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1. 发明授权

US6147697A Image forming apparatus 失效
标题翻译：图像形成装置
公开(公告)号：US6147697A
公开(公告)日：2000-11-14
申请号：US406379
申请日：1999-09-27
申请人： Takashi Deguchi , Tuyosi Hattori , Manabu Nakahanada , Atsuro Yanata
发明人： Takashi Deguchi , Tuyosi Hattori , Manabu Nakahanada , Atsuro Yanata
IPC分类号： B41J2/447 , B41J2/47 , G03B27/54
CPC分类号： B41J2/4476
摘要： An image recording apparatus having therein an image recording section includes: a light emitting dot row provided on a base plate and having thereon anodes arranged in a form of an array of a single row or a plurality of rows and having phosphors provided on the anodes; a cathode provided apart from the light emitting dot row, electrons emitted from the cathode colliding on the phosphors thereby the phosphors emit light; a grid which covers at least a part of the base plate in the vicinity of at least the light emitting dot row; an image focusing optical system having a focal depth of 350 .mu.m for focusing light emitted from the light emitting dot row on an image recording position; a driving element for driving the light emitting dot row so that the light emitting dot row emits light; and a conveyance device which conveys the light emitting dot row or an image recording medium so that the image recording medium moves relatively to the light emitting dot row.
摘要翻译：其中具有图像记录部分的图像记录装置包括：发光点阵列，其设置在基板上并且具有布置成单行或多行阵列形式并且在阳极上提供荧光体的阳极; 与发光点列隔开设置的阴极，从阴极发射的电子碰撞在荧光体上，由此荧光体发光; 在至少所述发光点列附近覆盖所述基板的至少一部分的格栅; 具有350μm的焦深的图像聚焦光学系统，用于将从发光点行发射的光聚焦在图像记录位置上; 用于驱动发光点列使得发光点行发光的驱动元件; 以及输送装置，其传送发光点行或图像记录介质，使得图像记录介质相对于发光点行移动。

2. 发明授权

US08881399B2 Method of manufacturing a nozzle plate for a liquid ejection head 有权
标题翻译：制造喷液头喷嘴板的方法
公开(公告)号：US08881399B2
公开(公告)日：2014-11-11
申请号：US12310380
申请日：2007-08-17
申请人： Atsuro Yanata , Isao Doi
发明人： Atsuro Yanata , Isao Doi
IPC分类号： B41J2/16 , B41J2/14
CPC分类号： B41J2/162 , B41J2/1433 , B41J2/161 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2202/11 , Y10T29/49401
摘要： A manufacturing method of nozzle plate for liquid ejection head includes, providing a substrate having a first base material of Si and a second base material, of which the etching rate in Si anisotropic dry etching is lower then that of Si, provided on one side of the first base material, forming a film as a second etching mask on the surface of the second base material, forming a second etching mask pattern having a small-diameter opening shape in the second etching mask film, etching until the etching part is extended through the second base material, forming a film as a first etching mask film on the surface of the first base material, forming a first etching mask pattern having a large-diameter opening shape in the first etching mask film, and Si anisotropic dry etching until the etched part is extended through the first base material.
摘要翻译：一种液体喷射头用喷嘴板的制造方法，其特征在于，提供具有Si的第一基材和第二基材的基板，其中Si各向异性干蚀刻中的蚀刻速度低于Si的蚀刻速率，第一基材，在第二基材的表面上形成作为第二蚀刻掩模的膜，在第二蚀刻掩模膜中形成具有小直径开口形状的第二蚀刻掩模图案，直到蚀刻部分延伸通过第二基材，在第一基材的表面上形成作为第一蚀刻掩模膜的膜，在第一蚀刻掩模膜中形成具有大直径开口形状的第一蚀刻掩模图案，以及Si各向异性干蚀刻，直到蚀刻部分延伸通过第一基材。

3. 发明授权

US07690766B2 Liquid ejection head, liquid ejection device and liquid ejection method 有权
标题翻译：液体喷射头，液体喷射装置和液体喷射方法
公开(公告)号：US07690766B2
公开(公告)日：2010-04-06
申请号：US11793083
申请日：2005-12-07
申请人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
发明人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J2/06
CPC分类号： B41J2/04576 , B41J2/04581 , B41J2/04588 , B41J2/06 , B41J2/14233 , B41J2002/14475
摘要： A liquid ejection head having: a nozzle for ejecting a liquid; a flat nozzle plate on which the nozzle is provided; a cavity to store the liquid to be ejected from an ejection hole of the nozzle; a pressure generating section which generates pressure on the liquid in the nozzle and forms a meniscus of the liquid in the ejection hole of the nozzle; an electrostatic voltage applying section which applies electrostatic voltage between a base material and the liquid in the nozzle and the cavity, and generates electrostatic suction force; and an operation control section which controls applying of the electrostatic voltage by the electrostatic voltage applying section, and controls applying of drive voltage to drive the pressure generating portion, wherein a volume resistivity of the nozzle plate is 1015 Ωm or more.
摘要翻译：一种液体喷射头，具有：用于喷射液体的喷嘴; 设有喷嘴的扁平喷嘴板; 用于存储从喷嘴的喷射孔喷出的液体的空腔; 压力产生部分，其在喷嘴中的液体上产生压力并在喷嘴的喷射孔中形成液体的弯月面; 静电电压施加部，其在基材与喷嘴中的液体和空腔之间施加静电电压，并产生静电吸引力; 以及操作控制部，其控制由所述静电电压施加部施加静电电压，并且控制施加驱动电压来驱动所述压力产生部，其中所述喷嘴板的体积电阻率为1015Ω·cm以上。

4. 发明申请

US20090195605A1 MANUFACTURING METHOD OF NOZZLE PLATE FOR LIQUID EJECTION HEAD, NOZZLE PLATE FOR LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD 有权
标题翻译：液体喷射头喷嘴板，液体喷射头喷嘴板和液体喷射头的制造方法
公开(公告)号：US20090195605A1
公开(公告)日：2009-08-06
申请号：US12310380
申请日：2007-08-17
申请人： Atsuro Yanata , Isao Doi
发明人： Atsuro Yanata , Isao Doi
IPC分类号： B41J2/16 , G11B5/127
CPC分类号： B41J2/162 , B41J2/1433 , B41J2/161 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2202/11 , Y10T29/49401
摘要： A manufacturing method of nozzle plate for liquid ejection head includes, providing a substrate having a first base material of Si and a second base material, of which the etching rate in Si anisotropic dry etching is lower then that of Si, provided on one side of the first base material, forming a film as a second etching mask on the surface of the second base material, forming a second etching mask pattern having a small-diameter opening shape in the second etching mask film, etching until the etching part is extended through the second base material, forming a film as a first etching mask film on the surface of the first base material, forming a first etching mask pattern having a large-diameter opening shape in the first etching mask film, and Si anisotropic dry etching until the etched part is extended through the first base material.
摘要翻译：一种液体喷射头用喷嘴板的制造方法，其特征在于，提供具有Si的第一基材和第二基材的基板，其中Si各向异性干蚀刻中的蚀刻速度低于Si的蚀刻速率，第一基材，在第二基材的表面上形成作为第二蚀刻掩模的膜，在第二蚀刻掩模膜中形成具有小直径开口形状的第二蚀刻掩模图案，直到蚀刻部分延伸通过第二基材，在第一基材的表面上形成作为第一蚀刻掩模膜的膜，在第一蚀刻掩模膜中形成具有大直径开口形状的第一蚀刻掩模图案，以及Si各向异性干蚀刻，直到蚀刻部分延伸通过第一基材。

5. 发明授权

US06884572B2 Concentrated color developer composition and processing method by use thereof 失效
标题翻译：浓缩彩色显影剂组合物及其使用方法
公开(公告)号：US06884572B2
公开(公告)日：2005-04-26
申请号：US10371120
申请日：2003-02-21
申请人： Wataru Satake , Atsuro Yanata
发明人： Wataru Satake , Atsuro Yanata
IPC分类号： G03C5/26 , G03C7/413 , G03C7/44
CPC分类号： G03C7/413 , G03C5/266 , G03C7/44
摘要： A concentrated color developer composition packed in a container which is comprised of material exhibiting an oxygen permeability of not more than 50 ml/(m2·day·atm), and the concentrated color developer composition comprising a hydroxyalkyl-substituted p-phenediamine type color developing agent of not less than 0.05 mol/l, a sulfite and a hydroxylamine salt. The processing method by use of the concentrated composition is also disclosed.
摘要翻译：填充在容器中的浓缩彩色显影剂组合物，其由透氧度不超过50ml /（m 2·天）的材料组成，并且浓缩显色剂组合物包含羟烷基取代的对苯二胺型显色剂，不小于0.05mol / l，亚硫酸盐和羟胺盐。还公开了使用浓缩组合物的处理方法。

6. 发明授权

US08020971B2 Liquid ejection head, liquid ejection apparatus and liquid ejection method 有权
标题翻译：液体喷射头，液体喷射装置和液体喷射方法
公开(公告)号：US08020971B2
公开(公告)日：2011-09-20
申请号：US12224049
申请日：2007-02-15
申请人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
发明人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J2/06 , B41J2/12 , B41J2/115
CPC分类号： B41J2/085
摘要： A liquid ejection head, having: an insulating nozzle plate provided with a nozzle having, a liquid supply port to supply liquid and an ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity communicating with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage applying device to generate an electrostatic attraction force by applying an electrostatic voltage between the liquid in the nozzle and the cavity, and the substrate; and a control device to control the electrostatic voltage applying device for conducting polarization relaxation operation by applying an electrostatic voltage having reverse polarity opposite to that of the electrostatic voltage applied in liquid ejection, wherein the nozzle is a flat nozzle and the control device.
摘要翻译：一种液体喷射头，具有：具有喷嘴的绝缘喷嘴板，所述喷嘴具有：用于供应液体的液体供给口和用于将从所述液体供给口供给的液体喷射到基板上的喷射口; 与所述液体供给口连通的空腔以保留从所述喷射口喷出的液体; 静电电压施加装置，通过在喷嘴中的液体和空腔之间施加静电电压和基板而产生静电吸引力; 以及控制装置，其通过施加具有与施加在液体喷射中的静电电压相反的极性的相反极性的静电电压来控制用于进行偏振弛豫操作的静电电压施加装置，其中所述喷嘴是扁平喷嘴和所述控制装置。

7. 发明授权

US07938510B2 Liquid ejection head and liquid ejection method 有权
标题翻译：液体喷射头和液体喷射方法
公开(公告)号：US07938510B2
公开(公告)日：2011-05-10
申请号：US12224048
申请日：2007-02-15
申请人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
发明人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J2/01
CPC分类号： B41J2/06 , B41J2/04576 , B41J2/04588
摘要： A liquid ejection head including: an insulating nozzle plate 5 provided with a nozzle having, a liquid supply port to supply liquid and a ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity in communication with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage application device to generate an electrostatic attraction force by applying the electrostatic voltage between the liquid in the nozzle and in the cavity, and substrate; and a control device to control application of the electrostatic voltage through the electrostatic voltage application device; wherein the nozzle is a flat nozzle not protruding from the nozzle plate and the control device control the electrostatic voltage application device so as to eject the liquid from the nozzle by applying a bipolar pulse which alternates between negative and positive polarity.
摘要翻译：一种液体喷射头，包括：具有喷嘴的绝缘喷嘴板5，所述喷嘴具有：用于供应液体的液体供应口和用于将从所述液体供应口供应的液体喷射到基板上的喷射口; 与所述液体供给口连通的空腔，以保留从所述喷射口喷出的液体; 静电电压施加装置，通过在喷嘴中的液体和空腔之间施加静电电压和衬底来产生静电吸引力; 以及控制装置，通过静电电压施加装置控制静电电压的施加; 其中所述喷嘴是不从所述喷嘴板突出的扁平喷嘴，并且所述控制装置控制所述静电电压施加装置，以通过施加在负极性和正极性之间交替的双极脉冲从所述喷嘴喷射所述液体。

8. 发明申请

US20080150975A1 Liquid Ejection Head, Liquid Ejection Device And Liquid Ejection Method 有权
标题翻译：液体喷射头，液体喷射装置和液体喷射方法
公开(公告)号：US20080150975A1
公开(公告)日：2008-06-26
申请号：US11793083
申请日：2005-12-07
申请人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
发明人： Nobuhiro Ueno , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J29/38 , B41J2/045
CPC分类号： B41J2/04576 , B41J2/04581 , B41J2/04588 , B41J2/06 , B41J2/14233 , B41J2002/14475
摘要： A liquid ejection head having: a nozzle for ejecting a liquid; a flat nozzle plate on which the nozzle is provided; a cavity to store the liquid to be ejected from an ejection hole of the nozzle; a pressure generating section which generates pressure on the liquid in the nozzle and forms a meniscus of the liquid in the ejection hole of the nozzle; an electrostatic voltage applying section which applies electrostatic voltage between a base material and the liquid in the nozzle and the cavity, and generates electrostatic suction force; and an operation control section which controls applying of the electrostatic voltage by the electrostatic voltage applying section, and controls applying of drive voltage to drive the pressure generating portion, wherein a volume resistivity of the nozzle plate is 1015 Ωm or more.
摘要翻译：一种液体喷射头，具有：用于喷射液体的喷嘴; 设有喷嘴的扁平喷嘴板; 用于存储从喷嘴的喷射孔喷出的液体的空腔; 压力产生部分，其在喷嘴中的液体上产生压力并在喷嘴的喷射孔中形成液体的弯月面; 静电电压施加部，其在基材与喷嘴中的液体和空腔之间施加静电电压，并产生静电吸引力; 以及操作控制部，其控制由所述静电电压施加部施加静电电压，并控制施加驱动电压来驱动所述压力发生部，其中，所述喷嘴板的体积电阻率为10〜 Omegam或更多。

9. 发明申请

US20100182361A1 Liquid Ejection Head and Liquid Ejection Method 有权
标题翻译：液体喷射头和液体喷射方法
公开(公告)号：US20100182361A1
公开(公告)日：2010-07-22
申请号：US12224048
申请日：2007-02-15
申请人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
发明人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J29/38
CPC分类号： B41J2/06 , B41J2/04576 , B41J2/04588
摘要： A liquid ejection head including: an insulating nozzle plate 5 provided with a nozzle having, a liquid supply port to supply liquid and a ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity in communication with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage application device to generate an electrostatic attraction force by applying the electrostatic voltage between the liquid in the nozzle and in the cavity, and substrate; and a control device to control application of the electrostatic voltage through the electrostatic voltage application device; wherein the nozzle is a flat nozzle not protruding from the nozzle plate and the control device control the electrostatic voltage application device so as to eject the liquid from the nozzle by applying a bipolar pulse which alternates between negative and positive polarity.
摘要翻译：一种液体喷射头，包括：具有喷嘴的绝缘喷嘴板5，所述喷嘴具有：用于供应液体的液体供应口和用于将从所述液体供应口供应的液体喷射到基板上的喷射口; 与所述液体供给口连通的空腔，以保留从所述喷射口喷出的液体; 静电电压施加装置，通过在喷嘴中的液体和空腔之间施加静电电压和衬底来产生静电吸引力; 以及控制装置，通过静电电压施加装置控制静电电压的施加; 其中所述喷嘴是不从所述喷嘴板突出的扁平喷嘴，并且所述控制装置控制所述静电电压施加装置，以通过施加在负极性和正极性之间交替的双极脉冲从所述喷嘴喷射所述液体。

10. 发明申请

US20090096837A1 Liquid Ejection Head, Liquid Ejection Apparatus Liquid Ejection Method 有权
标题翻译：液体喷射头，液体喷射装置液体喷射方法
公开(公告)号：US20090096837A1
公开(公告)日：2009-04-16
申请号：US12224049
申请日：2007-02-15
申请人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
发明人： Naomi Kubo , Yasuo Nishi , Atsuro Yanata
IPC分类号： B41J2/06
CPC分类号： B41J2/085
摘要： A liquid ejection head, having: an insulating nozzle plate provided with a nozzle having, a liquid supply port to supply liquid and an ejection port to eject the liquid supplied from the liquid supply port onto a substrate; a cavity communicating with the liquid supply port to reserve the liquid to be ejected from the ejection port; an electrostatic voltage applying device to generate an electrostatic attraction force by applying an electrostatic voltage between the liquid in the nozzle and the cavity, and the substrate; and a control device to control the electrostatic voltage applying device for conducting polarization relaxation operation by applying an electrostatic voltage having reverse polarity opposite to that of the electrostatic voltage applied in liquid ejection, wherein the nozzle is a flat nozzle and the control device.
摘要翻译：一种液体喷射头，具有：具有喷嘴的绝缘喷嘴板，所述喷嘴具有：用于供应液体的液体供给口和用于将从所述液体供给口供给的液体喷射到基板上的喷射口; 与所述液体供给口连通的空腔以保留从所述喷射口喷出的液体; 静电电压施加装置，通过在喷嘴中的液体和空腔之间施加静电电压和基板而产生静电吸引力; 以及控制装置，其通过施加具有与施加在液体喷射中的静电电压相反的极性的相反极性的静电电压来控制用于进行偏振弛豫操作的静电电压施加装置，其中所述喷嘴是扁平喷嘴和所述控制装置。

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