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1. 发明授权

US06189482B1 High temperature, high flow rate chemical vapor deposition apparatus and related methods 失效
标题翻译：高温，高流量化学气相沉积装置及相关方法
公开(公告)号：US06189482B1
公开(公告)日：2001-02-20
申请号：US08799415
申请日：1997-02-12
申请人： Jun Zhao , Lee Luo , Xiao Liang Jin , Jia-Xiang Wang , Talex Sajoto , Stefan Wolff , Leonid Selyutin , Ashok Sinha
发明人： Jun Zhao , Lee Luo , Xiao Liang Jin , Jia-Xiang Wang , Talex Sajoto , Stefan Wolff , Leonid Selyutin , Ashok Sinha
IPC分类号： C23C1600
CPC分类号： H01J37/3244 , C23C16/4401 , C23C16/4412 , C23C16/4586 , C23C16/52 , H01J37/32082 , H01J2237/2001 , H01J2237/3321
摘要： The present invention provides systems, methods and apparatus for depositing titanium films at rates up to 200 Å/minute on semiconductor substrates from a titanium tetrachloride source. In accordance with an embodiment of the invention, a ceramic heater assembly with an integrated RF plane for bottom powered RF capability allows PECVD deposition at a temperature of at least 400° C. for more efficient plasma treatment. A thermal choke isolates the heater from its support shaft, reducing the thermal gradient across the heater to reduce the risk of breakage and improving temperature uniformity of the heater. A deposition system incorporates a flow restrictor ring and other features that allow a 15 liters/minute flow rate through the chamber with minimal backside deposition and minimized deposition on the bottom of the chamber, thereby reducing the frequency of chamber cleanings, and reducing clean time and seasoning. Deposition and clean processes are also further embodiments of the present invention.
摘要翻译：本发明提供了用于从四氯化钛源在半导体衬底上以200埃/分钟的速率沉积钛膜的系统，方法和装置。根据本发明的实施例，具有用于底部供电RF能力的集成射频平面的陶瓷加热器组件允许在至少400℃的温度下进行PECVD沉积以用于更有效的等离子体处理。热扼流器将加热器与其支撑轴隔离，减少了加热器两端的热梯度，以减少加热器断裂的危险并改善加热器的温度均匀性。沉积系统包括限流器环和其它特征，其允许15升/分钟的流速通过室，具有最小的背侧沉积并且最小化在室底部上的沉积，从而降低室清洁的频率，并且减少清洁时间和调味料。沉积和清洁过程也是本发明的进一步的实施方案。

2. 发明授权

US6035101A High temperature multi-layered alloy heater assembly and related methods 失效
标题翻译：高温多层合金加热器总成及相关方法
公开(公告)号：US6035101A
公开(公告)日：2000-03-07
申请号：US56703
申请日：1998-03-26
申请人： Talex Sajoto , Leonid Selyutin , Jun Zhao , Stefan Wolff
发明人： Talex Sajoto , Leonid Selyutin , Jun Zhao , Stefan Wolff
IPC分类号： H05B3/68 , C23C16/458 , C23C16/46 , C23C16/509 , H01L21/00 , H01L21/285 , H01L21/31 , C23C16/00 , F27B5/14 , F28F7/00 , H01L21/68
CPC分类号： C23C16/463 , C23C16/4586 , C23C16/46 , C23C16/5096 , H01L21/67109
摘要： The present invention provides systems, methods and apparatus for heating substrates in a processing chamber to temperatures up to at least 700.degree. C. In accordance with an embodiment of the invention a heater assembly with an inner core of high thermal conductivity is encased in a shell of lower thermal conductivity, creating a nearly isothermal interface between the core and shell. The inner core is brazed to the shell, promoting thermal transfer, and acts as a thermal short between opposing surfaces of the shell. The heater assembly is designed to minimize thermal stresses arising from the difference in the thermal expansion coefficients of the various components of the multi-layered heater assembly. In one embodiment of the invention, two independently-powered heating elements are arranged concentrically to each other to create a dual zone heater. A thermal gap in the inner core between the inner and outer heating elements de-couples the zones and provides a more controllable temperature profile at the surface of the heater, including excellent temperature uniformity. In one embodiment, an RF isolator is placed between a heater and a support shaft, allowing the heater to be powered as an electrode in a plasma process.
摘要翻译：本发明提供了用于将处理室中的衬底加热至至少700℃的温度的系统，方法和设备。根据本发明的实施例，具有高导热性的内芯的加热器组件被包封在壳体具有较低的导热性，从而在芯和壳之间产生接近等温的界面。内芯被钎焊到壳体上，促进热传递，并且作为壳体的相对表面之间的热短路。加热器组件被设计成最小化由多层加热器组件的各种部件的热膨胀系数的差异引起的热应力。在本发明的一个实施例中，两个独立供电的加热元件彼此同心地布置以产生双区加热器。内部加热元件和外部加热元件之间的内部芯片的热间隙使这些区域脱耦并在加热器表面提供更可控的温度分布，包括优异的温度均匀性。在一个实施例中，RF隔离器被放置在加热器和支撑轴之间，允许加热器在等离子体工艺中作为电极供电。

3. 发明授权

US5994678A Apparatus for ceramic pedestal and metal shaft assembly 失效
标题翻译：陶瓷基座和金属轴组件的装置
公开(公告)号：US5994678A
公开(公告)日：1999-11-30
申请号：US798004
申请日：1997-02-12
申请人： Jun Zhao , Talex Sajoto , Leonid Selyutin , Charles Dornfest , Stefan Wolff , Lee Luo , Eller Juco
发明人： Jun Zhao , Talex Sajoto , Leonid Selyutin , Charles Dornfest , Stefan Wolff , Lee Luo , Eller Juco
IPC分类号： C23C16/458 , C23C16/46 , C23C16/509 , H05B3/06 , C23C16/00
CPC分类号： C23C16/463 , C23C16/4586 , C23C16/46 , C23C16/5096
摘要： The present invention provides systems, methods and apparatus for depositing titanium films at rates up to 200 .ANG./minute on semiconductor substrates from a titanium tetrachloride source. In accordance with an embodiment of the invention, a ceramic heater assembly with an integrated RF plane for bottom powered RF capability allows PECVD deposition at a temperature of at least 400.degree. C. for more efficient plasma treatment. A thermal choke isolates the heater from its support shaft, reducing the thermal gradient across the heater to reduce the risk of breakage and improving temperature uniformity of the heater. A deposition system incorporates a flow restrictor ring and other features that allow a 15 liters/minute flow rate through the chamber with minimal backside deposition and minimized deposition on the bottom of the chamber, thereby reducing the frequency of chamber cleanings, and reducing clean time and seasoning. Deposition and clean processes are also further embodiments of the present invention.
摘要翻译：本发明提供了用于从四氯化钛源在半导体衬底上以高达200安培/分钟的速率沉积钛膜的系统，方法和装置。根据本发明的实施例，具有用于底部供电RF能力的集成射频平面的陶瓷加热器组件允许在至少400℃的温度下进行PECVD沉积以用于更有效的等离子体处理。热扼流器将加热器与其支撑轴隔离，减少了加热器两端的热梯度，以减少加热器断裂的危险并改善加热器的温度均匀性。沉积系统包括限流器环和其它特征，其允许通过腔室的15升/分钟的流速具有最小的背侧沉积并且最小化在室的底部上的沉积，从而降低室清洁的频率，并且减少清洁时间和调味料。沉积和清洁过程也是本发明的进一步的实施方案。

4. 发明授权

US5968379A High temperature ceramic heater assembly with RF capability and related methods 失效
标题翻译：具有射频功能的高温陶瓷加热器组件及相关方法
公开(公告)号：US5968379A
公开(公告)日：1999-10-19
申请号：US800096
申请日：1997-02-12
申请人： Jun Zhao , Charles Dornfest , Talex Sajoto , Leonid Selyutin , Stefan Wolff , Lee Luo , Harold Mortensen , Richard Palicka
发明人： Jun Zhao , Charles Dornfest , Talex Sajoto , Leonid Selyutin , Stefan Wolff , Lee Luo , Harold Mortensen , Richard Palicka
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , C23C16/509 , C23C16/52 , H01L21/00 , H01L21/687 , B23K10/00
CPC分类号： C23C16/4586 , C23C16/45565 , C23C16/5096 , C23C16/52 , H01L21/67103 , H01L21/68785 , H01L21/68792
摘要： The present invention provides systems, methods and apparatus for depositing titanium films at rates up to 200 .ANG./minute on semiconductor substrates from a titanium tetrachloride source. In accordance with an embodiment of the invention, a ceramic heater assembly with an integrated RF plane for bottom powered RF capability allows PECVD deposition at a temperature of at least 400.degree. C. for more efficient plasma treatment. A thermal choke isolates the heater from its support shaft, reducing the thermal gradient across the heater to reduce the risk of breakage and improving temperature uniformity of the heater. A deposition system incorporates a flow restrictor ring and other features that allow a 15 liters/minute flow rate through the chamber with minimal backside deposition and minimized deposition on the bottom of the chamber, thereby reducing the frequency of chamber cleanings, and reducing clean time and seasoning. Deposition and clean processes are also further embodiments of the present invention.
摘要翻译：本发明提供了用于从四氯化钛源在半导体衬底上以高达200安培/分钟的速率沉积钛膜的系统，方法和装置。根据本发明的实施例，具有用于底部供电RF能力的集成射频平面的陶瓷加热器组件允许在至少400℃的温度下进行PECVD沉积以用于更有效的等离子体处理。热扼流器将加热器与其支撑轴隔离，减少了加热器两端的热梯度，以减少加热器断裂的危险并改善加热器的温度均匀性。沉积系统包括限流器环和其它特征，其允许15升/分钟的流速通过室，具有最小的背侧沉积并且最小化在室底部上的沉积，从而降低室清洁的频率，并且减少清洁时间和调味料。沉积和清洁过程也是本发明的进一步的实施方案。

5. 发明授权

US5846332A Thermally floating pedestal collar in a chemical vapor deposition chamber 失效
标题翻译：在化学气相沉积室中的热浮底座
公开(公告)号：US5846332A
公开(公告)日：1998-12-08
申请号：US680724
申请日：1996-07-12
申请人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
发明人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
IPC分类号： C23C16/44 , C23C16/448 , C23C16/455 , C23C16/458 , C23C16/46 , C23C16/509 , C23C16/54 , H01J37/32 , H01L21/205 , H01L21/285 , C23C16/00
CPC分类号： C23C16/45508 , C23C16/4411 , C23C16/4412 , C23C16/4585 , C23C16/46 , C23C16/5096 , C23C16/54 , H01J37/3244 , H01J37/32477 , H01J37/32834 , H01J2237/2001
摘要： A substrate processing chamber, particularly a chemical vapor deposition (CVD) chamber used both for thermal deposition of a conductive material and a subsequently performed plasma process. The invention reduces thermal deposition of the conductive material on peripheral portions of the pedestal supporting a wafer and in a pumping channel exhausting the chamber. A peripheral ring placed on the pedestal, preferably also used to center the wafer, is thermally isolated from the pedestal so that its temperature is kept substantially lower than that of the wafer. Despite its thermal isolation, the peripheral ring is electrically connected to the pedestal to prevent arcing. The pumping channel is lined with various elements, some of which are electrically floating and which are designed so that conductive material deposited on these elements do not deleteriously affect a plasma generated for processing the wafer.
摘要翻译：衬底处理室，特别是用于导电材料的热沉积和随后执行的等离子体工艺的化学气相沉积（CVD）室。本发明减少了导电材料在支撑晶片的基座周边部分和排出腔室的泵送通道中的热沉积。放置在基座上的优选也用于使晶片居中的外围环与基座热隔离，使得其温度保持基本上低于晶片的温度。尽管其热隔离，外围环电连接到基座以防止电弧。泵浦通道衬有各种元件，其中一些元件是电浮动的，并且被设计成使得沉积在这些元件上的导电材料不会有害地影响用于处理晶片的等离子体。

6. 发明授权

US5983906A Methods and apparatus for a cleaning process in a high temperature, corrosive, plasma environment 失效
标题翻译：在高温，腐蚀性等离子体环境中清洗过程的方法和装置
公开(公告)号：US5983906A
公开(公告)日：1999-11-16
申请号：US918665
申请日：1997-08-22
申请人： Jun Zhao , Lee Luo , Jia-Xiang Wang , Xiao Liang Jin , Stefan Wolff , Talex Sajoto , Mei Chang , Paul Frederick Smith
发明人： Jun Zhao , Lee Luo , Jia-Xiang Wang , Xiao Liang Jin , Stefan Wolff , Talex Sajoto , Mei Chang , Paul Frederick Smith
IPC分类号： C23C14/00 , C23C16/44 , C23C16/458 , C23C16/52 , H01J37/32 , H01L21/203 , H01L21/205 , H01L21/285 , H01L21/31 , C23F1/00
CPC分类号： H01J37/3244 , C23C16/4401 , C23C16/4405 , C23C16/4412 , C23C16/4586 , C23C16/52 , H01J37/32082 , H01J2237/2001 , H01J2237/3321 , Y10S438/905
摘要： The present invention provides systems, methods and apparatus for depositing titanium films at rates up to 200 .ANG./minute on semiconductor substrates from a titanium tetrachloride source. In accordance with an embodiment of the invention, a ceramic heater assembly with an integrated RF plane for bottom powered RF capability allows PECVD deposition at a temperature of at least 400.degree. C. for more efficient plasma treatment. A thermal choke isolates the heater from its support shaft, reducing the thermal gradient across the heater to reduce the risk of breakage and improving temperature uniformity of the heater. A deposition system incorporates a flow restrictor ring and other features that allow a 15 liters/minute flow rate through the chamber with minimal backside deposition and minimized deposition on the bottom of the chamber, thereby reducing the frequency of chamber cleanings, and reducing clean time and seasoning. Deposition and clean processes are also further embodiments of the present invention.
摘要翻译：本发明提供了用于从四氯化钛源在半导体衬底上以高达200安培/分钟的速率沉积钛膜的系统，方法和装置。根据本发明的实施例，具有用于底部供电RF能力的集成射频平面的陶瓷加热器组件允许在至少400℃的温度下进行PECVD沉积以用于更有效的等离子体处理。热扼流器将加热器与其支撑轴隔离，减少了加热器两端的热梯度，以减少加热器断裂的危险并改善加热器的温度均匀性。沉积系统包括限流器环和其它特征，其允许15升/分钟的流速通过室，具有最小的背侧沉积并且最小化在室底部上的沉积，从而降低室清洁的频率，并且减少清洁时间和调味料。沉积和清洁过程也是本发明的进一步的实施方案。

7. 发明授权

US5964947A Removable pumping channel liners within a chemical vapor deposition chamber 失效
标题翻译：化学气相沉积室内可拆卸的泵送通道衬管
公开(公告)号：US5964947A
公开(公告)日：1999-10-12
申请号：US857847
申请日：1997-05-16
申请人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
发明人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
IPC分类号： C23C16/44 , C23C16/448 , C23C16/455 , C23C16/458 , C23C16/46 , C23C16/509 , C23C16/54 , H01J37/32 , H01L21/205 , H01L21/285 , C23C16/00
CPC分类号： C23C16/45508 , C23C16/4411 , C23C16/4412 , C23C16/4585 , C23C16/46 , C23C16/5096 , C23C16/54 , H01J37/3244 , H01J37/32477 , H01J37/32834 , H01J2237/2001
摘要： A substrate processing chamber, particularly a chemical vapor deposition (CVD) chamber used both for thermal deposition of a conductive material and a subsequently performed plasma process. The invention reduces thermal deposition of the conductive material in a pumping channel exhausting the chamber. The pumping channel is lined with various elements, some of which are electrically floating and which are designed so that conductive material deposited on these elements do not deleteriously affect a plasma generated for processing the wafer.
摘要翻译：衬底处理室，特别是用于导电材料的热沉积和随后执行的等离子体工艺的化学气相沉积（CVD）室。本发明减少了在排出室的泵送通道中导电材料的热沉积。泵浦通道衬有各种元件，其中一些元件是电浮动的，并且被设计成使得沉积在这些元件上的导电材料不会有害地影响用于处理晶片的等离子体。

8. 发明授权

US6051286A High temperature, high deposition rate process and apparatus for depositing titanium layers 失效
标题翻译：高温，高沉积速率工艺和用于沉积钛层的设备
公开(公告)号：US6051286A
公开(公告)日：2000-04-18
申请号：US918706
申请日：1997-08-22
申请人： Jun Zhao , Lee Luo , Xiao Liang Jin , Jia-Xiang Wang , Stefan Wolff , Talex Sajoto
发明人： Jun Zhao , Lee Luo , Xiao Liang Jin , Jia-Xiang Wang , Stefan Wolff , Talex Sajoto
IPC分类号： C23C16/44 , C23C16/52 , C23C16/08
CPC分类号： H01J37/3244 , C23C16/4401 , C23C16/4405 , C23C16/4412 , C23C16/52 , H01J2237/3321
摘要： The present invention provides systems, methods and apparatus for depositing titanium films at rates up to 200 .ANG./minute on semiconductor substrates from a titanium tetrachloride source. In accordance with an embodiment of the invention, a ceramic heater assembly with an integrated RF plane for bottom powered RF capability allows PECVD deposition at a temperature of at least 400.degree. C. for more efficient plasma treatment. A thermal choke isolates the heater from its support shaft, reducing the thermal gradient across the heater to reduce the risk of breakage and improving temperature uniformity of the heater. A deposition system incorporates a flow restrictor ring and other features that allow a 15 liters/minute flow rate through the chamber with minimal backside deposition and minimized deposition on the bottom of the chamber, thereby reducing the frequency of chamber cleanings, and reducing clean time and seasoning. Deposition and clean processes are also further embodiments of the present invention.
摘要翻译：本发明提供了用于从四氯化钛源在半导体衬底上以高达200安培/分钟的速率沉积钛膜的系统，方法和装置。根据本发明的实施例，具有用于底部供电RF能力的集成射频平面的陶瓷加热器组件允许在至少400℃的温度下进行PECVD沉积以用于更有效的等离子体处理。热扼流器将加热器与其支撑轴隔离，减少了加热器两端的热梯度，以减少加热器断裂的危险并改善加热器的温度均匀性。沉积系统包括限流器环和其它特征，其允许15升/分钟的流速通过室，具有最小的背侧沉积并且最小化在室底部上的沉积，从而降低室清洁的频率，并且减少清洁时间和调味料。沉积和清洁过程也是本发明的进一步的实施方案。

9. 发明授权

US06270859B1 Plasma treatment of titanium nitride formed by chemical vapor deposition 失效
公开(公告)号：US06270859B1
公开(公告)日：2001-08-07
申请号：US09049856
申请日：1998-03-27
申请人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
发明人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
IPC分类号： C23C1634
摘要： A method of depositing titanium nitride by chemical vapor deposition in a chamber having several design features directed to the conductive nature of titanium nitride, particularly when a plasma treatment step is performed after the thermal deposition of the film. Preferably, during the post-deposition plasma treatment, RF power is applied only to the showerhead counter-electrode and none to the pedestal supporting the wafer, thereby preventing charging of the wafer.

10. 发明授权

US6129044A Apparatus for substrate processing with improved throughput and yield 有权
标题翻译：用于基板处理的装置，具有改善的生产量和产量
公开(公告)号：US6129044A
公开(公告)日：2000-10-10
申请号：US409477
申请日：1999-10-06
申请人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
发明人： Jun Zhao , Ashok Sinha , Avi Tepman , Mei Chang , Lee Luo , Alex Schreiber , Talex Sajoto , Stefan Wolff , Charles Dornfest , Michal Danek
IPC分类号： C23C16/44 , C23C16/46 , C23C16/52 , C23C16/56 , H01J37/32 , C23C16/00 , G06F19/00
CPC分类号： C23C16/4411 , C23C16/4412 , C23C16/46 , C23C16/52 , C23C16/56 , H01J37/3244 , H01J37/32834 , H01J2237/2001
摘要： The present invention provides an approach which provides an increase in the number of usable substrates with a film, such as titanium nitride, deposited thereon at a sufficient deposition rate and where the film meets uniformity and resistivity specifications as well as providing good step coverage. In accordance with an embodiment, the present invention provides an apparatus for substrate processing. The apparatus circulates a heat exchange medium through a passage in a chamber body of a vacuum chamber, and heats a heater pedestal having a surface for supporting the substrate to a heater temperature. The heat exchange medium has a heat exchange temperature of about 60.degree. C. or less. The the apparatus also flows a gas into the chamber at a flow rate to deposit a film on a substrate, where the flow rate provides an effective temperature of the substrate lower than the heater temperature and where the film meets uniformity and resistance specifications after deposition onto a number of substrates. This number is less than twenty-five, in some embodiments, and less than ten in other embodiments. The use of the present invention thus avoids the discarding of the initial hundreds of processed substrates not meeting specifications that is typically experienced with the prior art processes.
摘要翻译：本发明提供了一种方法，其以足够的沉积速率在其上沉积有诸如氮化钛的膜，并且其中膜满足均匀性和电阻率规格以及提供良好的阶梯覆盖，提高了可用基板的数量的增加。根据实施例，本发明提供了一种用于基板处理的装置。该装置使热交换介质通过真空室的室主体中的通道循环，并将具有用于支撑基板的表面的加热器基座加热到加热器温度。热交换介质的热交换温度为约60℃以下。该设备还以流速将气体流入室中，以将膜沉积在基底上，其中流速提供了低于加热器温度的基底的有效温度，并且其中膜在沉积之后满足均匀性和电阻规格一些基板。在其他实施例中，该数量少于二十五个，在一些实施例中小于十个。因此，本发明的使用避免了丢弃初始数百个处理过的基板，这些基板不符合现有技术工艺通常经历的规格。

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