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    • 1. 发明专利
    • Exchange-coupling film, magnetoresistance effect element, thin film magnetic head, head gimbal assembly, head arm assembly, and magnetic disk unit
    • 交换耦合膜,磁阻效应元件,薄膜磁头,头部组件,头臂组件和磁盘单元
    • JP2008042103A
    • 2008-02-21
    • JP2006217638
    • 2006-08-10
    • Tdk CorpTdk株式会社
    • UESUGI TAKUMIMIURA SATOSHI
    • H01L43/08G11B5/39H01F10/16H01F10/32
    • G01R33/093B82Y25/00G11B5/3906H01F10/16H01F10/3272H01L43/08
    • PROBLEM TO BE SOLVED: To enlarge an exchange engagement magnetic field at exchange-coupling film having an anti-ferromagnetic laminated layer, and a fixed layer which has a synthetic structure.
      SOLUTION: An exchange-coupling film 30 has an anti-ferromagnetic layer 22 and a fixed layer 23. The fixed layer 23 includes a first layer 311, a second layer 312, a third layer 313, a non-magnetism interlayer 32 and an inner layer 33, which are arranged sequentially in order of distance near to the anti-ferromagnetic layer 22. The first layer 311 consists of ferromagnetic material and has a face centered cubic structure. The second layer 312 contains cobalt of x atom%, and iron of (100-x) atom%, and is made of alloy, where x is larger than zero and not larger than 60, or is made of only iron. The third layer 313 contains cobalt of y atom%, and iron of (100-y) atom%, and is made of alloy, where y is from 65 to 80. The anti-ferromagnetism layer 22 and the first layer 311 is subjected to switched connection. The third layer 313 and inner layer 33 are combined in anti-ferromagnetism.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:扩大具有反铁磁层压层的交换耦合膜和具有合成结构的固定层的交换接合磁场。 解决方案:交换耦合膜30具有反铁磁层22和固定层23.固定层23包括第一层311,第二层312,第三层313,非磁性层间32 以及内层33,其按照靠近反铁磁层22的距离顺序排列。第一层311由铁磁材料构成,并具有面心立方结构。 第二层312包含x原子%的钴和(100-x)原子%的铁,并且由合金制成,其中x大于零且不大于60,或仅由铁制成。 第三层313包含y原子%的钴和(100-y)原子%的铁,并且由合金制成,其中y为65至80.抗铁磁层22和第一层311经受 切换连接。 第三层313和内层33以反铁磁性组合。 版权所有(C)2008,JPO&INPIT
    • 4. 发明专利
    • Magneto-resistance effect element, magnetic head, head suspension assembly and magnetic disk device
    • 磁阻效应元件,磁头,头悬挂组件和磁盘设备
    • JP2003298147A
    • 2003-10-17
    • JP2002099737
    • 2002-04-02
    • Tdk CorpTdk株式会社
    • KAGAMI TAKEROUESUGI TAKUMI
    • G01R33/09G11B5/39H01L43/08
    • PROBLEM TO BE SOLVED: To have a structure obtained by laminating a magnetic domain control film applying a bias magnetic field to a free layer on a magneto-resistance effect layer, and simultaneously to obtain, in the free layer, the bias magnetic field enough to suppress Barkhausen noises even if a valid track width is narrow. SOLUTION: An antiferromagnetic layer 23 laminated through a non-magnetic metal layer 24 on a free layer 25 applies an exchange coupling magnetic field to the free layer 25 in a track width direction as a bias magnetic field. The antiferromagnetic layer 23, non-magnetic metal layer 24 and free layer 25 are formed so as to range from a valid area of the magneto-resistance effect layer to an area expanding on both sides in the track width direction. COPYRIGHT: (C)2004,JPO
    • 要解决的问题:为了获得通过将施加偏磁场的磁畴控制膜层叠到磁阻效应层上的自由层而获得的结构,并且同时在自由层中获得偏磁 即使有效的轨道宽度窄,也足以抑制巴克豪森噪声。 解决方案:通过自由层25上的非磁性金属层24层叠的反铁磁层23将作为偏磁场的轨道宽度方向的自由层25的交换耦合磁场施加。 反铁磁层23,非磁性金属层24和自由层25形成为从磁阻效应层的有效区域到轨道宽度方向两侧扩大的区域的范围。 版权所有(C)2004,JPO
    • 5. 发明专利
    • Manufacturing process of magnetoresistive effect element
    • 磁电效应元件的制造工艺
    • JP2006173254A
    • 2006-06-29
    • JP2004361544
    • 2004-12-14
    • Tdk CorpTdk株式会社
    • UESUGI TAKUMIMIURA SATOSHITAKAHASHI NORIOKANETANI TAKAYASU
    • H01L43/12H01L43/08
    • PROBLEM TO BE SOLVED: To provide a manufacturing process of a magnetoresistive effect element in which an upper layer of a barrier layer can inherits a crystal structure of a lower layer.
      SOLUTION: At first, a pinned layer 55 is formed. A metal layer 53a becoming the precursor of an oxide barrier layer 53 is then formed on the pinned layer, and a free layer 57 is formed thereon. Subsequently, the free layer, the metal layer and the pinned layer are patterned into a desired element profile by etching, e.g. milling. Thereafter, the patterned element is heated in oxygen atmosphere and oxygen is diffused from the sidewall of the metal layer. Consequently, the metal layer as the precursor is oxidized and an oxide barrier layer is formed.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供阻挡层的上层可以承受下层的晶体结构的磁阻效应元件的制造工艺。 解决方案:首先,形成钉扎层55。 然后,在被钉扎层上形成成为氧化物阻挡层53的前体的金属层53a,在其上形成自由层57。 随后,通过蚀刻,例如,将自由层,金属层和被钉扎层图案化成所需的元件轮廓。 铣削。 此后,图案化元件在氧气氛中被加热,氧从金属层的侧壁扩散。 因此,作为前体的金属层被氧化并形成氧化物阻挡层。 版权所有(C)2006,JPO&NCIPI
    • 6. 发明专利
    • Magnetic transducer, thin-film magnetic head, and method of manufacturing same
    • 磁性传感器,薄膜磁头及其制造方法
    • JP2006114932A
    • 2006-04-27
    • JP2005379285
    • 2005-12-28
    • Tdk CorpTdk株式会社
    • SANO MASASHIARAKI SATORUTSUCHIYA YOSHIHIROUESUGI TAKUMI
    • H01L43/08G11B5/39H01L43/10H01L43/12
    • PROBLEM TO BE SOLVED: To provide a magnetic transducer and a thin-film magnetic head having good thermal stability and capable of obtaining a high exchange coupling magnetic field, and a method of manufacturing the same. SOLUTION: An MR element has a stack 20 having a stack structure comprising an under layer 21, a crystal-growth inhibitor layer 22, a first soft magnetic layer 23, a second soft magnetic layer 24, a nonmagnetic layer 25, a ferromagnetic layer 26, an antiferromagnetic layer 27, and a protective layer 28, which are stacked in sequence. The ferromagnetic layer 26 has an inner ferromagnetic layer 26a, a coupling layer 26b, and an outer ferromagnetic layer 26c, which are stacked in this order on the nonmagnetic layer 25. The crystal-growth inhibitor layer 22, by inhibiting crystal growth of the layer formed thereon, limits an average in-surface particle diameter of the inner ferromagnetic layer 26a to a range between 3 nm and 8 nm, so that an interface between the inner ferromagnetic layer 26a and the coupling layer 26b is flattened. COPYRIGHT: (C)2006,JPO&NCIPI
    • 解决的问题:提供具有良好的热稳定性并且能够获得高交换耦合磁场的磁换能器和薄膜磁头及其制造方法。 解决方案:MR元件具有堆叠结构20,该堆叠结构包括下层21,晶体生长抑制层22,第一软磁层23,第二软磁层24,非磁性层25, 铁磁层26,反铁磁层27和保护层28。 铁磁层26具有在非磁性层25上依次层叠的内侧铁磁性层26a,耦合层26b和外部铁磁层26c。晶体生长抑制层22通过抑制层的晶体生长 在其上形成的内侧铁磁层26a的平均表面内径粒径限制在3nm和8nm之间的范围内,使得内部铁磁层26a和耦合层26b之间的界面变平。 版权所有(C)2006,JPO&NCIPI
    • 7. 发明专利
    • Apparatus for determining predicted service life and apparatus for determining voltage of tmr element
    • 用于确定预期服务寿命的装置和用于确定TMR元件电压的装置
    • JP2006013298A
    • 2006-01-12
    • JP2004191063
    • 2004-06-29
    • Tdk CorpTdk株式会社
    • INAGE KENJIUESUGI TAKUMIKUWAJIMA TETSUYA
    • H01L43/08
    • PROBLEM TO BE SOLVED: To provide an apparatus or the like for determining a predicted service life predicting and determining the service life of a TMR element.
      SOLUTION: The apparatus 11 for determining a predicted service life includes: a voltage value receiver 15 for receiving an applied voltage value V to the TMR element; a constant value receiver 17 for receiving a first constant value A and a second constant value B, an exponentiating calculator 19 for calculating the power of a value of a base e of a natural logarithm; and a predicted service life determination part 13 for determining the predicted service life T of the TMR element through the use of the exponentiating calculator from the result obtained by the voltage value receiver and the constant value receiver according to the equation of T=A×exp (B/V).
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种用于确定预测和确定TMR元件的使用寿命的预测使用寿命的装置等。 解决方案:用于确定预期使用寿命的装置11包括:电压值接收器15,用于接收施加的电压值V到TMR元件; 用于接收第一常数值A和第二常数值B的常数值接收器17,用于计算自然对数的基底e的值的幂的指数运算器19; 以及预测使用寿命确定部13,用于根据由电压值接收器和常数值接收器得到的结果,通过使用指数运算器来确定TMR元件的预测使用寿命T,根据T = A×exp (B / V)。 版权所有(C)2006,JPO&NCIPI
    • 8. 发明专利
    • Magnetic storage cell and magnetic memory device using the same
    • 磁性存储单元和使用该磁性存储单元的磁存储器件
    • JP2005044950A
    • 2005-02-17
    • JP2003202136
    • 2003-07-25
    • Tdk CorpTdk株式会社
    • UESUGI TAKUMIKAGAMI TAKERO
    • G11C11/15G11C11/16H01L21/8246H01L27/105H01L43/08
    • G11C11/16
    • PROBLEM TO BE SOLVED: To eliminate the common mode noise in a read output by constituting a magnetic storage cell using two magnetoresistive effect elements, to efficiently perform magnetization inversion by reducing the loss of a current magnetic field at the time of writing information, to increase the capacity of the storage by suppressing the occupied area of the magnetic storage cell, and to facilitate the manufacturing by simplifying the configuration. SOLUTION: The storage cell 1 is provided with two TMR elements 2a, 2b, and a circular magnetization layer 4 commonly provided between the TMR elements 2a, 2b. The TMR elements 2a, 2b are disposed in a direction along each other's stacked surfaces. A writing bit line 5 and a writing word line 6 are commonly provided between the two TMR elements 2a, 2b. The magnetization layer 4 is disposed so as to have an axial direction along the stacked direction, and constituted so as to be pierced by the plurality of conductor lines. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了通过使用两个磁阻效应元件构成磁存储单元来消除读取输出中的共模噪声,通过减少写入信息时的电流磁场损失来有效地执行磁化反转 通过抑制磁存储单元的占用面积来增加存储容量,并且通过简化配置便于制造。 解决方案:存储单元1设置有两个TMR元件2a,2b和通常设置在TMR元件2a,2b之间的圆形磁化层4。 TMR元件2a,2b沿着彼此的堆叠表面的方向设置。 写入位线5和写入字线6通常设置在两个TMR元件2a,2b之间。 磁化层4被设置为具有沿堆叠方向的轴向,并且被构造成被多根导线刺穿。 版权所有(C)2005,JPO&NCIPI
    • 10. 发明专利
    • Method for fabricating tunnel magnetoresistive effect element, method for manufacturing thin film magnetic head and method for fabricating magnetic memory
    • 用于制造隧道磁阻效应元件的方法,制造薄膜磁头的方法和制造磁性存储器的方法
    • JP2007305768A
    • 2007-11-22
    • JP2006132400
    • 2006-05-11
    • Tdk CorpTdk株式会社
    • MIURA SATOSHIUESUGI TAKUMI
    • H01L43/12G11B5/39H01L21/8246H01L27/105H01L43/08H01L43/10
    • G11B5/3909B82Y10/00B82Y25/00B82Y40/00G01R33/093G01R33/098G11B5/3163G11B5/3912H01F10/3254H01F41/307
    • PROBLEM TO BE SOLVED: To provide a method for fabricating a TMR element in which a high quality TRM film including a barrier layer having a high MR ratio and little pin hole can be obtained stably, and to provide a method for manufacturing a thin film magnetic head and a method for fabricating a magnetic memory.
      SOLUTION: In the method for fabricating a TMR element having a tunnel barrier layer sandwiched between ferromagnetic layers, a process for making the tunnel barrier layer comprises a step for depositing a first metallic material film on the ferromagnetic layer, a step for oxidizing the first metallic material film thus deposited, a step for depositing a second metallic material film of the same metallic material as that of the first metallic material film or a metallic material principally comprising the first metallic material on the metal oxide film obtained by oxidation, and a step for oxidizing the second metallic material film thus deposited under oxygen pressure lower than that when the first metallic material film is oxidized.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种制造TMR元件的方法,其中可以稳定地获得包括具有高MR比和低针孔的阻挡层的高品质TRM膜,并且提供一种制造方法 薄膜磁头和制造磁记忆体的方法。 解决方案:在用于制造具有夹在铁磁层之间的隧道势垒层的TMR元件的方法中,制造隧道势垒层的工艺包括在铁磁层上沉积第一金属材料膜的步骤,用于氧化的步骤 由此沉积的第一金属材料膜,用于将与第一金属材料膜相同的金属材料的第二金属材料膜或主要包含第一金属材料的金属材料沉积在通过氧化获得的金属氧化物膜上的步骤,以及 在氧压低于第一金属膜被氧化时的氧化下氧化由此沉积的第二金属材料膜的步骤。 版权所有(C)2008,JPO&INPIT