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1. 发明申请

US20090003978A1 Vacuum processing apparatus and vacuum processing method 有权
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20090003978A1
公开(公告)日：2009-01-01
申请号：US12230467
申请日：2008-08-29
申请人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/67
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus and method in which the apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
摘要翻译：一种真空处理装置和方法，其中所述装置包括用于对样品进行真空处理的真空处理室，真空支架，可切换室，用于支撑多个能够容纳样品的盒的盒支架，以及用于支持等同的盒子，其与支撑在盒支架上的盒子不同，并且能够具有多个样品。大气托架能够在多个盒子或等待盒中的给定盒中携带样品。控制器执行控制以在给定的盒式磁带，等待盒和真空处理室之间携带未处理和处理的样品，使得处理的和未处理的样品的混合物不存在于给定的盒式磁带或等待盒中。

2. 发明申请

US20110299962A1 Vacuum Processing Apparatus And Vacuum Processing Method 审中-公开
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20110299962A1
公开(公告)日：2011-12-08
申请号：US13209871
申请日：2011-08-15
申请人： Takeshi OONO , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi OONO , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/677 , H01L21/673
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
摘要翻译：真空处理设备包括用于对样品进行真空处理的真空处理室，真空托架，可切换室，用于支撑多个能够容纳样品的盒的盒支架和用于支撑不同的等待盒的等待盒支架从支撑在盒支架上的盒子并且能够具有多个样品。大气托架能够在多个盒子或等待盒中的给定盒中携带样品。控制器执行控制以在给定的盒式磁带，等待盒和真空处理室之间携带未处理和处理的样品，使得处理的和未处理的样品的混合物不存在于给定的盒式磁带或等待盒中。

3. 发明申请

US20050220575A1 Vacuum processing apparatus and vacuum processing method 有权
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20050220575A1
公开(公告)日：2005-10-06
申请号：US10874241
申请日：2004-06-24
申请人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/3065 , B65G1/00 , H01L21/00 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： The invention provides a vacuum processing apparatus and vacuum processing method capable of improving the yield factor of a product. A vacuum processing apparatus 1 comprises a plurality of vacuum processing chambers 7 for providing vacuum processing to a sample 2, a vacuum carriage means 8 for carrying a sample into and out of the vacuum processing chamber 7, a switchable chamber 9 capable of being switched between atmosphere and vacuum for carrying a sample into and out of the vacuum processing chamber, a cassette supporting means 10 for supporting a plurality of cassettes housing samples, a carriage means 4 capable of moving vertically for taking out a sample from a given cassette on the cassette supporting means, and a control means performing carriage control for carrying the sample in the given cassette via the carriage means, the switchable chamber and the vacuum carriage means into the vacuum processing chamber and for carrying the processed sample out of the vacuum processing chamber, wherein the apparatus is further equipped with a waiting cassette supporting means for supporting a waiting cassette 5 capable of preventing the processed samples and the unprocessed samples from being mixed in a single cassette.
摘要翻译：本发明提供能够提高产品的成品率的真空处理装置和真空处理方法。真空处理装置1包括用于向样品2提供真空处理的多个真空处理室7，用于将样品进出真空处理室7的真空载置装置8，可切换室9 用于将样品携带到真空处理室中的气体和真空;用于支撑容纳样品的多个盒的盒支撑装置10;能够垂直移动的托架装置4，用于从盒上的给定盒带取出样品支撑装置，以及执行托架控制的控制装置，用于将经由所述托架装置，所述可切换室和所述真空托架装置的所述样本运送到所述真空处理室中并将所述经处理的样品运送出所述真空处理室，该装置还配备有用于支撑等待盒式磁带5插头的等待盒支持装置防止处理的样品和未处理的样品在单个盒中混合。

4. 发明授权

US07862289B2 Vacuum processing apparatus and vacuum processing method 有权
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US07862289B2
公开(公告)日：2011-01-04
申请号：US12230467
申请日：2008-08-29
申请人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： B65H85/00
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus and method in which the apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
摘要翻译：一种真空处理装置和方法，其中所述装置包括用于对样品进行真空处理的真空处理室，真空支架，可切换室，用于支撑多个能够容纳样品的盒的盒支架，以及用于支持等同的盒子，其与支撑在盒支架上的盒子不同，并且能够具有多个样品。大气托架能够在多个盒子或等待盒中的给定盒中携带样品。控制器执行控制以在给定的盒式磁带，等待盒和真空处理室之间携带未处理和处理的样品，使得处理的和未处理的样品的混合物不存在于给定的盒式磁带或等待盒中。

5. 发明授权

US07476073B2 Vacuum processing method 有权
标题翻译：真空加工方法
公开(公告)号：US07476073B2
公开(公告)日：2009-01-13
申请号：US10874241
申请日：2004-06-24
申请人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/02
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus and method includes at least one vacuum processing chamber, at least one carriage for carrying the sample from a given cassette into and out of the vacuum processing chamber. A controller performs carriage control for carrying the sample taken out of the given cassette into the vacuum processing chamber, and for carrying the processed sample out of the vacuum processing chamber. A waiting cassette support supports a waiting cassette in which an unprocessed sample from the given cassette or a processed sample from the given cassette after vacuum processing is placed so as to prevent the processed and unprocessed sample from being mixed with each other.
摘要翻译：真空处理装置和方法包括至少一个真空处理室，至少一个托架，用于将来自给定盒的样品运送到真空处理室中。控制器执行托架控制，以将从给定盒取出的样品运送到真空处理室中，并将处理过的样品运送出真空处理室。等待的盒式支架支持等待盒，其中放置了来自给定盒的未处理样品或真空处理后的给定盒的处理样品，以防止处理和未处理的样品彼此混合。

6. 发明授权

US08033770B2 Vacuum processing apparatus 有权
标题翻译：真空加工设备
公开(公告)号：US08033770B2
公开(公告)日：2011-10-11
申请号：US12230466
申请日：2008-08-29
申请人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/677
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
摘要翻译：真空处理设备包括用于对样品进行真空处理的真空处理室，真空托架，可切换室，用于支撑多个能够容纳样品的盒的盒支架和用于支撑不同的等待盒的等待盒支架从支撑在盒支架上的盒子并且能够具有多个样品。大气托架能够在多个盒子或等待盒中的给定盒中携带样品。控制器执行控制以在给定的盒式磁带，等待盒和真空处理室之间携带未处理和处理的样品，使得处理的和未处理的样品的混合物不存在于给定的盒式磁带或等待盒中。

7. 发明申请

US20090010738A1 Vacuum processing apparatus and vacuum processing method 有权
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20090010738A1
公开(公告)日：2009-01-08
申请号：US12230466
申请日：2008-08-29
申请人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
发明人： Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
IPC分类号： H01L21/02
CPC分类号： H01L21/67167 , H01L21/67745 , Y10S414/136
摘要： A vacuum processing apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
摘要翻译：真空处理设备包括用于对样品进行真空处理的真空处理室，真空托架，可切换室，用于支撑多个能够容纳样品的盒的盒支架和用于支撑不同的等待盒的等待盒支架从支撑在盒支架上的盒子并且能够具有多个样品。大气托架能够在多个盒子或等待盒中的给定盒中携带样品。控制器执行控制以在给定的盒式磁带，等待盒和真空处理室之间携带未处理和处理的样品，使得处理的和未处理的样品的混合物不存在于给定的盒式磁带或等待盒中。

8. 发明授权

US07112805B2 Vacuum processing apparatus and vacuum processing method 失效
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US07112805B2
公开(公告)日：2006-09-26
申请号：US10875231
申请日：2004-06-25
申请人： Yoshitaka Kai , Kenichi Kuwabara , Takeo Uchino , Yasuhiro Nishimori , Takeshi Oono , Takeshi Shimada
发明人： Yoshitaka Kai , Kenichi Kuwabara , Takeo Uchino , Yasuhiro Nishimori , Takeshi Oono , Takeshi Shimada
IPC分类号： G01F23/00 , G01K5/08
CPC分类号： H01L21/67207 , H01L21/67167
摘要： The invention provides a semiconductor fabrication apparatus capable of preventing increase of carriage time of samples, deterioration of sample output, increase of footprint and increase of investment costs. The vacuum processing apparatus comprises a plurality of vacuum processing chambers for subjecting a sample to vacuum processing; a vacuum carriage for carrying the sample into and out of the vacuum processing chamber; a switchable chamber capable of being switched between atmosphere and vacuum for carrying the sample into and out of the vacuum processing chamber; a cassette support for supporting a plurality of cassettes and a controller for controlling carrying of the sample from a cassette through the switchable chambers, the vacuum carriage means into and out of the vacuum processing chamber. The vacuum processing chamber is equipped with an etching chamber and a critical dimension measurement chamber for critical dimension inspection of the sample.
摘要翻译：本发明提供一种半导体制造装置，其能够防止样品的携带时间增加，样品输出的劣化，占地面积的增加和投资成本的增加。真空处理装置包括用于对样品进行真空处理的多个真空处理室; 用于将样品进入和离开真空处理室的真空托架; 能够在大气和真空之间切换以将样品进出真空处理室的可切换室; 用于支撑多个盒的盒支撑件和控制器，用于控制样品从盒通过可切换室的携带，真空托架装置进入和离开真空处理室。真空处理室配有蚀刻室和临界尺寸测量室，用于对样品进行临界尺寸检验。

9. 发明申请

US20070023683A1 Vacuum processing apparatus and vacuum processing method 审中-公开
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20070023683A1
公开(公告)日：2007-02-01
申请号：US11518894
申请日：2006-09-12
申请人： Yoshitaka Kai , Kenichi Kuwabara , Takeo Uchino , Yasuhiro Nishimori , Takeshi Oono , Takeshi Shimada
发明人： Yoshitaka Kai , Kenichi Kuwabara , Takeo Uchino , Yasuhiro Nishimori , Takeshi Oono , Takeshi Shimada
IPC分类号： G01F23/00
CPC分类号： H01L21/67207 , H01L21/67167
摘要： A vacuum processing apparatus and method includes a sample taken out from a given cassette placed on a cassette support in atmosphere, the sample is carried into a vacuum processing chamber via a chamber enabling switching between atmosphere and vacuum, the sample is subjected to etching processing in the vacuum processing chamber, and at least one inspection process is carried out in the vacuum either before or after etching of the sample in the vacuum processing chamber. The at least one inspection process in the vacuum is a defect inspection.
摘要翻译：真空处理装置和方法包括从大气中放置在盒支架上的给定盒取出的样品，通过能够在大气和真空之间切换的室将样品运送到真空处理室中，对样品进行蚀刻处理在真空处理室中对样品进行蚀刻之前或之后，在真空中进行至少一次检查处理。真空中的至少一个检查过程是缺陷检查。

10. 发明申请

US20050218337A1 Vacuum processing apparatus and vacuum processing method 失效
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20050218337A1
公开(公告)日：2005-10-06
申请号：US10875231
申请日：2004-06-25
申请人： Yoshitaka Kai , Kenichi Kuwabara , Takeo Uchino , Yasuhiro Nishimori , Takeshi Oono , Takeshi Shimada
发明人： Yoshitaka Kai , Kenichi Kuwabara , Takeo Uchino , Yasuhiro Nishimori , Takeshi Oono , Takeshi Shimada
IPC分类号： H01L21/66 , H01J37/20 , H01L21/00 , H01L21/02 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67207 , H01L21/67167
摘要： The invention provides a semiconductor fabrication apparatus capable of preventing increase of carriage time of samples, deterioration of sample output, increase of footprint and increase of investment costs. The vacuum processing apparatus comprises a plurality of vacuum processing chambers 3, 4 for subjecting a sample 8 to vacuum processing; a vacuum carriage means 2 for carrying the sample into and out of the vacuum processing chamber; a switchable chamber 5 capable of being switched between atmosphere and vacuum for carrying the sample into and out of the vacuum processing chamber; a cassette supporting means 9 for supporting a plurality of cassettes 7 capable of housing samples; a carriage means 6 capable of moving vertically for taking out a sample from a given cassette on the cassette supporting means; and a control means performing carriage control for carrying the sample taken out of the given cassette via the carriage means, the switchable chamber and the vacuum carriage means into the vacuum processing chamber, and for carrying the processed sample out of the vacuum processing chamber; wherein the vacuum processing chamber is equipped with an etching chamber 3 and a defect inspection chamber or CD measurement chamber 4 for inspecting the sample for defects.
摘要翻译：本发明提供一种半导体制造装置，其能够防止样品的携带时间增加，样品输出的劣化，占地面积的增加和投资成本的增加。真空处理装置包括用于对样品8进行真空处理的多个真空处理室3,4; 用于将样品进出真空处理室的真空托架装置2; 能够在大气和真空之间切换的可切换室5，用于将样品进出真空处理室; 用于支撑能够容纳样品的多个盒带7的盒支撑装置9; 能够垂直移动以从盒支撑装置上的给定盒带取出样品的托架装置6; 以及控制装置，执行托架控制，用于将从所述给定盒中取出的样品经由所述滑架装置，所述可切换室和所述真空托架装置运送到所述真空处理室中，并将所述经处理的样品运送出所述真空处理室; 其中真空处理室配备有用于检查样品缺陷的蚀刻室3和缺陷检查室或CD测量室4。

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