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1. 发明申请

US20050086618A1 Apparatus and method for verifying an integrated circuit pattern 有权
标题翻译：用于验证集成电路图案的装置和方法
公开(公告)号：US20050086618A1
公开(公告)日：2005-04-21
申请号：US10948540
申请日：2004-09-24
申请人： Takeshi Ito , Takahiro Ikeda , Koji Hashimoto
发明人： Takeshi Ito , Takahiro Ikeda , Koji Hashimoto
IPC分类号： G01B11/24 , G01B21/20 , G06F17/50 , H01L21/66
CPC分类号： G06F17/5081
摘要： A first generator section generates a tolerance data corresponding to a target pattern set based on a design data of a semiconductor device. A second generator section generates an image data of a semi-conductor device pattern formed based on the target pattern. An extraction section extracts a contour data of the pattern from the image data supplied from the second generator section. A data synthesizing section is supplied with the tolerance data supplied from the second generator section and the contour data supplied from the extraction section. The data synthesizing section overlaps the tolerance data with the contour data.
摘要翻译：第一发生器部分基于半导体器件的设计数据生成对应于目标图案组的公差数据。第二发生器部分生成基于目标图案形成的半导体器件图案的图像数据。提取部分从从第二发生器部分提供的图像数据中提取图案的轮廓数据。向数据合成部分提供从第二发生器部分提供的公差数据和从提取部分提供的轮廓数据。数据合成部分与公差数据与轮廓数据重叠。

2. 发明申请

US20050024361A1 Graphic processing method and device 失效
标题翻译：图形处理方法和装置
公开(公告)号：US20050024361A1
公开(公告)日：2005-02-03
申请号：US10875295
申请日：2004-06-25
申请人： Takahiro Ikeda , Koji Hashimoto , Takeshi Ito
发明人： Takahiro Ikeda , Koji Hashimoto , Takeshi Ito
IPC分类号： G06T3/00 , G06K9/48 , G06T7/00 , G06T11/20 , G06T11/00
CPC分类号： G06T7/0004 , G06K9/48 , G06T7/66 , G06T2207/20044
摘要： There is disclosed a graphic processing method in which a first figure skeleton apart from an outline of a figure by each equal distance in a central direction of the figure is calculated using at least one of a medial axis and a chordal axis with respect to a figure representing the outline of the object shape reflected in a digital image by a set of points, branch lines to the skeleton from a vertex of the figure in the calculated first figure skeleton are removed to obtain a second figure skeleton, and a curve coordinate system is defined using the second figure skeleton as one coordinate axis and using a distance between the second figure skeleton and the outline of the figure as the other coordinate axis with respect to data obtained by one circulation of the outline of the figure using one end point of the second figure skeleton as a start point and using the other end point as a terminal point to transform the coordinate of points on the outline of the figure into the other coordinate axis of the curve coordinate system.
摘要翻译：公开了一种图形处理方法，其中使用相对于图形的中间轴和弦线中的至少一个来计算除了图形的中心方向上每个相等距离的图形的轮廓之外的第一图形框架代表通过一组点反映在数字图像中的对象形状的轮廓，去除所计算的第一图形骨架中的从图形的顶点到骨架的分支线以获得第二图形骨架，并且曲线坐标系为使用第二图形骨架作为一个坐标轴定义，并且使用第二图形框架和图形的轮廓之间的距离作为另一个坐标轴，相对于通过使用图形的一个端点的图形的轮廓的一次循环而获得的数据第二个图形骨架作为起始点，并使用另一个终点作为终点将图形轮廓上的点的坐标转换为另一个坐标曲线坐标系的坐标轴。

3. 发明授权

US07412671B2 Apparatus and method for verifying an integrated circuit pattern 有权
标题翻译：用于验证集成电路图案的装置和方法
公开(公告)号：US07412671B2
公开(公告)日：2008-08-12
申请号：US10948540
申请日：2004-09-24
申请人： Takeshi Ito , Takahiro Ikeda , Koji Hashimoto
发明人： Takeshi Ito , Takahiro Ikeda , Koji Hashimoto
IPC分类号： G06F17/50
CPC分类号： G06F17/5081
摘要： A first generator section generates a tolerance data corresponding to a target pattern set based on a design data of a semiconductor device. A second generator section generates an image data of a semi-conductor device pattern formed based on the target pattern. An extraction section extracts a contour data of the pattern from the image data supplied from the second generator section. A data synthesizing section is supplied with the tolerance data supplied from the second generator section and the contour data supplied from the extraction section. The data synthesizing section overlaps the tolerance data with the contour data.
摘要翻译：第一发生器部分基于半导体器件的设计数据生成对应于目标图案组的公差数据。第二发生器部分生成基于目标图案形成的半导体器件图案的图像数据。提取部分从从第二发生器部分提供的图像数据中提取图案的轮廓数据。向数据合成部分提供从第二发生器部分提供的公差数据和从提取部分提供的轮廓数据。数据合成部分与公差数据与轮廓数据重叠。

4. 发明授权

US07177480B2 Graphic processing method and device 失效
标题翻译：图形处理方法和装置
公开(公告)号：US07177480B2
公开(公告)日：2007-02-13
申请号：US10875295
申请日：2004-06-25
申请人： Takahiro Ikeda , Koji Hashimoto , Takeshi Ito
发明人： Takahiro Ikeda , Koji Hashimoto , Takeshi Ito
IPC分类号： G06K9/42 , G09G5/00
CPC分类号： G06T7/0004 , G06K9/48 , G06T7/66 , G06T2207/20044
摘要： There is disclosed a graphic processing method in which a first figure skeleton apart from an outline of a figure by each equal distance in a central direction of the figure is calculated using at least one of a medial axis and a chordal axis with respect to a figure representing the outline of the object shape reflected in a digital image by a set of points, branch lines to the skeleton from a vertex of the figure in the calculated first figure skeleton are removed to obtain a second figure skeleton, and a curve coordinate system is defined using the second figure skeleton as one coordinate axis and using a distance between the second figure skeleton and the outline of the figure as the other coordinate axis with respect to data obtained by one circulation of the outline of the figure using one end point of the second figure skeleton as a start point and using the other end point as a terminal point to transform the coordinate of points on the outline of the figure into the other coordinate axis of the curve coordinate system.
摘要翻译：公开了一种图形处理方法，其中使用相对于图形的中间轴和弦线中的至少一个来计算除了图形的中心方向上每个相等距离的图形的轮廓之外的第一图形框架代表通过一组点反映在数字图像中的对象形状的轮廓，去除所计算的第一图形骨架中的从图形的顶点到骨架的分支线以获得第二图形骨架，并且曲线坐标系为使用第二图形骨架作为一个坐标轴定义，并且使用第二图形框架和图形的轮廓之间的距离作为另一个坐标轴，相对于通过使用图形的一个端点的图形的轮廓的一次循环而获得的数据第二个图形骨架作为起始点，并使用另一个终点作为终点将图形轮廓上的点的坐标转换为另一个坐标曲线坐标系的坐标轴。

5. 发明申请

US20060039596A1 Pattern measuring method, pattern measuring apparatus, photo mask manufacturing method, semiconductor device manufacturing method, and computer program product 审中-公开
标题翻译：图案测量方法，图案测量装置，光掩模制造方法，半导体器件制造方法和计算机程序产品
公开(公告)号：US20060039596A1
公开(公告)日：2006-02-23
申请号：US11205017
申请日：2005-08-17
申请人： Shigeki Nojima , Hiroshi Motoki , Takahiro Ikeda , Satoshi Tanaka , Takeshi Ito
发明人： Shigeki Nojima , Hiroshi Motoki , Takahiro Ikeda , Satoshi Tanaka , Takeshi Ito
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： A pattern measuring method includes preparing a substrate comprising a pattern, extracting a place to be measured on the substrate based on a simulation using pattern data relating to the pattern as input data, generating measurement information for measuring a physical quantity of the place to be measured by a measuring apparatus, and measuring the place to be measured based on the measurement information by the measuring apparatus.
摘要翻译：图案测量方法包括：准备包括图案的基板，基于使用与图案相关的图案数据作为输入数据的模拟，在基板上提取待测量的地方，生成用于测量待测位置的物理量的测量信息通过测量装置，并且基于测量装置的测量信息来测量待测量的位置。

6. 发明申请

US20080235650A1 PATTERN CREATION METHOD, MASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 失效
标题翻译：图形创建方法，掩模制造方法和半导体器件制造方法
公开(公告)号：US20080235650A1
公开(公告)日：2008-09-25
申请号：US12050764
申请日：2008-03-18
申请人： Takeshi Ito , Satoshi Tanaka , Toshiya Kotani , Tadahito Fujisawa , Koji Hashimoto
发明人： Takeshi Ito , Satoshi Tanaka , Toshiya Kotani , Tadahito Fujisawa , Koji Hashimoto
IPC分类号： G06F17/50
CPC分类号： G03F1/00
摘要： A pattern creation method, including laying out data of a most extreme end pattern of integrated circuit patterns on a first layer and laying out data of the integrated circuit patterns excluding the most extreme end pattern on a second layer, extracting data of a first most proximate pattern being most proximate to the most extreme end pattern from the second layer and converting the extracted data to a third layer, generating data of a contacting pattern which contacts both the first most proximate pattern and the most extreme end pattern in a fourth layer, generating data of a non-overlapping pattern of the contacting pattern excluding overlapping portions with the most extreme end pattern and the first most proximate pattern in a fifth layer, extracting data of a second most proximate pattern being most proximate to the non-overlapping pattern and converting the extracted data to the first layer.
摘要翻译：一种图案创建方法，包括在第一层上布置集成电路图案的最极端格式的数据，并且在第二层上布置不包括最末端图案的集成电路图案的数据，提取第一最接近的数据图案最接近于来自第二层的最末端图案，并将所提取的数据转换为第三层，产生在第四层中接触第一最近图案和最末端图案的接触图案的数据，产生接触图案的非重叠图案的数据，不包括在第五层中具有最末端图案和最前端图案和第一最近图案的重叠部分，提取最接近图案的第二最接近图案的数据，其最接近非重叠图案并且转换提取的数据到第一层。

7. 发明授权

US07669172B2 Pattern creation method, mask manufacturing method and semiconductor device manufacturing method 失效
标题翻译：图案形成方法，掩模制造方法和半导体器件制造方法
公开(公告)号：US07669172B2
公开(公告)日：2010-02-23
申请号：US12050764
申请日：2008-03-18
申请人： Takeshi Ito , Satoshi Tanaka , Toshiya Kotani , Tadahito Fujisawa , Koji Hashimoto
发明人： Takeshi Ito , Satoshi Tanaka , Toshiya Kotani , Tadahito Fujisawa , Koji Hashimoto
IPC分类号： G06F17/50
CPC分类号： G03F1/00
摘要： A pattern creation method, including laying out data of a most extreme end pattern of integrated circuit patterns on a first layer and laying out data of the integrated circuit patterns excluding the most extreme end pattern on a second layer, extracting data of a first most proximate pattern being most proximate to the most extreme end pattern from the second layer and converting the extracted data to a third layer, generating data of a contacting pattern which contacts both the first most proximate pattern and the most extreme end pattern in a fourth layer, generating data of a non-overlapping pattern of the contacting pattern excluding overlapping portions with the most extreme end pattern and the first most proximate pattern in a fifth layer, extracting data of a second most proximate pattern being most proximate to the non-overlapping pattern and converting the extracted data to the first layer.
摘要翻译：一种图案创建方法，包括在第一层上布置集成电路图案的最极端格式的数据，并且在第二层上布置不包括最末端图案的集成电路图案的数据，提取第一最接近的数据图案最接近于来自第二层的最末端图案，并将所提取的数据转换为第三层，产生在第四层中接触第一最近图案和最末端图案的接触图案的数据，产生接触图案的非重叠图案的数据，不包括在第五层中具有最末端图案和最前端图案和第一最近图案的重叠部分，提取最接近图案的第二最接近图案的数据，其最接近非重叠图案并且转换提取的数据到第一层。

8. 发明申请

US20050123858A1 Method for forming pattern and method for manufacturing semiconductor device 审中-公开
标题翻译：形成图案的方法和制造半导体器件的方法
公开(公告)号：US20050123858A1
公开(公告)日：2005-06-09
申请号：US10969174
申请日：2004-10-21
申请人： Takeshi Ito , Koji Hashimoto , Tadahito Fujisawa
发明人： Takeshi Ito , Koji Hashimoto , Tadahito Fujisawa
IPC分类号： G03F7/00 , G03F7/20 , G03F7/40 , H01L21/027 , H01L21/28
CPC分类号： G03F7/40 , G03F7/0035
摘要： A method for forming a pattern having holes arrayed with spacing less than resolution of exposure tool, includes forming first resist pattern including first resist openings having width and spacing equal to or greater than the resolution, in first resist film coated on underlying film. First shrank pattern including first holes having dimension equal to or less than the resolution in the underlying film is formed by first shrink process to the first resist pattern. Second resist pattern including second resist openings arrayed between the first holes having width equal to or greater than the resolution, is formed in second resist film coated on the underlying film. Second shrank pattern including second holes having dimension equal to or less than the resolution in the underlying film is formed by second shrink process to the second resist pattern.
摘要翻译：一种用于形成具有间隔小于曝光工具的分辨率的孔的图案的方法，包括在涂覆在下面的膜上的第一抗蚀剂膜中形成包括具有等于或大于分辨率的宽度和间距的第一抗蚀剂开口的第一抗蚀剂图案。通过对第一抗蚀剂图案进行第一收缩处理，形成包括尺寸等于或小于底层膜中的分辨率的第一孔的第一缩小图案。第二抗蚀剂图案包括排列在宽度等于或大于分辨率的第一孔之间的第二抗蚀剂孔，形成在涂覆在下面的膜上的第二抗蚀剂膜中。通过对第二抗蚀剂图案的第二收缩工艺形成包括尺寸等于或小于底层膜中的分辨率的第二孔的第二缩小图案。

9. 发明授权

US09756242B2 Communication terminal, display method, and computer program product 有权
公开(公告)号：US09756242B2
公开(公告)日：2017-09-05
申请号：US13902124
申请日：2013-05-24
申请人： Toru Harada , Hiroyuki Satoh , Noriyuki Terao , Yoshiaki Irino , Tomonori Tanaka , Nozomi Imae , Hirokazu Takenaka , Hideaki Yamamoto , Kensuke Masuda , Satoshi Sawaguchi , Satoshi Taneichi , Masanori Watanabe , Takeshi Ito
发明人： Toru Harada , Hiroyuki Satoh , Noriyuki Terao , Yoshiaki Irino , Tomonori Tanaka , Nozomi Imae , Hirokazu Takenaka , Hideaki Yamamoto , Kensuke Masuda , Satoshi Sawaguchi , Satoshi Taneichi , Masanori Watanabe , Takeshi Ito
IPC分类号： H04N5/232 , G06F17/30 , G06F3/0481
CPC分类号： H04N5/23238 , G06F3/04817 , G06F17/30274
摘要： A communication terminal displays thumbnails for predetermined-region images in a panoramic image and accepts a selection of a predetermined thumbnail so as to display the predetermined-region image corresponding to the accepted thumbnail. This brings about an effect that a user can easily find a desired panoramic image or a desired predetermined-region image in the panoramic image.

10. 发明授权

US08562194B2 Wavelength conversion unit and illumination apparatus including the unit 有权
标题翻译：波长转换单元和包括该单元的照明装置
公开(公告)号：US08562194B2
公开(公告)日：2013-10-22
申请号：US13009042
申请日：2011-01-19
申请人： Masahiro Nishio , Takeshi Ito , Hiroyuki Kamee
发明人： Masahiro Nishio , Takeshi Ito , Hiroyuki Kamee
IPC分类号： F21V7/04 , G02B7/02 , G05D25/00
CPC分类号： G02B6/262 , G02B6/0003 , G02B6/0008
摘要： A wavelength conversion unit includes a wavelength conversion member that transmits a part of incident excitation light and converts a part of the excitation light into wavelength-converted light having a wavelength different from a wavelength of the excitation light to emit the wavelength-converted light. The excitation light has an intensity distribution in which an intensity is maximum at the center and decreases as getting apart from the center. A thickness of the wavelength conversion member at a portion into which light at the center of the intensity distribution of the excitation light enters is larger than those at any other portions.
摘要翻译：波长转换单元包括：波长转换部件，其传输入射激发光的一部分，并将一部分激发光转换为具有与激发光的波长不同的波长的波长转换光，以发射波长转换的光。激发光具有在中心处强度最大的强度分布，并且随着与中心分离而减小。在激发光的强度分布的中心的光入射的部分处的波长转换构件的厚度大于任何其它部分处的光的厚度。

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