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    • 6. 发明申请
    • OXIDE SUPERCONDUCTOR AND METHOD FOR PRODUCING THE SAME
    • 氧化物超导体及其制造方法
    • US20110172103A1
    • 2011-07-14
    • US12900024
    • 2010-10-07
    • Takeshi Araki
    • Takeshi Araki
    • H01L39/12H01L39/24B32B15/00
    • H01L39/2425C23C18/1216C23C18/1254C23C18/1295Y10T29/49014Y10T428/24975Y10T428/26
    • An oxide superconductor film formed on a substrate includes an oxide containing at least one metal M selected from the group consisting of yttrium and lanthanoid metals, provided that cerium, praseodymium, promethium and ruthenium are excluded, and barium and copper, in which the film has an average thickness of 350 nm or more, an average amount of residual carbon of 3×1019 atoms/cc or more, and an amount of residual fluorine in a range of 5×1017 to 1×1019 atoms/cc, and in which, when divided the film into a plurality of regions from a surface of the film or from an interface between the film and the substrate, each region having a thickness of 10 nm, atomic ratios of copper, fluorine, oxygen and carbon between two adjacent regions are in a range of ⅕ times to 5 times.
    • 形成在基板上的氧化物超导体膜包括含有选自钇和镧系金属中的至少一种选自金属M的氧化物的氧化物,条件是除去铈,镨,ium和钌,以及其中所述膜具有的钡和铜 350nm以上的平均厚度,3×1019个原子/ cc以上的残存碳的平均量和5×1017〜1×1019个原子/ cc范围内的残留氟量,其中, 当将薄膜从薄膜的表面或薄膜与基片之间的界面分成多个区域时,两个相邻区域之间的厚度为10nm,铜,氟,氧和碳原子比的区域为 在⅕倍至5倍的范围内。