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    • 2. 发明申请
    • DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    • 显示装置及其制造方法
    • US20100032681A1
    • 2010-02-11
    • US12536645
    • 2009-08-06
    • Takeshi KURIYAGAWATakeshi NodaTakuo Kaitoh
    • Takeshi KURIYAGAWATakeshi NodaTakuo Kaitoh
    • H01L33/00H01L21/336
    • H01L29/78621H01L29/458
    • A display device includes: a transparent substrate; gate electrodes which are stacked on the transparent substrate; semiconductor films which are stacked above the gate electrodes and constitute thin film transistors together with the gate electrodes; source electrodes and drain electrodes which are formed above the semiconductor films; an insulation film which is stacked between the source electrodes and the semiconductor films and between the drain electrodes and the semiconductor films; and contact holes which are formed in the insulation film so as to connect the source electrodes and the drain electrodes with the semiconductor films. The semiconductor film includes a connection region which is positioned at least below the contact hole and is connected with the source electrode, and a connection region which is positioned at least below the contact hole and is connected with the drain electrode, and impurities are implanted into the connection regions.
    • 显示装置包括:透明基板; 层叠在透明基板上的栅电极; 叠层在栅电极上方并与栅电极一起构成薄膜晶体管的半导体膜; 源电极和漏极形成在半导体膜上方; 堆叠在源电极和半导体膜之间以及漏电极和半导体膜之间的绝缘膜; 以及形成在绝缘膜中的接触孔,以便将源电极和漏极连接到半导体膜。 半导体膜包括至少位于接触孔下方并与源电极连接的连接区域以及至少位于接触孔下方并与漏电极连接的连接区域,并将杂质注入 连接区域。
    • 3. 发明申请
    • DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    • 显示装置及其制造方法
    • US20100096632A1
    • 2010-04-22
    • US12578641
    • 2009-10-14
    • Takeshi KURIYAGAWATakeshi NodaTakuo Kaitoh
    • Takeshi KURIYAGAWATakeshi NodaTakuo Kaitoh
    • H01L27/12H01L21/77
    • H01L27/124H01L27/1248H01L29/66765
    • A second insulation layer which is formed by stacking a plurality of layers made of different materials in a mutually contact manner is formed such that the second insulation layer covers a source region and a drain region and also covers a gate electrode from above. A first contact hole which reaches one of the source region and the drain region and a recessed portion which is arranged above the gate electrode but is not communicated with the gate electrode are simultaneously formed on the second insulation layer by dry etching. A first line layer is formed so as to cover the first contact hole. After forming the first line layer, a bottom surface of the recessed portion is etched by dry etching thus forming a second contact hole which reaches the gate electrode in the first and second insulation layers. A second line layer is formed on the second contact hole.
    • 形成通过以相互接触的方式堆叠由不同材料制成的多个层而形成的第二绝缘层,使得第二绝缘层覆盖源极区域和漏极区域并且还从上方覆盖栅极电极。 通过干法蚀刻在第二绝缘层上同时形成到达源极区域和漏极区域中的一个的第一接触孔和设置在栅电极上方但不与栅电极连通的凹部。 第一线层形成为覆盖第一接触孔。 在形成第一线层之后,通过干蚀刻蚀刻凹陷部分的底表面,从而形成到达第一和第二绝缘层中的栅电极的第二接触孔。 在第二接触孔上形成第二线层。
    • 4. 发明申请
    • DISPLAY DEVICE AND METHOD OF MANUFACTURING THE DISPLAY DEVICE
    • 显示装置和制造显示装置的方法
    • US20120307335A1
    • 2012-12-06
    • US13483125
    • 2012-05-30
    • Takeshi KURIYAGAWA
    • Takeshi KURIYAGAWA
    • G02B26/02H05K13/00
    • G02B26/023
    • A display device according to the present invention includes a plurality of pixels provided on a substrate; a first insulating film provided on the substrate; a second insulating film provided on the first insulating film in contact with at least a part thereof and formed of a different material from that of the first insulating film; a plurality of MEMS shutters provided on the second insulating film respectively in correspondence with the plurality of pixels, the plurality of MEMS shutters having a third insulating film formed on side surfaces thereof; and a plurality of terminals for supplying a potential to the plurality of gate lines and the plurality of data lines, the plurality of terminals receiving the potential through openings formed in the first insulating film and the second insulating film, the openings being formed on the plurality of terminals.
    • 根据本发明的显示装置包括设置在基板上的多个像素; 设置在所述基板上的第一绝缘膜; 第二绝缘膜,设置在与所述第一绝缘膜的至少一部分接触并且由与所述第一绝缘膜的材料不同的材料形成的所述第一绝缘膜上; 多个MEMS百叶窗分别设置在第二绝缘膜上,与多个像素对应,多个MEMS快门具有形成在其侧表面上的第三绝缘膜; 以及多个端子,用于向所述多条栅极线和所述多条数据线提供电位,所述多个端子接收形成在所述第一绝缘膜和所述第二绝缘膜中的电势通孔,所述多个开口形成在所述多个栅极线 的终端。
    • 6. 发明申请
    • DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    • 显示装置及其制造方法
    • US20110254006A1
    • 2011-10-20
    • US13085517
    • 2011-04-13
    • Takeshi KURIYAGAWAJun Fujiyoshi
    • Takeshi KURIYAGAWAJun Fujiyoshi
    • H01L33/36H01L33/16H01L33/08
    • H01L33/42H01L27/124H01L29/4908
    • A display device in which a plurality of gate wires and a plurality of drain wires that intersect the gate wires are provided, and thin film transistors connected to the gate wires and the drain wires are formed for respective pixel regions. At least one of the gate wires, the drain wires, and lead wires drawn from the gate wires or the drain wires is formed of a light-transmitting patterned conductive film. The light-transmitting patterned conductive film is formed of at least a first light-transmitting patterned conductive film, and a second light-transmitting patterned conductive film laminated on the first light-transmitting patterned conductive film. The second light-transmitting patterned conductive film is formed of a conductive film for coating only the surface of the first light-transmitting patterned conductive film including its side wall surface.
    • 设置有与栅极布线相交的多个栅极布线和多个漏极布线的显示装置,并且为各像素区域形成与栅极布线和漏极布线连接的薄膜晶体管。 栅极线,漏极线以及从栅极线或漏极导线引出的引线中的至少一个由透光图案化的导电膜形成。 透光图案化导电膜由至少第一透光图案化导电膜和层压在第一透光图案化导电膜上的第二透光图案化导电膜形成。 第二透光图案化导电膜由仅用于涂覆包括其侧壁表面的第一透光图案化导电膜的表面的导电膜形成。