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    • 6. 发明授权
    • Semiconductor light emitting device, its manufacturing method and
optical recording and/or reproducing apparatus
    • 半导体发光器件,其制造方法和光学记录和/或再现装置
    • US5898662A
    • 1999-04-27
    • US967095
    • 1997-11-10
    • Akira IshibashiSatoshi TaniguchiTomonori HinoTakashi KobayashiKazushi NakanoNorikazu Nakayama
    • Akira IshibashiSatoshi TaniguchiTomonori HinoTakashi KobayashiKazushi NakanoNorikazu Nakayama
    • H01L33/00H01L33/02H01L33/28H01S5/042H01S5/32H01S5/327H01S5/347H01S3/18
    • H01L33/28B82Y20/00H01L33/0087H01L33/025H01S5/347H01S2301/173H01S5/0421H01S5/3203H01S5/327
    • A semiconductor light emitting device comprises: a compound semiconductor substrate; an n-type cladding layer on the compound semiconductor substrate; an active layer on the n-type cladding layer; a p-type cladding layer on the active layer: and a p-type contact layer on the p-type cladding layer, the n-type cladding layer, the active layer, the p-type cladding layer and the p-type contact layer being made of II-VI compound semiconductors containing at least one of group II elements selected from the group consisting of Zn, Cd, Mg, Hg and Be and at least one of group VI elements selected from the group consisting of S, Se, Te and O, characterized in that at least the active layer has undulations and at least the p-type layer is flat. A method for manufacturing a semiconductor light emitting device having: a compound semiconductor substrate; an n-type cladding layer on the compound semiconductor substrate; an active layer on the n-type cladding layer; and a p-type cladding layer on the active layer, the n-type cladding layer, the active layer and the p-type cladding layer being made of II-VI compound semiconductors containing at least one of group II elements selected from the group consisting of Zn, Cd, Mg, Hg and Be and at least one of group VI elements selected from the group consisting of S, Se, Te and O, characterized in that the n-type cladding layer, the active layer and said p-type cladding layer are grown by varying, for the respective layers, the ratio of the molecular beam intensity of the group VI element relative to the molecular beam intensity of the group II element.
    • 一种半导体发光器件包括:化合物半导体衬底; 在化合物半导体衬底上的n型覆层; 在n型包覆层上的有源层; 有源层上的p型覆层和p型覆层的p型接触层,n型包覆层,有源层,p型包覆层和p型接触层 由含有选自Zn,Cd,Mg,Hg和Be中的II族元素中的至少一种的II-VI化合物半导体和选自S,Se,Te中的至少一种VI族元素中的至少一种 和O,其特征在于至少所述活性层具有起伏并且至少所述p型层是平坦的。 一种半导体发光器件的制造方法,其具有:化合物半导体基板; 在化合物半导体衬底上的n型覆层; 在n型包覆层上的有源层; 和p型包覆层,n型包覆层,有源层和p型覆层由含有选自以下的II族元素中的至少一种的II-VI族化合物半导体构成: 的Zn,Cd,Mg,Hg和Be以及选自S,Se,Te和O的VI族元素中的至少一种,其特征在于,所述n型包覆层,所述有源层和所述p型 通过对于各层改变VI族元素的分子束强度相对于II族元素的分子束强度的比例,生长包覆层。