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1. 发明申请

US20130059951A1 HIGH HEAT-RESISTANT POLYGERMANE COMPOUND WITH SULFUR-CONTAINING ORGANIC GROUP 有权
标题翻译：具有含硫有机物的高耐热聚合物化合物
公开(公告)号：US20130059951A1
公开(公告)日：2013-03-07
申请号：US13579188
申请日：2011-02-16
申请人： Takehiro Nagasawa , Akira Watanabe , Tokuji Miyashita
发明人： Takehiro Nagasawa , Akira Watanabe , Tokuji Miyashita
IPC分类号： C07F7/30 , C08K5/56
CPC分类号： C07F7/30 , C08G79/00 , C08G79/14 , C08L85/00 , C09D133/08
摘要： There is provided a polygermane compound forming a film having a high refractive index and thermal stability, and containing a sulfur atom-containing organic group as a group bonded to a germanium atom. A polygermane compound comprising a sulfur atom-containing organic group as a group bonded to a germanium atom, in which the sulfur atom-containing organic group is a group of Formula [1]: -L-Z [1] where L is a single bond, a C1-6 alkylene group, or a C4-20 arylene group optionally substituted with a C1-6 alkyl group; and Z is a C1-20 sulfide group, a C1-14 cyclic sulfide group optionally substituted with a C1-6 alkyl group, a C2-20 alkyl group containing a sulfide bond, or a C5-20 aralkyl group containing a sulfide bond, with a proviso that when L is a single bond, Z is not a C1-20 sulfide group.
摘要翻译：提供了形成具有高折射率和热稳定性并且含有作为与锗原子键合的基团的含硫原子的有机基团的膜的聚锗烷化合物。包含含硫原子的有机基团作为与锗原子键合的基团的多锗烷化合物，其中含硫原子的有机基团为式[1]的基团：-LZ [1]，其中L为单键， C 1-6亚烷基或任选被C 1-6烷基取代的C 4-20亚芳基; Z为碳原子数为20-20的硫基，可以被C 1-6烷基取代的C 1-14环硫醚基，含硫醚键的碳原子数为20-20的烷基或含有硫醚键的碳原子数为5〜20的芳烷基，条件是当L是单键时，Z不是C1-20硫醚基团。

2. 发明授权

US08575249B2 High heat-resistant polygermane compound with sulfur-containing organic group 有权
标题翻译：高耐热聚锗烷化合物与含硫有机基团
公开(公告)号：US08575249B2
公开(公告)日：2013-11-05
申请号：US13579188
申请日：2011-02-16
申请人： Takehiro Nagasawa , Akira Watanabe , Tokuji Miyashita
发明人： Takehiro Nagasawa , Akira Watanabe , Tokuji Miyashita
IPC分类号： C07F7/30 , C08K5/56
CPC分类号： C07F7/30 , C08G79/00 , C08G79/14 , C08L85/00 , C09D133/08
摘要： There is provided a polygermane compound forming a film having a high refractive index and thermal stability, and containing a sulfur atom-containing organic group as a group bonded to a germanium atom. A polygermane compound comprising a sulfur atom-containing organic group as a group bonded to a germanium atom, in which the sulfur atom-containing organic group is a group of Formula [1]: -L-Z [1] where L is a single bond, a C1-6 alkylene group, or a C4-20 arylene group optionally substituted with a C1-6 alkyl group; and Z is a C1-20 sulfide group, a C1-14 cyclic sulfide group optionally substituted with a C1-6 alkyl group, a C2-20 alkyl group containing a sulfide bond, or a C5-20 aralkyl group containing a sulfide bond, with a proviso that when L is a single bond, Z is not a C1-20 sulfide group.
摘要翻译：提供了形成具有高折射率和热稳定性并且含有作为与锗原子键合的基团的含硫原子的有机基团的膜的聚锗烷化合物。包含含硫原子的有机基团作为与锗原子键合的基团的多锗烷化合物，其中含硫原子的有机基团是式[1]的基团：-LZ [1]，其中L是单键， C 1-6亚烷基或任选被C 1-6烷基取代的C 4-20亚芳基; Z为碳原子数为20-20的硫基，可以被C 1-6烷基取代的C 1-14环硫醚基，含硫醚键的碳原子数为20-20的烷基或含有硫醚键的碳原子数为5〜20的芳烷基，条件是当L是单键时，Z不是C1-20硫醚基团。

3. 发明申请

US20110281090A1 GERMANIUM-CONTAINING HIGH-REFRACTIVE-INDEX THIN FILM AND PRODUCTION METHOD THEREOF 审中-公开
标题翻译：含锗的高折射率薄膜及其生产方法
公开(公告)号：US20110281090A1
公开(公告)日：2011-11-17
申请号：US13127180
申请日：2009-11-11
申请人： Akira Watanabe , Tokuji Miyashita , Takehiro Nagasawa , Akira Hirooka , Makoto Hirooka , Eiko Hirooka
发明人： Akira Watanabe , Tokuji Miyashita , Takehiro Nagasawa , Akira Hirooka , Makoto Hirooka , Eiko Hirooka
IPC分类号： C08G79/00
CPC分类号： G02B1/10 , C07F7/30 , C08G79/00 , C09D185/00 , G02B1/00 , G02B1/118 , Y10T428/24942
摘要： There is provided a high refractive-index coating film and a production method of the high refractive-index coating film. The production method comprises producing a coating film containing a germanium compound containing a Ge—Ge bond as a backbone thereof, and baking the coating film under vacuum or in an inert gas atmosphere. The high refractive-index coating film produced by the method is soluble in a solvent and has a high moldability and film-formation property, and has a high refractive index of 1.8 or more and further 2.3 or more, and is chemically stable.
摘要翻译：提供高折射率涂膜和高折射率涂膜的制造方法。该制造方法包括制造含有Ge-Ge键的锗化合物作为其主链的涂膜，并在真空或惰性气体气氛下烘烤该涂膜。通过该方法制造的高折射率涂膜可溶于溶剂，成型性和成膜性高，折射率高1.8以上2.3以上，化学稳定。

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