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    • 2. 发明授权
    • Communication node, communication system and ad hoc communication method in accordance with time division multiple access scheme
    • 通信节点,通信系统和自组织通信方式根据时分多址方案
    • US08432886B2
    • 2013-04-30
    • US12823822
    • 2010-06-25
    • Hiroyuki Nakano
    • Hiroyuki Nakano
    • H04B7/212
    • H04W74/0808
    • A communication node, which performs ad hoc communication by occupying at least one time slot and transmitting a data block to one or a plurality of other nodes via the occupied at least one time slot through broadcasting, comprises a determination unit that determines an occupation time slot to be occupied by an own node in a frame used for transmitting the data block, based on occupation state data, a data block generating unit that generates the data block storing, in a control field, control data containing new occupation state data obtained by updating the occupation state data based on an occupation state of the occupation time slot, the data block being to be transmitted by the own node through the broadcasting, and a transmission unit that transmits the data block generated through the broadcasting via the occupation time slot.
    • 一种通过占用至少一个时隙执行自组织通信并且经由所占用的至少一个时隙通过广播向一个或多个其他节点发送数据块的通信节点,包括:确定单元,其确定占用时隙 由用于发送数据块的帧中的自身节点占据,基于占用状态数据,生成在控制字段中存储包含通过更新获得的新的占用状态数据的控制数据的数据块的数据块生成单元 基于所述占用时隙的占有状态的所述占用状态数据,所述数据块将由所述自身节点通过所述广播发送;以及发送单元,其经由所述占用时隙发送通过所述广播生成的数据块。
    • 4. 发明授权
    • Defect inspection method and system
    • 缺陷检查方法和系统
    • US07859656B2
    • 2010-12-28
    • US12366956
    • 2009-02-06
    • Sachio UtoHiroyuki NakanoYukihiro ShibataAkira HamamatsuYuta Urano
    • Sachio UtoHiroyuki NakanoYukihiro ShibataAkira HamamatsuYuta Urano
    • G01N21/00G01N21/88H01L27/00
    • G01N21/9501G01N21/21G01N21/4788G01N21/94G01N21/956
    • An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.
    • 检查系统包括:使用具有不同波长的宽带照明光和单波长光的设备,在具有透明膜的表面上的多个照明中对被检查对象进行暗视场照明 多个照明角度的方向; 检测从重复图案反射或散射的光和从彼此分离的波长的非重复图案反射或散射的光的设备; 有效地检测异物反射或散射的光或重复图案或非重复图案中的缺陷或透明膜表面上的异物或缺陷的设备; 以及通过重复图案衍射的光从实际图案的衍射光图像或表示图案的设计数据中去除的设施。 因此,能够稳定地检测出更微细的缺陷。
    • 5. 发明授权
    • Method and apparatus for detecting defects
    • 检测缺陷的方法和装置
    • US07751037B2
    • 2010-07-06
    • US12435523
    • 2009-05-05
    • Hiroyuki NakanoToshihiko NakataSachio UtoAkira HamamatsuShunji MaedaYuta Urano
    • Hiroyuki NakanoToshihiko NakataSachio UtoAkira HamamatsuShunji MaedaYuta Urano
    • G01N21/958G01N21/88
    • G01N21/956G01N21/47G01N21/94G01N21/9501G01N2021/8822
    • A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
    • 提供一种用于检测缺陷的方法和装置,用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。 用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向,用于利用来自倾斜方向的光照射电路图案的照明系统,以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。 利用这种布置,收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 此外,在傅立叶变换表面上提供空间滤波器,用于阻挡来自电路图形的线性部分的衍射光。 由检测器从样本接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。 如果这些信号彼此不相同,则检测到异物被确定为存在于样品上。
    • 9. 发明申请
    • METHOD AND APPARATUS FOR INSPECTING FOREIGN PARTICLE DEFECTS
    • 检查外来颗粒缺陷的方法和装置
    • US20090079973A1
    • 2009-03-26
    • US12273174
    • 2008-11-18
    • Sachio UTOHiroyuki Nakano
    • Sachio UTOHiroyuki Nakano
    • G01N21/00
    • G01N21/94G01N21/47G01N21/9501
    • The invention relates to a device production process for forming a circuit pattern on a substrate such as semiconductor device. To enable a stable inspection of a minute foreign particle and a pattern defect occurring in manufacture of a device at a high speed and with a high sensitivity, an object to be inspected on which a transparent film is formed, is irradiated with a beam which is emitted from an illuminator whose illumination direction and illumination angle are selected from a plurality of choices to be optimum, so that scattered reflected light from a minute foreign particle defect on the object or the transparent film is effectively detected by eliminating a noise from the pattern formed on the object, and a detection optical system is optimized by evaluating and adjusting, with an image forming performance checker, an image forming performance of the detection optical system included in an inspecting apparatus.
    • 本发明涉及用于在诸如半导体器件的衬底上形成电路图案的器件制造工艺。 为了能够在高速,高灵敏度的装置的制造中能够稳定地检查微小的外来粒子和图案缺陷,对要形成透明膜的检查对象进行照射, 从照明方向和照明角度从多个选择中选择为最佳的发光体发射,从而通过从形成的图案中消除噪声来有效地检测来自物体或透明膜上的微小异物缺陷的散射反射光 并且通过利用图像形成性能检查器评估和调整包括在检查装置中的检测光学系统的图像形成性能来优化检测光学系统。