata , Ei Yano , Katsumi Suzuki
发明人： Akira Nakashima , Miki Egami , Michio Komatsu , Yoshihiro Nakata , Ei Yano , Katsumi Suzuki
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： C09D183/02 , C08G77/08 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/316 , H01L21/31695
摘要： The present invention relates to an amorphous silica-based coating film with a low specific dielectric constant of 2.5 or below and the Young's modulus of 6.0 GPa or more and having excellent hydrophobic property, and to a method of forming the same. A liquid composition containing a silicon compound obtained by hydrolyzing tetraalkyl ortho silicate (TAOS) and specific alkoxysilane (AS) in the presence of tetraalkyl ammonium hydroxide (TAAOH) is prepared. The liquid composition is then applied on a substrate, heated and cured to obtain a coating film. The coating film obtained as described has a smooth surface and also has specific micropores therein.
摘要翻译：本发明涉及具有2.5以下的比介电常数低，6.0GPa以上的杨氏模量和疏水性优异的无定形二氧化硅系涂膜及其形成方法。制备含有在四烷基氢氧化铵（TAAOH）存在下水解四烷基原硅酸盐（TAOS）和特定烷氧基硅烷（AS））得到的硅化合物的液体组合物。然后将液体组合物涂布在基材上，加热固化，得到涂膜。如上所述获得的涂膜具有光滑表面，并且其中也具有特定的微孔。

6. 发明申请

US20050161935A1 Gaseous fuel vehicle rear structure 有权
标题翻译：气体燃料车辆后部结构
公开(公告)号：US20050161935A1
公开(公告)日：2005-07-28
申请号：US11041796
申请日：2005-01-21
申请人： Tohru Ono , Akira Nakashima , Yusuke Sogawa
发明人： Tohru Ono , Akira Nakashima , Yusuke Sogawa
IPC分类号： B60K15/07 , B62D21/15 , B60P3/22 , B62D21/00
CPC分类号： B60K15/07 , B60K2015/0638 , B62D21/152 , B62D21/155
摘要： A rear structure of a gaseous fuel vehicle in this invention includes right and left rear frame members, and a support frame mounted to the right and left rear frame members, on which support frame a gaseous fuel tank is mounted. Each of the right and left rear frame members is constituted by a curved member which includes a curved portion curving upward, and a front linear portion and a rear linear portion which are lower than the highest portion of the curved portion. The support frame is attached to the front linear portions and the rear linear portions. The front linear portions are attached to the rear end of a vehicle frame to provide a low floor in a passenger compartment. A load applied to the rear ends of the right and left rear frame members is dispersed into the right and left rear frame members and the support frame, and transmitted to the vehicle frame.
摘要翻译：本发明的气体燃料车辆的后部结构包括右后框架构件和左后框架构件，以及安装在右后框架构件和左后框架构件上的支撑框架，支撑框架安装在气体燃料箱上。右后框架构件和左后框架构件均由弯曲构件构成，该构件包括向上弯曲的弯曲部分和比弯曲部分的最高部分低的前直线部分和后直线部分。支撑框架附接到前线性部分和后线性部分。前线性部分附接到车架的后端以在乘客舱中提供低地板。施加到左右后框架构件的后端的负荷分散在左右后框架构件和支撑框架中，并被传递到车架。

7. 发明授权

US06652612B2 Silica particles for polishing and a polishing agent 有权
标题翻译：用于抛光的二氧化硅颗粒和抛光剂
公开(公告)号：US06652612B2
公开(公告)日：2003-11-25
申请号：US10291643
申请日：2002-11-12
申请人： Kazuhiro Nakayama , Akira Nakashima , Michio Komatsu
发明人： Kazuhiro Nakayama , Akira Nakashima , Michio Komatsu
IPC分类号： C01B3312
CPC分类号： B82Y30/00 , C01P2004/62 , C01P2004/64 , C01P2004/80 , C01P2006/90 , C09C1/3081 , C09K3/1409
摘要： Silica particles for polishing have a three-dimensional polycondensation structure with an average particle diameter in a range from 5 to 300 nm. The silica particles have residual alkoxy groups therein and a carbon content in a range from 0.5 to 5 weight % retained in the residual alkoxy groups.
摘要翻译：用于抛光的二氧化硅颗粒具有平均粒径在5至300nm范围内的三维缩聚结构。二氧化硅粒子中残留有烷氧基，碳残存在残留的烷氧基中的为0.5〜5质量％。

8. 发明授权

US06540221B2 Feeder of an image forming apparatus 有权
公开(公告)号：US06540221B2
公开(公告)日：2003-04-01
申请号：US09929314
申请日：2001-08-14
申请人： Akira Nakashima , Takashi Kubo , Yasumasa Morimoto
发明人： Akira Nakashima , Takashi Kubo , Yasumasa Morimoto
IPC分类号： B65H352
CPC分类号： B65H3/5223 , B65H2301/42324 , B65H2402/31 , B65H2402/32 , B65H2402/543 , B65H2405/1117
摘要： A movable sheet separating unit is pushed all the time by a lifting spring in a direction toward a feeding roller. In a non-feeding state, a sheet lifting plate is engaged with an operating fraction so that the movable sheet separating unit is held in a standby position where a separating pad is separated from the feeding roller. In a feeding state, the sheet lifting plate rises and disengages from the operating fraction so that the movable sheets separating unit moves to a pressing position where the separating pad is pressed against the feeding roller. In the pressing position, the separating pad is pressed against the feeding roller via a rotatable support base by a pressing spring, and is displaced by rotation in a direction away from the feeding roller in accordance with a thickness of a sheet S passing through between the separating pad and the feeding roller. Thus, durability of the separating pad can be improved, and a feeder suitable for a fixing type feeding cassette can be provided.

9. 发明授权

US06455154B1 Production of short fiber silica 有权
标题翻译：生产短纤维二氧化硅
公开(公告)号：US06455154B1
公开(公告)日：2002-09-24
申请号：US09560984
申请日：2000-04-28
申请人： Akira Nakashima , Kazuaki Inoue , Ryo Muraguchi , Michio Komatsu
发明人： Akira Nakashima , Kazuaki Inoue , Ryo Muraguchi , Michio Komatsu
IPC分类号： D02G300
CPC分类号： C08G77/02 , C09D183/02 , Y10T428/2904 , Y10T428/2907 , Y10T428/2918 , Y10T428/31663
摘要： A coating liquid for forming porous silica coating, comprising a product of reaction between a short fiber silica and a hydrolyzate of an alkoxysilane of the formula XnSi(OR)4-n or a halogenated silane of the formula XnSiX′4-n (in the formula, X represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; X′ represents a chlorine atom or a bromine atom; and n is an integer of 0 to 3). A coated substrate comprising a porous silica coating film formed from the above coating liquid for forming porous silica coating. A short fiber silica having an average diameter (D) of 10 to 30 nm, a length (L) of 30 to 100 nm and an aspect ratio (L/D) of 3 to 10. The above coating liquid for forming porous silica coating enables forming an insulating film which is excellent in adherence to a substrate surface, mechanical strength, chemical resistance and crack resistance and enables flattening irregularities of a substrate surface to a high degree. The coating film of the coated substrate has the above excellent properties.
摘要翻译：一种用于形成多孔二氧化硅涂层的涂布液，包括短纤维二氧化硅和式XnSi（OR）4-n的烷氧基硅烷的水解产物或式XnSiX'4-n的卤代硅烷（在式中，X表示氢原子，氟原子，碳原子数1〜8的烷基，芳基或乙烯基; R表示氢原子，碳原子数1〜8的烷基，芳基或乙烯基; X'表示氯原子或溴原子，n表示0〜3的整数。一种涂覆基材，包括由用于形成多孔二氧化硅涂层的上述涂布液形成的多孔二氧化硅涂膜。平均直径（D）为10〜30nm，长度（L）为30〜100nm，纵横比（L / D）为3〜10的短纤维二氧化硅。上述用于形成多孔二氧化硅涂层的涂布液能够形成对基板表面的粘附性优异的机械强度，耐化学性和抗裂纹性的绝缘膜，能够高度地使基板表面变得平坦化。涂布基材的涂膜具有上述优异的性能。

10. 发明授权

US6090446A Method of forming particle layer on substrate, method of planarizing irregular surface of substrate and particle-layer-formed substrate 失效
标题翻译：在基板上形成颗粒层的方法，平面化基板和颗粒层形成的基板的不规则表面的方法
公开(公告)号：US6090446A
公开(公告)日：2000-07-18
申请号：US624537
申请日：1996-04-12
申请人： Akira Nakashima , Michio Komatsu , Kenji Ohno , Kuniharu Teramoto , Kazuaki Inoue
发明人： Akira Nakashima , Michio Komatsu , Kenji Ohno , Kuniharu Teramoto , Kazuaki Inoue
IPC分类号： B01J19/00 , B05D1/20 , G11B5/84 , G11B7/26 , H01L21/768 , B05D5/00 , B05D1/18 , B32B3/00
CPC分类号： B05D1/20 , Y10T428/24372 , Y10T428/24893
摘要： The present invention provides a method of forming on a substrate a particle layer highly adherent to the substrate, which comprises the steps of spreading a dispersion (I) comprising a dispersing medium and, dispersed therein, solid particles being surface treated with a compound acting as a binder on a liquid (II) having a specific gravity higher than that of the dispersing medium, said liquid (II) being immiscible with the dispersing medium, subsequently removing the dispersing medium from the dispersion (I) to thereby arrange the solid particles on the liquid (II) so that a particle layer is formed on the liquid (II) and thereafter transferring the particle layer onto a substrate. Moreover, the present invention provides a method of planarizing an irregular surface of a substrate, which comprises transferring the above particle layer to an irregular surface of a substrate and removing parts of the particle layer formed on protrudent parts of the substrate to thereby planarize the irregular surface of the substrate and also provides a particle-layer-formed substrate comprising a substrate and, superimposed on a surface thereof, the particle layer obtained by each of the above methods.
摘要翻译： PCT No.PCT / JP95 / 01610 Sec。 371日期：1996年4月12日 102（e）日期1996年4月12日PCT提交1995年8月11日PCT公布。出版物WO96 / 04998 日本1996年2月22日本发明提供了在基材上形成与基材高度附着的颗粒层的方法，其包括以下步骤：将包含分散介质的分散体（I）铺展并分散在其中进行表面处理的固体颗粒在比重高于分散介质的液体（II）上作为粘合剂的化合物，所述液体（II）与分散介质不混溶，随后从分散体（I）中除去分散介质，由此将固体颗粒布置在液体（II）上，使得在液体（II）上形成颗粒层，然后将颗粒层转移到基材上。此外，本发明提供一种平面化基板的不规则表面的方法，其包括将上述颗粒层转移到基板的不规则表面，并除去形成在基板突出部分上的颗粒层的部分，从而平坦化不规则并且还提供了包含基材的颗粒层形成的基材，并且在其表面上叠加通过上述方法获得的颗粒层。

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