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1. 发明授权

US07679055B2 Pattern displacement measuring method and pattern measuring device 有权
标题翻译：图案位移测量方法和图案测量装置
公开(公告)号：US07679055B2
公开(公告)日：2010-03-16
申请号：US11892675
申请日：2007-08-24
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
IPC分类号： G06K9/48 , G06K9/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
摘要翻译：提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

2. 发明申请

US20080224035A1 Pattern displacement measuring method and pattern measuring device 有权
标题翻译：图案位移测量方法和图案测量装置
公开(公告)号：US20080224035A1
公开(公告)日：2008-09-18
申请号：US11892675
申请日：2007-08-24
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
IPC分类号： G01C9/00 , G01N23/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
摘要翻译：提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

3. 发明授权

US08173962B2 Pattern displacement measuring method and pattern measuring device 有权
标题翻译：图案位移测量方法和图案测量装置
公开(公告)号：US08173962B2
公开(公告)日：2012-05-08
申请号：US12708148
申请日：2010-02-18
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Akiyuki Sugiyama , Hiroyuki Shindo
IPC分类号： A61N5/00 , G06K9/00 , G01C25/00 , G01R31/00
CPC分类号： G06T7/001 , G06T7/33 , G06T2207/10056 , G06T2207/30148
摘要： An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.
摘要翻译：提供了一种评估方法和装置，用于通过使用表示叠加的多个图案的设计数据来理想地评估图案图案的图案之间的位移。对于设计数据的线段和带电粒子辐射图像的边缘之间的上层图案测量第一距离，测量设计数据的线段与设计数据的边缘之间的较低层图案的第二距离带电粒子辐射图像; 并且根据第一距离和第二距离在上层图案和下层图案之间检测叠加位移。

4. 发明授权

US08019161B2 Method, device and computer program of length measurement 有权
标题翻译：长度测量的方法，设备和计算机程序
公开(公告)号：US08019161B2
公开(公告)日：2011-09-13
申请号：US11717772
申请日：2007-03-14
申请人： Hidetoshi Morokuma , Takumichi Sutani , Ryoichi Matsuoka , Hitoshi Komuro , Akiyuki Sugiyama
发明人： Hidetoshi Morokuma , Takumichi Sutani , Ryoichi Matsuoka , Hitoshi Komuro , Akiyuki Sugiyama
IPC分类号： G06K9/46
CPC分类号： G01N23/2251
摘要： A workpiece size measurement method suitable for length measurement of multilayered circuit elements with increased complexities is disclosed. This method employs a technique for changing measurement conditions in a way pursuant to either an image of workpiece or the situation of a target semiconductor circuit element to be measured when measuring pattern sizes on the workpiece image using design data of the semiconductor circuit element. With such an arrangement, adequate measurement conditions are selectable in accordance with the state of workpiece image and/or the state of a circuit element formed on the workpiece, thereby making it possible to improve the measurement efficiency. A workpiece size measurement apparatus using the technique is also disclosed.
摘要翻译：公开了一种适合于具有增加的复杂度的多层电路元件的长度测量的工件尺寸测量方法。该方法采用在使用半导体电路元件的设计数据测量工件图像上的图案尺寸时，根据工件的图像或待测量的目标半导体电路元件的情况来改变测量条件的技术。通过这样的布置，可以根据工件图像的状态和/或形成在工件上的电路元件的状态来选择适当的测量条件，从而可以提高测量效率。还公开了使用该技术的工件尺寸测量装置。

5. 发明申请

US20110158543A1 SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION INSPECTING/MEASURING APPARATUS 有权
标题翻译：样本尺寸检查/测量方法和样品尺寸检查/测量装置
公开(公告)号：US20110158543A1
公开(公告)日：2011-06-30
申请号：US13041894
申请日：2011-03-07
申请人： Hidetoshi Morokuma , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Yasutaka Toyoda
发明人： Hidetoshi Morokuma , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Yasutaka Toyoda
IPC分类号： G06K9/00
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译：本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。

6. 发明授权

US07518110B2 Pattern measuring method and pattern measuring device 有权
标题翻译：图案测量方法和图案测量装置
公开(公告)号：US07518110B2
公开(公告)日：2009-04-14
申请号：US11359374
申请日：2006-02-23
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
IPC分类号： G01B9/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.
摘要翻译：提供了一种图案测量方法和装置，其基于通过扫描电子显微镜等测量的测量点的基准位置，基于从扫描电子显微镜获取的图像上的参考图案的位置信息，并基于通过使用设计数据检测的位置关系，在测量点和形成在与测量点隔离的位置处形成的参考图案之间。

7. 发明申请

US20060193508A1 Pattern measuring method and pattern measuring device 有权
公开(公告)号：US20060193508A1
公开(公告)日：2006-08-31
申请号：US11359374
申请日：2006-02-23
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
IPC分类号： G06K9/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.

8. 发明授权

US07925095B2 Pattern matching method and computer program for executing pattern matching 有权
标题翻译：模式匹配方法和执行模式匹配的计算机程序
公开(公告)号：US07925095B2
公开(公告)日：2011-04-12
申请号：US11698988
申请日：2007-01-29
申请人： Akiyuki Sugiyama , Hiroyuki Shindo , Hitoshi Komuro , Takumichi Sutani , Hidetoshi Morokuma
发明人： Akiyuki Sugiyama , Hiroyuki Shindo , Hitoshi Komuro , Takumichi Sutani , Hidetoshi Morokuma
IPC分类号： G06K9/32
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译：能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。

9. 发明授权

US08507856B2 Pattern measuring method and pattern measuring device 有权
公开(公告)号：US08507856B2
公开(公告)日：2013-08-13
申请号：US13457359
申请日：2012-04-26
申请人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
发明人： Takumichi Sutani , Ryoichi Matsuoka , Hidetoshi Morokuma , Hitoshi Komuro , Akiyuki Sugiyama
IPC分类号： G06K9/48 , G06K9/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.

10. 发明授权

US08338804B2 Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus 有权
标题翻译：样品尺寸检测/测量方法和样品尺寸检测/测量仪器
公开(公告)号：US08338804B2
公开(公告)日：2012-12-25
申请号：US13041894
申请日：2011-03-07
申请人： Hidetoshi Morokuma , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Yasutaka Toyoda
发明人： Hidetoshi Morokuma , Akiyuki Sugiyama , Ryoichi Matsuoka , Takumichi Sutani , Yasutaka Toyoda
IPC分类号： G06K9/00 , H01J37/28 , G01N23/00
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译：本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。

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