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    • 1. 发明申请
    • SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    • 基板处理装置和基板处理方法
    • US20100175714A1
    • 2010-07-15
    • US12440400
    • 2007-09-05
    • Tatsuo NagaiHiroshi MoritaHiroaki TakahashiHiroaki UchidaToyohide Hayashi
    • Tatsuo NagaiHiroshi MoritaHiroaki TakahashiHiroaki UchidaToyohide Hayashi
    • B08B3/08
    • G03F7/423H01L21/6708
    • A substrate processing apparatus and a substrate processing method, with which a resist can be removed satisfactorily from the substrate and a processing solution used for removing the resist can be recycled, are provided. The substrate processing apparatus includes: a substrate holding means holding a substrate; a peroxosulfuric acid generating means generating a peroxosulfuric acid using sulfuric acid; a mixing means mixing the peroxosulfuric acid generated by the peroxosulfuric acid generating means and sulfuric acid of higher temperature and higher concentration than the sulfuric acid used in the peroxosulfuric acid generating means; and a discharging means discharging, toward the substrate held by the substrate holding means, the mixed solution of the peroxosulfuric acid and the sulfuric acid mixed by the mixing means as a processing solution for removing a resist from the substrate.
    • 提供了可以从衬底中令人满意地去除抗蚀剂的衬底处理设备和衬底处理方法,并且可以再循环用于除去抗蚀剂的处理溶液。 基板处理装置包括:保持基板的基板保持装置; 使用硫酸生成过氧硫酸的过氧硫酸生成装置; 将由过硫酸产生装置产生的过氧硫酸与比过硫酸产生装置中使用的硫酸更高和更高浓度的硫酸混合的混合装置; 以及排出装置将由所述基板保持装置保持的基板排出由所述混合装置混合的所述过硫酸和所述硫酸的混合溶液作为从所述基板除去抗蚀剂的处理溶液。
    • 2. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US08038799B2
    • 2011-10-18
    • US12440400
    • 2007-09-05
    • Tatsuo NagaiHiroshi MoritaHiroaki TakahashiHiroaki UchidaToyohide Hayashi
    • Tatsuo NagaiHiroshi MoritaHiroaki TakahashiHiroaki UchidaToyohide Hayashi
    • C23G1/02
    • G03F7/423H01L21/6708
    • A substrate processing apparatus and a substrate processing method, with which a resist can be removed satisfactorily from the substrate and a processing solution used for removing the resist can be recycled, are provided. The substrate processing apparatus includes: a substrate holding means holding a substrate; a peroxosulfuric acid generating means generating a peroxosulfuric acid using sulfuric acid; a mixing means mixing the peroxosulfuric acid generated by the peroxosulfuric acid generating means and sulfuric acid of higher temperature and higher concentration than the sulfuric acid used in the peroxosulfuric acid generating means; and a discharging means discharging, toward the substrate held by the substrate holding means, the mixed solution of the peroxosulfuric acid and the sulfuric acid mixed by the mixing means as a processing solution for removing a resist from the substrate.
    • 提供了可以从衬底中令人满意地去除抗蚀剂的衬底处理设备和衬底处理方法,并且可以再循环用于除去抗蚀剂的处理溶液。 基板处理装置包括:保持基板的基板保持装置; 使用硫酸生成过氧硫酸的过氧硫酸生成装置; 将由过硫酸产生装置产生的过氧硫酸与比过硫酸产生装置中使用的硫酸更高和更高浓度的硫酸混合的混合装置; 以及排出装置将由所述基板保持装置保持的基板排出由所述混合装置混合的所述过硫酸和所述硫酸的混合溶液作为从所述基板除去抗蚀剂的处理溶液。
    • 3. 发明申请
    • SUBSTRATE TREATING APPARATUS
    • 基板处理装置
    • US20080236639A1
    • 2008-10-02
    • US12053922
    • 2008-03-24
    • Masahiro KimuraHiroaki TakahashiTadashi MaegawaToyohide Hayashi
    • Masahiro KimuraHiroaki TakahashiTadashi MaegawaToyohide Hayashi
    • B08B3/08B08B3/12
    • H01L21/67086H01L21/67057
    • A substrate treating apparatus for treating substrates with a treating liquid includes a treating tank having an inner tank for storing the treating liquid, and an outer tank for collecting the treating liquid overflowing the inner tank. A supply pipe interconnects the inner tank and the outer tank for circulating the treating liquid. A first branch pipe is shunted from the supply pipe, and a separator is mounted on the first branch pipe for separating deionized water and a solvent in the treating liquid, and discharging the deionized water. A second branch pipe interconnects positions upstream and downstream of the separator, and a deionized water remover is mounted on the second branch pipe for adsorbing and removing deionized water from the treating liquid. An injection pipe is connected to the supply pipe for injecting deionized water in a position downstream of the separator. A solvent injector injects the solvent into the injection pipe. A controller carries out a deionized water cleaning process for supplying deionized water from the injection pipe and cleaning the substrates inside the cleaning tank with deionized water, then a replacing process for injecting the solvent from the solvent injector and replacing the deionized water with the solvent, a separating and removing process for switching to the first branch pipe and causing the separator to remove the deionized water from the treating liquid, and an adsorbing and removing process for switching to the second branch pipe and causing the deionized water remover to adsorb and remove the deionized water from the treating liquid.
    • 用处理液处理基板的基板处理装置包括具有用于储存处理液的内罐的处理槽和用于收集溢出内罐的处理液的外罐。 供给管将内罐和外罐相互连接,以使处理液循环。 第一分支管从供给管分流,分离器安装在第一支管上,用于分离处理液中的去离子水和溶剂,并排出去离子水。 第二分支管将分离器的上游和下游的位置相互连接,并且去离子水去除器安装在第二分支管上,用于从处理液中吸附和去除去离子水。 喷射管连接到供给管,用于在分离器的下游位置喷射去离子水。 溶剂注入器将溶剂注入注射管中。 控制器执行去离子水清洗工艺,用于从注射管中提供去离子水,并用去离子水清洗清洗槽内的基材,然后用溶剂注入器中的溶剂注入和用溶剂代替去离子水的替换过程, 用于切换到第一分支管并使分离器从处理液中除去去离子水的分离和去除过程,以及用于切换到第二分支管并使去离子水去除剂吸附和去除 来自处理液体的去离子水。
    • 9. 发明授权
    • Corrugated tube protector
    • 波纹管保护器
    • US08907215B2
    • 2014-12-09
    • US13468250
    • 2012-05-10
    • Suguru SakaiYoshihito ImaizumiHiroaki TakahashiRyouta Ando
    • Suguru SakaiYoshihito ImaizumiHiroaki TakahashiRyouta Ando
    • H02G3/16H02G3/14H02G3/08H02G3/06
    • H02G3/0691
    • A box-shape corrugated tube protector includes a side wall including an opening with a guide part at each both sides of the opening; a bottom wall including an insertion depression adapted to receive and support a corrugated tube, in communication with the opening; and a cover adapted to close the opening including a slide part slidably engaging with the guide part, and also including a projecting ridge and a rib inside, wherein the projecting ridge has an end face along a circumference of the corrugated tube, the rib has a projecting end face formed curved or sloped, continuous from the projecting ridge in a sliding direction of the cover, and the end face of the projecting ridge and the projecting end face of the rib smoothly intersects to each other.
    • 箱形波纹管保护器包括:侧壁,其包括在开口的每一侧具有引导部的开口; 底壁,其包括适于容纳并支撑与所述开口连通的波纹管的插入凹部; 以及适于闭合所述开口的盖,所述盖包括滑动部分,所述滑动部分与所述引导部分可滑动地接合,并且还包括突出的凸脊和肋部,其中所述突出突出部沿着所述波纹管的圆周具有端面,所述肋具有 突出端面沿着盖的滑动方向从突出脊形成为弯曲或倾斜的,并且突出脊的端面和肋的突出端面平滑地相交。