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1. 发明授权

US5494524A Vertical heat treatment device for semiconductor 失效
标题翻译：半导体立式热处理装置
公开(公告)号：US5494524A
公开(公告)日：1996-02-27
申请号：US166999
申请日：1993-12-16
申请人： Takeshi Inaba , Eiichi Toya , Takashi Tanaka , Yasumi Sasaki
发明人： Takeshi Inaba , Eiichi Toya , Takashi Tanaka , Yasumi Sasaki
IPC分类号： H01L21/205 , C23C16/01 , C23C16/32 , C23C16/34 , C30B25/12 , H01L21/22 , H01L21/31 , H01L21/673 , H01L21/683 , C23C16/00 , B05C13/00 , B05C13/02 , B05C21/00
CPC分类号： H01L21/67306 , C23C16/01 , C23C16/325 , C23C16/345 , C30B25/12 , H01L21/67309
摘要： End members are located at the top and the bottom of a vertical heat treatment device. A plurality of support members are vertically mounted on the end members. A plurality of wafer hold members are fixed on the support members in a parallel manner, each of which is formed in an approximately circular arc shape. The wafer hold member is made of SiC by a CVD method or Si3N4 by a CVD method. The wafer hold member has a plate portion on which a wafer is to be placed and a reinforce portion connected to the plate portion. The plate portion is 100-1000 microns in thickness.
摘要翻译：端部件位于垂直热处理装置的顶部和底部。多个支撑构件垂直地安装在端部构件上。多个晶片保持构件以平行方式固定在支撑构件上，每个晶片保持构件形成为大致圆弧形状。晶片保持构件通过CVD法由SiC或Si 3 N 4通过CVD法制成。晶片保持构件具有其上要放置晶片的板部分和连接到板部分的加强部分。板部的厚度为100-1000微米。

2. 发明授权

US5449545A Ceramic device 失效
标题翻译：陶瓷装置
公开(公告)号：US5449545A
公开(公告)日：1995-09-12
申请号：US006856
申请日：1993-01-21
申请人： Eiichi Toya , Yukio Itoh , Takashi Tanaka , Yasumi Sasaki
发明人： Eiichi Toya , Yukio Itoh , Takashi Tanaka , Yasumi Sasaki
IPC分类号： G03F1/22 , G03F1/60 , H01L21/027 , G03F9/00
CPC分类号： G03F1/22 , Y10T428/24322 , Y10T428/24331 , Y10T428/24355 , Y10T428/24917 , Y10T428/265 , Y10T428/30
摘要： A ceramic device is disclosed that has a silicon base plate, a first ceramic film formed on a first surface of the silicon base plate, a second ceramic film formed on a second surface of the silicon base plate opposite to the first surface, and an operation opening formed in the silicon base plate between the first and second surfaces. A surface portion of the first ceramic film exposed to the operation opening Is a mirror surface having 0.05 micrometers or less of center line average height Ra. A mirror surface keeping film can be formed between the first surface of the silicon base plate and the first ceramic film for keeping a mirror surface in an etching step to etch the silicon base plate, and the silicon base plate can be reduced partially in the etching step for forming an operation opening thereby exposing a corresponding portion of the mirror surface keeping film to the operation opening.
摘要翻译：公开了一种陶瓷器件，其具有硅基板，形成在硅基板的第一表面上的第一陶瓷膜，形成在与第一表面相对的硅基板的第二表面上的第二陶瓷膜，以及操作开口形成在第一和第二表面之间的硅基板中。暴露于操作开口的第一陶瓷膜的表面部分是具有0.05微米或更小的中心线平均高度Ra的镜面。在蚀刻步骤中，在硅基板的第一表面和第一陶瓷膜之间可以形成镜面保持膜，用于在蚀刻步骤中保持镜面，以蚀刻硅基板，并且可以在蚀刻中部分地减少硅基板用于形成操作开口的步骤，从而将镜面保持膜的相应部分暴露于操作开口。

3. 发明授权

US5200157A Susceptor for vapor-growth deposition 失效
标题翻译：蒸气生长沉积物的受体
公开(公告)号：US5200157A
公开(公告)日：1993-04-06
申请号：US668329
申请日：1991-03-14
申请人： Eiichi Toya , Masayuki Ohkawa , Kazuo Itoh , Yasumi Sasaki
发明人： Eiichi Toya , Masayuki Ohkawa , Kazuo Itoh , Yasumi Sasaki
IPC分类号： C30B25/12
CPC分类号： C30B25/12
摘要： The susceptor according to the present invention comprises a main body in the shape of a trapezoidal plate, and which has three circular depressions formed in its surface. The main body is made of silicon carbide having a bulk density of 3.00 g/cm.sup.3 or more. At least 70% of the surface region of the main body is made of crystal particles having a diameter of 5 .mu.m or more. The main body has a thickness of, for example, 700 .mu.m. Six susceptors are attached to a hexagonal upper plate which is fastened to a shaft, and also to a hexagonal lower plate, thereby forming a barrel. Silicon wafers are placed in the circular depressions, so that single-crystal layers may be epitaxially formed on the wafers.
摘要翻译：根据本发明的感受体包括呈梯形板形状的主体，并且在其表面上形成有三个圆形凹陷。主体由堆积密度为3.00g / cm 3以上的碳化硅构成。主体的表面区域的至少70％由直径为5μm以上的结晶粒子构成。主体的厚度例如为700μm。六个感受体连接到六角形上板，该六角形上板被固定到轴上，并且还连接到六边形下板，从而形成筒。将硅晶片放置在圆形凹陷中，使得可以在晶片上外延形成单晶层。

4. 发明授权

US5074017A Susceptor 失效
标题翻译： SUSCEPTOR
公开(公告)号：US5074017A
公开(公告)日：1991-12-24
申请号：US454782
申请日：1989-12-26
申请人： Eiichi Toya , Yukio Itoh , Tadashi Ohashi , Masayuki Sumiya , Yasumi Sasaki
发明人： Eiichi Toya , Yukio Itoh , Tadashi Ohashi , Masayuki Sumiya , Yasumi Sasaki
IPC分类号： C30B25/12 , C23C16/44 , C23C16/458 , H01L21/205 , H01L21/31
CPC分类号： C23C16/4584 , Y10T29/41
摘要： A susceptor for use in a vertical vapor growth apparatus includes a susceptor body (12) having an upper surface, a plurality of wafer receiving portions (17) formed in the upper surface of the susceptor body (12), and plates (16) fixed in the upper surface of the susceptor body (12) near the wafer setting portions (17). The plates (16) have an upper surface such that, when wafers (5) are mounted in the wafer setting portions (17), the upper surfaces of the plates (16) and the wafers (5) are positioned substantially in the same plane. The plates (16) are made of quartz glass or fused silica.
摘要翻译：用于垂直气相生长装置的基座包括具有上表面的基座体（12），形成在基座体（12）的上表面中的多个晶片接收部分（17），以及固定在靠近晶片设置部分（17）的基座主体（12）的上表面中。板（16）具有上表面，使得当晶片（5）安装在晶片设置部分（17）中时，板（16）和晶片（5）的上表面基本上位于同一平面。板（16）由石英玻璃或熔融石英制成。

5. 发明授权

US5324411A Electrode plate for plasma etching 失效
标题翻译：用于等离子体蚀刻的电极板
公开(公告)号：US5324411A
公开(公告)日：1994-06-28
申请号：US946602
申请日：1992-09-18
申请人： Masahiko Ichishima , Yasumi Sasaki , Eiichi Toya , Masatoshi Kasahara , Ritsurou Makita
发明人： Masahiko Ichishima , Yasumi Sasaki , Eiichi Toya , Masatoshi Kasahara , Ritsurou Makita
IPC分类号： H01L21/302 , H01J37/32 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/3244 , Y10S156/914
摘要： A disc-shaped electrode plate body is made of high-purity glassy carbon and has a large number of very-small-diameter through holes each of which has a plurality of spherical recesses in its internal wall surface.
摘要翻译：盘状电极板体由高纯度玻璃碳制成，并且具有大量非常小直径的通孔，每个通孔在其内壁表面具有多个球形凹槽。

6. 发明授权

US5448418A Mirror for SOR 失效
标题翻译： SOR镜
公开(公告)号：US5448418A
公开(公告)日：1995-09-05
申请号：US29648
申请日：1993-03-10
申请人： Shirou Hotate , Hiraku Yamazaki , Teruo Sugai , Shigeo Kato , Haruo Tazoe , Hiroaki Koike , Takeshi Inaba , Eiichi Toya , Shinichi Inoue
发明人： Shirou Hotate , Hiraku Yamazaki , Teruo Sugai , Shigeo Kato , Haruo Tazoe , Hiroaki Koike , Takeshi Inaba , Eiichi Toya , Shinichi Inoue
IPC分类号： G02B5/08 , G21K1/06 , H05H13/04
CPC分类号： B82Y10/00 , G21K1/062 , G21K2201/061 , Y10T428/2495 , Y10T428/24975
摘要： A mirror for SOR includes a base (1) made of a heat resistant ceramic material having a surface, a first SiC coating (2, 3) formed on the surface of the base (1), which has a first smoothed surface, and a second SiC coating (4, 5) formed on the first smoothed surface of the first SiC coating (2, 3), which has a second smoothed surface. A third SiC coating can be formed on the smoothed surface of the second SiC coating (4).
摘要翻译：用于SOR的反射镜包括由具有表面的耐热陶瓷材料制成的基座（1），形成在基部（1）的表面上的第一SiC涂层（2,3），其具有第一平滑表面，以及形成在所述第一SiC涂层（2,3）的第一平滑表面上的第二SiC涂层（4,5），其具有第二平滑表面。可以在第二SiC涂层（4）的平滑表面上形成第三SiC涂层。

7. 发明授权

US6043468A Carbon heater 失效
标题翻译：碳加热器
公开(公告)号：US6043468A
公开(公告)日：2000-03-28
申请号：US126847
申请日：1998-07-31
申请人： Eiichi Toya , Masahiko Ichishima , Tomio Konn , Tomohiro Nagata , Shigeru Yamamura , Norihiko Saito , Kouji Teraoka , Takeshi Inaba , Hiroyuki Honma , Ken Nakao , Takanori Saito , Hisaei Osanai , Toshiyuki Makiya
发明人： Eiichi Toya , Masahiko Ichishima , Tomio Konn , Tomohiro Nagata , Shigeru Yamamura , Norihiko Saito , Kouji Teraoka , Takeshi Inaba , Hiroyuki Honma , Ken Nakao , Takanori Saito , Hisaei Osanai , Toshiyuki Makiya
IPC分类号： C30B15/14 , C30B35/00 , H05B3/44
CPC分类号： C30B35/00 , C30B15/14 , H05B2203/003
摘要： A carbon heater comprising heater members (11, 111, 121 . . . 161, 212, 222, 315, 325 . . . 345, 411, 515, 612) in which a plurality of carbon fiber bundles having a plurality of carbon fibers whose diameter is 5 to 15 .mu.m bundled are woven into a longitudinally elongated shape such as a wire shape or a tape shape and the impurity content is less than 10 ppm in ashes.
摘要翻译：一种碳加热器，包括加热器构件（11,111,121,161,212,222,315,325,354,411,515,612），其中多个碳纤维束具有多个碳纤维，捆扎的直径为5〜15μm被编织成纵向细长形状，例如线状或带状，杂质含量在灰分中小于10ppm。

8. 发明授权

US5492229A Vertical boat and a method for making the same 失效
标题翻译：垂直船和制作相同的方法
公开(公告)号：US5492229A
公开(公告)日：1996-02-20
申请号：US151386
申请日：1993-11-12
申请人： Takashi Tanaka , Jun Yoshikawa , Eiichi Toya , Atsuo Kitazawa , Kazunori Meguro , Tatsuo Nozawa , Yutaka Ishizuka , Yoshiyuki Watanabe , Masaru Seino , Hideo Nakanishi
发明人： Takashi Tanaka , Jun Yoshikawa , Eiichi Toya , Atsuo Kitazawa , Kazunori Meguro , Tatsuo Nozawa , Yutaka Ishizuka , Yoshiyuki Watanabe , Masaru Seino , Hideo Nakanishi
IPC分类号： C30B31/14 , H01L21/673 , A47F7/00
CPC分类号： H01L21/67309 , C30B31/14
摘要： A vertical boat for holding a plurality of semiconductor wafers comprising two end members (2) positioned at the top and the bottom of the vertical boat, and a plurality of support members (3,4,5,6,104) vertically mounted on the end members (2) for supporting the wafers, wherein each support member (3,4,5,6,104) is formed by a plate-like member having a series of slits (9,10,7,8,108) formed thereon in such a manner that a plurality of support arms are defined by the slits (9,10,7,8,108) at a predetermined interval, each support arm having a support projection (11,12,13,14,112) formed at the end thereof, and wherein the inner portions (P) of the wafer (1) is to be supported by the support projections (11,12,13,14,112) whereas the periphery of the wafer (1) does not contact the arms of the support members (3,4,5,6,104). The slits can be formed in two steps: forming a series of first slit portions on the plate-like member at a predetermined interval so as to retain two side walls of the plate-like member; and forming a series of second small slit portions on one of the side walls at the same interval so as to connect each second slit portion to the corresponding first slit portion.
摘要翻译：一种用于保持多个半导体晶片的垂直船，包括位于垂直船的顶部和底部的两个端部构件（2）和垂直安装在端部构件上的多个支撑构件（3,4,5,6,104）（2），用于支撑晶片，其中每个支撑构件（3,4,5,6,104）由其上形成有一系列狭缝（9,10,7,8,108）的板状构件形成，其方式使得多个支撑臂由狭缝（9,10,7,8,108）以预定的间隔限定，每个支撑臂具有在其端部形成的支撑突起（11,12,13,14,112），并且其中内部晶片（1）的部分（P）将由支撑突起（11,12,13,14,112）支撑，而晶片（1）的周边不与支撑部件（3,4）的臂接触， 5,6,104）。狭缝可以分成两个步骤：以预定间隔在板状构件上形成一系列第一狭缝部分，以便保持板状构件的两个侧壁; 并且在一个侧壁上以相同的间隔形成一系列第二小狭缝部分，以将每个第二狭缝部分连接到相应的第一狭缝部分。

9. 发明申请

US20050133494A1 Carbon wire heating object sealing heater and fluid heating apparatus using the same heater 有权
标题翻译：碳丝加热对象密封加热器和使用相同加热器的流体加热装置
公开(公告)号：US20050133494A1
公开(公告)日：2005-06-23
申请号：US11038283
申请日：2005-01-21
申请人： Norihiko Saito , Hiroyuki Honma , Hiroshi Mori , Eiichi Toya , Tomio Konn , Tomohiro Nagata , Sunao Seko , Akira Otsu , Takanori Saito , Ken Nakao , Kazutoshi Miura , Harunari Hasegawa , George Hoshi , Katsutoshi Ishi
发明人： Norihiko Saito , Hiroyuki Honma , Hiroshi Mori , Eiichi Toya , Tomio Konn , Tomohiro Nagata , Sunao Seko , Akira Otsu , Takanori Saito , Ken Nakao , Kazutoshi Miura , Harunari Hasegawa , George Hoshi , Katsutoshi Ishi
IPC分类号： H01L23/34 , H05B3/14 , H05B3/34
CPC分类号： H05B3/145 , H01L2924/0002 , H01L2924/00
摘要： A carbon wire heating element sealing heater is provided. Therein, a carbon wire heating element using carbon fibers is sealed in a quartz glass member, wherein absorption water quantity of the carbon wire heating element is 2×10−3 g/cm3 or less.
摘要翻译：提供碳丝加热元件密封加热器。其中，使用碳纤维的碳丝加热元件密封在石英玻璃构件中，其中碳线加热元件的吸收水量为2×10 -3 / cm 3 或更少。

10. 发明授权

US06407371B1 Heater 有权
公开(公告)号：US06407371B1
公开(公告)日：2002-06-18
申请号：US09451868
申请日：1999-12-01
申请人： Eiichi Toya , Tomio Konn , Tomohiro Nagata , Norihiko Saito , Shigeru Yamamura , Ken Nakao , Takanori Saito , Hisaei Osanai , Toshiyuki Makiya
发明人： Eiichi Toya , Tomio Konn , Tomohiro Nagata , Norihiko Saito , Shigeru Yamamura , Ken Nakao , Takanori Saito , Hisaei Osanai , Toshiyuki Makiya
IPC分类号： H05B310
CPC分类号： H05B3/0047 , H01L2924/0002 , H01L2924/00
摘要： A rod-shaped heater provided is composed of a carbon wire heating element 2 sealed in a small or large diameter quartz glass tube, a small diameter quartz glass tube portions 3a and 3b charged with compressed wire carbon members at opposite ends thereof; a sealed terminal section 10 having connection lines 11a and 11b for power supply held between the compressed wire carbon members charged in the small diameter quartz glass tube. The connection lines and the carbon wire heating element are electrically connected by way of the wire carbon members. This rod-shaped heater using the carbon wire heating element is suitable for readily raising the temperature of the agent in the storage tank of the wet etching agent or the grinding agent.

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