会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Synthetic resin lens
    • 合成树脂镜片
    • US4930879A
    • 1990-06-05
    • US249314
    • 1988-09-26
    • Takeaki IryoSatoshi KubotaYoshio SanoYoshishige MurataYasumi Koinuma
    • Takeaki IryoSatoshi KubotaYoshio SanoYoshishige MurataYasumi Koinuma
    • C09D183/04G02B1/04G02B1/10
    • G02B1/105C09D183/04G02B1/041
    • A Synthetic resin lens having a surface hard coating comprises a synthetic resin lens body and a surface hard coat deposited on the lens body. The synthetic resin lens body is made of a resin obtained by copolymerizing monomers consisting essentially as synthetic resinous components of 10 to 80 percent by weight of at least one diester of itaconic acid and mesaconic acid, 10 to 80 percent by weight of at least one allyl compound and 5 to 50 percent by weight of diethyleneglycol bis(allylcarbonate). The surface hard coat is formed by curing a coating composition comprising 50 to 800 parts by weight of at least one organic silicon compound, 100 parts by weight of colloidal silica, 50 to 600 parts by weight of a polyfunctional compound such as a polyfunctional epoxy compound, a polyalcohol, a polycarboxylic acid, or a polycarboxylic anhydride and 0.01 to 5.0 percent by weight of a curing catalyst based on the residual solids in the composition after curing.
    • 具有表面硬涂层的合成树脂透镜包括合成树脂透镜体和沉积在透镜体上的表面硬涂层。 合成树脂透镜体由以下组成的树脂制成,所述树脂通过共聚基本上由10至80重量%的合成树脂组分组成的单体,至少一种衣康酸和中康酸的二酯,10至80重量%的至少一种烯丙基 化合物和5至50重量%的二甘醇双(烯丙基碳酸酯)。 表面硬涂层通过固化包含50至800重量份的至少一种有机硅化合物,100重量份胶体二氧化硅,50至600重量份多官能化合物如多官能环氧化合物 ,多元醇,多元羧酸或多元羧酸酐和0.01-5.0重量%的固化催化剂,基于固化后组合物中的残留固体。
    • 3. 发明授权
    • Contact lens article made of silicon- and fluorine-containing resin
    • 由含硅和含氟树脂制成的隐形眼镜制品
    • US4933406A
    • 1990-06-12
    • US403484
    • 1989-09-06
    • Keizo AnanNaoyuki AmayaYoshishige MurataTakayuki OtsuHiroshi KawashimaSatoshi KubotaMasaru Egawa
    • Keizo AnanNaoyuki AmayaYoshishige MurataTakayuki OtsuHiroshi KawashimaSatoshi KubotaMasaru Egawa
    • C08F230/08G02B1/04
    • G02B1/043C08F230/08
    • A contact lens article comprises a resin obtained by copolymerizing starting monomer components containing a silicon-containing compound (A) represented by the formula ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group, X.sub.1 and X.sub.2 each represent a methyl group or ##STR2## l represents 0 or 1, m represents an integer of 1 to 3 and n and p each represent an integer of 0 to 3; a fluorine-containing compound (B) represented by the formula (II) of: ##STR3## wherein at least one of R.sub.2 and R.sub.3 represents a straight chain or branched chain fluoroalkyl group represented by --C.sub.h H.sub.k F.sub.2h+l-k in which h represents an integer of 2 to 18, k represents an integer of 1 to 2 multiplied by h and when one of R.sub.2 and R.sub.3 is --C.sub.h H.sub.k F.sub.2h+l-k, the other of R.sub.2 and R.sub.3 represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms or a cycloalkyl group having 3 to 12 carbon atoms; and a radical polymerizable vinyl monomer.
    • 隐形眼镜制品包括通过共聚包含由式表示的含硅化合物(A)的起始单体成分得到的树脂,其中R 1表示氢原子或甲基,X 1和X 2各自表示甲基 组或 l表示0或1,m表示1至3的整数,n和p各自表示0至3的整数; 由式(II)表示的含氟化合物(B):其中R 2和R 3中的至少一个表示由-ChHkF 2h + lk表示的直链或支链氟烷基,其中h表示 2〜18,k表示1〜2的整数乘以h,当R2和R3之一为-ChHkF2h + lk时,R2和R3中的另一个为碳原子数1〜12的烷基,烯基为2 至12个碳原子或具有3至12个碳原子的环烷基; 和可自由基聚合的乙烯基单体。
    • 8. 发明申请
    • Radiographic intensifying screen
    • 射线增强屏
    • US20060038134A1
    • 2006-02-23
    • US11147174
    • 2005-06-08
    • Katsuhiro KohdaSatoshi Kubota
    • Katsuhiro KohdaSatoshi Kubota
    • G21K4/00
    • G21K4/00
    • A radiographic intensifying screen has a radiographic intensifying function layer in which the radiographic intensifying function layer is composed of a binder and radiographic intensifying particles, in which the intensifying particles is capable of absorbing a radiation and then not emitting a light in ultraviolet or visible wavelength region but emitting secondary electrons, secondary X-rays, secondary γ-rays or their combinations, and the particles contain at least one metal or metal compound in which the metal is gold, tungsten, tantalum, barium, tin, silver, molybdenum, niobium, zirconium, zinc, copper, nickel, cobalt, iron, chromium, vanadium, or titanium.
    • 射线照相增强屏具有射线照相增强功能层,其中放射增强功能层由粘合剂和射线照相增强粒子构成,其中增强粒子能够吸收辐射,然后不发射紫外或可见波长区域中的光 但是发射二次电子,二次X射线,二次γ射线或它们的组合,并且所述粒子含有至少一种金属或金属化合物,其中金属是金,钨,钽,钡,锡,银,钼,铌, 锆,锌,铜,镍,钴,铁,铬,钒或钛。
    • 9. 发明授权
    • Ni-based alloy improved in oxidation-resistance, high temperature strength and hot workability
    • Ni基合金的耐氧化性,耐高温性和热加工性提高
    • US06852177B2
    • 2005-02-08
    • US10322669
    • 2002-12-19
    • Satoshi KubotaToshihiro UeharaMotoi YamaguchiAkihiro Toji
    • Satoshi KubotaToshihiro UeharaMotoi YamaguchiAkihiro Toji
    • C22C19/05C22F1/10
    • C22C19/058C22C19/053C22C19/055C22C19/056C22F1/10
    • A nickel-based alloy is provided for provide parts and members of improved oxidation-resistance and high temperature strength for use in an oxidation atmosphere at high temperatures, such as automobile parts including an electrode for an ignition plug, power plant facility parts including a gas turbine nozzle, inner parts of heat treat furnaces, and fuel cell parts. The alloy improved in oxidation-resistance, high temperature strength and hot workability consists essentially of, in mass percentage, C: 0.003 to 0.1%, Si: 1.0% or less, Mn: 2.0% or less, Cr: 12 to 32%, Fe: 20% or less, Mg: 0.001 to 0.04%, at least one element, of not more than 2.5% in total, selected from the group consisting of Nb, Ta and V, impurity elements of S: 0.01% or less, but the ratio of the Mg-content to the S-content (Mg/S) being 1 or more, and Ti: 0 inclusive to 0.02%, and the rest being Ni and incidental impurities.
    • 提供了一种镍基合金,用于提供在高温下用于氧化气氛中的改善的耐氧化性和高温强度的部件和部件,例如包括用于火花塞的电极的汽车部件,包括气体的发电厂设备部件 涡轮喷嘴,热处理炉的内部部件和燃料电池部件。 该合金的耐氧化性,耐高温性和热加工性提高了质量百分比,基本上以C:0.003〜0.1%,Si:1.0%以下,Mn:2.0%以下,Cr:12〜32% Fe:20%以下,Mg:0.001〜0.04%,选自Nb,Ta和V中的至少一种不超过2.5%的元素,S:0.01%以下的杂质元素, 但Mg含量与S含量的比例(Mg / S)为1以上,Ti:0〜0.02%,其余为Ni及杂质。