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    • 4. 发明申请
    • Pixel and method for pixel repair
    • 像素修复的像素和方法
    • US20050110915A1
    • 2005-05-26
    • US10971620
    • 2004-10-21
    • Seok-Lyul LeeTean-Sen JenMing-Tien Lin
    • Seok-Lyul LeeTean-Sen JenMing-Tien Lin
    • G02F1/1343G02F1/1362G02F1/136
    • G02F1/134363G02F1/136259G02F2001/136268
    • A pixel structure and repair method thereof. A through hole is formed in the common line. When the source/drain electrode of a thin film transistor is not electrically connected to a pixel electrode due to a polymer residue remaining in a contact hole, a first laser beam passes through the through hole to weld the source/drain electrode and the pixel electrode. The defective pixel can be thus repaired to display the original color. In addition, if the defective pixel fails due to a defective thin film transistor, the invention irradiates a second laser beam to sever the source/drain electrode such that the defective thin film transistor is not electrically connected to the pixel electrode. The defective pixel can be thus repaired to a dark point.
    • 像素结构及其修复方法。 公共线中形成有通孔。 当由于残留在接触孔中的聚合物残留物而使薄膜晶体管的源极/漏极电极没有电连接到像素电极时,第一激光束通过通孔来焊接源/漏电极和像素电极 。 因此可以修复缺陷像素以显示原始颜色。 此外,如果缺陷像素由于薄膜晶体管缺陷而失效,则本发明照射第二激光束来切断源/漏电极,使得有缺陷的薄膜晶体管不与像素电极电连接。 因此,有缺陷的像素可以被修复到暗点。
    • 5. 发明授权
    • Pixel and method for pixel repair
    • 像素修复的像素和方法
    • US07253851B2
    • 2007-08-07
    • US10971620
    • 2004-10-21
    • Seok-Lyul LeeTean-Sen JenMing-Tien Lin
    • Seok-Lyul LeeTean-Sen JenMing-Tien Lin
    • G02F1/1343G02F1/1333
    • G02F1/134363G02F1/136259G02F2001/136268
    • A pixel structure and repair method thereof. A through hole is formed in the common line. When the source/drain electrode of a thin film transistor is not electrically connected to a pixel electrode due to a polymer residue remaining in a contact hole, a first laser beam passes through the through hole to weld the source/drain electrode and the pixel electrode. The defective pixel can be thus repaired to display the original color. In addition, if the defective pixel fails due to a defective thin film transistor, the invention irradiates a second laser beam to sever the source/drain electrode such that the defective thin film transistor is not electrically connected to the pixel electrode. The defective pixel can be thus repaired to a dark point.
    • 像素结构及其修复方法。 公共线中形成有通孔。 当由于残留在接触孔中的聚合物残留物而使薄膜晶体管的源极/漏极电极没有电连接到像素电极时,第一激光束通过通孔来焊接源/漏电极和像素电极 。 因此可以修复缺陷像素以显示原始颜色。 此外,如果缺陷像素由于薄膜晶体管缺陷而失效,则本发明照射第二激光束来切断源/漏电极,使得有缺陷的薄膜晶体管不与像素电极电连接。 因此,有缺陷的像素可以被修复到暗点。
    • 7. 发明授权
    • Method of forming thin film transistors for use in a liquid crystal display
    • 一种形成用于液晶显示器的薄膜晶体管的方法
    • US06376288B1
    • 2002-04-23
    • US09862546
    • 2001-05-22
    • Tean-Sen JenTe-Cheng ChungMing-Tien Lin
    • Tean-Sen JenTe-Cheng ChungMing-Tien Lin
    • H01L2184
    • H01L27/1288G02F1/136227H01L27/1214H01L29/66765
    • A method of forming a TFT structure is performed on a glass substrate. A first metal layer deposited on the glass substrate is patterned with a first mask to form a gate line and a gate electrode. Next, a gate insulating layer, a first semiconductor layer and an etch-stop layer are successively formed, and backside exposure patterns the etch-stop layer. Thus, the remaining part of the etch-stop layer is disposed over the gate electrode and the gate line. Next, a second semiconductor layer and a second metal layer are successively formed, and then the second metal layer is patterned with a second mask to form a data line perpendicular to the gate line. Thereafter, the second semiconductor layer and the first semiconductor layer not covered by the second metal layer are removed. Next, a first protection layer formed on the exposed surface of the glass substrate is patterned with a third mask to form a first opening and a second opening, wherein the first opening is over the gate electrode and the second opening is over a predetermined drain electrode. Next, a conductive layer and a photoresist layer successively formed on the exposed surface of the glass substrate are patterned with a fourth mask to form a pattern of a predetermined pixel electrode. Finally, after removing the second metal layer and the second semiconductor layer underlying the first opening to expose the etch-stop layer, a second protection layer is formed on the first protection layer to fill the first opening.
    • 在玻璃基板上进行TFT结构的形成方法。 沉积在玻璃基板上的第一金属层用第一掩模图案化以形成栅极线和栅电极。 接下来,连续地形成栅极绝缘层,第一半导体层和蚀刻停止层,并且背面曝光对蚀刻停止层进行图案化。 因此,蚀刻停止层的剩余部分设置在栅电极和栅极线之上。 接下来,依次形成第二半导体层和第二金属层,然后用第二掩模对第二金属层进行构图,以形成垂直于栅极线的数据线。 此后,除去未被第二金属层覆盖的第二半导体层和第一半导体层。 接下来,用第三掩模对形成在玻璃基板的暴露表面上的第一保护层进行图案化,以形成第一开口和第二开口,其中第一开口在栅电极之上,第二开口在预定的漏极上 。 接下来,用第四掩模对连续形成在玻璃基板的暴露表面上的导电层和光致抗蚀剂层进行图案化以形成预定像素电极的图案。 最后,在去除第一开口下面的第二金属层和第二半导体层以露出蚀刻停止层之前,在第一保护层上形成第二保护层以填充第一开口。
    • 10. 发明授权
    • Method for eliminating flickers of liquid crystal display
    • 消除液晶显示器闪烁的方法
    • US07423620B2
    • 2008-09-09
    • US10964803
    • 2004-10-13
    • Tean-Sen JenMing-Tien LinDeuk-Su LeeTa-Wei Tseng
    • Tean-Sen JenMing-Tien LinDeuk-Su LeeTa-Wei Tseng
    • G09G3/36G02F1/1343
    • G02F1/136213G09G3/3648G09G2310/0232G09G2320/0223G09G2320/0247
    • The screen of a liquid crystal display is first divided into a compensation portion, a compensation transition portion and a non-compensation portion in a sequence arranged along the scanning line. Then storage capacitor areas of the pixels in the non-compensation portion are made equal, whereas the difference between the storage capacitor area of the pixel in the compensation portion and that in the non-compensation portion is set to one constant basic compensation area. Afterward, the average of the storage capacitor areas of the pixels on each data line in the compensation transition portion progressively varies along the scanning line, where the average is greater than or equal to any of the storage capacitor areas of the pixels in the non-compensation portion. The direction of the scanning line is designated as either the direction in which scanning signals are transmitted or the direction opposite thereto.
    • 液晶显示器的屏幕首先按沿扫描线排列的顺序分为补偿部分,补偿过渡部分和非补偿部分。 然后使非补偿部分中的像素的存储电容器区域相等,而补偿部分中的像素的存储电容器面积与非补偿部分中的像素的存储电容器面积之间的差被设置为一个恒定的基本补偿区域。 之后,补偿过渡部分中的每个数据线上的像素的存储电容器区域的平均值沿着扫描线逐渐变化,其中平均值大于或等于非易失性存储器中的像素的任何存储电容器区域, 补偿部分。 扫描线的方向被指定为扫描信号传输的方向或与其相反的方向。