专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100316858A1 SYNTHETIC OPAQUE QUARTZ GLASS AND METHOD FOR PRODUCING THE SAME 审中-公开
标题翻译：合成OPAQUE QUARTZ玻璃及其制造方法
公开(公告)号：US20100316858A1
公开(公告)日：2010-12-16
申请号：US12515727
申请日：2007-12-04
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Katsuhide Orikasa , Makoto Tanaka
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Katsuhide Orikasa , Makoto Tanaka
IPC分类号： C03B20/00 , C03B8/04 , C03C11/00 , B32B17/00
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/23 , C03C3/06 , C03C2201/80 , Y10T428/24967 , Y10T428/249969
摘要： Provided is a method for producing a synthetic opaque quartz glass where flame processing can be performed in high purity with a simple way and even a large sized one can be produced, and the synthetic opaque quartz glass.A method for producing a synthetic opaque quartz glass which comprises the step of heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa at a temperature of from 1200° C. to 2000° C. The quartz glass porous body is prepared by depositing quartz glass particles which are produced by hydrolyzing a silicon compound with an oxyhydrogen flame.
摘要翻译：提供一种制造合成不透明石英玻璃的方法，其中可以以简单的方式进行高纯度的火焰加工，甚至可以制造大尺寸的方法，以及合成的不透明石英玻璃。一种合成不透明石英玻璃的制造方法，其特征在于，在1200℃〜2000℃的温度下，在0.15MPa〜1000MPa的压力下对石英玻璃多孔体进行加热燃烧的工序。通过沉积通过用氢氧焰水解硅化合物而制备的石英玻璃颗粒来制备体。

2. 发明授权

US5977000A High purity opaque silica glass 失效
标题翻译：高纯度不透明石英玻璃
公开(公告)号：US5977000A
公开(公告)日：1999-11-02
申请号：US977887
申请日：1997-11-25
申请人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
发明人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
IPC分类号： C03B5/02 , C03B5/08 , C03B19/09 , C03B20/00 , C03C3/06 , C03C4/08 , C03C11/00
CPC分类号： C03B5/08 , C03B19/09 , C03B20/00 , C03B5/021 , C03C3/06 , C03C2201/02 , C03C2201/80 , Y10S501/904 , Y10S501/905 , Y10T428/249969
摘要： Opaque silica glass having a density of 2.0 to 2.18 g/cm.sup.3, sodium and potassium elements concentrations in the silica glass of each 0.5 ppm or less and an OH group concentration of 30 ppm or less, and containing bubbles which are independent bubbles having the following physical values: a bubble diameter of 300 .mu.m or less, and a bubble density of 100,000 to 1,000,000 bubbles/cm.sup.3, and a production process for opaque silica glass, including: filling quartz raw material grain having a particle size of 10 to 350 .mu.m in a heat resistant mold, heating it in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50 to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-raising speed not exceeding 50.degree. C./minute, then, slowly heating it up to a temperature higher by 10 to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and cooling after maintaining at the above temperature.
摘要翻译：密度为2.0〜2.18g / cm 3的不透明二氧化硅玻璃，二氧化硅玻璃中的钠和钾元素浓度为0.5ppm以下，OH基浓度为30ppm以下，并且含有具有以下的独立气泡的气泡物理值：气泡直径为300μm以下，气泡密度为100,000〜1,000,000个气泡/ cm 3，以及不透明石英玻璃的制造方法，其特征在于，填充粒径为10〜350μm的石英原料粒子在耐热模具中，将其在非氧化性气氛中从室温加热到低于50-150℃的温度，而不是以不升温速度将上述原料颗粒熔化的温度超过50℃/分钟，然后缓慢加热至高于10℃至80℃的温度，高于石英原料颗粒以10℃/分钟或更低的速度熔化的温度，并保持冷却在上述温度下。

3. 发明授权

US07365037B2 Quartz glass having excellent resistance against plasma corrosion and method for producing the same 有权
标题翻译：具有优异的等离子体腐蚀性的石英玻璃及其制造方法
公开(公告)号：US07365037B2
公开(公告)日：2008-04-29
申请号：US11076944
申请日：2005-03-11
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
IPC分类号： C03C3/04 , C03C3/095 , C03B20/00
CPC分类号： C03C3/06 , C03B19/01 , C03B19/06 , C03B19/066 , C03B19/09 , C03B19/1438 , C03B19/1453 , C03B20/00 , C03B2201/36 , C03C2201/36 , C03C2203/10 , C03C2203/22 , C03C2203/40
摘要： As a jig material to use under plasma reaction for producing semiconductors the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
摘要翻译：作为用于制造半导体的等离子体反应的夹具材料，本发明提供了具有耐等离子体腐蚀性，特别是耐氟基等离子体气体的耐腐蚀性的石英玻璃，其可以在不引起硅晶片异常的情况下使用; 本发明还提供一种石英玻璃夹具及其制造方法。含有0.1〜20重量％的两种以上金属元素的石英玻璃，所述金属元素包含选自元素周期表第3B族的至少一种金属元素作为第一金属元素和至少一种金属元素选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf，镧系元素和锕系元素作为第二金属元素，条件是每个第二金属元素的最大浓度为1.0 wt％以下。

4. 发明授权

US07661277B2 Quartz glass having excellent resistance against plasma corrosion and method for producing the same 有权
标题翻译：具有优异的等离子体腐蚀性的石英玻璃及其制造方法
公开(公告)号：US07661277B2
公开(公告)日：2010-02-16
申请号：US12003353
申请日：2007-12-21
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
IPC分类号： C03B19/00 , C03B20/00 , C03C3/00 , C03C3/06 , B32B17/06 , B32B18/00
CPC分类号： C03C3/06 , C03B19/01 , C03B19/06 , C03B19/066 , C03B19/09 , C03B19/1438 , C03B19/1453 , C03B20/00 , C03B2201/36 , C03C2201/36 , C03C2203/10 , C03C2203/22 , C03C2203/40
摘要： As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
摘要翻译：作为制造半导体的等离子体反应中使用的夹具材料，本发明提供一种具有耐等离子体腐蚀性，特别是耐氟等离子体气体的耐腐蚀性的石英玻璃，可以在不引起硅晶片异常的情况下使用; 本发明还提供一种石英玻璃夹具及其制造方法。含有0.1〜20重量％的两种以上金属元素的石英玻璃，所述金属元素包含选自元素周期表第3B族的至少一种金属元素作为第一金属元素和至少一种金属元素选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf，镧系元素和锕系元素作为第二金属元素，条件是每个第二金属元素的最大浓度为1.0 wt％以下。

5. 发明申请

US20090098370A1 BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER 审中-公开
标题翻译：黑色合成石英玻璃与透明层
公开(公告)号：US20090098370A1
公开(公告)日：2009-04-16
申请号：US12249616
申请日：2008-10-10
申请人： Tatsuhiro Sato , Nobumasa Yoshida
发明人： Tatsuhiro Sato , Nobumasa Yoshida
IPC分类号： B32B17/06 , C03C15/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03C4/02 , C03C4/082 , C03C23/008 , C03C2201/02 , C03C2201/26 , C03C2203/54 , Y10T428/261
摘要： To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.
摘要翻译：为了提供具有透明层的黑色合成石英玻璃，其在远红外区域具有高发射率，具有优异的遮光性能，在金属杂质方面保持与合成石英玻璃相同的纯度，具有高温粘度与天然石英玻璃相当的特性，可进行焊接等高温加工，不会从表面释放碳; 以及其生产方法。含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应，反应开始后，达到一定程度的真空度超过10mmHg（1343Pa），在1200℃〜2000℃的温度下进行加热，生成紧凑的玻璃体。

6. 发明申请

US20080113174A1 Quartz glass having excellent resistance against plasma corrosion and method for producing the same 有权
标题翻译：具有优异的等离子体腐蚀性的石英玻璃及其制造方法
公开(公告)号：US20080113174A1
公开(公告)日：2008-05-15
申请号：US12003353
申请日：2007-12-21
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
IPC分类号： C03B19/00 , B32B18/00 , C03C3/06
CPC分类号： C03C3/06 , C03B19/01 , C03B19/06 , C03B19/066 , C03B19/09 , C03B19/1438 , C03B19/1453 , C03B20/00 , C03B2201/36 , C03C2201/36 , C03C2203/10 , C03C2203/22 , C03C2203/40
摘要： As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
摘要翻译：作为制造半导体的等离子体反应中使用的夹具材料，本发明提供一种具有耐等离子体腐蚀性，特别是耐氟等离子体气体的耐腐蚀性的石英玻璃，可以在不引起硅晶片异常的情况下使用; 本发明还提供一种石英玻璃夹具及其制造方法。含有0.1〜20重量％的两种以上金属元素的石英玻璃，所述金属元素包含选自元素周期表第3B族的至少一种金属元素作为第一金属元素和至少一种金属元素选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf，镧系元素和锕系元素作为第二金属元素，条件是每个第二金属元素的最大浓度为1.0 wt％以下。

7. 发明申请

US20060059948A1 Method for producing synthetic quartz glass and synthetic quartz glass article 有权
标题翻译：生产合成石英玻璃和合成石英玻璃制品的方法
公开(公告)号：US20060059948A1
公开(公告)日：2006-03-23
申请号：US10535935
申请日：2003-11-28
申请人： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
发明人： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
IPC分类号： C03C25/64
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
摘要： First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
摘要翻译：首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形，特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外吸收率和排放率，对防止碱金属的扩散具有极高的效果。该方法是生产具有245nm的吸收系数为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，其次是烘烤，从而形成致密的玻璃体。

8. 发明申请

US20050272588A1 Quartz glass having excellent resistance against plasma corrosion and method for producing the same 有权
标题翻译：具有优异的等离子体腐蚀性的石英玻璃及其制造方法
公开(公告)号：US20050272588A1
公开(公告)日：2005-12-08
申请号：US11076944
申请日：2005-03-11
申请人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
发明人： Tatsuhiro Sato , Nobumasa Yoshida , Mamoru Endo
IPC分类号： C03B19/01 , C03B19/06 , C03B19/09 , C03B19/14 , C03C3/06
CPC分类号： C03C3/06 , C03B19/01 , C03B19/06 , C03B19/066 , C03B19/09 , C03B19/1438 , C03B19/1453 , C03B20/00 , C03B2201/36 , C03C2201/36 , C03C2203/10 , C03C2203/22 , C03C2203/40
摘要： As a jig material to use under plasma reaction for producing semiconductors the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
摘要翻译：作为用于制造半导体的等离子体反应的夹具材料，本发明提供了具有耐等离子体腐蚀性，特别是耐氟基等离子体气体的耐腐蚀性的石英玻璃，其可以在不引起硅晶片异常的情况下使用; 本发明还提供一种石英玻璃夹具及其制造方法。含有0.1〜20重量％的两种以上金属元素的石英玻璃，所述金属元素包含选自元素周期表第3B族的至少一种金属元素作为第一金属元素和至少一种金属元素选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf，镧系元素和锕系元素作为第二金属元素，条件是每个第二金属元素的最大浓度为1.0 wt％以下。

9. 发明授权

US5772714A Process for producing opaque silica glass 失效
标题翻译：生产不透明石英玻璃的方法
公开(公告)号：US5772714A
公开(公告)日：1998-06-30
申请号：US682962
申请日：1996-07-18
申请人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
发明人： Tatsuhiro Sato , Akira Fujinoki , Kyoichi Inaki , Nobumasa Yoshida , Tohru Yokota
IPC分类号： C03B5/02 , C03B5/08 , C03B19/09 , C03B20/00 , C03C3/06
CPC分类号： C03B5/08 , C03B19/09 , C03B20/00 , C03B5/021 , C03C3/06 , C03C2201/02 , C03C2201/80 , Y10S501/904 , Y10S501/905 , Y10T428/249969
摘要： A process for producing opaque silica glass in which a quartz raw material grain having a particle size of 10 to 350 .mu.m is filled into a heat resistant mold, the quartz raw material grain is heated in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50.degree. to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-increase speed not exceeding 50.degree. C./minute, then, slowly heated up to a temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and the heated quartz raw material grain is further maintained at the temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted, followed by cooling down to the room temperature. Especially, in the case of producing a large scale opaque silica glass block, a quartz raw material grain filled into a heat-resistant mold is heated by a belt-like heating source located perpendicularly to a trunk of a filling layer of the quartz raw material grain so as to form a moving heating zone in the filling layer and the heating zone is successively moved either upwardly starting at the lower end portion of the filling layer or downwardly starting at the upper end portion thereof in a non-oxidizing atomosphere.
摘要翻译：将具有10〜350μm粒径的石英原料颗粒填充到耐热性模具中的不透明石英玻璃的制造方法，将石英原料颗粒从室温下在非氧化性气氛中加热比上述原料颗粒以不超过50℃/分钟的升温速度熔化的温度低于50℃至150℃的温度，然后缓慢加热至高于10℃的温度相对于石英原料粒子以10℃/分钟以下的速度熔融的温度为80℃以下，加热的石英原料粒子进一步保持在10〜80℃ 比石英原料晶粒熔化的温度高，然后冷却至室温。特别是，在生产大型不透明石英玻璃块的情况下，填充在耐热性模具中的石英原料颗粒通过垂直于石英原料填充层的树干的带状加热源加热从而在填充层中形成移动的加热区域，并且加热区域从填充层的下端部开始向上移动，或者从非氧化性空气的上端向下移动。

10. 发明授权

US07841211B2 Production process of synthetic quartz glass 有权
标题翻译：人造石英玻璃的生产工艺
公开(公告)号：US07841211B2
公开(公告)日：2010-11-30
申请号：US10535935
申请日：2003-11-28
申请人： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
发明人： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
IPC分类号： C03B20/00 , C03B19/14
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
摘要： First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
摘要翻译：首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形，特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外吸收率和排放率，对防止碱金属的扩散具有极高的效果。该方法是制造吸收系数在245nm为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，然后进行烧成，由此形成致密的玻璃身体。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式