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    • 3. 发明授权
    • Layers used to prevent reticulation in photographic elements
    • US4056396A
    • 1977-11-01
    • US578069
    • 1975-05-16
    • Ikutaro HorieTakushi MiyazakoShinji SakaguchiNobuo TsujiNagao Kameji
    • Ikutaro HorieTakushi MiyazakoShinji SakaguchiNobuo TsujiNagao Kameji
    • G03C1/04C08F16/00C08F16/14C08F20/00C08F20/52G03C1/053G03C1/76G03C3/00
    • G03C1/7614G03C1/053
    • A photographic light-sensitive material including a support, a non-light sensitive uppermost layer consisting of at least one organic synthetic high polymer compound as a film forming material and at least one light-sensitive layer between the support and the uppermost layer, said organic high polymer compound being selected from the group consisting of the following polymers (A) to (F):polymer (A) comprising repeating units a.sub.1 and a.sub.2 ;______________________________________ a.sub.1 : ##STR1## 80 - 97 mol% a.sub.2 : ##STR2## 3 - 20 mol% ______________________________________ Wherein M represents a cation, and m represents 0, 3 or 4;Polymer (B) comprising repeating units b.sub.1, b.sub.2 and b.sub.3 ;______________________________________ b.sub.1 : ##STR3## 5 - 30 mol% b.sub.2 : ##STR4## 5 - 75 mol% b.sub.3 : ##STR5## 20 - 65 mol% ______________________________________ Wherein R.sub.1 and R.sub.2 each represents --CH.sub.3 or --C.sub.2 H.sub.5, R.sub.3 and R.sub.5 each represents --H or --CH.sub.3, and R.sub.4 represents --CH.sub.3, --C.sub.2 H.sub.5, --C.sub.3 H.sub.7 or --C.sub.4 H.sub.9 ;polymer (C) comprising repeating units c.sub.1 and c.sub.2 ;______________________________________ c.sub.1 : ##STR6## 10 - 40 mol% c.sub.2 : ##STR7## 60 - 90 mol% ______________________________________ Wherein R.sub.6 represents --H or --CH.sub.3, and Z represents --COOH, --COOCH.sub.3, --COOC.sub.2 H.sub.5, --COOC.sub.3 H.sub.7, --COOC.sub.4 H.sub.9 or --CONH.sub.2 ;polymer (D) comprising repeating units d.sub.1 and d.sub.2 ;______________________________________ d.sub.1 : ##STR8## 10 - 40 mol% d.sub.2 : ##STR9## 60 - 90 mol% ______________________________________ Wherein R.sub.7 represents --H or --CH.sub.3 ;polymer (E) comprising repeating units e.sub.1 and e.sub.2 ;______________________________________ e.sub.1 : ##STR10## 20 - 60 mol% e.sub.2 : ##STR11## 40 - 80 mol% ______________________________________ wherein R.sub.8 and R.sub.9 each represents --H or --CH.sub.3, and X represents --CH.sub.3, --C.sub.2 H.sub.5, --C.sub.3 H.sub.7 or --C.sub.4 H.sub.9 ; andpolymer (F) comprising repeating unit f.sub.1 ;______________________________________ f.sub.1 : ##STR12## wherein Y represents --CH.sub.3 or --COCH.sub.3, R.sub.10 represents --H or --C.sub.n H.sub.2n+1, n being an integer of 1 to 12, said organic synthetic high polymer compound being insoluble to a processing solutions
    • 4. 发明授权
    • Color diffusion transfer process photographic elements
    • 彩色扩散转印摄影元素
    • US4199362A
    • 1980-04-22
    • US859636
    • 1977-12-12
    • Takashi YoshidaShinji SakaguchiKazunobu KatohYukio Karino
    • Takashi YoshidaShinji SakaguchiKazunobu KatohYukio Karino
    • C08F2/00C08F2/22C08F220/00C08F220/04C08F246/00G03C7/00G03C8/54G03C1/40B44D1/09G03C1/48G03C5/54
    • G03C8/54Y10S430/158Y10T428/31855Y10T428/31891Y10T428/31928Y10T428/31935
    • In a photographic element for the color diffusion transfer process including a neutralizing system for reducing the pH of an aqueous alkaline processing solution which comprises a neutralizing layer and a timing layer, the improvement which comprises the timing layer comprising a polymer latex which is produced by emulsion polymerization of (1) each of (A) at least one monomer selected from the group consisting of ethylene-type monomers having at least a free carboxylic acid group, a free sulfonic acid group or a free phosphoric acid group or a salt thereof and (B) at least one monomer selected from the group consisting of monomers represented by the following general formula (I) ##STR1## wherein X is a hydrogen atom, a methyl group or a --COOR.sup.1 group; Y is a hydrogen atom, a methyl group or a --(CH.sub.2).sub.n COOR.sup.2 group; Z is an aryl group, a --COOR.sup.3 group or a ##STR2## group; R.sup.1, R.sup.2 and R.sup.3, which may be the same or different, each represents an aliphatic group or an aryl group; and n is an integer of 0 to 3, or (2) each of (A) at least one monomer selected from the group consisting of the ethylene type monomers described above, (B) at least one monomer selected from the group consisting of monomers represented by the general formula (I) above, and (C) at least one monomer selected from the group consisting of monofunctional or polyfunctional unsaturated monomers other than those monomers described in (A) and (B) above which are copolymerizable with the monomers described in (A) and (B) above and selected from the group consisting of acrylamides, methacrylamides, vinyl ethers, vinyl ketones, allyl compounds, olefins, vinyl heterocyclic compounds, unsaturated nitriles and polyfunctional monomers.
    • 在用于颜色扩散转移方法的照相元件中,包括用于降低碱性处理溶液的pH值的中和系统,该中和系统包括中和层和定时层,其改进包括由乳液制成的聚合物胶乳 (A)至少一种选自由至少具有游离羧酸基团的乙烯型单体,游离磺酸基或游离磷酸基或其盐组成的组中的至少一种单体的聚合(1)和 B)至少一种选自由以下通式(I)表示的单体的单体:其中X是氢原子,甲基或-COOR1基团; Y是氢原子,甲基或 - (CH2)nCOOR2基团; Z是芳基,-COOR 3基团或基团; R 1,R 2和R 3可以相同或不同,表示脂族基团或芳基; 和(2)选自(A)至少一种选自上述乙烯型单体的单体,(B)至少一种选自单体的单体 由上述通式(I)表示的至少一种单体和(C)至少一种选自除上述(A)和(B)中描述的单体之外的单官能或多官能不饱和单体的单体,其可与所述单体共聚 在上述(A)和(B)中,选自丙烯酰胺,甲基丙烯酰胺,乙烯基醚,乙烯基酮,烯丙基化合物,烯烃,乙烯基杂环化合物,不饱和腈和多官能单体。
    • 7. 发明授权
    • Color diffusion transfer photographic materials with vinyl copolymer
neutralization rate controlling layer
    • 彩色扩散转印照相材料与乙烯基共聚物中和率控制层
    • US4123275A
    • 1978-10-31
    • US708973
    • 1976-07-26
    • Yukio KarinoShinji SakaguchiTakashi Yoshida
    • Yukio KarinoShinji SakaguchiTakashi Yoshida
    • G03C8/54G03C7/00G03C1/40G03C5/54
    • G03C8/54
    • In a color diffusion transfer photographic material comprising a photosensitive element including at least one light-sensitive silver halide emulsion layer having a dye image providing material associated therewith, an image receiving element for fixing the diffusible dye formed from said dye image providing material to form a dye image, an alkaline processing composition capable of developing the exposed photosensitive element, and, if necessary, a hydrophilic colloid layer, the photographic material further having neutralizing means for reducing the pH of the alkaline processing composition. The stability of the transferred dye image formed in the image receiving element is improved by incorporating in the neutralization rate controlling layer of the neutralizing means a copolymer of a vinyl compound and an unsaturated monomer, said copolymer having the recurring structural unit represented by the general formula: ##STR1## wherein R represents a hydrogen atom, an aliphatic group having 1 to 10 carbon atoms, or an aryl group.
    • 在包含感光元件的彩色扩散转印照相材料中,所述感光元件包括至少一个具有与其相关的染料图像的感光卤化银乳剂层,用于固定由所述染料图像提供材料形成的可扩散染料的图像接收元件,以形成 染料图像,能够显影曝光的感光元件的碱性处理组合物,以及必要时的亲水胶体层,所述照相材料还具有用于降低碱性处理组合物的pH的中和装置。 通过在中和装置的中和速率控制层中加入乙烯基化合物和不饱和单体的共聚物,可以改善在图像接收元件中形成的转印染料图像的稳定性,所述共聚物具有由通式表示的重复结构单元 :其中R表示氢原子,碳原子数1〜10的脂肪族基或芳基。
    • 9. 发明授权
    • Fine pattern forming method
    • 精细图案形成方法
    • US06497996B1
    • 2002-12-24
    • US09562076
    • 2000-05-01
    • Masayuki NayaShinji Sakaguchi
    • Masayuki NayaShinji Sakaguchi
    • G03F736
    • G03F7/095G03F7/0757
    • As shown in FIG. 1A, a first resist film 2 comprising organic high molecules and a second resist film 3 comprising a photosensitive material are sequentially applied to a substrate 1 by the spin coat method or the spray method for forming a two-layer resist. Then, a mask 4 with which a metallic fine opening pattern 6 is formed on a mask substrate 5 comprising a dielectric, such as glass, is tightly contacted with the two-layer resist. Then, light is projected onto the back of the mask substrate to carry out exposure with near field light 7 which is effused from the opening portions of the mask 4 where no metal is formed. Then, a pattern is formed by processing the second resist layer 3 for development with a developing solution. Thereafter, with the pattern in the second resist layer 3 being used as a mask, the first resist layer 2 is dry-etched with O2 plasma to form a fine pattern having a high aspect ratio, and with the pattern in the two-layer resist, the substrate is worked by etching, vapor deposition, or the like, before the two-layer resist is peeled off.
    • 如图所示。 如图1A所示,通过旋涂法或用于形成双层抗蚀剂的喷涂方法将包含有机高分子的第一抗蚀剂膜2和包含感光材料的第二抗蚀剂膜3依次施加到基板1上。 然后,在包括诸如玻璃的电介质的掩模基板5上形成有金属细孔图案6的掩模4与双层抗蚀剂紧密接触。 然后,将光投射到掩模基板的背面上,以从未形成金属的掩模4的开口部分流出的近场光7进行曝光。 然后,通过用显影液处理用于显影的第二抗蚀剂层3来形成图案。 此后,利用第二抗蚀剂层3中的图案作为掩模,用O 2等离子体干蚀刻第一抗蚀剂层2,以形成具有高纵横比的精细图案,并且在两层抗蚀剂中的图案 在剥离两层抗蚀剂之前,通过蚀刻,蒸镀等进行基板的加工。
    • 10. 发明授权
    • Positive photoresist composition
    • 正光致抗蚀剂组合物
    • US5565300A
    • 1996-10-15
    • US647904
    • 1991-01-30
    • Kazuya UenishiShinji SakaguchiTadayoshi Kokubo
    • Kazuya UenishiShinji SakaguchiTadayoshi Kokubo
    • G03F7/023C07C309/76G03F7/022H01L21/027
    • G03F7/022C07C309/76C07C2102/10
    • A photoresist composition is disclosed containing an alkali-soluble resin and a photosensitive substance obtained by reaction of a polyhydroxy compound and (a) a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonyl chloride(s), said photosensitive substance being a mixture of photosensitive compounds (1) to (3):(1) a photosensitive compound having at least one hydroxyl group per molecule and having a number ratio of 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonyl chloride sulfonate groups to hydroxyl groups within the range of from 3 to 20, contained in the photosensitive substance in an amount of 50 wt % or more;(2) a photosensitive compound where all the hydroxyl groups in the polyhydroxy compound have been 1,2-naphthoquinonediazidosulfonyl-esterified, contained in the photosensitive substance in an amount of 30 wt % to 0 wt %; and(3) a photosensitive compound having three or more hydroxyl groups which have not been 1,2-naphthoquinonediazidosulfonyl-esterified per molecule, contained in the photosensitive substance in an amount of 20 wt % to 0 wt %.The composition is suitable to exposure with g-ray, i-ray and excimer laser to provide a sharp resist image. The photoresist composition also has high sensitivity, high resolving power, precise reproducibility to provide resist images having good sectional shapes, broad development latitude, high heat resistance and good storage stability.
    • 公开了含有碱溶性树脂和通过多羟基化合物和(a)1,2-萘醌二叠氮基-5-(和/或-4-)磺酰氯反应获得的光敏物质的光致抗蚀剂组合物,所述光致抗蚀剂组合物 感光性物质为光敏性化合物(1)〜(3)的混合物:(1)每分子具有至少一个羟基并且具有1,2-萘醌二叠氮基-5-(和/或-4 - )磺酰氯磺酸盐基团,其含量为50重量%以上的含有3〜20重量份的光敏物质的羟基; (2)感光性物质中含有多重羟基化合物中的全部羟基的化合物为感光性物质中的含量为30重量%〜0重量%的感光性化合物, 和(3)感光性物质中含有20重量%〜0重量%的含有3个以上不具有每分子1,2-萘醌二氮杂磺酰基酯化的羟基的感光性化合物。 该组合物适用于用g射线,i射线和准分子激光曝光以提供清晰的抗蚀剂图像。 光致抗蚀剂组合物还具有高灵敏度,高分辨能力,精确的再现性,以提供具有良好的截面形状,宽的显影宽度,高耐热性和良好的储存稳定性的抗蚀剂图像。