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    • 5. 发明申请
    • Photomask and exposure method
    • 光掩模和曝光方法
    • US20070287077A1
    • 2007-12-13
    • US11802005
    • 2007-05-18
    • Katsuhiro TakushimaTakashi Yasui
    • Katsuhiro TakushimaTakashi Yasui
    • A47G1/12G03F1/14G03F1/00
    • G03F1/64G03F1/62
    • To provide a photomask capable of preventing a foreign matter generation in using the photomask, and an exposure method using this photomask. The photomask includes a transparent substrate 2; a transfer pattern 4 formed in a main region 3 of a center portion of the transparent substrate 2; a light-shading band region 5 provided adjacent to the main region 3 in the outer peripheral region of the main region 3; and a pellicle 6 formed by adhering a pellicle film 6a to a pellicle frame 6b by an adhesive 8a, wherein this pellicle 6 is adhered onto a light-shading region 7 consisting of a light-shading film formed in the outer peripheral region of the main region 3, through an adhesive 8b.
    • 提供能够防止在使用光掩模中产生异物的光掩模和使用该光掩模的曝光方法。 光掩模包括透明基板2; 形成在透明基板2的中心部分的主区域3中的转印图案4; 在主区域3的外周区域中与主区域3相邻设置的遮光带区域5; 以及通过粘合剂8a将防护薄膜6a粘附在防护薄膜组件6b上形成的防护薄膜组件6,其中该防护薄膜组件6粘附在由形成在外围区域中的遮光膜构成的遮光区域7上 的主区域3,通过粘合剂8b。
    • 10. 发明授权
    • Photomask and exposure method
    • 光掩模和曝光方法
    • US08067132B2
    • 2011-11-29
    • US11802005
    • 2007-05-18
    • Katsuhiro TakushimaTakashi Yasui
    • Katsuhiro TakushimaTakashi Yasui
    • G03F1/00H01L21/00
    • G03F1/64G03F1/62
    • To provide a photomask capable of preventing a foreign matter generation in using the photomask, and an exposure method using this photomask. The photomask includes a transparent substrate 2; a transfer pattern 4 formed in a main region 3 of a center portion of the transparent substrate 2; a light-shading band region 5 provided adjacent to the main region 3 in the outer peripheral region of the main region 3; and a pellicle 6 formed by adhering a pellicle film 6a to a pellicle frame 6b by an adhesive 8a, wherein this pellicle 6 is adhered onto a light-shading region 7 consisting of a light-shading film formed in the outer peripheral region of the main region 3, through an adhesive 8b.
    • 提供能够防止在使用光掩模中产生异物的光掩模和使用该光掩模的曝光方法。 光掩模包括透明基板2; 形成在透明基板2的中心部分的主区域3中的转印图案4; 在主区域3的外周区域中与主区域3相邻设置的遮光带区域5; 以及通过粘合剂8a将防护薄膜6a粘接到防护薄膜框架6b上形成的防护薄膜组件6,其中该防护薄膜组件6粘附到由形成在主体的外围区域中的遮光膜构成的遮光区域7上 区域3,通过粘合剂8b。