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1. 发明授权

US08269194B2 Composite focused ion beam device, and processing observation method and processing method using the same 有权
标题翻译：复合聚焦离子束装置及其加工方法及处理方法
公开(公告)号：US08269194B2
公开(公告)日：2012-09-18
申请号：US12733089
申请日：2008-08-06
申请人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J49/00
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G03F1/74 , G03F1/84 , H01J37/08 , H01J37/3005 , H01J2237/0805 , H01J2237/0807 , H01J2237/31745
摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.
摘要翻译：复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统样品。第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

2. 发明申请

US20100176296A1 COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHOD AND PROCESSING METHOD USING THE SAME 有权
标题翻译：复合聚焦离子束装置和处理观测方法及其处理方法
公开(公告)号：US20100176296A1
公开(公告)日：2010-07-15
申请号：US12733089
申请日：2008-08-06
申请人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J37/30 , H01J27/02 , H01J37/08 , H01J37/26
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G03F1/74 , G03F1/84 , H01J37/08 , H01J37/3005 , H01J2237/0805 , H01J2237/0807 , H01J2237/31745
摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.
摘要翻译：复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源，从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

3. 发明申请

US20100288924A1 COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING THE SAME,AND PROCESSING METHOD 有权
标题翻译：复合聚焦离子束装置，使用该方法的方法观察方法和处理方法
公开(公告)号：US20100288924A1
公开(公告)日：2010-11-18
申请号：US12733091
申请日：2008-08-06
申请人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J37/26 , H01J37/30 , H01J37/08
CPC分类号： H01J37/08 , G01N1/04 , G01N1/06 , H01J37/3005 , H01J37/3056 , H01J2237/0807 , H01J2237/0817 , H01J2237/31745
摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metallic ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion. A beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is smaller than that of the first ion beam 10A emitted from the first ion beam irradiation system 1
摘要翻译：复合聚焦离子束装置包括包括用于产生第一离子的液体金属离子源的第一离子束照射系统10和包括用于产生第二离子的气体离子源的第二离子束照射系统20。从第二离子束照射系统20发射的第二离子束20A的光束直径小于从第一离子束照射系统1发射的第一离子束10A的光束直径

4. 发明授权

US08274063B2 Composite focused ion beam device, process observation method using the same, and processing method 有权
标题翻译：复合聚焦离子束装置，工艺观察方法采用相同的加工方法
公开(公告)号：US08274063B2
公开(公告)日：2012-09-25
申请号：US12733091
申请日：2008-08-06
申请人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J49/00
CPC分类号： H01J37/08 , G01N1/04 , G01N1/06 , H01J37/3005 , H01J37/3056 , H01J2237/0807 , H01J2237/0817 , H01J2237/31745
摘要： A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.
摘要翻译：复合聚焦离子束装置具有照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束用于处理或观察样品的第二离子束照射系统。第一离子束照射系统具有产生用于形成第一离子束的第一离子的等离子体型气体离子源，每个第一离子具有第一质量。第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。每个第二离子具有比第一质量小的第二质量。

5. 发明授权

US08657962B2 Particle removing method, particle removing device, atomic force microscope, and charged particle beam apparatus 有权
标题翻译：粒子去除法，粒子去除装置，原子力显微镜和带电粒子束装置
公开(公告)号：US08657962B2
公开(公告)日：2014-02-25
申请号：US12139065
申请日：2008-06-13
申请人： Hiroki Hayashi , Takashi Konno , Kouji Iwasaki , Masatoshi Yasutake , Junichi Tashiro
发明人： Hiroki Hayashi , Takashi Konno , Kouji Iwasaki , Masatoshi Yasutake , Junichi Tashiro
IPC分类号： B08B7/00
CPC分类号： B25J7/00 , G01Q80/00
摘要： Small tweezers having a pair of arms openable and closable is moved closer to a sample and grips a particle attached on a surface of the sample and carries it onto an adhesion member to attach it thereto. The small tweezers are opened to release the particle and brought away from the adhesion member to leave the particle on the adhesion member. A particle removing device includes small tweezers having a pair of arms openable and closable; an opening/closing driving unit that drives the arm or arms to open/close the small tweezers; a stage mounting an adhesion member that attaches thereto a particle to withdraw the particle; and a moving mechanism that moves the small tweezers between the sample and the adhesion member mounted on the stage. Also, an atomic force microscope and a charged ion beam apparatus that include the particle removing device are disclosed.
摘要翻译：具有可打开和关闭的一对臂的小镊子移动得更靠近样品并且夹持附着在样品表面上的颗粒并将其携带到粘附构件上以将其附着在其上。打开小镊子以释放颗粒并从附着构件脱离，使颗粒留在粘合构件上。颗粒除去装置包括具有可打开和关闭的一对臂的小镊子; 打开/关闭驱动单元，驱动臂或臂打开/关闭小镊子; 安装附着于其上以吸收颗粒的粘合构件的载物台; 以及移动机构，其将小镊子移动在样品和安装在台架上的粘合构件之间。另外，还公开了包括粒子除去装置的原子力显微镜和带电离子束装置。

6. 发明申请

US20070267579A1 Photomask correction method using composite charged particle beam, and device used in the correction method 审中-公开
公开(公告)号：US20070267579A1
公开(公告)日：2007-11-22
申请号：US11646723
申请日：2006-12-28
申请人： Yasuhiko Sugiyama , Junichi Tashiro , Anto Yasaka
发明人： Yasuhiko Sugiyama , Junichi Tashiro , Anto Yasaka
IPC分类号： H01J3/14
CPC分类号： G03F1/74
摘要： The object of the present invention is to provide a method for solving the problem of surface damage due to gallium ion irradiation that poses a problem when carrying out mask repair using currently established FIB techniques, and the problem of residual gallium, and to provide a device realizing this method. The device of the present invention has an electron beam lens barrel that can carry out processing, as well as an FIB lens barrel, provided inside the same sample chamber, which means that a mask repair method of the present invention, in correction processing to remove redundant sections such as a mask opaque defect, phase shift film bump defect or a glass substrate cut remnant defect, comprises a step of coarse correction by etching using a focused ion beam and a step of finishing processing using an electron beam, to remove surface damage due to gallium irradiation, and residual gallium.

7. 发明授权

US08581206B2 Focused ion beam system and sample processing method using the same 有权
标题翻译：聚焦离子束系统和样品处理方法使用相同
公开(公告)号：US08581206B2
公开(公告)日：2013-11-12
申请号：US12707024
申请日：2010-02-17
申请人： Xin Man , Kouji Iwasaki , Junichi Tashiro
发明人： Xin Man , Kouji Iwasaki , Junichi Tashiro
IPC分类号： G21K5/10 , G21K5/08 , G21K1/00 , G21K5/04
CPC分类号： H01J37/20 , G01N1/32 , H01J37/3056 , H01J2237/208
摘要： A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.
摘要翻译：聚焦离子束系统包括具有用于固定样品的固定平面的样品保持器，其上设置有样品保持器的样品基底，将聚焦离子束照射到样品的聚焦离子束照射机构，保持样品的微量滴定器并且具有与样品台的表面成预定角度的轴向方向，打开和关闭微型加热器的开闭机构，使微型加热器绕轴向旋转的旋转机构，以及移动机构，微动员。

8. 发明申请

US20100213386A1 FOCUSED ION BEAM SYSTEM AND SAMPLE PROCESSING METHOD USING THE SAME 有权
标题翻译：聚焦离子束系统和采用该方法的样品处理方法
公开(公告)号：US20100213386A1
公开(公告)日：2010-08-26
申请号：US12707024
申请日：2010-02-17
申请人： Xin Man , Kouji Iwasaki , Junichi Tashiro
发明人： Xin Man , Kouji Iwasaki , Junichi Tashiro
IPC分类号： G21K5/10 , G21K5/08 , G21K1/00 , G21K5/04
CPC分类号： H01J37/20 , G01N1/32 , H01J37/3056 , H01J2237/208
摘要： A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.
摘要翻译：聚焦离子束系统包括具有用于固定样品的固定平面的样品保持器，其上设置有样品保持器的样品基底，将聚焦离子束照射到样品的聚焦离子束照射机构，保持样品的微量滴定器并且具有与样品台的表面成预定角度的轴向方向，打开和关闭微型加热器的开闭机构，使微型加热器绕轴向旋转的旋转机构，以及移动机构，微动员。

9. 发明授权

US07172839B2 Photomask correction method using composite charged particle beam, and device used in the correction method 有权
标题翻译：使用复合带电粒子束的光掩模校正方法，以及在校正方法中使用的装置
公开(公告)号：US07172839B2
公开(公告)日：2007-02-06
申请号：US10721522
申请日：2003-11-24
申请人： Yasuhiko Sugiyama , Junichi Tashiro , Anto Yasaka
发明人： Yasuhiko Sugiyama , Junichi Tashiro , Anto Yasaka
IPC分类号： G03F9/00 , C03C15/00 , G01L21/30
CPC分类号： G03F1/74
摘要： The object of the present invention is to provide a method for solving the problem of surface damage due to gallium ion irradiation that poses a problem when carrying out mask repair using currently established FIB techniques, and the problem of residual gallium, and to provide a device realizing this method. The device of the present invention has an electron beam lens barrel that can carry out processing, as well as an FIB lens barrel, provided inside the same sample chamber, which means that a mask repair method of the present invention, in correction processing to remove redundant sections such as a mask opaque defect, phase shift film bump defect or a glass substrate cut remnant defect, comprises a step of coarse correction by etching using a focused ion beam and a step of finishing processing using an electron beam, to remove surface damage due to gallium irradiation, and residual gallium.
摘要翻译：本发明的目的是提供一种解决由于镓离子照射引起的表面损伤的问题的方法，当使用当前建立的FIB技术进行掩模修复时存在问题，并且存在残留镓的问题，并提供一种装置实现这个方法。本发明的装置具有能够进行处理的电子束透镜镜筒以及设置在同一样品室内的FIB镜筒，这意味着本发明的掩模修复方法在校正处理中去除冗余部分如掩模不透明缺陷，相移膜凸起缺陷或玻璃衬底切割残余缺陷包括通过使用聚焦离子束的蚀刻进行粗略校正的步骤和使用电子束进行精加工的步骤以去除表面损伤由于镓照射和残留的镓。

10. 发明申请

US20080042059A1 FOCUSED ION BEAM APPARATUS AND SAMPLE SECTION FORMING AND THIN-PIECE SAMPLE PREPARING METHODS 有权
标题翻译：聚焦离子束装置和样品制备和薄层样品制备方法
公开(公告)号：US20080042059A1
公开(公告)日：2008-02-21
申请号：US11840575
申请日：2007-08-17
申请人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
发明人： Junichi Tashiro , Yutaka Ikku , Toshiaki Fujii
IPC分类号： G01N23/00
CPC分类号： G01N23/2255 , G01N1/32 , G01N2223/104 , G01N2223/32 , G01N2223/611 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/30466 , H01J2237/30488 , H01J2237/31745 , H01J2237/31749
摘要： Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing amount of the detected secondary electron signal an end-point detecting mechanism detects an end point to thereby terminate the etching, so that a center position of a defect or a contact hole is effectively detected even with an FIB apparatus not having a SEM observation function.
摘要翻译：检测到的是通过照射聚焦离子束而同时进行蚀刻样品部分和周围扫描照射聚焦离子束而产生的二次电子。从检测到的二次电子信号的变化量中，终点检测机构检测终点，从而终止蚀刻，即使不具有SEM的FIB装置也能够有效地检测缺陷或接触孔的中心位置观察功能。

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