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    • 8. 发明授权
    • Photoelectric conversion device and semiconductor device
    • 光电转换器件和半导体器件
    • US07772667B2
    • 2010-08-10
    • US11383645
    • 2006-05-16
    • Yuusuke SugawaraKazuo NishiTatsuya AraoDaiki YamadaHidekazu TakahashiNaoto Kusumoto
    • Yuusuke SugawaraKazuo NishiTatsuya AraoDaiki YamadaHidekazu TakahashiNaoto Kusumoto
    • H01L31/075
    • H01L31/1055H01L31/02162H01L31/022408H01L31/02325
    • The present invention provides a photoelectric conversion device in which a leakage current is suppressed. A photoelectric conversion device of the present invention comprises: a first electrode over a substrate; a photoelectric conversion layer including a first conductive layer having one conductivity, a second semiconductor layer, and a third semiconductor layer having a conductivity opposite to the one conductivity of the second semiconductor layer over the first electrode, wherein an end portion of the first electrode is covered with the first semiconductor layer; an insulating film, and a second electrode electrically connected to the third semiconductor film with the insulating film therebetween, over the insulating film, are formed over the third semiconductor film, and wherein a part of the second semiconductor layer and a part of the third semiconductor layer is removed in a region of the photoelectric conversion layer, which is not covered with the insulating film.
    • 本发明提供抑制漏电流的光电转换装置。 本发明的光电转换装置包括:基板上的第一电极; 光电转换层,包括具有一个导电性的第一导电层,第二半导体层和具有与第一电极上的第二半导体层的一个导电率相反的导电性的第三半导体层,其中第一电极的端部为 覆盖第一半导体层; 在所述第三半导体膜上形成绝缘膜和在所述绝缘膜上与所述第三半导体膜电绝缘膜电连接的第二电极,并且其中所述第二半导体层的一部分和所述第三半导体的一部分 在光电转换层的未被绝缘膜覆盖的区域中去除层。